WO2010005831A3 - Grayscale patterning of polymer thin films using direct-write multiphoton photolithography - Google Patents

Grayscale patterning of polymer thin films using direct-write multiphoton photolithography Download PDF

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Publication number
WO2010005831A3
WO2010005831A3 PCT/US2009/049207 US2009049207W WO2010005831A3 WO 2010005831 A3 WO2010005831 A3 WO 2010005831A3 US 2009049207 W US2009049207 W US 2009049207W WO 2010005831 A3 WO2010005831 A3 WO 2010005831A3
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
polymer layer
layer
grayscale
write
Prior art date
Application number
PCT/US2009/049207
Other languages
French (fr)
Other versions
WO2010005831A2 (en
WO2010005831A8 (en
Inventor
Daniel A. Higgins
Takashi Ito
Xiao YAO
Original Assignee
Kansas State University Research Foundation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kansas State University Research Foundation filed Critical Kansas State University Research Foundation
Publication of WO2010005831A2 publication Critical patent/WO2010005831A2/en
Publication of WO2010005831A3 publication Critical patent/WO2010005831A3/en
Publication of WO2010005831A8 publication Critical patent/WO2010005831A8/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70608—Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser

Abstract

Improved, high resolution, laser ablated grayscale assembles (A) are provided including a substrate (24a) and a polymer layer (24b) having an etched region (R) presenting areas of different, predetermined thicknesses. Preferably, the region (R) exhibits a maximum RMS roughness value of up to about 5 ran. The fabrication method involves providing a sample (24) having a substrate (24a) and polymer layer (24b), and laser ablating the layer (24b) by multiphoton photolithography to give the different thickness areas characteristic of a desired grayscale pattern. Preferably, the fabrication involves transmissivc laser ablation wherein the incident laser beam is transmitted through the substrate (24a) to ablate the layer (24b). Advantageously, the polymer layer (24b) comprises a poly(alkylene dioxythiophene):poly(styrene sulfonate) mixture.
PCT/US2009/049207 2008-07-07 2009-06-30 Grayscale patterning of polymer thin films using direct-write multiphoton photolithography WO2010005831A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US7869808P 2008-07-07 2008-07-07
US61/078,698 2008-07-07

Publications (3)

Publication Number Publication Date
WO2010005831A2 WO2010005831A2 (en) 2010-01-14
WO2010005831A3 true WO2010005831A3 (en) 2010-04-08
WO2010005831A8 WO2010005831A8 (en) 2010-06-10

Family

ID=41507675

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2009/049207 WO2010005831A2 (en) 2008-07-07 2009-06-30 Grayscale patterning of polymer thin films using direct-write multiphoton photolithography

Country Status (1)

Country Link
WO (1) WO2010005831A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117491142B (en) * 2024-01-02 2024-03-12 西南科技大学 Method for rapidly detecting surface crushing characteristics of granite particles

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040266207A1 (en) * 2001-05-23 2004-12-30 Henning Sirringhauss Patterning of devices
US20050202352A1 (en) * 2004-03-11 2005-09-15 Worcester Polytechnic Institute Systems and methods for sub-wavelength imaging

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040266207A1 (en) * 2001-05-23 2004-12-30 Henning Sirringhauss Patterning of devices
US20050202352A1 (en) * 2004-03-11 2005-09-15 Worcester Polytechnic Institute Systems and methods for sub-wavelength imaging

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DANIEL A. HIGGINS ET AL.: "High-resolution direct-write multiphoton photolitho graphy in poly films", APPLIED PHYSICS LETTERS, 2006 *

Also Published As

Publication number Publication date
WO2010005831A2 (en) 2010-01-14
WO2010005831A8 (en) 2010-06-10

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