WO2009145611A1 - Appareil et procédé pour l'épuration d'un gaz - Google Patents

Appareil et procédé pour l'épuration d'un gaz Download PDF

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Publication number
WO2009145611A1
WO2009145611A1 PCT/NL2008/050332 NL2008050332W WO2009145611A1 WO 2009145611 A1 WO2009145611 A1 WO 2009145611A1 NL 2008050332 W NL2008050332 W NL 2008050332W WO 2009145611 A1 WO2009145611 A1 WO 2009145611A1
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WO
WIPO (PCT)
Prior art keywords
gas
cryostat
xenon
vessel
cooling
Prior art date
Application number
PCT/NL2008/050332
Other languages
English (en)
Inventor
Johann Carl Rudolf Van Der Hart
Original Assignee
J.C.R. Van Der Hart Holding B.V.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by J.C.R. Van Der Hart Holding B.V. filed Critical J.C.R. Van Der Hart Holding B.V.
Priority to PCT/NL2008/050332 priority Critical patent/WO2009145611A1/fr
Priority to EP08766755A priority patent/EP2307836A1/fr
Publication of WO2009145611A1 publication Critical patent/WO2009145611A1/fr

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/06—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation
    • F25J3/063—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation characterised by the separated product stream
    • F25J3/0685—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation characterised by the separated product stream separation of noble gases
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2210/00—Processes characterised by the type or other details of the feed stream
    • F25J2210/42—Nitrogen
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2215/00—Processes characterised by the type or other details of the product stream
    • F25J2215/36—Xenon
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2240/00—Processes or apparatus involving steps for expanding of process streams
    • F25J2240/40—Expansion without extracting work, i.e. isenthalpic throttling, e.g. JT valve, regulating valve or venturi, or isentropic nozzle, e.g. Laval
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2270/00—Refrigeration techniques used
    • F25J2270/90—External refrigeration, e.g. conventional closed-loop mechanical refrigeration unit using Freon or NH3, unspecified external refrigeration
    • F25J2270/904—External refrigeration, e.g. conventional closed-loop mechanical refrigeration unit using Freon or NH3, unspecified external refrigeration by liquid or gaseous cryogen in an open loop
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2280/00—Control of the process or apparatus
    • F25J2280/30—Control of a discontinuous or intermittent ("batch") process

Definitions

  • the present invention relates to a method and apparatus for purifying a gas.
  • WO-87/06684 discloses a method for krypton separation. In that method, two streams of liquid oxygen are produced, one of which being richer in krypton and xenon than the other one. The relatively enriched stream is subjected to further steps for enriching.
  • US-7,368,000 discloses a method for recovering xenon or krypton from a gas mixture.
  • the gas mixture is conveyed through a gas chromatography column.
  • the invention aims to provide a robust method for purifying a gas, in particular a method suited for obtaining purified xenon gas.
  • this is realized with a method for purifying a xenon-comprising gas for obtaining purified xenon, in which the xenon-comprising gas is introduced into a cryostat, and said xenon-comprising gas is subjected to cycles comprising the steps of cooling the xenon-comprising gas below a temperature required to make the xenon gas liquid in order to obtain a fluid having a liquid phase and a gas phase, removing the gas phase from the cryostat in a time which is short in comparison to the evaporation or sublimation time of the liquid phase, and heating the remaining liquid phase until the largest part of the xenon-comprising gas is in its gas phase.
  • the invention further provides an apparatus for purifying a gas, comprising a cryostat having a cryostat inlet and a cryostat outlet, said cryostat further having an internal vessel for holding said gas, a cooling jacket, at least partially surrounding said internal vessel and having a cooling medium inlet an a cooling medium outlet for allowing a cooling medium to be introduced into said cooling jacket for cooling said internal vessel for cooling said gas, and heating elements reaching into said internal vessel of said cryostat, an overflow vessel which is coupled via a valve to the upper part of said internal vessel of said cryostat, for allowing said overflow vessel to be in fluid communication with the upper part of the cryostat volume, and a vacuum pump which is operationally coupled to said overflow vessel for reducing the pressure in said overflow vessel.
  • the use of the particular steps provide a method which is robust. It allows a flow of highly contaminated xenon gas to be purified.
  • the gas can even be purified up to a level of 4.0, and even levels of up to 6.0 and higher can be obtained.
  • the method allows a continuous process for the purification of effluent gas from production processes.
  • the method may require a buffer vessel for the storing xenon- comprising gas before applying the method of the invention. Economically, it is preferred if all the xenon-comprising gas is heated until it is in its gas phase.
  • the buffer vessel can also be used for recycling gas which originates from the overflow vessel. This enhances the performance of the apparatus and method. It enables repeating the cycles of the method almost without loss of xenon gas.
  • a cryogenic temperature is a temperature below about -70 degrees Celsius (203K).
  • the cryostat is filled with such an amount of xenon-comprising gas that said liquid phase fills less than about 90 % of the volume of the cryostat. Filling the cryostat further with liquid phase will reduce the efficiency of the method. For an efficient process, a filling of about 50-70 % liquid phase is efficient.
  • said xenon-comprising gas is cooled to a temperature below about - 80 degrees Celsius (193K).
  • said xenon-comprising gas is cooled to a temperature below about - 100 degrees Celsius (173K).
  • the xenon-comprising gas is cooled to a temperature below the temperature a which the xenon becomes liquid. In practise, this will result in a temperature below 165 K.
  • said xenon-comprising gas comprises at least about 50% xenon.
  • contaminated xenon will have a maximum of about 80% xenon.
  • purify gas which has at least about 20% xenon It will be clear that it will also be possible to purify cleaner xenon. In fact, it may be possible to clean for instance 4.7 xenon (99.997% xenon). Further purification may require more cycles.
  • said liquid phase is heated to a temperature of at least about -90 degrees Celsius (183K), in an embodiment to a temperature of at least about -80 degrees Celsius (193K).
  • 183K -90 degrees Celsius
  • the gas may need to be cooled again (liquefied).
  • the temperature should be high enough to turn largest part of the contents of the cryostat into a gas. This will make the process give the best energy effectiveness. Part of the contents, however, may in practise remain solid.
  • heating to slightly above 165K the boiling temperature of xenon
  • this may require more time before cooling again, i.e. a slower process cycle.
  • said gas phase is removed in about 1-10 seconds.
  • it should be fast enough to prevent a substantial part of the liquid phase to evaporate.
  • Fast removal may require low pressure of an overflow vessel.
  • In may also require a large volume of the overflow vessel. It may also require a large cross section of a connection between cryostat and overflow vessel.
  • the pressure of the xenon-comprising gas in the first cycle is introduced in the cryostat at a pressure of less than about 50 bar. Using a higher pressure may result in solid xenon. A high pressure reduces the filling time and may reduce required cooling
  • the pressure of the gas phase of the xenon-comprising gas in the subsequent cycles in the cryostat is less than about 1 bar. This is the pressure before removing the gas atmosphere. In fact, when the amount of contamination is low, it may be much lower.
  • said gas phase is removed by bringing the part of said cryostat holding said gas phase into contact with a volume which is at a lower pressure than said gas phase.
  • a volume which is at least 2 times the volume of the gas phase showed to be efficient.
  • a pressure of below 10 ⁇ -3 mbar also provides fast removal of the gas atmosphere. Using a lower pressure may increase the removal speed. Furthermore, it may increase the amount of contamination which can be removed. In fact, the pressure may be increased at each cycle.
  • said gas phase is removed by bringing the part of said cryostat holding said gas phase into contact with a volume which is below about 10 ⁇ -3 mbar. This will give an efficient removal. It may be considered at the first cycle to use a higher pressure, if the amount of contamination is very high.
  • said gas phase is removed by bringing the part of said cryostat holding said gas phase into contact with a volume which is at least about 2 times the volume of said gas phase. As stated before, a volume of up to 10 times the volume of the gas phase may be used.
  • the removed volume of gas may be returned into the process when starting with a next batch of gas in a first cycle. Usually, the gas removed during the first cycle may be thrown away as this will usually have a very large amount of contaminant.
  • said xenon-comprising gas is introduced at a temperature of more than about -50 degrees Celsius. This prevents forming of solid xenon in the system.
  • said method is substantially a batch process.
  • a quantity of gas is stored and batch- wise, portions of the gas are purified, thus making the method a continuous batch process.
  • further intermediate storage buffers may be used.
  • said step of removing said gas phase is done in such a way that the temperature of said liquid phase is lowered not more than 40 degrees. As stated above, solid material in the cryostat may slow the process down.
  • said xenon-comprising gas which is introduced into said cryostat has a feed purity level (FPL) and said purified xenon has a set purity level (SPL), and the difference between the FPL and SPL is used for setting the number of cycles.
  • FPL feed purity level
  • SPL set purity level
  • a controller may determine the number of cycles before the cycles start. It may also adjust the number of cycles during the process of purification.
  • said xenon-comprising gas is cooled by contacting it indirectly with a cooling medium, in an embodiment liquid nitrogen. This has proven to be efficient.
  • said steps are repeated at least four times.
  • the process can in fact run very many cycles, depending on the required purity. Usually, about ten cycles will be sufficient.
  • said removed gas phase is returned to a buffer of xenon-comprising gas if the contents of xenon in said gas phase is above a set level. This can be automatically done after the first cycle. In another embodiment, this is done after several cycles.
  • the apparatus further comprises temperature sensors in said cryostat. This allows good process control.
  • said temperature sensors are provided at various levels in said internal vessel in said cryostat. Thus, the process can be monitored sufficiently.
  • the apparatus further comprises a flow sensor for measuring a mass flow of a gas into said cryostat.
  • a flow sensor for measuring a mass flow of a gas into said cryostat.
  • the apparatus further comprises a controller, operationally coupled to said temperature sensors and to valves, for steering a cooling and heating process of the cryostat.
  • the temperature of the cooling fluid entering the cryostat and the temperature inside the cryostat are compared.
  • xenon is a good isolator, there will be a difference which decreases during cooling.
  • the apparatus further comprises a buffer vessel for storing a gas which needs to be purified, which buffer vessel is operationally coupled to said cryostat. This allows the batch process to be a continuous batch process.
  • the apparatus further comprises a device for freezing out moisture and carbon dioxide from a gas, which device is operationally coupled to the inlet of said cryostat.
  • the apparatus further comprises at least one molecular sieve, operationally coupled to the outlet of the cryostat. Using this device, it is possible to remove remaining traces of contaminants.
  • said molecular sieve comprises an A12O3 skeleton which has been calcinated to have an pore cross section adapted to block molecules of the gas which needs to be purified, in an embodiment in which said gas is xenon, said pore cross section is smaller than about 0.3 nanometre.
  • said pore cross section is smaller than about 0.3 nanometre.
  • other pores sizes may be selected.
  • a molecular sieve us used which has an Al-Si basis.
  • a 6 ring zeolite or an 8 ring zeolite may be used.
  • the invention further pertains to a cryostat, specifically designed for use in the method or the apparatus of the preceding claims.
  • the invention further relates to a method for purifying a krypton-comprising gas for obtaining purified krypton.
  • a method for purifying a krypton-comprising gas for obtaining purified krypton In such a method, it should be clear that the krypton- comprising gas should be cooled to a temperature at or below which krypton is mainly liquid.
  • the invention further relates to a method for purifying a neon-comprising gas for obtaining purified neon.
  • a method for purifying a neon-comprising gas for obtaining purified neon it should be clear that the neon-comprising gas should be cooled to a temperature at or below which neon is mainly liquid.
  • the temperatures used should b adapted to the temperature at which argon liquefies.
  • Fig. 1 a cross sectional view of an embodiment of a cryostat which can be used
  • Fig. 2 a cross sectional view through the lid of the cryostat of figure 1;
  • Fig. 3 a top view of the lid of figure 2;
  • Fig. 4 a view on the bottom of the lid of fig. 2;
  • Fig. 5 a process cycle of the method of the invention for purifying an effluent gas which is rich in xenon;
  • Figs. 6a-6c a process sheet showing the process cycles, cut in three parts;
  • Figs. 7a and 7b a simplified system chart cut into two parts fitting together, showing the most important apparatus parts of the apparatus of the invention.
  • FIG 1 an example of a cryostat which can be used in the method and apparatus of the current invention is shown.
  • the cryostat 1 has an internal vessel 2 for holding a gas (liquefied).
  • the cryostat 1 is closed by a lid 3 which has an inlet 4 to the internal vessel 2 and an outlet 5 for extracting the purified gas from the internal vessel 2.
  • the internal vessel 2 is surrounded by a cooling jacket 6. Through this cooling jacket, a cooling medium can circulate around the internal vessel 2 in order to cool its contents.
  • a cooling medium In an embodiment for purifying xenon, liquid nitrogen is used for cooling the contents of the internal vessel 2.
  • the cooling jacket 6 has inlets 7 for the cooling medium, and outlets 7' for the cooling medium. In the drawings, these inlets 7 and outlets 7' are depicted at one side of the cryostat 1. In practice, however, they will be located at opposite positions of the cryostat to allow a proper flow of cooling medium.
  • the cooling jacket has been divided into three sections, indicated with numbers 8, 9 and 10. Using three sections 8, 9, 10, it is possible to better control the temperature in the cryostat 1.
  • the cryostat 1 further has an insulating jacket 11 which in this embodiment consists of an isolating jacket 11 surrounding the cooling jacket.
  • the space between the wall of isolating jacket 11 and the cooling jacket 6 is usually put at a reduced pressure
  • Fig. 2 shows a cross section through lid 3 of the cryostat 1.
  • Lid 3 has a through hole 4 as inlet 4 for introducing gas into the cryostat 1.
  • Lid 3 further has an outlet 5 formed by a through hole.
  • Lid 3 further has means for cooling 13 and means for heating 12 the gas in the cryostat 1.
  • the lid 3 has a set of channels 13 in the plane of the lid through which a cooling medium/fluid can flow.
  • the lid 3 also has channels 12 through which hot fingers can be inserted for heating.
  • FIG. 3 shows a top view of lid 3.
  • the lid 3 has a central outlet 5 and an inlet 4.
  • the cooling channels 13 are indicated with dotted lines.
  • the cooling channels 13 are in this embodiment three sets of circular channels, each having its own inlet and outlet for cooling fluid.
  • the channels 12 for heating are three channels which form three sides of a triangle, also indicated with dotted lines.
  • FIG 5 a temperature cycle of an embodiment of the method of the invention used for purifying xenon is shown.
  • the temperature starts at an ambient temperature of 20 degrees Celsius (293 K).
  • the cryostat in this embodiment is filled at a rate of 58 nl/min, during which the gas is cooled to a temperature of -112 degrees Celsius (161 K).
  • the cryostat is filled up to 2/3 of its total volume with liquid gas.
  • 1/3 of the volume is filled with a gas phase.
  • the gas atmosphere is rapidly removed, in this case in 5 seconds. At this speed, the xenon does not have the time to substantially evaporate.
  • the liquid in the cryostat which now has a top layer or gas atmosphere which is at a low pressure, usually of between l*10 ⁇ -3 and 5 * 10 ⁇ -3 mbar, is heated to a temperature at which the liquid becomes gaseous again.
  • a temperature at which the liquid becomes gaseous again For xenon, a temperature of about -80 degrees Celsius (193 K) proved sufficient.
  • Heating will be done as quickly as possible. In this embodiment, it is done within one hour. In fact, in order to speed up the process as much as possible, heating is done as fast as possible.
  • the construction of the cryostat usually is the limiting factor in this.
  • the cycle of cooling, removal of the remaining gas phase, and heating is repeated several times.
  • the gas can then be sampled in order to check is a desired degree of purity is already reached. If this is the case, the gas can be processed further using other purification techniques, or used as such.
  • Figures 6a-6c shows a process cycle which is used in this embodiment for the purification of xenon.
  • the schedule is cut into three parts in order to be readable, and shows the different steps the controller will take in the process.
  • Figs. 7a and 7b shows the system chart, cut into two parts for clarity reasons.
  • the apparatus in this embodiment uses three identical cryostats 1, 1 ' and 1 " in order to be failsafe and in order to provide sufficient production capacity. Some of the features of the cryostats 1, 1 ' and 1 " are already discussed above.
  • the apparatus has an inlet for contaminated gas 15, in this case contaminated xenon gas.
  • the contaminated feed gas is then passed though a device for removing a large fraction of the moisture and carbondioxide from the gas.
  • the gas is passed through a cooled body in order to freeze out these components. In this embodiment, this is done because these compounds can be removed easily, in particular if they are present in relatively large amounts. It is not required to use this pre-phase.
  • the gas is stored in a storage vessel 17.
  • This storage vessel 17 is used for transforming the batch process of the cryostat 1 into a continuous batch process.
  • the volume of this storage vessel 17 is matched to the flow of feed gas and to the processing capacity of the cryostats 1, 1 ' and 1".
  • batches of feed gas are fed to the cryostats 1, 1 ' and 1", via inlets 4, 4' and 4".
  • the gas is cooled using a cooling fluid.
  • liquid nitrogen in introduced into the apparatus via cooling fluid inlet 23.
  • the cooling fluid cools the gas via the cooling jacket of the cryostat and via the lid of the cryostat.
  • the cryostat further comprises a hollow spiral 25 running through the inner vessel.
  • cooling fluid can be passed.
  • the spiral 25 is designed in such a way that it can pass cooling fluid through its core down and through its wall up, and vise versa. In this way, it is possible to further control the temperature in the cryostat at different locations.
  • each cryostat has its own overflow vessel 20, 20' and 20", which is coupled via valves 22, 22' and 22", respectively, to the upper part of the inner vessel of a cryostat.
  • Each overflow vessel is coupled via a line to a vacuum pump 22.
  • the exact nature of this type of pumps is known to a person skilled in the art.
  • the pressure in the overflow vessels is reduced.
  • the overflow vessel 17 is brought at a pressure below the pressure of the gas atmosphere which exists above the liquid gas in the cryostat. The pressure should be such that the gas atmosphere is removed before the liquid is evaporated.
  • the volume of an overflow vessel 17 should be such that the gas atmosphere is removed quickly. In an embodiment, both volume and pressure will be chosen for fast removal.
  • the pressure will be between about 10*10 ⁇ -3 and l*10 ⁇ -3 mbar.
  • the volume will be selected to be at least 2 times the gas atmosphere volume. It is also conceivable to use one overflow vessel for all the cryostats.
  • the purified gas which is removed from the cryostats is then stored intermediately into an intermediate storage vessel 26. This can be done for further improving the continuous nature of the apparatus.
  • the gas can be further purified up to very high levels using techniques which are well known as such. For instance commercially available getters, molecular sieves, and other techniques.
  • the gas is fed to specially designed and constructed molecular sieves 40, 40' 40" and 40'".
  • These molecular sieves are based upon an aluminium oxide (A12O3) skeleton. This skeleton was calcinated to obtain a pore size cross section of less than 0.3 nanometres, which is effective for adsorbing molecules below the kinetic diameter of xenon. Thus allowing other, smaller molecules to adsorbed.
  • the further purified xenon is stored in a storage vessel 50.
  • the cryostat has various temperature sensors.
  • PTlOO temperature sensors are used. These sensors are operationally coupled to a PLC process controller.
  • the cryostat has various temperature sensors, indicated with PT(number) and T(number). The temperature is measured at several levels in the cryostat. Furthermore, the temperature of the cooling fluid entering and leaving the cryostat can be measured. A hot finger is indicated with H7, for instance.
  • the process and apparatus described in this text are specifically designed for purifying xenon.
  • the parameters can, however, be modified in order to make the process and method suited for purifying, for instance, krypton.
  • krypton has a boiling point at 120 Kelvin and a melting point at 116 K
  • xenon has its boiling point at 165 K and its melting point at 161 K.
  • all the temperature mentioned for xenon should be lowered by 45 K in order to use the process for krypton.
  • the boiling temperature of Argon should b kept in mind.
  • temperatures should be lowered with about 78 K with respect to xenon.
  • Neon the temperatures should be lowered with about 138 K, i.e. the boiling temperature of neon should be kept in mind.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Separation By Low-Temperature Treatments (AREA)

Abstract

L’invention porte sur un procédé et sur un appareil pour l’épuration d’un gaz contenant du xénon, comprenant un cryostat (1) pourvu d’un orifice d’admission de cryostat (4) et d’un orifice de sortie de cryostat (5), ledit cryostat possédant en outre une enceinte intérieure (2) contenant ledit gaz, une chemise de refroidissement(6), entourant au moins en partie ladite enceinte intérieure et possédant un orifice d’admission de milieu de refroidissement (7) et un orifice de sortie de milieu de refroidissement (7’) permettant à un milieu de refroidissement d’être introduit dans ladite chemise de refroidissement pour refroidir ladite enceinte intérieure et ainsi ledit gaz, et comprenant également des éléments chauffants atteignant ladite enceinte intérieure dudit cryostat, une enceinte de débordement couplée par l’intermédiaire d’une valve à la partie supérieure de ladite enceinte intérieure dudit cryostat, permettant à ladite enceinte de débordement d’être en communication fluidique avec la partie supérieure du volume du cryostat, ainsi qu’une pompe à vide couplée de manière opérationnelle à ladite enceinte de débordement et servant à réduire la pression à l’intérieur de ladite enceinte de débordement.
PCT/NL2008/050332 2008-05-30 2008-05-30 Appareil et procédé pour l'épuration d'un gaz WO2009145611A1 (fr)

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PCT/NL2008/050332 WO2009145611A1 (fr) 2008-05-30 2008-05-30 Appareil et procédé pour l'épuration d'un gaz
EP08766755A EP2307836A1 (fr) 2008-05-30 2008-05-30 Appareil et procédé pour l'épuration d'un gaz

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DE19635002A1 (de) * 1996-08-30 1998-03-05 Messer Griesheim Gmbh Verfahren zur Online-Rückgewinnung von Xenon aus Narkosegas
WO1998018718A1 (fr) * 1996-10-29 1998-05-07 Siad Societa' Italiana Acetilene & Derivati S.P.A. Procede et appareil servant a purifier et a recuperer du xenon et d'autres gaz rares utilises dans des systemes anesthesiques
DE19749836A1 (de) * 1997-11-11 1999-05-20 Forschungszentrum Juelich Gmbh Ausfrieren einer Gaskomponente aus einem Gasgemisch
WO2004060459A1 (fr) * 2003-01-02 2004-07-22 Uws Ventures Ltd Dispositif de separation de gaz

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