WO2009136429A1 - Masking device and plasma display panel manufacturing system equipped with the same - Google Patents

Masking device and plasma display panel manufacturing system equipped with the same Download PDF

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Publication number
WO2009136429A1
WO2009136429A1 PCT/JP2008/001181 JP2008001181W WO2009136429A1 WO 2009136429 A1 WO2009136429 A1 WO 2009136429A1 JP 2008001181 W JP2008001181 W JP 2008001181W WO 2009136429 A1 WO2009136429 A1 WO 2009136429A1
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WO
WIPO (PCT)
Prior art keywords
mask
work area
masks
masking
substrate
Prior art date
Application number
PCT/JP2008/001181
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French (fr)
Japanese (ja)
Inventor
憲亮 徳永
友彦 村瀬
Original Assignee
日立プラズマディスプレイ株式会社
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Priority to PCT/JP2008/001181 priority Critical patent/WO2009136429A1/en
Publication of WO2009136429A1 publication Critical patent/WO2009136429A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B12/00Arrangements for controlling delivery; Arrangements for controlling the spray area
    • B05B12/16Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
    • B05B12/20Masking elements, i.e. elements defining uncoated areas on an object to be coated
    • B05B12/22Masking elements, i.e. elements defining uncoated areas on an object to be coated movable relative to the spray area
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001General methods for coating; Devices therefor
    • C03C17/002General methods for coating; Devices therefor for flat glass, e.g. float glass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/10AC-PDPs with at least one main electrode being out of contact with the plasma
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B12/00Arrangements for controlling delivery; Arrangements for controlling the spray area
    • B05B12/16Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
    • B05B12/20Masking elements, i.e. elements defining uncoated areas on an object to be coated
    • B05B12/24Masking elements, i.e. elements defining uncoated areas on an object to be coated made at least partly of flexible material, e.g. sheets of paper or fabric
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/30Aspects of methods for coating glass not covered above
    • C03C2218/34Masking

Definitions

  • the present invention relates to an apparatus for performing masking for attaching a substance to a surface of an object except for a part thereof, and a plasma display panel manufacturing system.
  • a plate-shaped mask on the surface of the object where the material of the film material does not adhere Masking covered with (shielding body) is performed.
  • the mask has a shape corresponding to the masking area to be shielded.
  • one mask is repeatedly used for a plurality of times of film formation in the case where a film is sequentially formed on a large number of workpieces to be formed. Then, the film formation is periodically stopped, and cleaning for removing a substance attached to the mask or mask replacement for replacing the used mask with an unused mask is performed.
  • a thermal spraying masking device having an endless belt as a mask is known (Patent Document 1).
  • the endless belt is guided by a plurality of pulleys so as to circulate and move along a plane including the conveying direction of the object to be sprayed, and passes through a spraying position for receiving spraying and a retreating position for cleaning.
  • the sprayed material adhering to the endless belt at the spraying position is removed by the scraper at the retracted position. That is, in this apparatus, the endless belt is automatically cleaned when it passes the retracted position.
  • Masking with a belt (strip mask) that is longer than the object to be masked has the advantage that other parts of the belt can be cleaned while masking using part of the belt.
  • it is advantageous to lengthen the belt in order to reduce belt consumption, it is advantageous to lengthen the belt.
  • the belt guide mechanism in an apparatus that circulates an endless belt, if the belt is lengthened, the belt guide mechanism becomes complicated and the apparatus becomes large.
  • an endless belt having a good seam without protrusions or steps that damage an object is expensive.
  • the present invention has been made in view of such circumstances, and an object of the present invention is to provide a masking apparatus that can clean the mask without pausing the masking and prolong the life of the mask. Another object is to provide a manufacturing system suitable for a masking process in mass production of plasma display panels.
  • a masking device that achieves the above object is a device for masking to attach a substance to a surface of an object except for a part thereof, and is a belt-like mask extending across a work area where an object to be masked is placed And a pair of forward and reverse rotating rollers that wind the mask on both sides of the working area in the extending direction of the mask.
  • the masking device reciprocates the mask by switching the rotation direction of the pair of rollers. Since the mask is arranged in a roll form in which a pair of rollers are wound, the length of the mask can be made sufficiently longer than the distance between the rollers. If the mask is lengthened, the use frequency per unit length of the mask is reduced, so that the life of the mask is extended.
  • the mask can be cleaned outside the work area.
  • a means for automatically cleaning may be assembled to the masking device, or cleaning may be performed using a cleaning device separate from the masking device.
  • the position of the mask in the width direction of the mask in the work area is variable, so that the use of the masking apparatus is diversified.
  • a manufacturing system that achieves the above object is a system that is used in a process of partially attaching a layer forming material to the surface of a substrate in the manufacture of a plasma display panel, and injects the layer forming material downward from an injection port.
  • An apparatus a transfer device that transfers the substrate in one direction and places it in a work area below the injection port, and masking that partially hides the surface of the substrate arranged in the work area from the injection port Device.
  • the masking device includes a strip-shaped mask extending across the work area along a direction intersecting the substrate transport direction, and a pair of winding the mask on both sides of the mask extending direction with respect to the work area And a roller capable of forward and reverse rotation, and the mask is reciprocated by switching the rotation direction of the pair of rollers.
  • the masking apparatus exemplified as an embodiment of the present invention is a facility for manufacturing a plasma display panel.
  • a plasma display panel is a device used for displaying television images and computer output, and is composed of a pair of glass plates each having an electrode arranged thereon.
  • a system 100 for manufacturing a plasma display panel is used in a process in which a layer forming material is partially dispersed and adhered to the surface of a substrate 10 to be processed later to be a glass plate.
  • the layer forming material is a powder of magnesium oxide crystals, and is dispersed in order to improve gas discharge characteristics. Since the effect of spreading the magnesium oxide crystals is not directly related to the present invention, the description thereof is omitted here.
  • Japanese Patent Application Laid-Open No. 2008-91086 describes the effect of spraying magnesium oxide crystals.
  • the system 100 is for spraying the layer forming material by transporting the substrate 10 in one direction (hereinafter referred to as the first direction) M1 and the injection device 20 having the nozzle 21 that injects the layer forming material downward.
  • a transport device 30 disposed in the work area and a masking device 40 that partially hides the surface of the substrate 10 disposed in the work area from the ejection port of the nozzle 21 are provided.
  • the working area is a space in a predetermined range in front of the nozzle 21 with respect to the ejection port, and is a place where the substrate 10 to be ejected and a mask for masking should be arranged. In the example, since the nozzle 21 faces downward, the work area is located below the injection port.
  • the injection device 20 includes a material tank and an injection pump (not shown) and is called a spray gun.
  • the exemplified transfer device 30 includes a belt conveyor that horizontally transfers the substrate 10 and a lift mechanism 35 (see FIG. 2) that moves the substrate 10 up and down within the work area.
  • the belts 31 and 32 for horizontal conveyance are intermittently driven so that the substrate 10 stays in the work area for a predetermined time.
  • a substrate 10a carried out of the work area by belt driving is depicted.
  • the sizes of the substrates 10, 10a, 10b correspond to, for example, a screen size of 50 inches diagonal or more.
  • the masking device 40 is configured as described in detail below.
  • the reason why masking performed by the masking apparatus 40 is necessary is mainly to increase the yield of a scribe process in which unnecessary portions of the substrate 10 are removed or divided after the layer forming material is dispersed.
  • the position of the scribe line defined on the substrate 10 depends on the screen size of the plasma display panel to be manufactured.
  • the masking device 40 is configured to be able to change the mask arrangement position in the work area so that it can be used for manufacturing a plurality of types of plasma display panels having different screen sizes.
  • the masking device 40 includes first and second belt-like masks 41 extending away from each other so as to horizontally traverse the work area along a second direction M2 that intersects the first direction M1 perpendicular to the transport direction of the substrate 10. , 42, two pairs of forward and reverse rollers 45A, 45B, 46A, 46B around which the first and second masks 41, 42 are wound on both sides of the work area in the second direction M2, and the work area And third and fourth belt-like masks 43 and 44 that extend along the first direction M1 apart from each other and are distributed outside the work area to one side and the other side in the second direction M2 with respect to the work area.
  • the masking device 40 includes a driving mechanism (not shown) including a motor that rotates a total of four pairs of rollers, and a controller (not shown) that controls the driving mechanism and the washing machines 50A and 50B.
  • the first mask 41 is stretched above the substrate 10 disposed in the work area by a pair of pulleys 61 and 62 that rotate about an axis parallel to the first direction M1.
  • the second mask 42 is stretched above the substrate 10 by a pair of similar pulleys 63 and 64.
  • the third mask 43 is stretched above the substrate 10 disposed in the work area by a pair of pulleys 71 and 72 that rotate about an axis in a direction inclined with respect to the second direction M2 in the horizontal plane and 90. It is twisted and guided to the rollers 47A and 47B for winding.
  • the fourth mask 44 is stretched above the substrate 10 by a pair of pulleys 73 and 74 arranged symmetrically with respect to the pulleys 71 and 72 and twisted 90 degrees to guide the rollers 48A and 48B for winding. Is done.
  • These four masks 41, 42, 43, and 44 constitute a square mask in the work area.
  • Each of the masks 41, 42, 43, and 44 has a length of, for example, 10 times or more the path length between the rollers of the corresponding winding roller pair, and is wound around the roller pair in a roll shape.
  • the mask is sent out from the roll of one roller of the roller pair, and at the same time, the mask is wound up by another roller. At this time, only the roller on the winding side may be driven to drive the roller on the sending side, or both may be driven in synchronization. In any case, it is desirable to apply an appropriate tension so that the mask does not loosen.
  • the delivery reaches the maximum, the rotation of the roller pair is reversed and the mask is delivered in the opposite direction.
  • the mask reciprocates along a predetermined path as the roller pair is normally reversed.
  • the roller 45A sends out the first mask 41 and the roller 45B takes up, and the roller 46A sends out the second mask 42 and the roller 46B takes up.
  • the roller 47A sends out the third mask 43 and the roller 47B winds up, and the roller 48A sends out the fourth mask 44 and the roller 48B takes up. That is, the movement direction is opposite between the first mask 41 and the second mask 42 that are parallel to each other in the work area, and between the third mask 43 and the fourth mask 44 that are parallel to each other in the work area. But the direction of movement is the opposite.
  • the present invention is not limited to this, and the relative relationship in the movement direction of the four masks 41, 42, 43, 44 can be arbitrarily determined.
  • the mask movement includes an intermittent movement in which the mask is stationary while the layer forming material is being sprayed (hereinafter referred to as work) and a continuous movement in which the mask is moved during the work. Intermittent movement is preferred when the mask is brought into close contact with the substrate 10 in order to increase the masking accuracy. In the case of adopting continuous movement, it is desirable not to bring the mask and the substrate 10 into close contact.
  • the mask arrangement position in the work area is changed by the horizontal movement of the first and fourth masks 41 and 44.
  • the pulleys 61 and 62 for guiding the first mask 41 are supported so as to be movable in the axial directions thereof, and the pulleys 73 and 74 for guiding the fourth mask 44 are supported so as to be movable in the second direction M2.
  • the substrate 10a depicted in FIG. 1 is dispersed in a masking state in which the first mask 41 is closest to the second mask 42 and the fourth mask 44 is closest to the third mask 43 within the movable range. It has the layer 19a formed by.
  • the substrate 10b is formed by spraying in a masking state in which the first mask 41 is furthest away from the second mask 42 and the fourth mask 44 is furthest away from the third mask 43 within the movable range. It has a layer 19b.
  • the first and fourth masks 41 and 44 are not necessarily arranged at the end of the variable range, and can be arranged at any position within the variable range. The movement of the first mask 41 and the movement of the fourth mask 44 can be performed independently.
  • the movable range is appropriately selected according to the application of the masking device 40.
  • the positions of the second and third masks 42 and 43 can be made variable, thereby making the mask arrangement more diverse.
  • the material of the masks 41, 42, 43, 44 may be metal or resin as long as it can withstand repeated use.
  • the thickness needs to satisfy the condition that it can be rolled and that plastic deformation does not occur when guided by a pulley.
  • Preferred examples of the masks 41, 42, 43, 44 include stainless steel (SUS304, SUS316, etc.) tapes having a thickness of about 0.05 to 0.5 mm.
  • Each of the cleaning machines 50A and 50B disposed on both sides of the work area in the second direction M2 has a liquid tank 51 for storing a cleaning liquid (for example, a nitric acid solution) and a moving path of each of the masks 41, 42, 43, and 44.
  • a path switching mechanism 53 for switching between a winding path and a delivery path, and a blower 54 as means for removing the cleaning liquid from the cleaned mask.
  • the path switching mechanism 53 of the cleaning machines 50A and 50B is a mechanism for moving up and down a single pulley or a plurality of pulleys that guide the masks 41, 42, 43, and 44, respectively. As shown in FIG. 2 as a representative movement path of the first mask 41, each path switching mechanism 53 causes a feeding path R1 that does not pass through the cleaning liquid 52 and a winding path R2 that passes through the cleaning liquid 52. Switching takes place.
  • the delivery path R1 is set by the path switching mechanism 53 of the cleaning machine 50A for the part of the mask 41 that is sent to the work area, and the part of the mask 41 that passes the work area is cleaned.
  • the winding path R2 is set by the path switching mechanism 53 of 50B.
  • blower 54 of the wind-up side cleaning machine 50B blows air onto both the front and back surfaces of the portion of the mask 41 that passes through the cleaning liquid.
  • the blower 54 of the washing machine 50B on the delivery side is at rest.
  • the delivery path R1 is set on one of the two cleaning machines 50A and 50B and the winding path R2 is set on the other as shown in FIG.
  • the delivery path R1 is set for the part to be sent out of the mask 43
  • the take-up path R2 is set for the part to be taken up.
  • a delivery path R1 is set for a portion to be sent out of the mask 44
  • a take-up path R2 is set for a portion to be wound.
  • the flowchart in FIG. 3 shows the procedure for switching the rotation direction of the roller pair corresponding to one mask and switching the movement path in the cleaning machine.
  • the controller of the masking device 40 checks the mask winding state in the roller pair corresponding to each mask when the masking device 40 starts operation. For example, for the mask 41, the state of the pair of rollers 45A and 45B is checked. One of the pair of rollers is first determined as the first and the other is determined as the second, and the controller first checks whether or not the first roller can be sent out (# 11).
  • the state that can be sent out is a state in which a mask is wound around the roller. This state can be detected by a method in which the size of the roll diameter is detected by a sensor or the amount (time, length, or roller rotation speed) is counted at the time of feeding.
  • the mask moving path in the cleaning machine between the first roller and the work area is set as the sending path R1, and the cleaning machine between the second roller and the work area is in the cleaning machine.
  • the path switching mechanisms 53 of the two cleaning machines 50A and 50B are controlled so that the mask movement path is the winding path R2 (# 12).
  • forward rotation of the roller pair is started (# 13).
  • the positive rotation is a rotation in which the first roller sends out the mask and the second roller winds up the mask.
  • the positive rotation is intermittent or continuous rotation as described above. If the first roller is not ready to be fed, the controller executes a process of step number # 15 described later.
  • the forward rotation is stopped, and the mask moving path in the cleaning machine between the first roller and the work area is defined as a winding path R2.
  • the path switching mechanism 53 of each of the two cleaning machines 50A and 50B is controlled so that the mask movement path in the cleaning machine between the second roller and the work area is set as the delivery path R1 (# 15). Whether or not the delivery has reached the limit can be determined by providing a mark (for example, a hole) in the vicinity of the mask edge and detecting it optically or mechanically.
  • reverse rotation of the roller pair is started (# 16).
  • the reverse rotation is a rotation in which the second roller feeds the mask and the first roller winds the mask.
  • the reverse rotation is also intermittent or continuous rotation.
  • step # 17 When the delivery by the second roller reaches or reaches a limit (# 17), the reverse rotation is stopped and the process returns to step # 12 to switch the path in the cleaning machine and the rotation direction of the roller pair. .
  • each of the belt-like masks 41 to 44 is used as a substantial shield for masking in one spraying, and different parts of the masks 41 to 44 are moved in the length direction during a plurality of maskings. Since it can be used, the deposition amount of the substance adhering to the mask can be reduced. By reducing the deposition amount, it is possible to prevent the boundary between the masking region and the non-masking region from being distorted by the deposit, and it is possible to shorten the time required for cleaning the mask.
  • the route of the loop is not complicated even if the mask is sufficiently long.
  • rollers 45A, 45B, 46A, 46B, 47A, 47B, 48A, and 48B around which the masks 41 to 44 are wound are arranged on both sides of the conveyance path of the substrate 10 that is a masking target, they are arranged above the conveyance path.
  • the configuration of the system 100 can be simplified compared with the case where In the configuration in which the cleaning machines 50A and 50B are assembled, the degree of freedom of arrangement of the cleaning machines 50A and 50B is large.
  • the positions in the width direction of the masks 41 to 44 can be made variable by a simple mechanism.
  • the masking apparatus 40 can be used for manufacturing a plurality of types of plasma display panels having different screen sizes.
  • the change over time of the masks 41 to 44 is compared with the case where the mask 41 is wound with the deposit remaining or wet with the cleaning liquid. Can be reduced.
  • the configuration of the system 100 is not limited to the example.
  • the substance sprayed by the injection device 20 is not limited to powder, but may be a liquid in which the powder is dispersed or another solution.
  • the nozzle 21 may be fixedly arranged, or may move along the surface of the object.
  • the transfer device 30 is not limited to the belt conveyor type, and may be a robot that handles the substrate 10 with an arm, for example.
  • the number of masks in the masking device 40 is not limited to four.
  • the configuration including only the first mask 41 or the configuration including only two masks that intersect each other may be employed.
  • the distance between the parallel masks in the work area and the width of each mask may be appropriately selected according to the size of the substrate 10.
  • the mask arrangement may be adapted to the masking target. For example, when masking a mother substrate in order to manufacture a plurality of plasma display panels at once, the masks are arranged so that a plurality of separated layers are formed.
  • the blower 54 on the sending side may be stopped as described above, or the blower 54 may be operated regardless of winding and sending.
  • air is blown to the mask after winding and before winding, but in addition to the blower 54, a blower for blowing air to the mask from the washing machines 50A and 50B toward the work area can be provided.
  • the cleaning liquid 52 is selected according to the sprayed material, and the mask material is selected in consideration of resistance to the cleaning liquid.
  • the size and material of the roller and pulley are also selected as appropriate.
  • the surface of the roller or pulley may be a smooth surface or a surface that has been processed to increase the frictional force, or may be a surface having elasticity such as synthetic resin or synthetic rubber.
  • the present invention can be used for masking for forming a film having a desired pattern including a coating film.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
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Abstract

A device (40) is used for masking, at the time of sticking a substance onto the surface of an object (10). The device has belt-like masks (41, 42) extending across an operation area in which an object to be masked is disposed, and a pair of forward/reverse rotatable rollers (45A, 45B), which are disposed on the both sides of the extending direction (M2) of the masks (41, 42) across the operation area and wind the masks (41, 42). The rotating direction of the rollers (45A, 45B) is switched to reciprocate the masks (41, 42).

Description

マスキング装置およびそれを備えたプラズマディスプレイパネル製造システムMasking apparatus and plasma display panel manufacturing system having the same
 本発明は、物体の表面にその一部を除いて物質を付着させるためのマスキングをする装置およびプラズマディスプレイパネルの製造システムに関する。 The present invention relates to an apparatus for performing masking for attaching a substance to a surface of an object except for a part thereof, and a plasma display panel manufacturing system.
 スプレー塗布、蒸着、気相堆積などの各種手法によって物体の表面にその一部を除くように膜を形成する際に、物体の表面のうちの膜材料の物質を付着させない領域を板状のマスク(遮蔽体)で覆うマスキングが行われる。一般に、マスクは遮蔽すべきマスキング領域に対応した形状をもつ。工業製品の量産においては、成膜対象である多数のワークに対して一定個数ずつ順に膜を形成する場合に、1つのマスクが複数回の成膜に繰り返し用いられる。そして、定期的に膜形成が休止され、マスクに付着した物質を除去する清掃または使用したマスクを未使用のマスクに取り替えるマスク交換が行われる。 When a film is formed on the surface of an object so that a part of the surface is removed by various methods such as spray coating, vapor deposition, vapor deposition, etc., a plate-shaped mask on the surface of the object where the material of the film material does not adhere Masking covered with (shielding body) is performed. In general, the mask has a shape corresponding to the masking area to be shielded. In the mass production of industrial products, one mask is repeatedly used for a plurality of times of film formation in the case where a film is sequentially formed on a large number of workpieces to be formed. Then, the film formation is periodically stopped, and cleaning for removing a substance attached to the mask or mask replacement for replacing the used mask with an unused mask is performed.
 マスクとして無端ベルトを備えた溶射用のマスキング装置が知られている(特許文献1)。開示された装置において、無端ベルトは溶射対象物の搬送方向を含む平面に沿って循環移動するように複数のプーリで案内され、溶射を受ける溶射位置と清掃のための退避位置とを通る。溶射位置で無端ベルトに付着した溶射物質は退避位置でスクレーパによって除去される。つまり、この装置では無端ベルトが退避位置を通るときに自動的に清掃される。
特開平10-8233号公報
A thermal spraying masking device having an endless belt as a mask is known (Patent Document 1). In the disclosed apparatus, the endless belt is guided by a plurality of pulleys so as to circulate and move along a plane including the conveying direction of the object to be sprayed, and passes through a spraying position for receiving spraying and a retreating position for cleaning. The sprayed material adhering to the endless belt at the spraying position is removed by the scraper at the retracted position. That is, in this apparatus, the endless belt is automatically cleaned when it passes the retracted position.
Japanese Patent Laid-Open No. 10-8233
 マスキング対象の物体よりも長いベルト(帯状マスク)によるマスキングには、ベルトの一部を用いてマスキングを行いながらベルトの他の部分の清掃を行うことができるという利点がある。ベルトの消耗を軽減する上でベルトを長くするのが有利であるが、無端ベルトを循環させる装置では、ベルトを長くすればベルト案内機構が複雑になるとともに装置が大型になる。また、物体を傷つける突起や段差のない良好な継ぎ目をもつ無端ベルトは高価である。 Masking with a belt (strip mask) that is longer than the object to be masked has the advantage that other parts of the belt can be cleaned while masking using part of the belt. In order to reduce belt consumption, it is advantageous to lengthen the belt. However, in an apparatus that circulates an endless belt, if the belt is lengthened, the belt guide mechanism becomes complicated and the apparatus becomes large. In addition, an endless belt having a good seam without protrusions or steps that damage an object is expensive.
 本発明はこのような事情に鑑みてなされ、マスキングを休止せずにマスクを清掃することができ且つマスクの寿命を長くすることのできるマスキング装置の提供を目的としている。他の目的はプラズマディスプレイパネルの量産におけるマスキングを行う工程に好適な製造システムを提供することである。 The present invention has been made in view of such circumstances, and an object of the present invention is to provide a masking apparatus that can clean the mask without pausing the masking and prolong the life of the mask. Another object is to provide a manufacturing system suitable for a masking process in mass production of plasma display panels.
 上記目的を達成するマスキング装置は、物体の表面にその一部を除いて物質を付着させるためのマスキングをする装置であって、マスキング対象の物体が配置される作業エリアを横切って延びる帯状のマスクと、前記作業エリアに対する前記マスクの延在方向の両側で前記マスクを巻回する一対の正逆回転の可能なローラとを備える。当該マスキング装置は、前記一対のローラの回転方向を切り換えて前記マスクを往復移動させる。前記マスクの配置は一対のローラが巻回するロール形式であるので、マスクの長さをローラ間の距離よりも十分に長くすることができる。マスクを長くすればマスクの単位長あたりの使用頻度が減少するので、マスクの寿命が延びる。 A masking device that achieves the above object is a device for masking to attach a substance to a surface of an object except for a part thereof, and is a belt-like mask extending across a work area where an object to be masked is placed And a pair of forward and reverse rotating rollers that wind the mask on both sides of the working area in the extending direction of the mask. The masking device reciprocates the mask by switching the rotation direction of the pair of rollers. Since the mask is arranged in a roll form in which a pair of rollers are wound, the length of the mask can be made sufficiently longer than the distance between the rollers. If the mask is lengthened, the use frequency per unit length of the mask is reduced, so that the life of the mask is extended.
 マスクに対して作業エリア外で清掃を実施することができる。清掃を自動的に行う手段をマスキング装置に組み付けてもよいし、マスキング装置と別体の清掃装置を使用して清掃を行うようにしてもよい。清掃のための手段を組み付ける場合、作業エリアの両側に手段を配置してマスクの移動方向にかかわらず清掃後にローラで巻き取るようにするのが望ましい。 The mask can be cleaned outside the work area. A means for automatically cleaning may be assembled to the masking device, or cleaning may be performed using a cleaning device separate from the masking device. When assembling means for cleaning, it is desirable to dispose the means on both sides of the work area and wind it up with a roller after cleaning regardless of the moving direction of the mask.
 好ましい態様では、作業エリアでの前記マスクの当該マスクにおける幅方向の位置が可変とされ、マスキング装置の用途の多様化が図られている。 In a preferred embodiment, the position of the mask in the width direction of the mask in the work area is variable, so that the use of the masking apparatus is diversified.
 上記目的を達成する製造システムは、プラズマディスプレイパネルの製造における基板の表面に部分的に層形成材料を付着させる工程に用いるシステムであって、層形成材料を噴射口から下方に向けて噴射する噴射装置と、前記基板を一方向に搬送して前記噴射口の下方の作業エリアに配置する搬送装置と、前記作業エリアに配置された前記基板の表面を前記噴射口に対して部分的に隠すマスキング装置とを備える。前記マスキング装置は、前記基板の搬送方向と交差する方向に沿って前記作業エリアを横切って延びる帯状のマスクと、前記作業エリアに対する前記マスクの延在方向の両側で前記マスクを巻回する一対の正逆回転の可能なローラとを備えており、前記一対のローラの回転方向を切り換えて前記マスクを往復移動させる。 A manufacturing system that achieves the above object is a system that is used in a process of partially attaching a layer forming material to the surface of a substrate in the manufacture of a plasma display panel, and injects the layer forming material downward from an injection port. An apparatus, a transfer device that transfers the substrate in one direction and places it in a work area below the injection port, and masking that partially hides the surface of the substrate arranged in the work area from the injection port Device. The masking device includes a strip-shaped mask extending across the work area along a direction intersecting the substrate transport direction, and a pair of winding the mask on both sides of the mask extending direction with respect to the work area And a roller capable of forward and reverse rotation, and the mask is reciprocated by switching the rotation direction of the pair of rollers.
本発明の実施形態に係るマスキング装置を備えたプラズマディスプレイパネル製造システムの構成を示す斜視図である。It is a perspective view which shows the structure of the plasma display panel manufacturing system provided with the masking apparatus which concerns on embodiment of this invention. 前記マスキング装置における第1のマスクの移動経路を模式的に示す図である。It is a figure which shows typically the movement path | route of the 1st mask in the said masking apparatus. 前記マスキング装置におけるマスク移動制御の概要を示すフローチャートである。It is a flowchart which shows the outline | summary of the mask movement control in the said masking apparatus.
 本発明の実施形態として例示するマスキング装置は、プラズマディスプレイパネルの製造のための設備である。プラズマディスプレイパネルはテレビジョン映像やコンピュータ出力の表示に使用されるデバイスであり、それぞれに電極が配列された一対のガラス板からなる。 The masking apparatus exemplified as an embodiment of the present invention is a facility for manufacturing a plasma display panel. A plasma display panel is a device used for displaying television images and computer output, and is composed of a pair of glass plates each having an electrode arranged thereon.
 図1において、プラズマディスプレイパネルの製造のためのシステム100は、後に加工されてガラス板となる基板10の表面に部分的に層形成材料を散布して付着させる工程に用いられる。層形成材料は具体的には酸化マグネシウム結晶の粉体であり、ガス放電特性を良好にするために散布される。酸化マグネシウム結晶の散布の効果は本発明に直接には関係しないので、ここではその説明を省略する。なお、例えば特開2008-91086号公報に酸化マグネシウム結晶の散布の効果の説明がある。 Referring to FIG. 1, a system 100 for manufacturing a plasma display panel is used in a process in which a layer forming material is partially dispersed and adhered to the surface of a substrate 10 to be processed later to be a glass plate. Specifically, the layer forming material is a powder of magnesium oxide crystals, and is dispersed in order to improve gas discharge characteristics. Since the effect of spreading the magnesium oxide crystals is not directly related to the present invention, the description thereof is omitted here. For example, Japanese Patent Application Laid-Open No. 2008-91086 describes the effect of spraying magnesium oxide crystals.
 システム100は、層形成材料を下方に向けて噴射するノズル21を有した噴射装置20と、基板10を一方向(以下、第1方向という)M1に搬送して層形成材料の散布のための作業エリアに配置する搬送装置30と、作業エリアに配置された基板10の表面をノズル21の噴射口に対して部分的に隠すマスキング装置40とを備える。作業エリアとは、ノズル21の噴射口に対する前方の所定範囲の空間であり、噴射を受ける基板10およびマスキングのためのマスクを配置すべき場所である。例示ではノズル21が下向きであるので作業エリアは噴射口の下方に位置する。噴射装置20は、図示しない材料タンクおよび噴射用ポンプなどを備え、スプレーガンと呼ばれる。例示の搬送装置30は基板10を水平搬送するベルトコンベアと、作業エリア内で基板10を上下移動させるリフト機構35(図2参照)とから構成される。水平搬送用のベルト31,32は基板10が作業エリア内に所定時間停留するように間欠的に駆動される。図には、作業エリアに配置されてリフトアップされた状態の基板10、次のベルト駆動で作業エリアに配置される基板10、前回のベルト駆動で作業エリアから搬出された基板10b、および前々回のベルト駆動で作業エリアから搬出された基板10aが描かれている。基板10,10a、10bのサイズは例えば対角50インチまたはそれ以上の画面サイズに対応する。マスキング装置40は以下に詳述するように構成される。 The system 100 is for spraying the layer forming material by transporting the substrate 10 in one direction (hereinafter referred to as the first direction) M1 and the injection device 20 having the nozzle 21 that injects the layer forming material downward. A transport device 30 disposed in the work area and a masking device 40 that partially hides the surface of the substrate 10 disposed in the work area from the ejection port of the nozzle 21 are provided. The working area is a space in a predetermined range in front of the nozzle 21 with respect to the ejection port, and is a place where the substrate 10 to be ejected and a mask for masking should be arranged. In the example, since the nozzle 21 faces downward, the work area is located below the injection port. The injection device 20 includes a material tank and an injection pump (not shown) and is called a spray gun. The exemplified transfer device 30 includes a belt conveyor that horizontally transfers the substrate 10 and a lift mechanism 35 (see FIG. 2) that moves the substrate 10 up and down within the work area. The belts 31 and 32 for horizontal conveyance are intermittently driven so that the substrate 10 stays in the work area for a predetermined time. In the figure, the substrate 10 placed in the work area and lifted up, the substrate 10 placed in the work area by the next belt drive, the substrate 10b carried out of the work area by the previous belt drive, A substrate 10a carried out of the work area by belt driving is depicted. The sizes of the substrates 10, 10a, 10b correspond to, for example, a screen size of 50 inches diagonal or more. The masking device 40 is configured as described in detail below.
 マスキング装置40の行うマスキングが必要である理由は、主として層形成材料を散布した後に基板10の不要部分を取り除いたり分割したりするスクライブ工程の歩留まりを高めるためである。スクライブ時の基板10のハンドリング状態を良好とするには、基板10におけるスクライブラインとその近傍への粉体の付着を防ぐ必要がある。基板10に定められるスクライブラインの位置は製造するプラズマディスプレイパネルの画面サイズに依存する。マスキング装置40は、画面サイズの異なる複数種のプラズマディスプレイパネルの製造に使用できるように、作業エリアでのマスク配置位置の変更が可能に構成されている。 The reason why masking performed by the masking apparatus 40 is necessary is mainly to increase the yield of a scribe process in which unnecessary portions of the substrate 10 are removed or divided after the layer forming material is dispersed. In order to improve the handling state of the substrate 10 at the time of scribing, it is necessary to prevent the powder from adhering to the scribe line and its vicinity on the substrate 10. The position of the scribe line defined on the substrate 10 depends on the screen size of the plasma display panel to be manufactured. The masking device 40 is configured to be able to change the mask arrangement position in the work area so that it can be used for manufacturing a plurality of types of plasma display panels having different screen sizes.
 マスキング装置40は、基板10の搬送方向である第1方向M1と直角に交差する第2方向M2に沿って作業エリアを水平に横切るように互いに離れて延びる第1および第2の帯状のマスク41,42と、作業エリアに対する第2方向M2の両側で第1および第2のマスク41,42を巻回する二対の正逆回転の可能なローラ45A,45B,46A,46Bと、作業エリア内で互いに離れて第1方向M1に沿って延び且つ作業エリアの外で当該作業エリアに対する第2方向M2における一方側と他方側とに振り分けられた第3および第4の帯状のマスク43,44と、作業エリアの第2方向M2の一方側で第3のマスク43を巻回し且つ他方側で第4のマスク44を巻回する二対の正逆回転の可能なローラ47A,47B,48A,48Bと、計4本のマスク41,42,43,44を清掃するための一対の洗浄機50A,50Bとを備える。さらにマスキング装置40は、計4対のローラを回転させるモータを含む図示しない駆動機構および駆動機構や洗浄機50A,50Bを制御する図示しないコントローラを備える。 The masking device 40 includes first and second belt-like masks 41 extending away from each other so as to horizontally traverse the work area along a second direction M2 that intersects the first direction M1 perpendicular to the transport direction of the substrate 10. , 42, two pairs of forward and reverse rollers 45A, 45B, 46A, 46B around which the first and second masks 41, 42 are wound on both sides of the work area in the second direction M2, and the work area And third and fourth belt- like masks 43 and 44 that extend along the first direction M1 apart from each other and are distributed outside the work area to one side and the other side in the second direction M2 with respect to the work area. Two pairs of forward and reverse rotating rollers 47A, 47B, 48A, 48 are wound around which the third mask 43 is wound on one side of the second direction M2 of the work area and the fourth mask 44 is wound on the other side. When provided with a pair of washers 50A for cleaning a total of four masks 41, 42, 43, 44, and 50B. Further, the masking device 40 includes a driving mechanism (not shown) including a motor that rotates a total of four pairs of rollers, and a controller (not shown) that controls the driving mechanism and the washing machines 50A and 50B.
 第1のマスク41は、第1方向M1と平行な軸の回りに回転する一対のプーリ61,62によって、作業エリアに配置された基板10の上方に張られる。第2のマスク42は同様の一対のプーリ63,64によって基板10の上方に張られる。第3のマスク43は、水平面内で第2方向M2に対して傾いた方向の軸の回りに回転する一対のプーリ71,72によって、作業エリアに配置された基板10の上方に張られ且つ90度捻られて巻回用の上記ローラ47A,47Bへ案内される。第4のマスク44は、プーリ71,72に対して対称に配置された一対のプーリ73,74によって基板10の上方に張られ且つ90度捻られて巻回用の上記ローラ48A,48Bへ案内される。これら4本のマスク41,42,43,44によって作業エリア内に四角形のマスクが構成される。 The first mask 41 is stretched above the substrate 10 disposed in the work area by a pair of pulleys 61 and 62 that rotate about an axis parallel to the first direction M1. The second mask 42 is stretched above the substrate 10 by a pair of similar pulleys 63 and 64. The third mask 43 is stretched above the substrate 10 disposed in the work area by a pair of pulleys 71 and 72 that rotate about an axis in a direction inclined with respect to the second direction M2 in the horizontal plane and 90. It is twisted and guided to the rollers 47A and 47B for winding. The fourth mask 44 is stretched above the substrate 10 by a pair of pulleys 73 and 74 arranged symmetrically with respect to the pulleys 71 and 72 and twisted 90 degrees to guide the rollers 48A and 48B for winding. Is done. These four masks 41, 42, 43, and 44 constitute a square mask in the work area.
 マスク41,42,43,44のそれぞれは、対応する巻回用ローラ対のローラ間の経路長の例えば10倍以上の長さをもち、ローラ対にロール状に多重に巻回される。ローラ対の片方のローラのロールからマスクが送り出され、同時に他のローラによるマスクの巻き取りが行われる。このとき、巻き取り側のローラのみを駆動して送り出し側のローラを従動させてもよいし、両方を同期させて駆動してもよい。いずれにしても、マスクが弛まないように適度のテンションをかけるのが望ましい。送り出しが最大限に達すると、ローラ対の回転が反転されて以前と反対の方向にマスクが送り出される。ローラ対の正反転に伴ってマスクは所定の経路を往復移動する。 Each of the masks 41, 42, 43, and 44 has a length of, for example, 10 times or more the path length between the rollers of the corresponding winding roller pair, and is wound around the roller pair in a roll shape. The mask is sent out from the roll of one roller of the roller pair, and at the same time, the mask is wound up by another roller. At this time, only the roller on the winding side may be driven to drive the roller on the sending side, or both may be driven in synchronization. In any case, it is desirable to apply an appropriate tension so that the mask does not loosen. When the delivery reaches the maximum, the rotation of the roller pair is reversed and the mask is delivered in the opposite direction. The mask reciprocates along a predetermined path as the roller pair is normally reversed.
 図1に示されたある時点のローラ対の回転の様子では、第1のマスク41をローラ45Aが送り出してローラ45Bが巻き取り、第2のマスク42をローラ46Aが送り出してローラ46Bが巻き取り、第3のマスク43をローラ47Aが送り出してローラ47Bが巻き取り、第4のマスク44をローラ48Aが送り出してローラ48Bが巻き取っている。つまり、作業エリアにおいて互いに平行な第1のマスク41と第2のマスク42との間で移動方向が反対であり、作業エリアにおいて互いに平行な第3のマスク43と第4のマスク44との間でも移動方向が反対である。ただし、これに限らず、4本のマスク41,42,43,44の移動方向の相対関係は任意に定めることができる。 In the state of rotation of the roller pair at a certain time shown in FIG. 1, the roller 45A sends out the first mask 41 and the roller 45B takes up, and the roller 46A sends out the second mask 42 and the roller 46B takes up. The roller 47A sends out the third mask 43 and the roller 47B winds up, and the roller 48A sends out the fourth mask 44 and the roller 48B takes up. That is, the movement direction is opposite between the first mask 41 and the second mask 42 that are parallel to each other in the work area, and between the third mask 43 and the fourth mask 44 that are parallel to each other in the work area. But the direction of movement is the opposite. However, the present invention is not limited to this, and the relative relationship in the movement direction of the four masks 41, 42, 43, 44 can be arbitrarily determined.
 マスク移動には、層形成材料の散布中(以下、作業中という)はマスクを静止させる間欠移動と、作業中もマスクを移動させる連続移動とがある。マスキング精度を高めるためにマスクを基板10と密着させる場合は間欠移動が好ましい。連続移動を採用する場合はマスクと基板10とを密着させないのが望ましい。 The mask movement includes an intermittent movement in which the mask is stationary while the layer forming material is being sprayed (hereinafter referred to as work) and a continuous movement in which the mask is moved during the work. Intermittent movement is preferred when the mask is brought into close contact with the substrate 10 in order to increase the masking accuracy. In the case of adopting continuous movement, it is desirable not to bring the mask and the substrate 10 into close contact.
 作業エリアでのマスク配置位置は、第1および第4のマスク41,44の水平移動によって変更される。第1のマスク41を案内するプーリ61,62はそれらの軸方向に移動可能に支持され、第4のマスク44を案内するプーリ73,74は第2方向M2に移動可能に支持されている。図1に描かれた基板10aは、移動可能範囲内で第1のマスク41を第2のマスク42に最も近づけ且つ第4のマスク44を第3のマスク43に最も近づけたマスキング状態での散布により形成された層19aを有している。また、基板10bは、移動可能範囲内で第1のマスク41を第2のマスク42から最も遠ざけ且つ第4のマスク44を第3のマスク43から最も遠ざけたマスキング状態での散布により形成された層19bを有している。ただし、第1および第4のマスク41,44を必ずしも可変範囲の端の位置に配置する必要はなく、可変範囲内のどの位置にも配置することができる。第1のマスク41の移動と第4のマスク44の移動とを独立に行うことができる。移動可能範囲はマスキング装置40の用途に応じて適宜選定される。第1および第4のマスク41,44だけでなく、第2および第3のマスク42,43の位置を可変とし、それによってマスク配置をより多様にすることができる。 The mask arrangement position in the work area is changed by the horizontal movement of the first and fourth masks 41 and 44. The pulleys 61 and 62 for guiding the first mask 41 are supported so as to be movable in the axial directions thereof, and the pulleys 73 and 74 for guiding the fourth mask 44 are supported so as to be movable in the second direction M2. The substrate 10a depicted in FIG. 1 is dispersed in a masking state in which the first mask 41 is closest to the second mask 42 and the fourth mask 44 is closest to the third mask 43 within the movable range. It has the layer 19a formed by. Further, the substrate 10b is formed by spraying in a masking state in which the first mask 41 is furthest away from the second mask 42 and the fourth mask 44 is furthest away from the third mask 43 within the movable range. It has a layer 19b. However, the first and fourth masks 41 and 44 are not necessarily arranged at the end of the variable range, and can be arranged at any position within the variable range. The movement of the first mask 41 and the movement of the fourth mask 44 can be performed independently. The movable range is appropriately selected according to the application of the masking device 40. In addition to the first and fourth masks 41 and 44, the positions of the second and third masks 42 and 43 can be made variable, thereby making the mask arrangement more diverse.
 マスク41,42,43,44の材質は繰り返しの使用に耐えるのであれば金属でも樹脂でもよい。厚さについてはロール化が可能で且つプーリによる案内で塑性変形が生じないという条件を満たす必要がある。マスク41,42,43,44として、厚さ0.05~0.5mm程度のステンレス(SUS304、SUS316など)のテープが好適例として挙げられる。 The material of the masks 41, 42, 43, 44 may be metal or resin as long as it can withstand repeated use. The thickness needs to satisfy the condition that it can be rolled and that plastic deformation does not occur when guided by a pulley. Preferred examples of the masks 41, 42, 43, 44 include stainless steel (SUS304, SUS316, etc.) tapes having a thickness of about 0.05 to 0.5 mm.
 マスク41,42,43,44のそれぞれにおけるマスキングに使用された部分は、巻き取りの前に洗浄機50Aまたは洗浄機50Bによって洗浄される。作業エリアの第2方向M2の両側に配置された洗浄機50A,50Bのそれぞれは、洗浄液(例えば、硝酸溶液)を収容する液槽51と、マスク41,42,43,44のそれぞれの移動経路を巻き取り用の経路か送り出し用の経路かのいずれかに切り換える経路切換え機構53と、洗浄後のマスクから洗浄液を除去する手段としての送風器54とを備える。 The portions used for masking in each of the masks 41, 42, 43, and 44 are cleaned by the cleaning machine 50A or the cleaning machine 50B before winding. Each of the cleaning machines 50A and 50B disposed on both sides of the work area in the second direction M2 has a liquid tank 51 for storing a cleaning liquid (for example, a nitric acid solution) and a moving path of each of the masks 41, 42, 43, and 44. Is provided with a path switching mechanism 53 for switching between a winding path and a delivery path, and a blower 54 as means for removing the cleaning liquid from the cleaned mask.
 洗浄機50A,50Bの経路切換え機構53は、マスク41,42,43,44をそれぞれ案内する単一または複数のプーリを上下移動させる機構である。図2に代表として第1のマスク41の移動経路が示されるとおり、各経路切換え機構53によって洗浄液52の液中を通過しない送り出し経路R1と洗浄液52の液中を通過する巻き取り経路R2との切り換えが行われる。図2では、マスク41のうちの作業エリアへ送り出される部分に対して洗浄機50Aの経路切換え機構53によって送り出し経路R1が設定され、マスク41のうちの作業エリアを通り過ぎた部分に対して洗浄機50Bの経路切換え機構53によって巻き取り経路R2が設定されている。また、巻き取り側の洗浄機50Bの送風器54がマスク41のうちの洗浄液中を通過の部分の表裏両面にエアーを吹き付けている。送り出し側の洗浄機50Bの送風器54は休止している。上述のとおり送り出しと巻き取りとが切り換れば、各経路切換え機構53の状態も切り換わる。 The path switching mechanism 53 of the cleaning machines 50A and 50B is a mechanism for moving up and down a single pulley or a plurality of pulleys that guide the masks 41, 42, 43, and 44, respectively. As shown in FIG. 2 as a representative movement path of the first mask 41, each path switching mechanism 53 causes a feeding path R1 that does not pass through the cleaning liquid 52 and a winding path R2 that passes through the cleaning liquid 52. Switching takes place. In FIG. 2, the delivery path R1 is set by the path switching mechanism 53 of the cleaning machine 50A for the part of the mask 41 that is sent to the work area, and the part of the mask 41 that passes the work area is cleaned. The winding path R2 is set by the path switching mechanism 53 of 50B. Further, the blower 54 of the wind-up side cleaning machine 50B blows air onto both the front and back surfaces of the portion of the mask 41 that passes through the cleaning liquid. The blower 54 of the washing machine 50B on the delivery side is at rest. When the feeding and winding are switched as described above, the state of each path switching mechanism 53 is also switched.
 なお、第1および第2のマスク41,42のそれぞれに注目すると、図2のように2つの洗浄機50A,50Bの一方では送り出し経路R1が他方では巻き取り経路R2が設定される。これとは異なり、第3のマスク43に注目すると、片方の洗浄機50Aにおいて、マスク43の送出すべき部分には送り出し経路R1が設定され、巻き取るべき部分には巻き取り経路R2が設定される。また、第4のマスク44に注目すると、片方の洗浄機50Bにおいて、マスク44の送り出すべき部分には送り出し経路R1が設定され、巻き取るべき部分には巻き取り経路R2が設定される。 If attention is paid to each of the first and second masks 41 and 42, the delivery path R1 is set on one of the two cleaning machines 50A and 50B and the winding path R2 is set on the other as shown in FIG. On the other hand, paying attention to the third mask 43, in one of the cleaning machines 50A, the delivery path R1 is set for the part to be sent out of the mask 43, and the take-up path R2 is set for the part to be taken up. The Further, paying attention to the fourth mask 44, in one of the cleaning machines 50B, a delivery path R1 is set for a portion to be sent out of the mask 44, and a take-up path R2 is set for a portion to be wound.
 マスキング装置40においては、4本のマスク41,42,43,44に対して個別に移動制御が行われる。図3のフローチャートは1つのマスクに対応したローラ対の回転方向の切り換えと洗浄機内の移動経路の切り換えの手順を示している。 In the masking device 40, movement control is individually performed for the four masks 41, 42, 43, and 44. The flowchart in FIG. 3 shows the procedure for switching the rotation direction of the roller pair corresponding to one mask and switching the movement path in the cleaning machine.
 マスキング装置40のコントローラは、マスキング装置40の稼動開始に際して各マスクに対応したローラ対におけるマスク巻回状態をチェックする。例えばマスク41については一対のローラ45A,45Bの状態をチェックする。予め一対のローラうちの一方が第1で他方が第2と定められており、コントローラはまず第1のローラが送り出し可能な状態か否をチェックする(#11)。送り出し可能な状態とは、当該ローラにマスクが巻回されている状態である。この状態は、ロール径の大小をセンサで検出したり、送り出しに際してその量(時間、長さ、またはローラ回転数)をカウントしておいたりする方法によって検知することができる。 The controller of the masking device 40 checks the mask winding state in the roller pair corresponding to each mask when the masking device 40 starts operation. For example, for the mask 41, the state of the pair of rollers 45A and 45B is checked. One of the pair of rollers is first determined as the first and the other is determined as the second, and the controller first checks whether or not the first roller can be sent out (# 11). The state that can be sent out is a state in which a mask is wound around the roller. This state can be detected by a method in which the size of the roll diameter is detected by a sensor or the amount (time, length, or roller rotation speed) is counted at the time of feeding.
 第1のローラが送り出し可能な状態であれば、第1のローラと作業エリアとの間における洗浄機内のマスク移動経路を送り出し経路R1とし、第2のローラと作業エリアとの間における洗浄機内のマスク移動経路を巻き取り経路R2とするように、2つの洗浄機50A,50Bのそれぞれの経路切換え機構53が制御される(#12)。その後、ローラ対の正回転が開始される(#13)。ここでいう正回転とは、第1のローラがマスクを送り出し、第2のローラがマスクを巻き取る回転である。正回転は上述のとおり間欠的または連続的な回転とされる。第1のローラが送り出し可能な状態でなければ、コントローラは後述のステップ番号#15の処理を実行する。 If the first roller can be sent out, the mask moving path in the cleaning machine between the first roller and the work area is set as the sending path R1, and the cleaning machine between the second roller and the work area is in the cleaning machine. The path switching mechanisms 53 of the two cleaning machines 50A and 50B are controlled so that the mask movement path is the winding path R2 (# 12). Thereafter, forward rotation of the roller pair is started (# 13). Here, the positive rotation is a rotation in which the first roller sends out the mask and the second roller winds up the mask. The positive rotation is intermittent or continuous rotation as described above. If the first roller is not ready to be fed, the controller executes a process of step number # 15 described later.
 第1のローラによる送り出しが限界またはそれに近い状態に達すると(#14)、正回転が停止され、第1のローラと作業エリアとの間における洗浄機内のマスク移動経路を巻き取り経路R2とし、第2のローラと作業エリアとの間における洗浄機内のマスク移動経路を送り出し経路R1とするように、2つの洗浄機50A,50Bのそれぞれの経路切換え機構53が制御される(#15)。送り出しが限界に達した否かは、マスク端の近傍にマーク(例えば穴)を設けておき、それを光学的または機械的に検出することによって判断することができる。洗浄機内の経路を設定した後、ローラ対の逆回転が開始される(#16)。逆回転とは、第2のローラがマスクを送り出し、第1のローラがマスクを巻き取る回転である。逆回転も間欠的または連続的な回転とされる。 When the delivery by the first roller reaches the limit or close to the limit (# 14), the forward rotation is stopped, and the mask moving path in the cleaning machine between the first roller and the work area is defined as a winding path R2. The path switching mechanism 53 of each of the two cleaning machines 50A and 50B is controlled so that the mask movement path in the cleaning machine between the second roller and the work area is set as the delivery path R1 (# 15). Whether or not the delivery has reached the limit can be determined by providing a mark (for example, a hole) in the vicinity of the mask edge and detecting it optically or mechanically. After setting the path in the washing machine, reverse rotation of the roller pair is started (# 16). The reverse rotation is a rotation in which the second roller feeds the mask and the first roller winds the mask. The reverse rotation is also intermittent or continuous rotation.
 第2のローラによる送り出しが限界またはそれに近い状態に達すると(#17)、逆回転が停止され、ステップ番号#12に戻って洗浄機内の経路の切り換えおよびローラ対の回転方向の切り換えが行われる。 When the delivery by the second roller reaches or reaches a limit (# 17), the reverse rotation is stopped and the process returns to step # 12 to switch the path in the cleaning machine and the rotation direction of the roller pair. .
 以上のマスキング装置40を使用することには次の利点がある。1回の散布におけるマスキングに帯状の各マスク41~44の一部を実質の遮蔽体として使用し、複数回のマスキングに際してマスクを長さ方向に移動させて各マスク41~44の互いに異なる部分を使用することができるので、マスク上に付着する物質の堆積量を少なくすることができる。堆積量を少なくすることにより、堆積物によってマスキング領域と非マスキング領域との境界が歪になるのを防ぐことができるとともに、マスクの清掃に要する時間を短縮することができる。これに対して、マスキング対象物と同程度の大きさの固定式のマスクによるマスキングにおいては、マスクを頻繁に交換することで付着物質の堆積量を少なくすることができるものの、マスク交換の作業負担が大きく、多数のマスクを用意し且つそれらを保管するための費用が必要である。 Using the above masking device 40 has the following advantages. A part of each of the belt-like masks 41 to 44 is used as a substantial shield for masking in one spraying, and different parts of the masks 41 to 44 are moved in the length direction during a plurality of maskings. Since it can be used, the deposition amount of the substance adhering to the mask can be reduced. By reducing the deposition amount, it is possible to prevent the boundary between the masking region and the non-masking region from being distorted by the deposit, and it is possible to shorten the time required for cleaning the mask. On the other hand, in the masking with a fixed mask of the same size as the object to be masked, the amount of deposited substances can be reduced by frequently changing the mask, but the work of replacing the mask is difficult. Is expensive and requires a lot of money to prepare and store a large number of masks.
 帯状のマスク41~44の掛け回しがロール形式であるので、循環形式とは違って、マスクを十分に長くしても掛け回しの経路が複雑にならない。 Since the belt-shaped masks 41 to 44 are rolled in a roll form, unlike the circulation form, the route of the loop is not complicated even if the mask is sufficiently long.
 マスク41~44を巻回するローラ45A,45B,46A,46B,47A,47B,48A,48Bがマスキング対象物である基板10の搬送路の両側に配置されるので、搬送路の上方に配置される場合と比べてシステム100の構成を簡素化することができる。洗浄機50A,50Bを組み付ける構成において洗浄機50A,50Bの配置の自由度が大きい。マスク41~44の幅方向の位置を簡素な機構によって可変にすることができる。 Since the rollers 45A, 45B, 46A, 46B, 47A, 47B, 48A, and 48B around which the masks 41 to 44 are wound are arranged on both sides of the conveyance path of the substrate 10 that is a masking target, they are arranged above the conveyance path. The configuration of the system 100 can be simplified compared with the case where In the configuration in which the cleaning machines 50A and 50B are assembled, the degree of freedom of arrangement of the cleaning machines 50A and 50B is large. The positions in the width direction of the masks 41 to 44 can be made variable by a simple mechanism.
 第1および第4のマスク41,44の幅方向の位置が可変であるので、画面サイズの異なる複数種のプラズマディスプレイパネルの製造にマスキング装置40を使用することができる。 Since the positions in the width direction of the first and fourth masks 41 and 44 are variable, the masking apparatus 40 can be used for manufacturing a plurality of types of plasma display panels having different screen sizes.
 マスク41~44の使用部分を巻き取る以前に洗浄し且つ洗浄液を除去するので、付着物を残したまま又は洗浄液で濡れたままの状態で巻き取るのと比べて、マスク41~44の経時変化を低減することができる。 Since the used portions of the masks 41 to 44 are cleaned before the winding is performed and the cleaning liquid is removed, the change over time of the masks 41 to 44 is compared with the case where the mask 41 is wound with the deposit remaining or wet with the cleaning liquid. Can be reduced.
 上記の実施形態において、システム100の構成は例示に限定されない。噴射装置20が散布する物質は粉体に限らず、粉体が分散した液体または他の溶液であってもよい。ノズル21が固定配置されてもよいし対象物の表面に沿って移動するものであってもよい。 In the above embodiment, the configuration of the system 100 is not limited to the example. The substance sprayed by the injection device 20 is not limited to powder, but may be a liquid in which the powder is dispersed or another solution. The nozzle 21 may be fixedly arranged, or may move along the surface of the object.
 搬送装置30はベルトコンベア式に限らず、例えばアームで基板10をハンドリングするロボットであってもよい。 The transfer device 30 is not limited to the belt conveyor type, and may be a robot that handles the substrate 10 with an arm, for example.
 マスキング装置40におけるマスク数は4に限らない。第1のマスク41のみを備える構成でも、互いに交差する2本のマスクのみ(例えば、マスク41とマスク44)を備える構成でもよい。さらに、第1のマスク41と平行に3本以上の帯状マスクを配置したり、基板10の搬送方向(M1)と平行に3本以上の帯状マスクを配置したりすることも可能である。作業エリアでの平行なマスク間の距離や各マスクの幅は基板10の大きさに応じて適宜選定すればよい。マスク配置はマスキング対象に適合すればよい。例えば、複数個のプラズマディスプレイパネルを一括に製造するためにマザー基板に対してマスキングを行う場合には、分離された複数の層が形成されるようにマスクを配置する。 The number of masks in the masking device 40 is not limited to four. The configuration including only the first mask 41 or the configuration including only two masks that intersect each other (for example, the mask 41 and the mask 44) may be employed. Furthermore, it is possible to arrange three or more strip masks in parallel with the first mask 41, or to arrange three or more strip masks in parallel to the transport direction (M1) of the substrate 10. The distance between the parallel masks in the work area and the width of each mask may be appropriately selected according to the size of the substrate 10. The mask arrangement may be adapted to the masking target. For example, when masking a mother substrate in order to manufacture a plurality of plasma display panels at once, the masks are arranged so that a plurality of separated layers are formed.
 洗浄機50A,50Bにおいて、上述のように送り出し側の送風器54を休止させてもよいし、巻き取りと送り出しとにかかわらず送風器54を稼動させてもよい。例示では洗浄後で巻き取りの前にマスクにエアーを吹き付ける構成であるが、送風器54に加えて洗浄機50A,50Bから作業エリアに向かうマスクにエアーを吹き付ける送風器を設けることができる。 In the washing machines 50A and 50B, the blower 54 on the sending side may be stopped as described above, or the blower 54 may be operated regardless of winding and sending. In the illustrated example, air is blown to the mask after winding and before winding, but in addition to the blower 54, a blower for blowing air to the mask from the washing machines 50A and 50B toward the work area can be provided.
 洗浄液52は散布物質に応じて選定され、洗浄液に対する耐性を考慮してマスクの材質は選定される。ローラやプーリのサイズおよび材質も適宜選定される。ローラやプーリの表面を滑らかな面または摩擦力を高める加工を施した面としてもよいし、合成樹脂や合成ゴムなどの伸縮性をもつ面としてもよい。 The cleaning liquid 52 is selected according to the sprayed material, and the mask material is selected in consideration of resistance to the cleaning liquid. The size and material of the roller and pulley are also selected as appropriate. The surface of the roller or pulley may be a smooth surface or a surface that has been processed to increase the frictional force, or may be a surface having elasticity such as synthetic resin or synthetic rubber.
 本発明は、塗装膜を含む所望パターンの膜形成のためのマスキングに利用することができる。 The present invention can be used for masking for forming a film having a desired pattern including a coating film.

Claims (11)

  1.  物体の表面にその一部を除いて物質を付着させるためのマスキングをするマスキング装置であって、
     マスキング対象の物体が配置される作業エリアを横切って延びる帯状のマスクと、
     前記作業エリアに対する前記マスクの延在方向の両側で前記マスクを巻回する一対の正逆回転の可能なローラとを備え、
     前記一対のローラの回転方向を切り換えて前記マスクを往復移動させる
     ことを特徴とするマスキング装置。
    A masking device for performing masking to attach a substance to a surface of an object except for a part thereof,
    A strip-shaped mask extending across the work area where the object to be masked is placed;
    A pair of forward and reverse rotatable rollers that wind the mask on both sides of the mask in the extending direction of the mask with respect to the work area;
    A masking apparatus, wherein the mask is reciprocated by switching the rotation direction of the pair of rollers.
  2.  前記作業エリアでの前記マスクの当該マスクにおける幅方向の位置が可変である
     請求項1に記載のマスキング装置。
    The masking apparatus according to claim 1, wherein a position in the width direction of the mask in the work area is variable.
  3.  前記一対のローラのそれぞれと前記作業エリアとの間に配置され、前記マスクに付着した物質を前記マスクから取り除く複数の洗浄機を備える
     請求項1に記載のマスキング装置。
    The masking apparatus according to claim 1, further comprising: a plurality of cleaning machines that are disposed between each of the pair of rollers and the work area and remove substances adhering to the mask from the mask.
  4.  前記複数の洗浄機のそれぞれが、
     洗浄液を収容する液槽と、
     前記洗浄機における前記マスクの移動経路を前記洗浄液の液中を通過する巻き取り経路か前記洗浄液の液中を通過しない送り出し経路かのいずれかに切り換える機構とを備える
     請求項3に記載のマスキング装置。
    Each of the plurality of washing machines
    A liquid tank containing the cleaning liquid;
    The masking apparatus according to claim 3, further comprising: a mechanism for switching a movement path of the mask in the cleaning machine to either a winding path that passes through the cleaning liquid or a delivery path that does not pass through the cleaning liquid. .
  5.  前記複数の洗浄機のそれぞれが、前記洗浄液の液中を通過した前記マスクからそれに付着する洗浄液を除去する手段を備える
     請求項4に記載のマスキング装置。
    The masking apparatus according to claim 4, wherein each of the plurality of cleaning machines includes means for removing the cleaning liquid adhering to the mask that has passed through the cleaning liquid.
  6.  プラズマディスプレイパネルの製造における基板の表面に部分的に層形成材料を付着させる工程に用いるシステムであって、
     層形成材料を噴射口から下方に向けて噴射する噴射装置と、
     前記基板を一方向に搬送して前記噴射口の下方の作業エリアに配置する搬送装置と、
     前記作業エリアに配置された前記基板の表面を前記噴射口に対して部分的に隠すマスキング装置とを備えており、
     前記マスキング装置が、
     前記基板の搬送方向と交差する方向に沿って前記作業エリアを横切って延びる帯状のマスクと、
     前記作業エリアに対する前記マスクの延在方向の両側で前記マスクを巻回する一対の正逆回転の可能なローラとを備え、
     前記一対のローラの回転方向を切り換えて前記マスクを往復移動させる
     ことを特徴とするプラズマディスプレイパネル製造システム。
    A system used in a process of partially attaching a layer forming material to the surface of a substrate in the manufacture of a plasma display panel,
    An injection device for injecting the layer forming material downward from the injection port;
    A transport device for transporting the substrate in one direction and arranging it in a work area below the ejection port;
    A masking device that partially hides the surface of the substrate disposed in the work area with respect to the ejection port;
    The masking device is
    A strip-shaped mask extending across the work area along a direction intersecting the transport direction of the substrate;
    A pair of forward and reverse rotatable rollers that wind the mask on both sides of the mask in the extending direction of the mask with respect to the work area;
    The plasma display panel manufacturing system, wherein the mask is reciprocated by switching the rotation direction of the pair of rollers.
  7.  プラズマディスプレイパネルの製造における基板の表面に部分的に層形成材料を付着させる工程に用いるシステムであって、
     層形成材料を噴射口から下方に向けて噴射する噴射装置と、
     前記基板を一方向に搬送して前記噴射口の下方の作業エリアに配置する搬送装置と、
     前記作業エリアに配置された前記基板の表面を前記噴射口に対して部分的に隠すマスキング装置とを備えており、
     前記マスキング装置が、
     前記基板の搬送方向と交差する方向に沿って前記作業エリアを横切るように互いに離れて延びる第1および第2の帯状のマスクと、
     前記作業エリアに対する前記マスクの延在方向の両側で前記第1および第2のマスクを巻回する二対の正逆回転の可能なローラとを備え、
     前記二対のローラの回転方向を切り換えて前記第1および第2のマスクをそれぞれ往復移動させる
     ことを特徴とするプラズマディスプレイパネル製造システム。
    A system used in a process of partially attaching a layer forming material to the surface of a substrate in the manufacture of a plasma display panel,
    An injection device for injecting the layer forming material downward from the injection port;
    A transport device for transporting the substrate in one direction and arranging it in a work area below the ejection port;
    A masking device that partially hides the surface of the substrate disposed in the work area with respect to the ejection port;
    The masking device is
    First and second strip-shaped masks extending away from each other so as to cross the work area along a direction intersecting the transport direction of the substrate;
    Two pairs of forward and reverse rotating rollers for winding the first and second masks on both sides of the working area in the extending direction of the mask,
    The plasma display panel manufacturing system, wherein the rotation directions of the two pairs of rollers are switched to reciprocate the first and second masks, respectively.
  8.  前記第1および第2のマスクの少なくとも片方について、前記作業エリアでの前記搬送方向の位置が可変とされている
     請求項7に記載のプラズマディスプレイパネル製造システム。
    The plasma display panel manufacturing system according to claim 7, wherein the position in the transport direction in the work area is variable for at least one of the first and second masks.
  9.  前記マスキング装置が、
     前記作業エリア内で互いに離れて前記搬送方向に沿って延び且つ前記作業エリアの外で当該作業エリアに対する前記第1および第2のマスクの延在方向における一方側と他方側とに振り分けられた第3および第4の帯状のマスクと、
     前記作業エリアの前記延在方向の一方側で前記第3のマスクを巻回し且つ他方側で前記第4のマスクを巻回する二対の正逆回転の可能なローラとを備え、
     前記第3および第4のマスクを巻回するローラの回転方向を切り換えて前記第3および第4のマスクをそれぞれ往復移動させる
     請求項7に記載のプラズマディスプレイパネル製造システム。
    The masking device is
    In the work area, the first and second masks are separated from each other and extend in the transport direction, and are distributed outside the work area to one side and the other side in the extending direction of the first and second masks with respect to the work area. A third and fourth strip-shaped mask;
    Two pairs of forward and reverse rotating rollers that wind the third mask on one side of the working area in the extending direction and wind the fourth mask on the other side;
    The plasma display panel manufacturing system according to claim 7, wherein the third and fourth masks are reciprocated by switching a rotation direction of a roller that winds the third and fourth masks.
  10.  前記第3および第4のマスクの少なくとも片方について、前記作業エリアでの前記延在方向の位置が可変とされている
     請求項9に記載のプラズマディスプレイパネル製造システム。
    The plasma display panel manufacturing system according to claim 9, wherein a position in the extending direction in the work area is variable for at least one of the third and fourth masks.
  11.  前記作業エリアに対する前記延在方向の両側に配置され、前記第1、第2、第3および第4のマスクに付着した材料物質を前記第1、第2、第3および第4のマスクから取り除く複数の洗浄機を備える
     請求項9に記載のプラズマディスプレイパネル製造システム。
    The material substances disposed on both sides in the extending direction with respect to the working area and attached to the first, second, third and fourth masks are removed from the first, second, third and fourth masks. The plasma display panel manufacturing system according to claim 9, comprising a plurality of cleaning machines.
PCT/JP2008/001181 2008-05-09 2008-05-09 Masking device and plasma display panel manufacturing system equipped with the same WO2009136429A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP2008/001181 WO2009136429A1 (en) 2008-05-09 2008-05-09 Masking device and plasma display panel manufacturing system equipped with the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2008/001181 WO2009136429A1 (en) 2008-05-09 2008-05-09 Masking device and plasma display panel manufacturing system equipped with the same

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105817364A (en) * 2015-01-05 2016-08-03 科峤工业股份有限公司 Spray room anti-ink splash object conveying device
CN112275510A (en) * 2020-10-22 2021-01-29 安徽星露科技发展有限公司 Spraying device for monitoring machining of vertical rod

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10128444A (en) * 1996-10-29 1998-05-19 Mitsubishi Heavy Ind Ltd Apparatus for straightening thin strip
JP2000104156A (en) * 1998-09-28 2000-04-11 Honda Motor Co Ltd Masking mechanism for thermal spraying apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10128444A (en) * 1996-10-29 1998-05-19 Mitsubishi Heavy Ind Ltd Apparatus for straightening thin strip
JP2000104156A (en) * 1998-09-28 2000-04-11 Honda Motor Co Ltd Masking mechanism for thermal spraying apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105817364A (en) * 2015-01-05 2016-08-03 科峤工业股份有限公司 Spray room anti-ink splash object conveying device
CN105817364B (en) * 2015-01-05 2018-07-06 科峤工业股份有限公司 Prevent from splashing the object conveying device of ink in spray room
CN112275510A (en) * 2020-10-22 2021-01-29 安徽星露科技发展有限公司 Spraying device for monitoring machining of vertical rod

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