WO2009090798A1 - Flux creeping-up preventive composition for solder, electronic member for solder coated with the composition, method for soldering the member, and electrical appliance - Google Patents
Flux creeping-up preventive composition for solder, electronic member for solder coated with the composition, method for soldering the member, and electrical appliance Download PDFInfo
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- WO2009090798A1 WO2009090798A1 PCT/JP2008/071320 JP2008071320W WO2009090798A1 WO 2009090798 A1 WO2009090798 A1 WO 2009090798A1 JP 2008071320 W JP2008071320 W JP 2008071320W WO 2009090798 A1 WO2009090798 A1 WO 2009090798A1
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/0008—Soldering, e.g. brazing, or unsoldering specially adapted for particular articles or work
- B23K1/0016—Brazing of electronic components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/20—Preliminary treatment of work or areas to be soldered, e.g. in respect of a galvanic coating
- B23K1/203—Fluxing, i.e. applying flux onto surfaces
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
- C08F220/24—Esters containing halogen containing perhaloalkyl radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3452—Solder masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/42—Printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/015—Fluoropolymer, e.g. polytetrafluoroethylene [PTFE]
Definitions
- a flux treatment for improving the adhesiveness of the solder is performed in advance.
- a general flux is a corrosive agent containing an acidic component in a solvent. For this reason, it is undesirable for flux to penetrate or adhere to electrical contact parts of electronic parts such as connectors, switches, volumes, semi-fixed resistors, or parts that do not require soldering on printed circuit boards, and this must be prevented. .
- the flux scooping up that occurs in the through-hole part of electronic parts due to the capillary phenomenon, the flux adheres to or penetrates into parts that are not soldered, causing corrosion. Need to prevent.
- such a polymer is typically CH 2 ⁇ C (R 1 ) COO—QR f (wherein R 1 is a hydrogen atom or a methyl group, Q is a divalent linking group, R f is A polymer derived from a (meth) acrylate having a polyfluoroalkyl group represented by (C4-14 polyfluoroalkyl group) (see Patent Document 1).
- the flux creeping-up preventing agent is required to be a very thin film in order to prevent contact failure due to the flux creeping-up preventing film processed on the contact part of the electronic component.
- IPA performance at a very low concentration is required.
- the present invention is a polymer containing a polymer unit derived from an unsaturated compound having a polyfluoroalkyl group having 6 or less carbon atoms, which has little influence on the living body and the environment.
- a flux scooping prevention composition for a solder having a performance equivalent to that of a flux scooping prevention agent comprising a polymer containing a polymer unit derived from an unsaturated compound having a molecular weight of 8 or more and having a high flux scooping prevention performance With the goal.
- the present invention is a polymer containing a polymer unit derived from an unsaturated compound having a polyfluoroalkyl group having 6 or less carbon atoms, which has little influence on the living body and the environment.
- a polar group into the polymer and setting the weight average molecular weight of the polymer to 150,000 or more, a polymer unit derived from an unsaturated compound having 8 or more carbon atoms in a conventional polyfluoroalkyl group is obtained.
- the present invention makes it possible to provide a flux scooping preventive agent having the same performance as the flux scooping preventive agent containing the polymer contained.
- the solder flux creeping-up composition according to the present invention comprises a polymerization unit (A) derived from a compound represented by the following formula (a) and a polymerization unit (B) derived from an unsaturated compound containing a hydroxyl group.
- A polymerization unit
- B polymerization unit
- Each polymer contains at least one polymer and has a weight average molecular weight (in terms of polymethyl methacrylate) of 150,000 or more.
- R 1 a hydrogen atom or a methyl group
- Q 1 a single bond or a divalent linking group
- R f represents a polyfluoroalkyl group or polyfluoroether group having a main chain length of 1 to 6 carbon atoms.
- a preferred R f group is a linear perfluoroalkyl group or perfluoroether group having 1 to 6 carbon atoms.
- Q 1 is preferably a single bond or a linear alkylene group having 1 to 6 carbon atoms, an amino group, a sulfonyl group, or a combination thereof.
- the polymerization unit (B) is preferably derived from a compound represented by the following formula (b). CH 2 ⁇ C (R 1 ) —C (O) O—Q 2 —OH (b) Wherein, R 1: same as in the formula (a), Q 2: 2 divalent linking group.
- the solder flux creeping-up composition according to the present invention is usually in a liquid form, and preferably contains a polymer as described above at a concentration of 0.001 to 10% by mass.
- Another aspect of the present invention is an electronic member that has a coating made of any of the above-described compositions on part or all of the soldering portion of the electronic member and has a solder flux creeping-up preventing performance.
- the present invention also provides a method of forming a film made of any of the above-described compositions on a part or all of a part to be soldered of an electronic member, applying a part or all of the film with a soldering flux, A method of soldering an electronic member to be attached is provided, and an electric product including the electronic member soldered by the method is also provided.
- (meth) acrylate represents both or one of acrylic ester and methacrylic ester.
- the polymer contained in the composition for preventing creeping up of the solder flux of the present invention is a polymer unit (A) derived from a compound represented by the following formula (a): And at least one polymerization unit (B) derived from an unsaturated compound containing a hydroxyl group. CH 2 ⁇ C (R 1 ) —COO—Q 1 —R f (a)
- the symbols in the formulas have the following meanings.
- R 1 a hydrogen atom or a methyl group
- Q 1 a single bond or a divalent linking group
- R f a polyfluoroalkyl group or polyfluoroether group having a main chain length of 1 to 6 carbon atoms.
- the polyfluoroalkyl group means a partially fluoro-substituted or perfluoro-substituted alkyl group in which two to all of the hydrogen atoms of the alkyl group are substituted with fluorine atoms.
- the polyfluoroalkyl group represented by the R f group may have either a straight chain structure or a branched structure, but the main chain length (the number of carbon atoms not including the side chain) is an alkyl having 1 to 6 carbon atoms.
- the polyfluoroether group means a group in which an etheric oxygen atom is inserted between one or more carbon-carbon atoms in the polyfluoroalkyl group.
- the R f group preferably has a linear structure from the viewpoint of increasing the packing of the R f group. For the same reason, in the case of a branched structure, it is preferable that the branched portion is present at the terminal portion of the R f group.
- the R f group is preferably a polyfluoroalkyl group. Further, the R f group is preferably a substantially perfluorinated perfluoroalkyl group (R F ), more preferably an R F group having a main chain length of 1 to 6 carbon atoms, It is particularly preferable that the R F group is.
- Q 1 is a single bond or a divalent linking group.
- the above linking group may have a substituent.
- substituents include a halogen atom (F, Cl, Br, I), a hydroxyl group, a cyano group, an alkoxy group (methoxy, ethoxy, butoxy, octyl).
- Q 1 can be appropriately selected as long as it is a single bond or a divalent linking group, but is a single bond or a linear or branched alkylene group having 1 to 6 carbon atoms, a phenylene group, an amino group (—N ( R)-), a sulfonyl group (—SO 2 —) and a divalent linking group selected from a combination thereof are preferable.
- Specific examples of the divalent linking group in this combination include —N (R) —SO 2 —, the above alkylene group or phenylene group, and —NR—, —SO 2 — or —N (R) —SO. Examples thereof include a linking group to 2- .
- the alkylene group is preferably linear.
- a preferable one is represented by the following formula (a1).
- p is an integer from 0 to 6
- R 1 and R f are the same as those in the formula (a).
- R f is a linear perfluoroalkyl group (R F ) having 1 to 6 carbon atoms
- R F a linear perfluoroalkyl group
- R 1 is the same as defined above, and Q 3 represents an alkylene group, a phenylene group, a cyclohexylene group, an ester bond, an amide bond, — (CH 2 CH 2 O) n —, — (CH 2 CH 2 CH 2 O) n- , or a combination thereof (where n is an integer from 1 to 30).
- Q 3 represents an alkylene group, a phenylene group, a cyclohexylene group, an ester bond, an amide bond, — (CH 2 CH 2 O) n —, — (CH 2 CH 2 CH 2 O) n- , or a combination thereof (where n is an integer from 1 to 30).
- These groups may have a substituent such as a hydroxyl group or an aryl group.
- N 1 to 10 in Table 1 above
- the polymer according to the present invention is a copolymer containing at least one of the above polymerized units (A) and polymerized units (B), and the polymerized units (B) are represented by the formula (b). It is preferable that the polymerization unit (A) is derived from the compound represented by the formula (a1) and the polymerization unit (B) is derived from the compound represented by the formula (b1). It is more preferable that they are used.
- the content of polymer units (A) in the polymer is preferably 90% by mass or more, and more preferably 95% by mass or more.
- the content of the polymerization unit (A) is 90% by mass or more, the IPA performance can be maintained and the creeping prevention performance can be maintained.
- the content of the polymer units (B) in the polymer is preferably 0.1 to 10% by mass, more preferably 0.5 to 5% by mass.
- the content is within the above range, the IPA performance of the copolymer is improved, and good anti-cracking performance of the flux can be obtained.
- the content is too small, the creeping prevention performance is low, and when the content is too large, the solubility of the copolymer in the solvent is remarkably lowered.
- the content of each polymerization unit can be substantially regarded as a polymerization charge amount.
- the content is the total of the respective polymerization units.
- the polymer according to the present invention may contain other polymer units (C) in addition to the polymer units (A) and (B) as described above.
- the other polymerization unit (C) is not particularly limited as long as it is a polymerization unit derived from a compound that can be copolymerized with the compounds forming the above (A) and (B).
- this compound include a compound (c) having a polymerizable group.
- examples thereof include a compound (c) having an unsaturated group such as an acrylic acid compound (c2) and a further polymerizable compound (c3).
- an acrylic acid compound (c2) and a further polymerizable compound (c3).
- R 2 —H, CH 3 , —Cl, —CHO, —COOH, —CH 2 Cl, —CH 2 NH 2 , —CH 2 N (CH 3 ) 2 , —CH 2 N (CH 3 ) 3 Cl, —CH 2 NH 3 Cl, —CH 2 CN, —CH 2 COOH, —CH 2 N (CH 2 COOH) 2 , —CH 2 SH, —CH 2 SO 3 Na or —CH 2 OCOCH 3 .
- the polymer according to the present invention can contain, as the polymerized unit (C), a polymerized unit derived from one or more of the compounds (c) as described above.
- the total amount may be 50% by mass or less, preferably 20% by mass or less.
- the polymer according to the present invention requires a high molecular weight for sufficiently exhibiting the creeping prevention performance in addition to the structure as described above.
- the polymer has a weight average molecular weight (Mw) of 150,000 or more.
- Mw weight average molecular weight
- the molecular weight is preferably 180,000 or more, more preferably 200,000 or more.
- the molecular weight is too large, solubility in a solvent and handling of a polymer become difficult, so that it is preferably at most 2 million, more preferably 1 million or less. Even 500,000 or less may be sufficient.
- the weight average molecular weight is defined as GPC (gel permeation chromatography; column filler: styrene divinylbenzene copolymer, moving layer: polymethyl methacrylate (standard name) measured by Asahiklin AK-225 (trade name). Substance) The molecular weight in terms of conversion.
- the polymer according to the present invention is not particularly limited with respect to the polymerization form and the like except that it includes the above-described polymerization units (A) and (B) and an additional polymerization unit (C).
- the polymerization form may be any of random, block, graft and the like, and is not particularly limited, but usually a random copolymer is preferred.
- the scooping preventive agent of the present invention is a liquid composition containing the above-mentioned polymer and usually dissolved or dispersed in a solvent.
- the polymer is produced by solution polymerization using a solvent described later as a polymerization medium, and the liquid composition is directly prepared by polymerization.
- the polymerization raw material compound is a gas such as vinyl chloride, it may be continuously supplied under pressure using a pressure vessel.
- the solvent for forming the composition is not particularly limited as long as it can dissolve or disperse the polymer, and examples thereof include various organic solvents, water, and mixed media thereof.
- the polymer is particularly easily dissolved in a fluorinated solvent, and hydrochlorofluorocarbon (HCFC) and perfluorocarbon (PFC) can also be used.
- hydrochlorofluorocarbon (HCFC) and perfluorocarbon (PFC) can also be used.
- hydrofluorocarbon (HFC) or hydrofluoroether (HFE) is preferable. Specific examples of usable fluorine-based solvents are shown below, but are not limited thereto.
- m-XHF m-xylene hexafluoride
- p-XHF p-xylene hexafluoride
- CF 3 CH 2 CF 2 CH 3 CF 3 CH 2 CF 2 H
- C 6 F 13 OCH 3 C 6 F 13 OC 2 H 5
- C 3 F 7 OCH 3 C 3 F 7 OC 2 H 5
- C 6 F 13 H CF 2 HCF 2 CH 2 OCF 2 CF 2 H
- CF 3 (OCF 2 CF 2 ) n (OCF 2 ) m OCF 2 H m and n are each 1 to 20
- CF 3 CF 2 CHCl 2 and CClF 2 CF 2 CHClF is a trade name of Asahi Clin AK-225 (manufactured by Asahi Glass Co., Ltd.), and CF 3 (CF 2 ) 3 OC 2 H 5 and (CF 3 )
- a hydrofluoroether mixture with 2 CFCF 2 OC 2 H 5 is available under the trade name Novec HFE 7200 (manufactured by 3M).
- the scooping preventive agent of the present invention may contain any desired component as long as it does not adversely affect the stability of the composition, the flux scooping prevention performance or the appearance.
- Such components include, for example, pH control agents, rust preventives for preventing corrosion of the coating surface, the purpose of controlling the concentration of the polymer in the liquid when the composition is diluted, and untreated parts Dyes, dye stabilizers, flame retardants, antifoaming agents, antistatic agents, and the like.
- a coating film of the scooping-up preventing agent as described above is formed on a part or all of the soldering portion of the surface of the electronic member, and after treating a part or all of the coating film with a soldering flux, An electronic member soldering method for soldering is provided.
- the scooping-up preventing agent can be diluted to an arbitrary concentration according to the purpose and application and coated on the electronic member.
- a coating method a general coating method can be employed. For example, there are methods such as dip coating, spray coating, or coating with an aerosol can filled with the composition of the present invention.
- the electronic member include an electronic component having an electrical contact such as a connector, a switch, a volume, or a semi-fixed resistor, and a printed circuit board having an electrical contact.
- the location covered with the scooping preventive agent of the present invention include a location where a flux scooping may occur when an electronic component such as a connector is soldered to a printed circuit board. More specifically, a base part of an electronic component such as a connector to be attached to the printed board, a substrate surface on the side of the printed board on which the electronic component main body is mounted, or a through hole provided in the printed board for attaching the electronic component, etc. It is done. Moreover, you may coat
- the scooping preventive agent of the present invention forms a film on the surface of an electronic member such as an electronic component or a printed circuit board and prevents scooping of the solder flux. Therefore, according to the present invention, an electronic member such as an electronic component or a printed board in which corrosion due to flux is prevented is provided.
- An electronic component such as an electronic component or a printed circuit board having a coating (dried) formed on the surface as described above or a printed board is then treated with a soldering flux, and then soldered.
- the soldering method is not particularly limited, and is performed according to a conventionally known method.
- the types of flux and solder are not particularly limited, and those commonly used for soldering electronic members can be used.
- the electronic components or electronic members such as printed boards are used as materials for various electric products.
- the electrical product is an excellent quality electrical product in which a failure caused by corrosion due to flux is prevented.
- Specific examples of the electric products include devices for computer devices, televisions, audio devices (radio cassettes, compact discs, minidiscs), mobile phones, and the like.
- Test 2 The polymerization compositions of Examples 1 to 5 were diluted with HFE7200 to prepare solder flux creep-up inhibitors having a polymer concentration of 1%. A test piece subjected to silver plating (3 ⁇ m) was dipped in each scooping preventive agent at room temperature for 1 minute, then taken out and dried at room temperature, and treated with a scooping preventive agent.
- SAT-5100 (Resca Co., Ltd.) was used for the zero cross time measurement.
- Solder used H63A-B20 (eutectic solder, Senju Metal Industry Co., Ltd.) Solder temperature: 235 ° C Flux: Rosin flux 25% IPA solution (Senju Metal Industry Co., Ltd.)
- Base material Silver-plated plate (10 x 30 x 0.3 mm, Reska Co., Ltd.) Immersion conditions: Immersion speed: 20 mm / sec, Immersion depth: 2 mm, Immersion time: 10 sec Treatment conditions: After immersion for 1 minute, air-dry at room temperature for 20 minutes or more.
- Table 4 shows the evaluation results of contact resistance and solder wettability (zero cross time).
- the scooping-up preventing agent even when the treatment was performed at a concentration of 1% which is considerably higher than the concentration of a general scooping-up preventing agent, the contact resistance was almost the same as that of untreated. From this, it was confirmed that even if a film made of the scooping-up preventing agent is formed on the contact portion of the electrical component, the possibility of contact failure is very low. Moreover, since the zero cross time after the treatment at the above 1% concentration is also 1 second or less, it has been confirmed that even if the scooping prevention coating is processed on the soldered portion, it does not affect the soldering. .
Abstract
Description
CH2=C(R1)-C(O)O-Q1-Rf (a)
式中、R1:水素原子またはメチル基、
Q1:単結合または2価の連結基、
Rf:主鎖の鎖長が炭素数1~6のポリフルオロアルキル基またはポリフルオロエーテル基を示す。 The solder flux creeping-up composition according to the present invention comprises a polymerization unit (A) derived from a compound represented by the following formula (a) and a polymerization unit (B) derived from an unsaturated compound containing a hydroxyl group. Each polymer contains at least one polymer and has a weight average molecular weight (in terms of polymethyl methacrylate) of 150,000 or more.
CH 2 ═C (R 1 ) —C (O) OQ 1 —R f (a)
In the formula, R 1 : a hydrogen atom or a methyl group,
Q 1 : a single bond or a divalent linking group,
R f represents a polyfluoroalkyl group or polyfluoroether group having a main chain length of 1 to 6 carbon atoms.
また式(a)において、好ましいQ1は単結合または炭素数1~6の直鎖アルキレン基、アミノ基、スルホニル基、またはこれらの組合せである。 In the above formula (a), a preferred R f group is a linear perfluoroalkyl group or perfluoroether group having 1 to 6 carbon atoms.
In Formula (a), Q 1 is preferably a single bond or a linear alkylene group having 1 to 6 carbon atoms, an amino group, a sulfonyl group, or a combination thereof.
CH2=C(R1)-C(O)O-Q2-OH (b)
式中、R1:前記式(a)と同じ、Q2:2価の連結基。 The polymerization unit (B) is preferably derived from a compound represented by the following formula (b).
CH 2 ═C (R 1 ) —C (O) O—Q 2 —OH (b)
Wherein, R 1: same as in the formula (a), Q 2: 2 divalent linking group.
本発明に係るはんだ用フラックス這い上がり防止組成物は、通常、液状形態であり、好ましくは上記のような重合体を0.001~10質量%の濃度で含有する。 An embodiment in which the proportion of the polymer units (B) in the polymer is 10% by mass or less is preferable.
The solder flux creeping-up composition according to the present invention is usually in a liquid form, and preferably contains a polymer as described above at a concentration of 0.001 to 10% by mass.
本発明のフラックス這い上がり防止組成物は、それにより形成される被膜の接触抵抗やはんだ濡れ性が該被膜のない状態と同じであることから、電子部品等に被膜を形成しても、接点部が被膜による接触不良を起こす可能性が低く、さらに、被膜形成部分のはんだ付けに支障が生じにくいものと考えられる。 The present invention provides a composition for preventing flux creep-up, not only by suppressing the content of polyfluoroalkyl groups having 8 or more carbon atoms in the polymer to ensure safety to living bodies and the environment, but also to polyfluoroalkyl. Suppression of the creeping prevention performance due to the decrease in the chain length of the group is suppressed, and it is possible to maintain the same level of performance as conventional products.
The flux scooping prevention composition of the present invention has the same contact resistance and solder wettability as the film formed thereby, so that even if a film is formed on an electronic component or the like, the contact portion Is less likely to cause contact failure due to the coating, and it is considered that the soldering of the coating forming portion is less likely to cause trouble.
CH2=C(R1)-COO-Q1-Rf (a)
ただし、式中の記号は以下の意味を示す。
R1:水素原子またはメチル基、
Q1:単結合または2価の連結基、
Rf:主鎖の鎖長が炭素数1~6のポリフルオロアルキル基またはポリフルオロエーテル基。 The polymer contained in the composition for preventing creeping up of the solder flux of the present invention (also referred to as “scooping-up preventing agent”) is a polymer unit (A) derived from a compound represented by the following formula (a): And at least one polymerization unit (B) derived from an unsaturated compound containing a hydroxyl group.
CH 2 ═C (R 1 ) —COO—Q 1 —R f (a)
However, the symbols in the formulas have the following meanings.
R 1 : a hydrogen atom or a methyl group,
Q 1 : a single bond or a divalent linking group,
R f : a polyfluoroalkyl group or polyfluoroether group having a main chain length of 1 to 6 carbon atoms.
また、ポリフルオロエーテル基とは、上記ポリフルオロアルキル基中の1箇所以上の炭素-炭素原子間にエーテル性酸素原子が挿入された基を意味する。 The polyfluoroalkyl group means a partially fluoro-substituted or perfluoro-substituted alkyl group in which two to all of the hydrogen atoms of the alkyl group are substituted with fluorine atoms. The polyfluoroalkyl group represented by the R f group may have either a straight chain structure or a branched structure, but the main chain length (the number of carbon atoms not including the side chain) is an alkyl having 1 to 6 carbon atoms. A partially fluoro- or perfluoro-substituted alkyl group corresponding to the group. Specific examples include a moiety corresponding to an alkyl group such as methyl, ethyl, propyl, butyl, pentyl, hexyl, isopropyl, 3-methylbutyl or a perfluoro-substituted alkyl group.
The polyfluoroether group means a group in which an etheric oxygen atom is inserted between one or more carbon-carbon atoms in the polyfluoroalkyl group.
また、Rf基としては、ポリフルオロアルキル基が好ましい。さらに、Rf基は、実質的に全フッ素置換されたパーフルオロアルキル基(RF)が好ましく、主鎖の鎖長が炭素数1~6のRF基であることがより好ましく、直鎖のRF基であることが特に好ましい。 Among the above, the R f group preferably has a linear structure from the viewpoint of increasing the packing of the R f group. For the same reason, in the case of a branched structure, it is preferable that the branched portion is present at the terminal portion of the R f group.
The R f group is preferably a polyfluoroalkyl group. Further, the R f group is preferably a substantially perfluorinated perfluoroalkyl group (R F ), more preferably an R F group having a main chain length of 1 to 6 carbon atoms, It is particularly preferable that the R F group is.
CH2=C(R1)-COO-(CH2)p-Rf (a1)
式中、p:0~6の整数、
R1、Rf:式(a)と同じ。 Among the compounds represented by the formula (a), a preferable one is represented by the following formula (a1).
CH 2 ═C (R 1 ) —COO— (CH 2 ) p —R f (a1)
Where p is an integer from 0 to 6,
R 1 and R f are the same as those in the formula (a).
CH2=CH-COO-(CH2)2-C6F13、
CH2=C(CH3)-COO-(CH2)2-C6F13、
CH2=CH-COO-(CH2)2-C4F9、
CH2=C(CH3)-COO-(CH2)2-C4F9
などである。 Among these, compounds having a structure in which R f is a linear perfluoroalkyl group (R F ) having 1 to 6 carbon atoms are particularly suitable. Such compounds specifically include
CH 2 ═CH—COO— (CH 2 ) 2 —C 6 F 13 ,
CH 2 ═C (CH 3 ) —COO— (CH 2 ) 2 —C 6 F 13 ,
CH 2 = CH-COO- (CH 2) 2 -C 4 F 9,
CH 2 ═C (CH 3 ) —COO— (CH 2 ) 2 —C 4 F 9
Etc.
CH2=C(R1)-C(O)O-Q2-OH (b)
式中、R1:式(a)における定義と同じであり、Q2:2価の連結基である。
Q2は、2価の連結基であれば適宜選択可能であり、前記式(a)におけるQ1と同様のものが挙げられるが、これらに限定されるものではない。 The polymerization unit (B) is derived from an unsaturated compound containing a hydroxyl group. This compound is preferably a compound represented by the following formula (b).
CH 2 ═C (R 1 ) —C (O) O—Q 2 —OH (b)
In the formula, R 1 is the same as defined in formula (a), and Q 2 is a divalent linking group.
Q 2 can be appropriately selected as long as it is a divalent linking group, and examples thereof include, but are not limited to, those similar to Q 1 in formula (a).
CH2=C(R1)-C(O)O-Q3-OH (b1)
式中、R1は前記と同じであり、Q3は、アルキレン基、フェニレン基、シクロヘキシレン基、エステル結合、アミド結合、-(CH2CH2O)n-、-(CH2CH2CH2O)n-、またはこれらの組合せである(ここでのnは1~30の整数)。これらの基は、たとえば水酸基、アリール基等の置換基を有していてもよい。Q3の具体例を表1に示す。Phはフェニル基である。
上記表1におけるn=1~10 Among these, a compound represented by the following formula (b1) is preferable.
CH 2 ═C (R 1 ) —C (O) O—Q 3 —OH (b1)
In the formula, R 1 is the same as defined above, and Q 3 represents an alkylene group, a phenylene group, a cyclohexylene group, an ester bond, an amide bond, — (CH 2 CH 2 O) n —, — (CH 2 CH 2 CH 2 O) n- , or a combination thereof (where n is an integer from 1 to 30). These groups may have a substituent such as a hydroxyl group or an aryl group. Specific examples of Q 3 shown in Table 1. Ph is a phenyl group.
N = 1 to 10 in Table 1 above
なお、本発明に係る重合体において、各重合単位の含有量は、実質的に、重合仕込み量とみなすことができる。また、重合単位(A)または(B)において、重合単位が2種以上からなる場合には、上記含有量は、各重合単位の合計でのものである。 The content of the polymer units (B) in the polymer is preferably 0.1 to 10% by mass, more preferably 0.5 to 5% by mass. When the content is within the above range, the IPA performance of the copolymer is improved, and good anti-cracking performance of the flux can be obtained. When the content is too small, the creeping prevention performance is low, and when the content is too large, the solubility of the copolymer in the solvent is remarkably lowered.
In the polymer according to the present invention, the content of each polymerization unit can be substantially regarded as a polymerization charge amount. In the polymerization unit (A) or (B), when the polymerization unit is composed of two or more kinds, the content is the total of the respective polymerization units.
式中、R2:-H、CH3、-Cl、-CHO、-COOH、-CH2Cl、-CH2NH2、-CH2N(CH3)2、-CH2N(CH3)3Cl、-CH2NH3Cl、-CH2CN、-CH2COOH、-CH2N(CH2COOH)2、-CH2SH、-CH2SO3Naまたは-CH2OCOCH3である。 As said (c1), the styrene-type compound represented by a following formula is mentioned.
In the formula, R 2 : —H, CH 3 , —Cl, —CHO, —COOH, —CH 2 Cl, —CH 2 NH 2 , —CH 2 N (CH 3 ) 2 , —CH 2 N (CH 3 ) 3 Cl, —CH 2 NH 3 Cl, —CH 2 CN, —CH 2 COOH, —CH 2 N (CH 2 COOH) 2 , —CH 2 SH, —CH 2 SO 3 Na or —CH 2 OCOCH 3 .
CH2=C(R1)-COO-R3
式中、R1:水素原子またはメチル基であり、R3:-CH3-CH2CH2N(CH3)2、-(CH2)mH (m=2~20)、-CH2CH(CH3)2、-CH2-C(CH3)2-OCO-Ph、-CH2Ph、-CH2CH2OPh、-CH2N(CH3)3Cl、-(CH2CH2O)mCH3(m=2~20)、-(CH2)2-NCO、
である。 Examples of (c2) include acrylic acid, methacrylic acid, and (meth) acrylate represented by the following formula.
CH 2 ═C (R 1 ) —COO—R 3
In the formula, R 1 is a hydrogen atom or a methyl group, and R 3 is —CH 3 —CH 2 CH 2 N (CH 3 ) 2 , — (CH 2 ) m H (m = 2 to 20), —CH 2 CH (CH 3 ) 2 , —CH 2 —C (CH 3 ) 2 —OCO—Ph, —CH 2 Ph, —CH 2 CH 2 OPh, —CH 2 N (CH 3 ) 3 Cl, — (CH 2 CH 2 O) m CH 3 (m = 2 to 20), — (CH 2 ) 2 —NCO,
It is.
CH2=C(R1)-CONH-R4
式中、R1:水素原子またはメチル基であり、R4:-CmH2m+1(m=2~20)、-Hである。 Examples of (c2) further include polyesters of (meth) acrylic acid such as acrylic acid diesters and compounds represented by the following formula.
CH 2 = C (R 1 ) -CONH-R 4
In the formula, R 1 is a hydrogen atom or a methyl group, and R 4 is —C m H 2m + 1 (m = 2 to 20), —H.
また、重合性化合物(c3)としては、以下のようなエポキシ基を有する不飽和エステルも挙げられる。
Moreover, as a polymeric compound (c3), the unsaturated ester which has the following epoxy groups is also mentioned.
なお、本発明における重量平均分子量とは、GPC(ゲル浸透クロマトグラフィー;カラム充填剤:スチレンジビニルベンゼン共重合体,移動層:アサヒクリンAK-225(商品名)により測定されるポリメチルメタクリレート(標準物質)換算分子量である。 If the molecular weight of the polymer as described above is small, it will not be possible to exhibit sufficient creeping prevention performance. For this reason, the polymer according to the present invention requires a high molecular weight for sufficiently exhibiting the creeping prevention performance in addition to the structure as described above. Specifically, the polymer has a weight average molecular weight (Mw) of 150,000 or more. The molecular weight is preferably 180,000 or more, more preferably 200,000 or more. However, if the molecular weight is too large, solubility in a solvent and handling of a polymer become difficult, so that it is preferably at most 2 million, more preferably 1 million or less. Even 500,000 or less may be sufficient.
In the present invention, the weight average molecular weight is defined as GPC (gel permeation chromatography; column filler: styrene divinylbenzene copolymer, moving layer: polymethyl methacrylate (standard name) measured by Asahiklin AK-225 (trade name). Substance) The molecular weight in terms of conversion.
p-キシレンヘキサフルオリド(以下、p-XHFと記す。)、
CF3CH2CF2CH3、
CF3CH2CF2H、
C6F13OCH3、
C6F13OC2H5、
C3F7OCH3、
C3F7OC2H5、
C6F13H、
CF2HCF2CH2OCF2CF2H、
CF3CFHCFHCF2CH3、
CF3(OCF2CF2)n(OCF2)mOCF2H(m、nはいずれも1~20)、
C3F17OCH3、
C7F15OCH3、
C4F9OCH3、
C4F9OC2H5、
CF3(CF2)3OC2H5、
(CF3)2CFCF2OC2H5、
C4F9CH2CH3、
CF3CH2OCF2CF2CF2H、
CF3CF2CHCl2、
CClF2CF2CHClF
およびこれらの混合物。
たとえばCF3CF2CHCl2とCClF2CF2CHClFとの混合物がアサヒクリンAK-225(旭硝子(株)製)の商品名で、CF3(CF2)3OC2H5と(CF3)2CFCF2OC2H5とのハイドロフルオロエーテル混合物がノベックHFE7200(3M社製)の商品名で入手可能である。 m-xylene hexafluoride (hereinafter referred to as m-XHF),
p-xylene hexafluoride (hereinafter referred to as p-XHF),
CF 3 CH 2 CF 2 CH 3 ,
CF 3 CH 2 CF 2 H,
C 6 F 13 OCH 3 ,
C 6 F 13 OC 2 H 5 ,
C 3 F 7 OCH 3 ,
C 3 F 7 OC 2 H 5 ,
C 6 F 13 H,
CF 2 HCF 2 CH 2 OCF 2 CF 2 H,
CF 3 CFHCFHCF 2 CH 3,
CF 3 (OCF 2 CF 2 ) n (OCF 2 ) m OCF 2 H (m and n are each 1 to 20),
C 3 F 17 OCH 3 ,
C 7 F 15 OCH 3 ,
C 4 F 9 OCH 3 ,
C 4 F 9 OC 2 H 5 ,
CF 3 (CF 2 ) 3 OC 2 H 5 ,
(CF 3 ) 2 CFCF 2 OC 2 H 5 ,
C 4 F 9 CH 2 CH 3 ,
CF 3 CH 2 OCF 2 CF 2 CF 2 H,
CF 3 CF 2 CHCl 2 ,
CClF 2 CF 2 CHClF
And mixtures of these.
For example, a mixture of CF 3 CF 2 CHCl 2 and CClF 2 CF 2 CHClF is a trade name of Asahi Clin AK-225 (manufactured by Asahi Glass Co., Ltd.), and CF 3 (CF 2 ) 3 OC 2 H 5 and (CF 3 ) A hydrofluoroether mixture with 2 CFCF 2 OC 2 H 5 is available under the trade name Novec HFE 7200 (manufactured by 3M).
フラックス及びはんだの種類についても、特に制限されることはなく、電子部材のはんだ付けに常用されているものが使用可能である。 An electronic component such as an electronic component or a printed circuit board having a coating (dried) formed on the surface as described above or a printed board is then treated with a soldering flux, and then soldered. The soldering method is not particularly limited, and is performed according to a conventionally known method.
The types of flux and solder are not particularly limited, and those commonly used for soldering electronic members can be used.
以下の調製例で使用した重合モノマーを表2に示す。これらの化合物は、すべて市場から試薬として入手することができる。 The present invention will be specifically described below, but the present invention is not limited to the following examples. Unless otherwise specified, what is indicated by “%” in the description of the following examples represents “mass%”.
The polymerization monomers used in the following preparation examples are shown in Table 2. All of these compounds are commercially available as reagents.
<重合組成物の調製>
密閉容器に、モノマー、重合溶剤(m-XHF)、開始剤のジメチル2,2'-アゾビス(2-メチルプロピオナート)(V-601:和光純薬工業(株)製商品名)を、それぞれ表3に記載の仕込み比で仕込み、70℃で26時間反応を行い、重合組成物1~5を得た。以下のように求めた各重合組成物の各重合体の分子量を表3に示す。
以下において、重合組成物を希釈する際には、反応により得られた所定量の重合組成物を120℃で2時間乾燥させた後の乾燥残分を重合体として秤量し、重合組成物の重合体濃度%(質量%)を求めた。 (Examples 1 to 5)
<Preparation of polymerization composition>
In a closed container, monomer, polymerization solvent (m-XHF), initiator dimethyl 2,2′-azobis (2-methylpropionate) (V-601: Wako Pure Chemical Industries, Ltd., trade name) Each was charged at the charging ratio shown in Table 3, and reacted at 70 ° C. for 26 hours to obtain polymerization compositions 1 to 5. Table 3 shows the molecular weight of each polymer of each polymerization composition determined as follows.
In the following, when diluting the polymerization composition, a predetermined amount of the polymerization composition obtained by the reaction is dried at 120 ° C. for 2 hours, and the dry residue is weighed as a polymer. The coalescence concentration% (mass%) was determined.
重合組成物を、重合体の濃度が約1%になるように、アサヒクリンAK-225(旭硝子(株)製)を用いて希釈し、測定サンプルとした。昭和電工株式会社製Shodex GPC-104を用いて、以下の条件でGPCを測定した。
<GPC測定条件>
Separtion Column:LF-604(充填剤:スチレンジビニルベンゼン共重合体,昭和電工株式会社製)×2
Default Column:KF600RH(充填剤:なし,昭和電工株式会社製)×2
Clean Liquid:AK-225
Flow Rate:0.2ml/min
標準物質:ポリメチルメタクリレート [Measurement of weight average molecular weight]
The polymerization composition was diluted with Asahiklin AK-225 (manufactured by Asahi Glass Co., Ltd.) so that the concentration of the polymer was about 1%, and used as a measurement sample. GPC was measured under the following conditions using Shodex GPC-104 manufactured by Showa Denko K.K.
<GPC measurement conditions>
Separtion Column: LF-604 (Filler: Styrene divinylbenzene copolymer, Showa Denko KK) x 2
Default Column: KF600RH (filler: none, Showa Denko KK) x 2
Clean Liquid: AK-225
Flow Rate: 0.2ml / min
Reference material: Polymethylmethacrylate
表3に記載の仕込みモノマーに代えた以外は、実施例1と同様にして比較重合組成物1~9を得た。実施例と同様にして求めた各重合組成物の各重合体の分子量を表3に示す。 (Comparative Examples 1 to 9)
Comparative polymerization compositions 1 to 9 were obtained in the same manner as in Example 1 except that the charged monomers listed in Table 3 were used. Table 3 shows the molecular weight of each polymer of each polymerization composition obtained in the same manner as in the Examples.
上記実施例および比較例で得られた各重合組成物を、HFE7200(3M社製)で希釈し、重合体濃度0.05%の各はんだ用フラックス這い上がり防止剤を調製した。
このはんだ用フラックス這い上がり防止剤について、IPAに対する接触角を測定し、撥IPA性を評価した。結果を上記表3に示す。接触角の測定方法は以下のとおりである。
[接触角の測定]
銀めっき加工(3μm)を施したテストピースに防止剤の各々に、常温で1分間浸漬後、取出して室温で乾燥させて、這い上がり防止剤の被膜を処理した。該銀めっき板に、2-プロパノール(IPA)を滴下して接触角の測定を行った。接触角の測定には、自動接触角計OCA-20[dataphysics社製]を用いた。 (Test 1) IPA Repellency Each polymerization composition obtained in the above Examples and Comparative Examples was diluted with HFE7200 (manufactured by 3M), and a flux scooping inhibitor for each solder having a polymer concentration of 0.05% was added. Prepared.
About this solder flux creeping-up inhibitor, the contact angle with respect to IPA was measured and IPA repellency was evaluated. The results are shown in Table 3 above. The contact angle measurement method is as follows.
[Measurement of contact angle]
A test piece subjected to silver plating (3 μm) was immersed in each of the inhibitors for 1 minute at room temperature, then taken out and dried at room temperature to treat the scooping-up inhibitor film. 2-propanol (IPA) was dropped onto the silver plating plate, and the contact angle was measured. For the measurement of the contact angle, an automatic contact angle meter OCA-20 (manufactured by dataphysics) was used.
実施例1~5の重合組成物を、HFE7200を用いて希釈し、重合体濃度1%のはんだ用フラックス這い上がり防止剤を調製した。
銀めっき加工(3μm)を施したテストピースを、上記各這い上がり防止剤中に、常温で1分間浸漬後、取出して室温で乾燥させて、這い上がり防止剤による処理を行なった。 (Test 2)
The polymerization compositions of Examples 1 to 5 were diluted with HFE7200 to prepare solder flux creep-up inhibitors having a polymer concentration of 1%.
A test piece subjected to silver plating (3 μm) was dipped in each scooping preventive agent at room temperature for 1 minute, then taken out and dried at room temperature, and treated with a scooping preventive agent.
処理後の各テストピースについて、以下の条件で接触抵抗を測定した。
接触抵抗接触抵抗評価・測定装置:MS2007(ファクトケイ株式会社)
プローブ:Pt,φ=1mm
基材:銀めっき板(10×50×1mm、日本テストパネル株式会社)
処理条件:1分間浸漬後、室温で20分以上風乾。
測定荷重:5gf~100gf [Measurement of contact resistance]
About each test piece after a process, contact resistance was measured on condition of the following.
Contact resistance Contact resistance evaluation / measurement device: MS2007 (Fact Kei Co., Ltd.)
Probe: Pt, φ = 1mm
Base material: Silver plated plate (10 × 50 × 1 mm, Nippon Test Panel Co., Ltd.)
Treatment conditions: After immersion for 1 minute, air-dry at room temperature for 20 minutes or more.
Measurement load: 5gf-100gf
上記処理後の各テストピースについて、ゼロクロスタイムを測定した。
ゼロクロスタイムははんだの濡れ性の目安であり、短時間の方が濡れやすいことを意味し、性能が良好と評価される。 [Measurement of solder wettability (zero cross time)]
The zero cross time was measured for each test piece after the above treatment.
Zero cross time is a measure of the wettability of the solder, meaning that it is easier to wet in a short time, and the performance is evaluated as good.
<測定条件>
使用はんだ:H63A-B20(共晶はんだ、千住金属工業株式会社)
はんだ温度:235℃
フラックス:ロジンフラックス25%IPA溶液(千住金属工業株式会社)
基材:銀めっき板(10×30×0.3mm、株式会社レスカ)
浸漬条件:浸漬速度:20mm/sec、浸漬深さ:2mm、浸漬時間:10sec
処理条件:1分間浸漬後、室温で20分以上風乾。 SAT-5100 (Resca Co., Ltd.) was used for the zero cross time measurement.
<Measurement conditions>
Solder used: H63A-B20 (eutectic solder, Senju Metal Industry Co., Ltd.)
Solder temperature: 235 ° C
Flux: Rosin flux 25% IPA solution (Senju Metal Industry Co., Ltd.)
Base material: Silver-plated plate (10 x 30 x 0.3 mm, Reska Co., Ltd.)
Immersion conditions: Immersion speed: 20 mm / sec, Immersion depth: 2 mm, Immersion time: 10 sec
Treatment conditions: After immersion for 1 minute, air-dry at room temperature for 20 minutes or more.
這い上がり防止剤としては、一般的な這い上がり防止剤の濃度よりもかなり濃い1%濃度で処理を行っても、未処理とほとんど変わらない接触抵抗を示した。このことより、這い上がり防止剤による被膜が電気部品の接点部に形成されても、接触不良を起こす可能性が非常に低いことが確認できた。
また、上記1%濃度で処理後のゼロクロスタイムについても、1秒以下であることから、這い上がり防止被膜がはんだ付け部分に処理されていても、はんだ付けに影響を与えないことが確認できた。 Table 4 shows the evaluation results of contact resistance and solder wettability (zero cross time).
As the scooping-up preventing agent, even when the treatment was performed at a concentration of 1% which is considerably higher than the concentration of a general scooping-up preventing agent, the contact resistance was almost the same as that of untreated. From this, it was confirmed that even if a film made of the scooping-up preventing agent is formed on the contact portion of the electrical component, the possibility of contact failure is very low.
Moreover, since the zero cross time after the treatment at the above 1% concentration is also 1 second or less, it has been confirmed that even if the scooping prevention coating is processed on the soldered portion, it does not affect the soldering. .
実施例1,4および5と、比較例1,2,8および9で得られた重合組成物を、HFE7200で希釈し、重合体濃度0.05%および0.01%の極低濃度の希釈液を調製し、それらのフラックスの這い上がり性能を検討した。具体的な這い上がり性能評価の一例として、サイド型コネクター05FDZ-ST(S)(LF)(SN)(日本圧着端子製)を用い、いくつかの試験的条件を設定する方法により、以下のような試験を実施した。
コネクター部品を上記希釈液に1分間浸漬し、取り出した後室温で30分間乾燥させた。コネクター部品を、リード線の付け根までフラックスに10秒間漬けた。部品を基板に設置し、部品を設置した状態ではんだ付け面をフラックスに漬けた。235℃で溶融させた共晶はんだ(H63A-B20 千住金属工業株式会社)に、はんだ付け面を漬け、はんだ付けを行った。コネクター部品を解体して、接点部分にフラックスが這い上がっているかどうかを確認した。
上記のようなフラックスの這い上がり性能評価の結果を表5に示す。本発明の重合組成物は、低濃度でも充分な性能を示すことが確認できた。 (Test 3)
The polymerization compositions obtained in Examples 1, 4 and 5 and Comparative Examples 1, 2, 8 and 9 were diluted with HFE7200, and diluted at extremely low concentrations with polymer concentrations of 0.05% and 0.01%. Liquids were prepared and the creeping performance of those fluxes was examined. As an example of a specific climbing performance evaluation, a side type connector 05FDZ-ST (S) (LF) (SN) (manufactured by Nippon Crimp Terminal) was used, and several test conditions were set as follows. Tests were conducted.
The connector part was immersed in the diluted solution for 1 minute, taken out, and dried at room temperature for 30 minutes. The connector part was soaked in the flux for 10 seconds to the root of the lead wire. The component was placed on the board, and the soldering surface was immersed in the flux with the component placed. The soldering surface was dipped in eutectic solder (H63A-B20 Senju Metal Industry Co., Ltd.) melted at 235 ° C. and soldered. The connector parts were disassembled and it was confirmed whether or not the flux crawls up at the contact portions.
Table 5 shows the evaluation results of the flux climbing performance as described above. It has been confirmed that the polymerization composition of the present invention exhibits sufficient performance even at a low concentration.
Claims (7)
- 下記式(a)で表される化合物から導かれる重合単位(A)と、水酸基を含有する不飽和化合物から導かれる重合単位(B)のそれぞれ少なくとも1種を含有し、重量平均分子量(ポリメチルメタクリレート換算)が15万以上である重合体を含むはんだ用フラックス這い上がり防止組成物:
CH2=C(R1)-C(O)O-Q1-Rf (a)
式中、R1:水素原子またはメチル基、
Q1:単結合または2価の連結基、
Rf:主鎖の鎖長が炭素数1~6のポリフルオロアルキル基またはポリフルオロエーテル基を示す。 It contains at least one polymer unit (A) derived from a compound represented by the following formula (a) and a polymer unit (B) derived from an unsaturated compound containing a hydroxyl group, and has a weight average molecular weight (polymethyl) Flux creep-up preventing composition for solder containing a polymer having a methacrylate equivalent of 150,000 or more:
CH 2 ═C (R 1 ) —C (O) OQ 1 —R f (a)
In the formula, R 1 : a hydrogen atom or a methyl group,
Q 1 : a single bond or a divalent linking group,
R f represents a polyfluoroalkyl group or polyfluoroether group having a main chain length of 1 to 6 carbon atoms. - 前記Rf基が炭素数1~6の直鎖のパーフルオロアルキル基またはパーフルオロエーテル基である請求項1に記載の組成物。 The composition according to claim 1, wherein the R f group is a linear perfluoroalkyl group or perfluoroether group having 1 to 6 carbon atoms.
- 前記重合単位(B)が、下記式(b)で表される化合物から導かれる請求項1または2に記載の組成物:
CH2=C(R1)-C(O)O-Q2-OH (b)
式中、R1:前記式(a)と同じ、Q2:2価の連結基。 The composition according to claim 1 or 2, wherein the polymerization unit (B) is derived from a compound represented by the following formula (b):
CH 2 ═C (R 1 ) —C (O) O—Q 2 —OH (b)
Wherein, R 1: same as in the formula (a), Q 2: 2 divalent linking group. - 前記重合体中の前記重合単位(B)の割合が10質量%以下である請求項1~3のいずれかに記載の組成物。 The composition according to any one of claims 1 to 3, wherein a ratio of the polymerization unit (B) in the polymer is 10% by mass or less.
- 電子部材のはんだ付けする箇所に、請求項1~4のいずれかに記載の組成物からなる被膜を有し、はんだ用フラックス這い上がり防止性能を有する電子部材。 An electronic member having a coating made of the composition according to any one of claims 1 to 4 at a soldering position of the electronic member and having a solder flux creeping-up preventing performance.
- 電子部材のはんだ付けする箇所に、請求項1~4のいずれかに記載の組成物からなる被膜を形成し、該被膜の上にはんだ用フラックスを塗布した後、はんだ付けする、電子部材のはんだ付け方法。 A solder for an electronic member, wherein a film made of the composition according to any one of claims 1 to 4 is formed at a place to be soldered on the electronic member, a solder flux is applied on the film, and then soldered. Attaching method.
- 請求項6に記載の方法ではんだ付けした電子部材を含む電気製品。 An electrical product including an electronic member soldered by the method according to claim 6.
Priority Applications (2)
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JP2009549962A JP5295131B2 (en) | 2008-01-18 | 2008-11-25 | Solder flux creeping-up composition, electronic member for solder coated with the composition, method for soldering the member, and electrical product |
CN2008801253005A CN101952082B (en) | 2008-01-18 | 2008-11-25 | Flux creeping-up preventive composition for solder, electronic member for solder coated with the composition, method for soldering the member, and electrical appliance |
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JP2008-008923 | 2008-01-18 | ||
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PCT/JP2008/071320 WO2009090798A1 (en) | 2008-01-18 | 2008-11-25 | Flux creeping-up preventive composition for solder, electronic member for solder coated with the composition, method for soldering the member, and electrical appliance |
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JP (1) | JP5295131B2 (en) |
CN (1) | CN101952082B (en) |
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Cited By (3)
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WO2011021623A1 (en) * | 2009-08-20 | 2011-02-24 | Agcセイミケミカル株式会社 | Fluoroalkyl group-containing n-substituted (meth)acrylamide compound, polymer thereof, and use thereof |
WO2011105223A1 (en) * | 2010-02-26 | 2011-09-01 | アルプス電気株式会社 | Surface treating agent for electrical contacts |
WO2011152126A1 (en) * | 2010-06-02 | 2011-12-08 | Dic株式会社 | Cationically polymerizable composition, adhesive containing same, and cured product and polarizing plate which are obtained using same |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN108250338B (en) * | 2017-12-27 | 2020-11-20 | 兰州大学 | Polymer with anti-creep property and preparation method thereof |
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JPH07201501A (en) * | 1993-12-28 | 1995-08-04 | Dainippon Ink & Chem Inc | Method of preventing penetration of flux into electronic component |
JPH08301909A (en) * | 1995-05-12 | 1996-11-19 | Senju Metal Ind Co Ltd | Pounce for soldering flux |
JPH1133708A (en) * | 1997-07-15 | 1999-02-09 | Seimi Chem Co Ltd | Soldering flux climb preventive, its composition, and application |
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EP0996523B1 (en) * | 1997-07-15 | 2002-06-12 | Seimi Chemical Co., Ltd. | Composition for preventing creeping of a flux for soldering |
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2008
- 2008-11-25 WO PCT/JP2008/071320 patent/WO2009090798A1/en active Application Filing
- 2008-11-25 JP JP2009549962A patent/JP5295131B2/en active Active
- 2008-11-25 MY MYPI2010003394A patent/MY150334A/en unknown
- 2008-11-25 CN CN2008801253005A patent/CN101952082B/en active Active
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JPH07201501A (en) * | 1993-12-28 | 1995-08-04 | Dainippon Ink & Chem Inc | Method of preventing penetration of flux into electronic component |
JPH08301909A (en) * | 1995-05-12 | 1996-11-19 | Senju Metal Ind Co Ltd | Pounce for soldering flux |
JPH1133708A (en) * | 1997-07-15 | 1999-02-09 | Seimi Chem Co Ltd | Soldering flux climb preventive, its composition, and application |
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WO2007099760A1 (en) * | 2006-03-01 | 2007-09-07 | Agc Seimi Chemical Co., Ltd. | Anti-flux migration composition for solder |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2011021623A1 (en) * | 2009-08-20 | 2011-02-24 | Agcセイミケミカル株式会社 | Fluoroalkyl group-containing n-substituted (meth)acrylamide compound, polymer thereof, and use thereof |
US9000110B2 (en) | 2009-08-20 | 2015-04-07 | Agc Seimi Chemical Co., Ltd. | Fluoroalkyl group-containing n-substituted (meth)acrylamide compound, polymer thereof, and use thereof |
JP5719299B2 (en) * | 2009-08-20 | 2015-05-13 | Agcセイミケミカル株式会社 | Fluoroalkyl group-containing N-substituted (meth) acrylamide compound, polymer thereof and use thereof |
WO2011105223A1 (en) * | 2010-02-26 | 2011-09-01 | アルプス電気株式会社 | Surface treating agent for electrical contacts |
WO2011152126A1 (en) * | 2010-06-02 | 2011-12-08 | Dic株式会社 | Cationically polymerizable composition, adhesive containing same, and cured product and polarizing plate which are obtained using same |
JP4947244B2 (en) * | 2010-06-02 | 2012-06-06 | Dic株式会社 | Cationic polymerizable composition, adhesive containing the same, and cured product and polarizing plate obtained using the same |
Also Published As
Publication number | Publication date |
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CN101952082B (en) | 2013-03-13 |
CN101952082A (en) | 2011-01-19 |
JP5295131B2 (en) | 2013-09-18 |
MY150334A (en) | 2013-12-31 |
JPWO2009090798A1 (en) | 2011-05-26 |
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