WO2009077199A3 - METHOD AND INSTALLATION FOR TREATING OR CLEANING Si BLOCKS - Google Patents

METHOD AND INSTALLATION FOR TREATING OR CLEANING Si BLOCKS Download PDF

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Publication number
WO2009077199A3
WO2009077199A3 PCT/EP2008/010871 EP2008010871W WO2009077199A3 WO 2009077199 A3 WO2009077199 A3 WO 2009077199A3 EP 2008010871 W EP2008010871 W EP 2008010871W WO 2009077199 A3 WO2009077199 A3 WO 2009077199A3
Authority
WO
WIPO (PCT)
Prior art keywords
blocks
cleaning
treating
installation
module
Prior art date
Application number
PCT/EP2008/010871
Other languages
German (de)
French (fr)
Other versions
WO2009077199A2 (en
Inventor
Heinz Kappler
Original Assignee
Gebr. Schmid Gmbh & Co.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gebr. Schmid Gmbh & Co. filed Critical Gebr. Schmid Gmbh & Co.
Publication of WO2009077199A2 publication Critical patent/WO2009077199A2/en
Publication of WO2009077199A3 publication Critical patent/WO2009077199A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • C30B33/08—Etching
    • C30B33/10—Etching in solutions or melts
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/037—Purification
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photovoltaic Devices (AREA)

Abstract

The invention relates to a method and installation for treating or cleaning Si blocks (17) to produce wafers for solar cells. According to the method, the Si blocks (17) are conveyed through various treatment modules (16, 30, 37, 45, 55) on a continuous, horizontal conveyor belt (14). In a first step or a cleaning module (16), the Si blocks are subjected to an alkaline cleaning step and then rinsed. In a second step or an etch-polish module (30), the blocks are subjected to etching polishing, an etching solution being applied to the Si blocks from all four sides. The blocks are then rinsed in a rinse module after etching polishing.
PCT/EP2008/010871 2007-12-19 2008-12-19 METHOD AND INSTALLATION FOR TREATING OR CLEANING Si BLOCKS WO2009077199A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007063169.5 2007-12-19
DE200710063169 DE102007063169A1 (en) 2007-12-19 2007-12-19 Method and system for processing or cleaning Si blocks

Publications (2)

Publication Number Publication Date
WO2009077199A2 WO2009077199A2 (en) 2009-06-25
WO2009077199A3 true WO2009077199A3 (en) 2010-11-18

Family

ID=40546094

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2008/010871 WO2009077199A2 (en) 2007-12-19 2008-12-19 METHOD AND INSTALLATION FOR TREATING OR CLEANING Si BLOCKS

Country Status (2)

Country Link
DE (1) DE102007063169A1 (en)
WO (1) WO2009077199A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008053598A1 (en) * 2008-10-15 2010-04-22 Gebr. Schmid Gmbh & Co. A method for releasing wafers from a wafer carrier and apparatus therefor
DE102012209902A1 (en) * 2012-06-13 2013-12-19 Singulus Stangl Solar Gmbh Method for treating silicon rods with e.g. water during manufacturing polycrystalline silicon ingots in process reactor, involves transporting semiconductor rods by endless chains, and treating semiconductor rods with liquid or gas
WO2015040094A2 (en) * 2013-09-18 2015-03-26 Flint Group Germany Gmbh Digitally exposable flexographic printing element and method for producing flexographic printing plates
CN114212796B (en) * 2021-12-31 2024-01-30 隆基绿能科技股份有限公司 Silicon material treatment device and silicon material treatment method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4119519A1 (en) * 1991-06-13 1992-12-17 Wacker Chemitronic Transport and surface treatment of semiconductor materials - uses moving belts inside modular treatment chambers with movements which optimise the process to reduce contamination and cost
EP1643545A1 (en) * 2003-05-28 2006-04-05 SUMCO Corporation Method of processing silicon wafer
WO2007082772A2 (en) * 2006-01-23 2007-07-26 Gebr. Schmid Gmbh + Co. Method and device for processing or treating silicon material

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003164816A (en) * 2001-11-29 2003-06-10 Fine Machine Kataoka Kk Washing apparatus and method for conveying work there
US7287535B2 (en) * 2003-05-01 2007-10-30 Fine Machine Kataoka Co., Ltd. Work washing apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4119519A1 (en) * 1991-06-13 1992-12-17 Wacker Chemitronic Transport and surface treatment of semiconductor materials - uses moving belts inside modular treatment chambers with movements which optimise the process to reduce contamination and cost
EP1643545A1 (en) * 2003-05-28 2006-04-05 SUMCO Corporation Method of processing silicon wafer
WO2007082772A2 (en) * 2006-01-23 2007-07-26 Gebr. Schmid Gmbh + Co. Method and device for processing or treating silicon material

Also Published As

Publication number Publication date
DE102007063169A1 (en) 2009-06-25
WO2009077199A2 (en) 2009-06-25

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