WO2009050966A1 - Light transmission optical system, illumination optical system, exposure apparatus, and device manufacturing method - Google Patents

Light transmission optical system, illumination optical system, exposure apparatus, and device manufacturing method Download PDF

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Publication number
WO2009050966A1
WO2009050966A1 PCT/JP2008/066526 JP2008066526W WO2009050966A1 WO 2009050966 A1 WO2009050966 A1 WO 2009050966A1 JP 2008066526 W JP2008066526 W JP 2008066526W WO 2009050966 A1 WO2009050966 A1 WO 2009050966A1
Authority
WO
WIPO (PCT)
Prior art keywords
optical system
light flux
light
light transmission
diffraction optical
Prior art date
Application number
PCT/JP2008/066526
Other languages
French (fr)
Japanese (ja)
Inventor
Kouji Muramatsu
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to JP2009538007A priority Critical patent/JP5459482B2/en
Publication of WO2009050966A1 publication Critical patent/WO2009050966A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/04—Prisms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

An illumination optical system of which a reflection characteristic of a reflecting member such as a reflection mirror and a total reflection forty-five degree prism can be stably maintained. The illumination optical system of the present invention is provided with a light transmission optical system (5) for transmitting a light flux from a light source to an effective diffraction optical surface of a diffraction optical element (61). The light transmission optical system comprises light flux splitting members (51a, 51b) which split an incident light flux (L) into a first light flux (L1) and a second light flux (L2), reflecting members (53a, 53b, 54a, 54b) that are arranged in the optical path between the light flux splitting members and the diffraction optical element, and light guide members (56a, 56b) which guide the first light flux to a first area (61a) in the effective diffraction optical surface and the second light flux to a second area (61b) in the effective diffraction optical surface.
PCT/JP2008/066526 2007-10-16 2008-09-12 Light transmission optical system, illumination optical system, exposure apparatus, and device manufacturing method WO2009050966A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009538007A JP5459482B2 (en) 2007-10-16 2008-09-12 Light transmission optical system, illumination optical system, exposure apparatus, and device manufacturing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007268468 2007-10-16
JP2007-268468 2007-10-16

Publications (1)

Publication Number Publication Date
WO2009050966A1 true WO2009050966A1 (en) 2009-04-23

Family

ID=40567242

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/066526 WO2009050966A1 (en) 2007-10-16 2008-09-12 Light transmission optical system, illumination optical system, exposure apparatus, and device manufacturing method

Country Status (2)

Country Link
JP (1) JP5459482B2 (en)
WO (1) WO2009050966A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT518591A1 (en) * 2016-05-11 2017-11-15 Bernecker + Rainer Industrie-Elektronik Ges M B H Illuminant with adjustable irradiance

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07135145A (en) * 1993-06-29 1995-05-23 Canon Inc Aligner
JP2005093522A (en) * 2003-09-12 2005-04-07 Canon Inc Optical illumination system and aligner using the same
WO2005036619A1 (en) * 2003-10-09 2005-04-21 Nikon Corporation Illumination optical device, and exposure device and method
JP2005236088A (en) * 2004-02-20 2005-09-02 Nikon Corp Illuminating optical device, aligner, and exposure method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07135145A (en) * 1993-06-29 1995-05-23 Canon Inc Aligner
JP2005093522A (en) * 2003-09-12 2005-04-07 Canon Inc Optical illumination system and aligner using the same
WO2005036619A1 (en) * 2003-10-09 2005-04-21 Nikon Corporation Illumination optical device, and exposure device and method
JP2005236088A (en) * 2004-02-20 2005-09-02 Nikon Corp Illuminating optical device, aligner, and exposure method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT518591A1 (en) * 2016-05-11 2017-11-15 Bernecker + Rainer Industrie-Elektronik Ges M B H Illuminant with adjustable irradiance
US10136491B2 (en) 2016-05-11 2018-11-20 B&R Industrial Automation GmbH Lighting apparatus with adjustable irradiance
AT518591B1 (en) * 2016-05-11 2019-04-15 B & R Ind Automation Gmbh Illuminant with adjustable irradiance

Also Published As

Publication number Publication date
JPWO2009050966A1 (en) 2011-02-24
JP5459482B2 (en) 2014-04-02

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