WO2009044463A1 - Drying device for coating film - Google Patents
Drying device for coating film Download PDFInfo
- Publication number
- WO2009044463A1 WO2009044463A1 PCT/JP2007/069368 JP2007069368W WO2009044463A1 WO 2009044463 A1 WO2009044463 A1 WO 2009044463A1 JP 2007069368 W JP2007069368 W JP 2007069368W WO 2009044463 A1 WO2009044463 A1 WO 2009044463A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- coating film
- supporting means
- supporting
- drying device
- Prior art date
Links
- 238000001035 drying Methods 0.000 title abstract 4
- 239000011248 coating agent Substances 0.000 title abstract 2
- 238000000576 coating method Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 4
- 238000010438 heat treatment Methods 0.000 abstract 2
- 239000007788 liquid Substances 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
- B05C9/14—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B15/00—Machines or apparatus for drying objects with progressive movement; Machines or apparatus with progressive movement for drying batches of material in compact form
- F26B15/10—Machines or apparatus for drying objects with progressive movement; Machines or apparatus with progressive movement for drying batches of material in compact form with movement in a path composed of one or more straight lines, e.g. compound, the movement being in alternate horizontal and vertical directions
- F26B15/12—Machines or apparatus for drying objects with progressive movement; Machines or apparatus with progressive movement for drying batches of material in compact form with movement in a path composed of one or more straight lines, e.g. compound, the movement being in alternate horizontal and vertical directions the lines being all horizontal or slightly inclined
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B23/00—Heating arrangements
- F26B23/04—Heating arrangements using electric heating
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B9/00—Machines or apparatus for drying solid materials or objects at rest or with only local agitation; Domestic airing cupboards
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Sustainable Development (AREA)
- Life Sciences & Earth Sciences (AREA)
- Drying Of Solid Materials (AREA)
Abstract
By disposing a substrate (4) whose upper surface is coated with a coating liquid in a drying area for drying by heating by a heating means (hot plate) (3) and relatively moving two supporting means (5, 6) for supporting the substrate by driving means (7), switching between a mode in which one supporting means (5) supports the lower surface of the substrate (4) at points and a mode in which the other supporting means (6) supports the surface of the substrate (4) at points different from those of the one supporting means (5) is performed. The driving means (7) are arranged in regions (S) outside the edge of the drying area (2) in plan view.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020077026217A KR101378049B1 (en) | 2007-10-03 | 2007-10-03 | Drying device for coated film |
PCT/JP2007/069368 WO2009044463A1 (en) | 2007-10-03 | 2007-10-03 | Drying device for coating film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2007/069368 WO2009044463A1 (en) | 2007-10-03 | 2007-10-03 | Drying device for coating film |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009044463A1 true WO2009044463A1 (en) | 2009-04-09 |
Family
ID=40525896
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/069368 WO2009044463A1 (en) | 2007-10-03 | 2007-10-03 | Drying device for coating film |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR101378049B1 (en) |
WO (1) | WO2009044463A1 (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01300519A (en) * | 1988-05-27 | 1989-12-05 | Tokyo Electron Ltd | Heating method |
JP2006222401A (en) * | 2005-02-14 | 2006-08-24 | Noritake Co Ltd | Walking-beam heat treatment apparatus |
JP3917994B2 (en) * | 2004-08-24 | 2007-05-23 | 株式会社石井表記 | Coating film drying oven |
-
2007
- 2007-10-03 KR KR1020077026217A patent/KR101378049B1/en active IP Right Grant
- 2007-10-03 WO PCT/JP2007/069368 patent/WO2009044463A1/en active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01300519A (en) * | 1988-05-27 | 1989-12-05 | Tokyo Electron Ltd | Heating method |
JP3917994B2 (en) * | 2004-08-24 | 2007-05-23 | 株式会社石井表記 | Coating film drying oven |
JP2006222401A (en) * | 2005-02-14 | 2006-08-24 | Noritake Co Ltd | Walking-beam heat treatment apparatus |
Also Published As
Publication number | Publication date |
---|---|
KR20100082392A (en) | 2010-07-19 |
KR101378049B1 (en) | 2014-03-27 |
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