WO2009038193A1 - Carbon material and method for producing the same - Google Patents

Carbon material and method for producing the same Download PDF

Info

Publication number
WO2009038193A1
WO2009038193A1 PCT/JP2008/067022 JP2008067022W WO2009038193A1 WO 2009038193 A1 WO2009038193 A1 WO 2009038193A1 JP 2008067022 W JP2008067022 W JP 2008067022W WO 2009038193 A1 WO2009038193 A1 WO 2009038193A1
Authority
WO
WIPO (PCT)
Prior art keywords
carbon material
buffer layer
base
producing
layer
Prior art date
Application number
PCT/JP2008/067022
Other languages
French (fr)
Japanese (ja)
Inventor
Takanori Kawano
Rie Tao
Yoshio Shodai
Original Assignee
Toyo Tanso Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Tanso Co., Ltd. filed Critical Toyo Tanso Co., Ltd.
Priority to JP2009533207A priority Critical patent/JPWO2009038193A1/en
Publication of WO2009038193A1 publication Critical patent/WO2009038193A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/278—Diamond only doping or introduction of a secondary phase in the diamond
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/04—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of carbon-silicon compounds, carbon or silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

Disclosed is a carbon material (10) comprising a carbonaceous or graphite base (1), a buffer layer (2) formed on the surface of the base (1) and containing diamond particles (4) which are partially embedded in the base (1), and a conductive diamond layer (3) formed on the buffer layer (2). Also disclosed is a method for producing a carbon material, which comprises a buffer layer-forming step wherein a buffer layer (2) containing diamond particles (4) is formed on the surface of a carbonaceous or graphite base (1) by embedding a part of the diamond particles (4) in the surface of the base (1), and a conductive diamond layer-forming step wherein a conductive diamond layer (3) is formed on the buffer layer (2).
PCT/JP2008/067022 2007-09-20 2008-09-19 Carbon material and method for producing the same WO2009038193A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009533207A JPWO2009038193A1 (en) 2007-09-20 2008-09-19 Carbon material and manufacturing method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-244552 2007-09-20
JP2007244552 2007-09-20

Publications (1)

Publication Number Publication Date
WO2009038193A1 true WO2009038193A1 (en) 2009-03-26

Family

ID=40468002

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/067022 WO2009038193A1 (en) 2007-09-20 2008-09-19 Carbon material and method for producing the same

Country Status (3)

Country Link
JP (1) JPWO2009038193A1 (en)
TW (1) TW200925108A (en)
WO (1) WO2009038193A1 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012066979A (en) * 2010-09-27 2012-04-05 Sumitomo Electric Ind Ltd High-hardness, electrically conductive polycrystalline diamond and method for producing the same
JP2012066980A (en) * 2010-09-27 2012-04-05 Sumitomo Electric Ind Ltd High-hardness, electrically conductive polycrystalline diamond and method for producing the same
WO2014024569A1 (en) * 2012-08-08 2014-02-13 日産自動車株式会社 Contact member and electric motor
CN115181957A (en) * 2022-08-25 2022-10-14 北京爱克瑞特金刚石工具有限公司 Preparation and application of functional diamond micro-nano powder and complex

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61251158A (en) * 1985-04-30 1986-11-08 Sumitomo Electric Ind Ltd Radiating substrate
JPS62138395A (en) * 1985-12-09 1987-06-22 Kyocera Corp Preparation of diamond film
JPH0297486A (en) * 1988-10-02 1990-04-10 Canon Inc Formation of diamond
JPH0558784A (en) * 1991-09-02 1993-03-09 Toyota Central Res & Dev Lab Inc Method for depositing diamond
JP2003147527A (en) * 2001-11-08 2003-05-21 Kobe Steel Ltd Diamond-coated nondiamond carbon member, and production method therefor
WO2005014886A1 (en) * 2003-08-07 2005-02-17 Ebara Corporation Method of coating for diamond electrode

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61251158A (en) * 1985-04-30 1986-11-08 Sumitomo Electric Ind Ltd Radiating substrate
JPS62138395A (en) * 1985-12-09 1987-06-22 Kyocera Corp Preparation of diamond film
JPH0297486A (en) * 1988-10-02 1990-04-10 Canon Inc Formation of diamond
JPH0558784A (en) * 1991-09-02 1993-03-09 Toyota Central Res & Dev Lab Inc Method for depositing diamond
JP2003147527A (en) * 2001-11-08 2003-05-21 Kobe Steel Ltd Diamond-coated nondiamond carbon member, and production method therefor
WO2005014886A1 (en) * 2003-08-07 2005-02-17 Ebara Corporation Method of coating for diamond electrode

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012066979A (en) * 2010-09-27 2012-04-05 Sumitomo Electric Ind Ltd High-hardness, electrically conductive polycrystalline diamond and method for producing the same
JP2012066980A (en) * 2010-09-27 2012-04-05 Sumitomo Electric Ind Ltd High-hardness, electrically conductive polycrystalline diamond and method for producing the same
WO2014024569A1 (en) * 2012-08-08 2014-02-13 日産自動車株式会社 Contact member and electric motor
CN115181957A (en) * 2022-08-25 2022-10-14 北京爱克瑞特金刚石工具有限公司 Preparation and application of functional diamond micro-nano powder and complex

Also Published As

Publication number Publication date
JPWO2009038193A1 (en) 2011-01-13
TW200925108A (en) 2009-06-16

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