WO2009024051A1 - Procédé de réalisation de l'adaptation d'impédance de rf et système d'adaptation d'impédance de rf - Google Patents

Procédé de réalisation de l'adaptation d'impédance de rf et système d'adaptation d'impédance de rf Download PDF

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Publication number
WO2009024051A1
WO2009024051A1 PCT/CN2008/071891 CN2008071891W WO2009024051A1 WO 2009024051 A1 WO2009024051 A1 WO 2009024051A1 CN 2008071891 W CN2008071891 W CN 2008071891W WO 2009024051 A1 WO2009024051 A1 WO 2009024051A1
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WIPO (PCT)
Prior art keywords
impedance
matching
admittance
matching network
input
Prior art date
Application number
PCT/CN2008/071891
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English (en)
Chinese (zh)
Inventor
Huangang Wang
Wenli Xu
Hui Li
Ning Wang
Haonan Shen
Ye Wu
Original Assignee
Beijing Nmc Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Nmc Co., Ltd. filed Critical Beijing Nmc Co., Ltd.
Publication of WO2009024051A1 publication Critical patent/WO2009024051A1/fr

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Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks
    • H03H7/40—Automatic matching of load impedance to source impedance

Definitions

  • the invention relates to an impedance matching technology, in particular to a method for realizing RF impedance matching and an RF impedance matching system. Background technique
  • an RF (radio frequency) generator with a constant output impedance typically 50 ⁇
  • a fixed frequency typically 13.56 MHz
  • the nonlinear load impedance of the plasma chamber is not equal to the constant output impedance of the RF generator, so there is a severe impedance mismatch between the RF generator and the plasma chamber, resulting in a large reflection on the transmission line.
  • the power is such that the power generated by the RF generator cannot be fully delivered to the plasma chamber.
  • the matching device is connected between the RF power source and the reaction chamber, and by adjusting the variable impedance component in the matching device, the impedance seen from the input end of the matching device to the output terminal is equal to the RF frequency.
  • the output impedance of the power supply allows the output power of the RF power source to be delivered to the reaction chamber for plasma excitation.
  • parameters such as voltage and current on the transmission line and phase difference between voltage and current are detected, and the input impedance of the matcher can be calculated based on these parameters. Then, based on the matched input impedance of the impedance detector, the amplitude error and the phase error are obtained, and the two error signals are used to control the tuning element, and the error signal is reduced to zero or small by continuously adjusting the tuning element. A match is reached.
  • the above prior art has at least the following disadvantages:
  • the tuning element affects both error signals simultaneously, ie affects both the amplitude error and the phase error. Due to the presence of this effect, the tuning time is long and the matching process is slow, resulting in an unreliable matching system. Summary of the invention
  • the impedance matching control between the radio frequency source and the load is implemented by matching the network, and the input admittance of the matching network is compared with the output admittance of the radio frequency source, and according to the comparison As a result, the input impedance of the matching network is adjusted to achieve impedance matching control.
  • the radio frequency impedance matching system of the present invention includes a radio frequency source and a load, wherein the radio frequency source is connected to the load through a matching network, and the matching network includes an impedance detector, a controller, and a variable impedance device.
  • the impedance detector detects an input impedance of the matching network and converts the input admittance of the matching network, and then transmits the input admittance to the controller; the controller is electrically connected to the variable impedance device, and
  • the input admittance of the matching network is compared with the output admittance of the radio frequency source, and the variable impedance device is adjusted according to the comparison result to achieve impedance matching between the radio frequency source and the load.
  • the input admittance of the matching network and the output admittance of the radio frequency source are performed. Comparing, and adjusting the input impedance of the matching network according to the result of the comparison to achieve impedance matching control. Therefore, the matching process is fast and the matching system is reliable.
  • FIG. 1 is a schematic diagram of a connection state of a matching device in the prior art
  • FIG. 2 is a circuit schematic diagram of a method for implementing RF impedance matching according to the present invention
  • FIG. 3 is a schematic diagram of a radio frequency impedance matching system of the present invention.
  • the invention implements a method for matching RF impedance, and achieves impedance matching control between a radio frequency source and a load through a matching network, compares an input admittance of the matching network with an output admittance of the radio frequency source, and according to the comparison result The input impedance of the matching network is adjusted to achieve impedance matching control.
  • Step 1 detecting an input impedance of the matching network, and converting the input admittance of the matching network according to the detected value;
  • Step 2 Compare the input admittance of the matching network with the output admittance of the RF source, and adjust the variable impedance device according to the comparison result, and adjust the input impedance of the matching network to achieve impedance matching control.
  • the matching network includes a first variable impedance device in parallel with the load and a second variable impedance device in series with the load.
  • the input admittance of the matching network is separately compared with the real and imaginary parts of the output admittance of the radio frequency source, and the first variable impedance device and the second variable impedance device are compared according to the comparison result. Make adjustments. Specifically, the following two methods can be adopted:
  • One is to first adjust the second variable impedance device G according to the error between the input admittance of the matching network and the real part of the output admittance of the RF source; and then, according to the input admittance of the matching network and the RF source The error between the imaginary parts of the output admittance adjusts the first variable impedance device G to achieve matching control.
  • the other is to adjust the second variable impedance device G according to the error between the input admittance of the matching network and the real part of the output admittance of the radio frequency source; meanwhile, according to the input admittance of the matching network and the radio frequency source
  • the error between the imaginary parts of the output admittance adjusts the first variable impedance device G to achieve matching control.
  • the input impedance Z of the matching network is:
  • admittance real part b is the admittance imaginary part, specifically:
  • adjusting the capacitance G does not affect the real part of the matching network input admittance.
  • the method for implementing the matching control of the present invention fully utilizes this feature by decoupling the control algorithm, firstly adjusting the capacitance G to make the real part of the admittance meet the requirement, and then adjusting the capacitance G to make the admittance imaginary part meet the requirement, because the adjustment G is admittance The real part has no effect.
  • the admittance imaginary part is adjusted, the system enters the matching state.
  • the decoupling control algorithm first detects the input admittance of the matching network to obtain the admittance real part and the imaginary part b, and then calculates the admittance real part deviation £? and the imaginary part deviation £ ⁇ 4.
  • the measured RF source output impedance is
  • A K 2 e b (9)
  • proportional coefficient which is the adjustable parameter of the algorithm.
  • Method 1 After calculating the capacitance adjustment amount, adjust the capacitances G and G separately. First, use the capacitor G to adjust the real part of the admittance. After the real part is adjusted, use the capacitor G to adjust the yin part of the admittance. In theory, if the steps of matching the real input adjustment and the imaginary part adjustment of the network input admittance are completed in sequence, the impedance automatic matching is completed.
  • Method 2 After calculating the capacitance adjustment amount, adjust the capacitances G and C 2 simultaneously.
  • the capacitors C 2 and G are simultaneously adjusted according to the admittance real part deviation and the imaginary part deviation, but at this time, the adjustment of the capacitance G will be affected by the adjustment of the capacitance G, and the adjustment of the G is not affected by the G.
  • the impedance matching speed of the two capacitors is adjusted at the same time as the capacitor is adjusted separately.
  • the invention controls the tuning element adjustment by using a decoupling control algorithm, using the admittance real part and the imaginary part error, and tuning the series branch due to the special relationship between the real part and the imaginary part of the matching network input admittance and the tuning element.
  • the components are not affected by the parallel branch tuning components.
  • the system enters the matching state as soon as the parallel tuning components are adjusted to the corresponding positions.
  • the relationship between the two error signals and the two tuning elements is simple. It is very easy to overcome the nonlinear correspondence between the tuning elements and the corresponding errors by adjusting some parameters in the decoupling algorithm.
  • the system matching can be realized by the decoupling control algorithm. There is no point that the impedance matching cannot be completed, and the algorithm is simple, easy to implement, and the system is reliable.
  • the present invention also provides an RF impedance matching system.
  • Figure 3 illustrates a preferred embodiment of the RF impedance matching system.
  • the system includes a radio frequency source, such as a load of a reaction chamber, the RF source being coupled to the load through a matching network to achieve impedance matching between the RF source and the load through the matching network.
  • the matching network includes an impedance detector, a controller, and a variable impedance device.
  • the impedance detector detects an input impedance of the matching network, and converts an input admittance of the matching network, and then transmits the input admittance to the controller.
  • the variable impedance means comprises a reaction chamber in parallel with the first variable impedance device G series with the load and a second variable impedance device C 2.
  • the variable impedance device can be connected to a driving device for converting the impedance under the control of the controller.
  • the variable impedance device may be a variable resistor, a variable capacitor or a variable inductor, or a plurality of variable impedance devices may be connected in parallel or in series, and may be variable by a controller. The impedance device is controlled.
  • the controller is electrically connected to the variable impedance device, and compares an input admittance of the matching network with an output admittance of the radio frequency source, and adjusts a variable impedance device according to the comparison result to implement a radio frequency source and Impedance matching between loads. Specifically, the controller separately compares the input admittance of the matching network with the real and imaginary parts of the output admittance of the radio frequency source, and compares the first variable impedance device and the second variable impedance device according to the comparison result. Make adjustments.
  • the controller adjusts the first variable impedance device and the second variable impedance device in one of the following ways: First, according to the input admittance of the matching network and the output of the RF source The error between the real parts of the nanometer adjusts the second variable impedance device; then, the first variable impedance device is adjusted according to the error between the input admittance of the matching network and the imaginary part of the output admittance of the RF source , achieve impedance matching control.
  • the error between the imaginary parts adjusts the first variable impedance device to achieve impedance matching control.
  • load in the foregoing embodiment is the reaction chamber of the plasma generating apparatus, other loads may be used in actual applications depending on actual needs.

Abstract

L'invention porte sur un procédé de réalisation de l'adaptation d'impédance de RF et sur son système. Le procédé comprend les opérations consistant à comparer l'admittance d'entrée du réseau d'adaptation et l'admittance de sortie de la source RF, puis à régler l'impédance d'entrée dudit réseau d'adaptation en fonction du résultat de comparaison et enfin à réaliser la commande de l'adaptation d'impédance. Le détecteur d'impédance détecte l'admittance d'entrée dudit réseau d'adaptation. Le contrôleur commande le réglage des éléments d'accord en utilisant les erreurs de la partie réelle et de la partie imaginaire de ladite admittance. En fonction de la relation entre les éléments d'accord et la partie réelle et la partie imaginaire de l'admittance d'entrée du réseau d'adaptation, l'élément d'accord de l'élément de la branche série et l'élément d'accord de la branche parallèle peuvent être réglés séparément du fait que l'élément d'accord de la branche série ne peut pas être affecté par l'élément d'accord de la branche parallèle. L'arithmétique de commande découplée peut être utilisée pour réaliser l'adaptation d'impédance du système.
PCT/CN2008/071891 2007-08-20 2008-08-06 Procédé de réalisation de l'adaptation d'impédance de rf et système d'adaptation d'impédance de rf WO2009024051A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN2007101204947A CN101374381B (zh) 2007-08-20 2007-08-20 实现射频阻抗匹配的方法及射频阻抗匹配系统
CN200710120494.7 2007-08-20

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WO2009024051A1 true WO2009024051A1 (fr) 2009-02-26

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CN117134732A (zh) * 2023-10-26 2023-11-28 深圳市恒运昌真空技术有限公司 一种分数阶微积分模型的射频阻抗匹配装置及控制方法

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CN103377869B (zh) * 2012-04-16 2016-02-10 北京北方微电子基地设备工艺研究中心有限责任公司 阻抗匹配方法、阻抗匹配系统及等离子体加工设备
CN103687267B (zh) * 2012-09-17 2017-03-22 北京北方微电子基地设备工艺研究中心有限责任公司 阻抗匹配装置、阻抗匹配方法及基片加工设备
CN102931927B (zh) * 2012-10-09 2015-07-15 昆山美博通讯科技有限公司 一种功率放大模组的阻抗匹配方法
US9155182B2 (en) * 2013-01-11 2015-10-06 Lam Research Corporation Tuning a parameter associated with plasma impedance
CN103619117B (zh) * 2013-11-29 2016-04-06 中国科学院微电子研究所 可实现快速阻抗匹配的射频电源系统
CN104716222B (zh) * 2013-12-11 2019-01-01 中国电子科技集团公司第十八研究所 射频裂解硒蒸气制作铜铟镓硒薄膜的方法
DE102014209469A1 (de) 2014-05-19 2015-11-19 TRUMPF Hüttinger GmbH + Co. KG Regelungsanordnung, Regelsystem und Hochfrequenzleistungserzeugungsvorrichtung
CN105227154B (zh) * 2014-06-04 2018-12-11 北京北方华创微电子装备有限公司 一种阻抗匹配装置
CN108271308A (zh) * 2016-12-30 2018-07-10 中微半导体设备(上海)有限公司 一种在电感耦合等离子体处理装置内点燃等离子体的方法
CN108133905A (zh) * 2017-12-20 2018-06-08 北京铂阳顶荣光伏科技有限公司 一种cigs薄膜预处理的系统及方法
CN108809270B (zh) * 2018-06-20 2021-03-19 北京邮电大学 一种天线电路中阻抗匹配网络的确定方法及天线电路
CN110444457A (zh) * 2019-08-29 2019-11-12 上海华力集成电路制造有限公司 一种等离子体刻蚀设备的射频源系统
CN112104052B (zh) * 2020-09-25 2022-04-12 桂林电子科技大学 一种阻抗匹配器的设计及工作方法
CN112259433B (zh) * 2020-10-13 2023-08-18 北京北方华创微电子装备有限公司 阻抗匹配方法、阻抗匹配器和半导体工艺设备
CN116418309B (zh) * 2021-12-29 2024-02-02 上海微创惟美医疗科技(集团)有限公司 阻抗匹配电路的阻抗匹配方法

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