WO2008156038A1 - 観察装置及び方法 - Google Patents

観察装置及び方法 Download PDF

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Publication number
WO2008156038A1
WO2008156038A1 PCT/JP2008/060893 JP2008060893W WO2008156038A1 WO 2008156038 A1 WO2008156038 A1 WO 2008156038A1 JP 2008060893 W JP2008060893 W JP 2008060893W WO 2008156038 A1 WO2008156038 A1 WO 2008156038A1
Authority
WO
WIPO (PCT)
Prior art keywords
solid
semiconductor device
immersed lens
reflection light
immersed
Prior art date
Application number
PCT/JP2008/060893
Other languages
English (en)
French (fr)
Inventor
Hirotoshi Terada
Hiroshi Tanabe
Original Assignee
Hamamatsu Photonics K.K.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Photonics K.K. filed Critical Hamamatsu Photonics K.K.
Priority to EP20080765603 priority Critical patent/EP2163934B1/en
Priority to CN2008800211927A priority patent/CN101688971B/zh
Priority to US12/665,588 priority patent/US8582202B2/en
Publication of WO2008156038A1 publication Critical patent/WO2008156038A1/ja

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/04—Measuring microscopes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/24—Base structure
    • G02B21/248—Base structure objective (or ocular) turrets
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/33—Immersion oils, or microscope systems or objectives for use with immersion fluids
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/022—Mountings, adjusting means, or light-tight connections, for optical elements for lenses lens and mount having complementary engagement means, e.g. screw/thread

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Microscoopes, Condenser (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

　半導体デバイス１１の観察を行う場合、まず固浸レンズ６が半導体デバイス１１に接触したことが検知されると、振動発生部により固浸レンズ６を振動させる。続いて、固浸レンズ６からの反射光像を入力し、反射光像の反射光量ｍを算出し、この反射光量ｍの入射光量ｎに対する比率（ｍ／ｎ）が閾値Ａを越えていないかどうかを判断する。比率（ｍ／ｎ）が閾値Ａを越えているときは、固浸レンズ６と半導体デバイス１１との光学的密着が得られていないと判断され、再び固浸レンズ６を振動させる。比率（ｍ／ｎ）が閾値Ａを越えていないときは、固浸レンズ６と半導体デバイス１１との光学的密着が得られていると判断され、半導体デバイス１１の観察画像を取得する。これにより、固浸レンズと観察対象物との密着性を向上させることができる観察装置及び方法が実現される。
PCT/JP2008/060893 2007-06-20 2008-06-13 観察装置及び方法 WO2008156038A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP20080765603 EP2163934B1 (en) 2007-06-20 2008-06-13 Observing device and method
CN2008800211927A CN101688971B (zh) 2007-06-20 2008-06-13 观察装置和方法
US12/665,588 US8582202B2 (en) 2007-06-20 2008-06-13 Observing device and method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007163188A JP5001075B2 (ja) 2007-06-20 2007-06-20 観察装置及び方法
JP2007-163188 2007-06-20

Publications (1)

Publication Number Publication Date
WO2008156038A1 true WO2008156038A1 (ja) 2008-12-24

Family

ID=40156197

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/060893 WO2008156038A1 (ja) 2007-06-20 2008-06-13 観察装置及び方法

Country Status (7)

Country Link
US (1) US8582202B2 (ja)
EP (1) EP2163934B1 (ja)
JP (1) JP5001075B2 (ja)
KR (1) KR20100028538A (ja)
CN (1) CN101688971B (ja)
TW (1) TWI437262B (ja)
WO (1) WO2008156038A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11284000B2 (en) * 2016-01-19 2022-03-22 Sony Olympus Mfdical Solutions Inc. Medical observation device, medical observation system, and image shake correction method

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5189321B2 (ja) * 2007-06-20 2013-04-24 浜松ホトニクス株式会社 固浸レンズホルダ
JP5001075B2 (ja) 2007-06-20 2012-08-15 浜松ホトニクス株式会社 観察装置及び方法
US8072699B2 (en) * 2009-06-17 2011-12-06 Semicaps Pte Ltd Solid immersion lens optics assembly
JP6223115B2 (ja) * 2013-10-18 2017-11-01 オリンパス株式会社 液浸顕微鏡対物レンズ及びそれを用いた顕微鏡
US9599807B2 (en) * 2015-06-30 2017-03-21 General Electric Company Optical microscope and method for detecting lens immersion
WO2019031680A1 (ko) 2017-08-11 2019-02-14 한국과학기술원 평판 메타렌즈 및 이를 포함하는 커버글라스
KR102455520B1 (ko) 2020-06-05 2022-10-17 한국과학기술원 마이크로렌즈 어레이를 이용한 초박형 카메라 장치 그리고 이의 다기능 이미징 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05328961A (ja) * 1992-06-03 1993-12-14 Sumitomo Heavy Ind Ltd プロセス観測装置
WO2005043210A1 (ja) * 2003-10-31 2005-05-12 Hamamatsu Photonics K.K. 固浸レンズホルダ
JP2006201407A (ja) * 2005-01-19 2006-08-03 Hamamatsu Photonics Kk 固浸レンズホルダ

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US5939709A (en) * 1997-06-19 1999-08-17 Ghislain; Lucien P. Scanning probe optical microscope using a solid immersion lens
EP1041545A1 (en) * 1998-10-21 2000-10-04 Sony Corporation Optical head and drive device for optical recording medium
JP3700491B2 (ja) * 1999-09-20 2005-09-28 株式会社日立製作所 アクチュエータ制御装置
JP2001236663A (ja) * 2000-02-18 2001-08-31 Sony Corp 光学系の位置制御装置、光学系の位置制御方法および記録再生装置
JP2003107358A (ja) * 2001-09-27 2003-04-09 Fujitsu Ltd ソリッドイマージョンレンズを使用した光学装置
US6828811B2 (en) * 2002-04-10 2004-12-07 Credence Systems Corporation Optics landing system and method therefor
US7123035B2 (en) * 2002-04-10 2006-10-17 Credence Systems Corporation Optics landing system and method therefor
WO2004083929A1 (ja) 2003-03-20 2004-09-30 Hamamatsu Photonics K.K. 固浸レンズ及び顕微鏡
JP2005046247A (ja) * 2003-07-31 2005-02-24 Topcon Corp レーザ手術装置
EP1667131B1 (en) 2003-09-16 2009-11-11 Fujitsu Limited Tracking device
US7042647B2 (en) * 2003-10-02 2006-05-09 Credence Systems Corporation Scanning optical system
US7312921B2 (en) * 2004-02-27 2007-12-25 Hamamatsu Photonics K.K. Microscope and sample observation method
JP4633484B2 (ja) 2005-01-19 2011-02-16 オリンパス株式会社 光学素子の支持機構
JP5189321B2 (ja) 2007-06-20 2013-04-24 浜松ホトニクス株式会社 固浸レンズホルダ
JP5001075B2 (ja) 2007-06-20 2012-08-15 浜松ホトニクス株式会社 観察装置及び方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05328961A (ja) * 1992-06-03 1993-12-14 Sumitomo Heavy Ind Ltd プロセス観測装置
WO2005043210A1 (ja) * 2003-10-31 2005-05-12 Hamamatsu Photonics K.K. 固浸レンズホルダ
JP2006201407A (ja) * 2005-01-19 2006-08-03 Hamamatsu Photonics Kk 固浸レンズホルダ

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2163934A4 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11284000B2 (en) * 2016-01-19 2022-03-22 Sony Olympus Mfdical Solutions Inc. Medical observation device, medical observation system, and image shake correction method

Also Published As

Publication number Publication date
EP2163934B1 (en) 2015-05-20
CN101688971B (zh) 2012-01-11
JP5001075B2 (ja) 2012-08-15
US8582202B2 (en) 2013-11-12
US20100202041A1 (en) 2010-08-12
EP2163934A1 (en) 2010-03-17
JP2009003134A (ja) 2009-01-08
CN101688971A (zh) 2010-03-31
TW200912367A (en) 2009-03-16
EP2163934A4 (en) 2012-10-10
TWI437262B (zh) 2014-05-11
KR20100028538A (ko) 2010-03-12

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