WO2008156002A1 - 研磨シートおよびその製造方法 - Google Patents
研磨シートおよびその製造方法 Download PDFInfo
- Publication number
- WO2008156002A1 WO2008156002A1 PCT/JP2008/060522 JP2008060522W WO2008156002A1 WO 2008156002 A1 WO2008156002 A1 WO 2008156002A1 JP 2008060522 W JP2008060522 W JP 2008060522W WO 2008156002 A1 WO2008156002 A1 WO 2008156002A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- polishing sheet
- manufacturing
- same
- sheet
- polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
本発明の目的は、立ち上げまでの時間が短くて済む研磨シートを提供することにあり、さらに、そのような研磨シートの製造方法を提供することにある。 本発明の研磨シートは、シート状の発泡体からなり、その表面が、最終仕上げとして60~200番手(60~200メッシュ)の砥粒径の研磨剤でバフ掛けが行われて仕上げられていることを特徴とする研磨シートである。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007162375A JP2009000761A (ja) | 2007-06-20 | 2007-06-20 | 研磨シートおよびその製造方法 |
| JP2007-162375 | 2007-06-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2008156002A1 true WO2008156002A1 (ja) | 2008-12-24 |
Family
ID=40156160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2008/060522 Ceased WO2008156002A1 (ja) | 2007-06-20 | 2008-06-09 | 研磨シートおよびその製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2009000761A (ja) |
| WO (1) | WO2008156002A1 (ja) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5567280B2 (ja) * | 2009-02-06 | 2014-08-06 | 富士紡ホールディングス株式会社 | 研磨パッド |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004001169A (ja) * | 2001-12-12 | 2004-01-08 | Toyobo Co Ltd | 半導体ウエハ研磨用研磨パッド |
| JP2006062058A (ja) * | 2004-08-30 | 2006-03-09 | Fujibo Holdings Inc | 仕上げ研磨用研磨布及び研磨布の製造方法 |
-
2007
- 2007-06-20 JP JP2007162375A patent/JP2009000761A/ja active Pending
-
2008
- 2008-06-09 WO PCT/JP2008/060522 patent/WO2008156002A1/ja not_active Ceased
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004001169A (ja) * | 2001-12-12 | 2004-01-08 | Toyobo Co Ltd | 半導体ウエハ研磨用研磨パッド |
| JP2006062058A (ja) * | 2004-08-30 | 2006-03-09 | Fujibo Holdings Inc | 仕上げ研磨用研磨布及び研磨布の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009000761A (ja) | 2009-01-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2008116043A8 (en) | Abrasive articles, rotationally reciprocating tools, and methods | |
| SG152978A1 (en) | Method for producing a semiconductor wafer with a polished edge | |
| WO2008116049A3 (en) | Methods of removing defects in surfaces | |
| SG160369A1 (en) | Polishing pad and process for producing the same | |
| WO2010002697A3 (en) | Sandpaper with non-slip coating layer | |
| WO2012092494A3 (en) | Abrasive particle and method of forming same | |
| WO2011028700A3 (en) | Chemical mechanical polishing conditioner | |
| WO2011150326A3 (en) | Non-abrasive back coat for coated abrasives | |
| UA97126C2 (ru) | Процесс шлифования сапфирной основы | |
| MY146815A (en) | Cmp porous pad with component-filled pores | |
| MY153077A (en) | Method to selectively polish silicon carbide films | |
| WO2013006611A3 (en) | Waterborne polyurethane coating compositions | |
| WO2013006605A3 (en) | Waterborne polyurethane coating compositions | |
| WO2011066491A3 (en) | Methods and apparatus for edge chamfering of semiconductor wafers using chemical mechanical polishing | |
| WO2012088004A3 (en) | Cmp pad conditioning tool | |
| WO2009137685A3 (en) | Configuring of lapping and polishing machines | |
| WO2012125335A3 (en) | Coarse sandpaper with non-slip coating layer | |
| EP2896482A3 (en) | A finishing grinding wheel and a forming method thereof | |
| SG169300A1 (en) | Polishing body and related manufacturing method | |
| WO2012177745A3 (en) | Sandpaper with fibrous non-slip layer | |
| WO2013006609A3 (en) | Waterborne polyurethane coating compositions | |
| WO2009129964A3 (de) | Verfahren zur herstellung eines polsterelements, insbesondere ein sitzpolsterelement zur verwendung in einem kraftfahrzeug, und polsterelement | |
| WO2012157936A3 (ko) | Cmp 패드 컨디셔너 및 상기 cmp 패드 컨디셔너 제조방법 | |
| SG11202103983YA (en) | Polyurethane for use in polishing layer, polishing layer, polishing pad, and method for modifying polishing layer | |
| WO2011017358A3 (en) | Abrasive tool having a particular porosity variation |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 08765323 Country of ref document: EP Kind code of ref document: A1 |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| 122 | Ep: pct application non-entry in european phase |
Ref document number: 08765323 Country of ref document: EP Kind code of ref document: A1 |