SCRATCH REMOVAL DEVICE AND METHOD
This application is being filed on 05 June 2008, as a PCT
International Patent application in the name of TCG International, Lie, a Canadian corporation, applicant for the designation of all countries except the US, and
Jonathan P. Thomas and Keith A. Beveridge, both citizens of the U.S., and claims priority to U.S. Utility Patent Application Serial No. 11/810,219, filed June 5, 2007.
Field of the Invention
The present invention relates to apparatus and methods for removing scratches from smooth surfaces such as glass. More specifically, the present invention relates to a polishing wheel and methods for manufacture and for use in removing the scratches.
Background of the Invention
Rotary tools are used to grind and polish glass to remove scratches and other damage from the surface of the glass. After processing the glass, such as windshields, it is desirable to leave the glass so the scratch or other damage is less visible and/or less likely to affect viewing through the glass. U.S. Patent Nos. 4,709,513 and 4,622,780 show various tools for use in polishing glass.
Further improvements are desired for the rotary tools and methods used to polish glass.
Summary of the Invention
The present invention relates to a polishing wheel including a body defining a central longitudinal axis and a central passage coaxial with the longitudinal axis. The body is mountable to a rotating polishing device. The body of the polishing wheel has a lower polishing surface including a planar portion. The lower polishing surface includes a plurality of main flutes extending from the central passage to an outer edge of the lower polishing surface. Further flutes extend from the outer edge of the lower polishing surface and terminate without communicating with the central passage or the main flutes. In one embodiment, the main flutes have a different depth between the central passage and the outer edge. As the lower portion of the body of the
polishing is worn away during use, the different depth portion allows for the main flutes to be reformed or recut so as to again be in fluid communication from the outer edge to the central passage if a portion of the main flute becomes worn away to a zero depth or an otherwise insufficient depth. In one preferred embodiment, the different depth portion is a varying depth portion located adjacent to the outer edge. In one preferred method in accordance with the present invention, a polishing wheel is formed by providing a generally cylindrical disk of polishing material. The disk is formed, such as being cut with a tool, to include a plurality of main flutes located on a lower surface of the disk. The main flutes extend from a central passage to an outer edge. The main flutes preferably include a varying depth portion, adjacent to the outer edge. In one preferred method, the tool for cutting the main flutes is a circular saw. Preferably, secondary flutes separate from the main flutes are cut with the same circular saw. One preferred method uses an indexing machine to equally space the main flutes and the secondary flutes around a central axis of the disk during formation.
Brief Description of the Drawings
Figure 1 is a perspective view of a polishing wheel in accordance with the present invention.
Figure 2 is a bottom view of the polishing wheel of Figure 1. Figure 3 is a side view of the polishing wheel of Figure 1.
Figure 4 is a cross-sectional side view of the polishing wheel of Figure 1, taken along lines 4-4 of Figure 2.
Figure 5 is a bottom view of an alternative embodiment of a polishing wheel. Figure 6 is a cross-sectional side view of the polishing wheel of
Figure 5, taken along lines 6-6 of Figure 5.
Figure 7 is a top view of the polishing wheel of Figure 5.
Figure 8 is a bottom view of a further alternative embodiment of a polishing wheel. Figure 9 is a cross-sectional side view of the polishing view of Figure
8, taken along lines 9-9.
Figure 10 is a top view of the polishing view of Figure 8.
Figure 11 is a perspective view of another alternative embodiment of a polishing wheel.
Figure 12 is a bottom view of the polishing wheel of Figure 11.
Figure 13 is a top view of the polishing wheel of Figure 11. Figure 14 is a first side view of the polishing wheel of Figure 11.
Figure 15 is another side view of the polishing wheel of Figure 11.
Figure 16 is a first cross-sectional view of the polishing wheel of Figure 11, taken along lines 16-16 of Figure 12.
Figure 17 is a second cross-sectional view of the polishing wheel of Figure 11, taken along lines 17-17 of Figure 12.
Figure 18 is a perspective view of one system for forming the polishing wheel of Figure 11.
Figure 19 is a side view as shown in Figure 14, showing a wearing of the polishing wheel and the reformed reduced profile exit passages. Figure 20 is a cross-section as shown in Figure 17, showing the worn polishing wheel and the reformed reduced profile exit passages as shown in Figure 19.
Figure 21 is a cross-section like Figure 16, showing an example T- nut. Figure 22 is a cross-section like Figure 17, showing the T-nut of
Figure 21.
Detailed Description of the Preferred Embodiment
Referring to Figures 1-4, one embodiment of a polishing wheel 10 is shown. Polishing wheel 10 is usable in the apparatus and methods described in U.S. Patent Nos. 4,622,780 and 4,709,513, the disclosures of which are incorporated by reference.
Polishing wheel 10 includes a body 12 defining a central longitudinal axis 14. During use, body 12 is rotated about longitudinal axis 14. Polishing wheel 10 is designed for use with a center slurry feed tool like that described in the above noted patents.
Body 12 includes a central passage 16 which is coaxial with longitudinal axis 14. Central passage 1$ is in fluid communication with the slurry source provided by the rotating tool as described in the above noted patents.
Body 12 further includes a lower portion or layer 18, and an upper S portion or layer 20. Lower portion 18 defines a lower polishing surface 26. Upper portion 20 is located on an opposite side of lower portion 18 from polishing surface 26. An upper surface 28 is defined by upper portion 20 and feces in an opposite direction to polishing surface 26- Body 12 further defines a side surface extending between polishing surface 26 and upper surface 28. Polishing surface 26 extends0 from an inner edge 36 adjacent to central passage 16 to an outer edge 38.
Lower portion 1 B includes main flutes 40 extending from central passage 16 at inner edge 36 to outer edge 38. ϊa the preferred embodiment, main flutes 40 extend radially. In one preferred embodiment, main flutes 40 include reduced profile exit passages 42 for providing control of slurry outflow. Generally,5 a main portion 41 of main flutes 40 extends completely through lower portion 18. Exit passages 42 are shown in the illustrated embodiment as small v-grooves formed in lower portion 18. Main flutes 40 are arranged radially relative to longitudinal axis 14. Main flutes 40 are further arranged to be equally spaced from each other.
Secondary flutes 44 are also provided in lower portion 18. Secondary0 flutes 44 extend from outer edge 38 toward central passage 16. However, secondary flutes 44 terminate before communicating with central passage 16 or main flutes 40. Ia the illustrated embodiment, secondary flutes 44 extend all the way through lower portion 18. Secondary flutes 44 are radially arranged, and are equally spaced about polishing surface 26. 5 Central passage 16 includes a T-nut 46 which permits mounting of polishing wheel 10 to the rotating tool. Preferably, an inner surface of T-nut 46 is threaded. Spikes or other projections on T-nut 46 can be added to assist with holding T-nut 46 in position.
Preferably, body 12 is made from a moldable material. In the0 preferred embodiment, lower portion 18 and upper portion 20 are made from a common material, such as a moldable elastomeric material. Lower portion 18 is further provided with an impregnated material to facilitate polishing. Preferably, the
impregnated material is a particulate. In one preferred embodiment, the particulate material is cerium oxide.
Upper portion 20 is not designed to polish. Therefore, no impregnated material for polishing is used in upper portion 20 in the preferred embodiment.
Preferably, lower and upper portions 18, 20 are molded together such that the layers are heat fused together. One preferred elastomeric material is expanded urethane. LP66 designation by Universal Photonics of Hicksville, NY is one material for layer 18 that can be used. LP66 material includes impregnated cerium oxide.
To indicate wear of lower portion 18 to the user, a colorant is added to one or both of lower portion 18 and upper portion 20. The colorant or colorants are selected so as to provide a visual contrast between lower portion 18 and upper portion 20. Such contrast provides a visual indication to the user when lower portion 18 is worn away, or is otherwise sufficiently removed to no longer be desired for continued use in further polishing operations. For example, lower portion 18 can be rust in color, and upper portion 20 can be gray.
Secondary flutes 44 reduce the lower surface area and allow for an increase in the workload on the wheel by minimizing the square area in contact with the surface being polished. Such increase in the workload will allow the polishing operation to be accomplished faster. The arrangement of flutes as shown in the Figures also helps to more evenly distribute the polishing material across the polishing surface 26, to minimize distortion. One problem with prior art devices is that inexperienced users can apply excessive pressure and cause uneven polishing, and possibly distortion, to the glass. By providing an arrangement of polishing surface 26 as described above, less distortion and less uneven polishing results.
Figures 5-7 show an alternative embodiment of a polishing wheel 100 including a body 112 having some similar features as polishing wheel 10. Polishing wheel 100 includes a smaller polishing surface 126. Polishing wheel 100 is useful for polishing smaller areas, or areas near the edges of windshields.
Body 112 includes a central axis 114 and a central passage 116 including a T-nut 146 which permits mounting of polishing wheel 100 to the
rotating tool. Lower portion 118 includes a different color from upper portion 120. Body 112 includes a side taper 130 which tapers down to polishing surface 126.
In the illustrated embodiment, polishing wheel 100 includes a plurality of radially extending flutes 140 extending from central passage 116 to an S outside edge of lower portion 118.
A further alternative embodiment of a polishing wheel 200 is shown in Figures 8-10. Body 212 is more cylindrical in shape relative to the earlier described embodiments. Body 212 includes a central axis 214 and a central passage 216 including a T-mit 246 which permits mounting of polishing wheel 200 to the0 rotating tool. Body212 ώdudes a low^portion 218 having a different color from upper portion 220. Polishing surface 226 includes a plurality of radially extending flutes 240 extending from central passage 216 to an outside edge of lower portion
218.
Another alternative embodiment of a polishing wheel 300 is shown in5 Figures 11-22. Body 312 includes a central axis 314, and a central passage 316- A T-nut similar to those described above, can be used to mount polishing wheel 300 to the totaling tool. Figures 21 and 22 show an example T-nut 352. T-nut 352 can be pressed into place. T-nut 352 can be held with adhesive to further maintain it in place. 0 Polishing surface 326 of polishing wheel 300 includes a plurality of radially extending main flutes 340 extending from central passage 316 to an outer edge 338 of lower portion 318. Polishing surface 326 also includes a plurality of radially extending secondary flutes 344. Secondary flutes 344 extend from adjacent to, but not in fluid corniminication with, central passage 316. Secondary flutes 3445 extend outward to outer edge 338.
Main flutes 340 include a width W|, and a depth D1 adjacent to central passage 316. At outer edge 338, the depth of main flutes 340 is reduced to depth Dj. Main flutes 340 each have a variable depth portion 342 from depth Di to D2. In the illustrated embodiment, the variable depth portion 342 has a curved0 surface 346. Exit passages 347 form reduced profile passages for the polishing fluid to exit out from wheel 300.
Secondary flutes 344 include a width Wj, and a depth D3 adjacent to outer edge 338. Adjacent to central passage 316, the depth of each second flute 344
reduces from depth D3 to a zero depth where it terminates at polishing surface 326. Preferably, each secondary flute 344 includes a variable depth portion 348. In the illustrated embodiment, the variable depth portion 348 has a curved surface 350.
Figure 18 illustrates one system 400 for forming polishing wheel 300. A disk-shaped body 402 is mounted on an indexing machine 404. Indexing machine 404 can move disk 402 horizontally in two directions and rotationally about the central axis of the body 402. A circular saw 408 is used to cut the main and secondary flutes 340, 344, respectively, as described in Figures 11-17. Saw blade 410 cuts the various grooves in disk-shaped body 402 to form the flutes. In the preferred embodiments, widths W1 and W2 are the same. One example width is 0.12 inches cut by a 1 1/2 inch diameter, 3/32 inch wide jeweler's saw. The variable depth portions 342 and 348 have a 0.75 radius curved shape. In the example embodiment: D1 = 0.325 inches; D2 = 0.05 inches; and D3 = 0.32 inches. Indexing machine 404 moves body 402 in the desired manner relative to saw blade 410 so saw blade 410 can cut each of the flutes 340, 344.
Referring now to Figures 19 and 20, polishing wheel 300 is shown to illustrate use over time. During polishing, polishing surface 326 will wear away, such as down to plane 360. At plane 360, main flutes 340 will no longer communicate between central passage 316 and outer edge 338. Exit passages 347 will be closed or too small to allow effective slurry flow. Slurry will be trapped in flutes 340, preventing effective polishing. Polishing wheel 300 allows for new reduced profile portions 357 to be reformed by a user in the filed. By using a cutting tool, such as a knife, body portions 358 can be removed to reestablish fluid communication between central passage 316 and outer edge 338. The recutting process can be repeated as the newly recut reduced profile portions 357 are worn away. For example, it is preferred that polishing wheel 300 can be recut at least twice, and more preferably more than twice, such as 3-5 times.
Any of the polishing wheels 10, 100, 200 described above can also be made in accordance with the flute features provided in wheel 300. Specifically, the materials, shapes and constructions including the attachment nuts can be used with the flute shapes and methods described with respect to Figures 11-22.
The above specification, examples and data provide a complete description of the manufacture and use of the composition of the invention. Since many embodiments of the invention can be made without departing from the spirit and scope of the invention, the invention resides in the claims hereinafter appended.