WO2008123550A1 - ビーム加工装置およびビーム観察装置 - Google Patents

ビーム加工装置およびビーム観察装置 Download PDF

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Publication number
WO2008123550A1
WO2008123550A1 PCT/JP2008/056598 JP2008056598W WO2008123550A1 WO 2008123550 A1 WO2008123550 A1 WO 2008123550A1 JP 2008056598 W JP2008056598 W JP 2008056598W WO 2008123550 A1 WO2008123550 A1 WO 2008123550A1
Authority
WO
WIPO (PCT)
Prior art keywords
hollow member
processing apparatus
outputting
hollow
work
Prior art date
Application number
PCT/JP2008/056598
Other languages
English (en)
French (fr)
Inventor
Tsuneaki Masuzawa
Fumitoshi Tanaka
Tomohiro Yamazaki
Yoshikazu Yoshida
Hiromichi Ikeda
Keigo Oguchi
Hikaru Yamagishi
Yuji Wakabayashi
Kouji Kobayashi
Original Assignee
Hiraide Precision Co., Ltd.
Toyo University
Nagano Prefecture
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hiraide Precision Co., Ltd., Toyo University, Nagano Prefecture filed Critical Hiraide Precision Co., Ltd.
Publication of WO2008123550A1 publication Critical patent/WO2008123550A1/ja

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/162—Open vessel, i.e. one end sealed by object or workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/166—Sealing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Laser Beam Processing (AREA)

Abstract

　本発明は、小形化が可能でかつコストの低減が可能なビーム加工装置またはビーム観察装置を提供することを目的とする。 本発明のビーム加工装置またはビーム観察装置は、ビーム出射源と、ワーク（２）に向けてビームを出射する出射部（２５ａ）を有しビーム出射源からワーク（２）に向かうビームが通過するビーム通過部材（２５）と、ワーク（２）が固定される固定面（６ａ）を有し所定方向へ移動可能な固定部材（６）と、３次元方向に変形可能にかつ中空状に形成され、ビーム通過部材（２５）が内部に配置される中空部材（２３）とを備えている。中空部材（２３）は、少なくとも、互いに接続される第１の中空部材（２６）と第２の中空部材（２７）とから構成されている。また、中空部材（２３）の一端には開口部（３７）が形成され、中空部材（２３）の一端は固定面に当接するとともに、中空部材（２３）の内部は真空状態とされる。
PCT/JP2008/056598 2007-04-03 2008-04-02 ビーム加工装置およびビーム観察装置 WO2008123550A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007096994A JP2008257929A (ja) 2007-04-03 2007-04-03 ビーム加工装置およびビーム観察装置
JP2007-096994 2007-04-03

Publications (1)

Publication Number Publication Date
WO2008123550A1 true WO2008123550A1 (ja) 2008-10-16

Family

ID=39831023

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/056598 WO2008123550A1 (ja) 2007-04-03 2008-04-02 ビーム加工装置およびビーム観察装置

Country Status (2)

Country Link
JP (1) JP2008257929A (ja)
WO (1) WO2008123550A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109243952A (zh) * 2018-10-26 2019-01-18 长沙埃福思科技有限公司 双真空室离子束修形加工系统及修形加工方法
WO2023094088A1 (en) * 2021-11-29 2023-06-01 Asml Netherlands B.V. Platform for charged particle apparatus and components within a charged particle apparatus

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004327302A (ja) * 2003-04-25 2004-11-18 Sony Corp 電子顕微鏡
JP2006244720A (ja) * 2005-02-28 2006-09-14 Jeol Ltd ビーム装置
JP2006294481A (ja) * 2005-04-13 2006-10-26 Hitachi High-Technologies Corp 荷電粒子線装置
JP2007019045A (ja) * 2003-09-10 2007-01-25 Hitachi High-Technologies Corp 小型電子銃
JP2007188821A (ja) * 2006-01-16 2007-07-26 Univ Osaka Sangyo ハンディ電子顕微鏡

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004327302A (ja) * 2003-04-25 2004-11-18 Sony Corp 電子顕微鏡
JP2007019045A (ja) * 2003-09-10 2007-01-25 Hitachi High-Technologies Corp 小型電子銃
JP2006244720A (ja) * 2005-02-28 2006-09-14 Jeol Ltd ビーム装置
JP2006294481A (ja) * 2005-04-13 2006-10-26 Hitachi High-Technologies Corp 荷電粒子線装置
JP2007188821A (ja) * 2006-01-16 2007-07-26 Univ Osaka Sangyo ハンディ電子顕微鏡

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109243952A (zh) * 2018-10-26 2019-01-18 长沙埃福思科技有限公司 双真空室离子束修形加工系统及修形加工方法
CN109243952B (zh) * 2018-10-26 2024-02-27 长沙埃福思科技有限公司 双真空室离子束修形加工系统及修形加工方法
WO2023094088A1 (en) * 2021-11-29 2023-06-01 Asml Netherlands B.V. Platform for charged particle apparatus and components within a charged particle apparatus

Also Published As

Publication number Publication date
JP2008257929A (ja) 2008-10-23

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