WO2008120391A1 - Multi-column electron beam exposure device and multi-column electron beam exposure method - Google Patents
Multi-column electron beam exposure device and multi-column electron beam exposure method Download PDFInfo
- Publication number
- WO2008120391A1 WO2008120391A1 PCT/JP2007/056974 JP2007056974W WO2008120391A1 WO 2008120391 A1 WO2008120391 A1 WO 2008120391A1 JP 2007056974 W JP2007056974 W JP 2007056974W WO 2008120391 A1 WO2008120391 A1 WO 2008120391A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- electron beam
- column
- exposure
- beam exposure
- column electron
- Prior art date
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Abstract
[PROBLEMS] To provide a multi-column electron beam exposure device and a multi-column electron beam exposure method which can improve the exposure accuracy and adjust the calibration time so as to improve the exposure throughput. [MEANS FOR SOLVING PROBLEMS] A multi-column electron beam exposure device includes: a plurality of column cells; an electron beam characteristic detection unit; a deflector for deflecting the electron beam according to exposure data; and a control unit which uses the electron beam characteristic detection unit to calculate an electron beam characteristic prediction value by using a continuous function for smoothly connecting measurement values obtained at calibration times in the past, the function being a prediction function continuously changing the electron beam characteristic until the next calibration time together with the plotting time, thereby calculating a correction value for the exposure data on each column cell. The control unit adjusts the calibration time interval according to a difference between the measurement value and the prediction value of the electron beam characteristic.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2007/056974 WO2008120391A1 (en) | 2007-03-29 | 2007-03-29 | Multi-column electron beam exposure device and multi-column electron beam exposure method |
JP2009507379A JPWO2008120391A1 (en) | 2007-03-29 | 2007-03-29 | Multi-column electron beam exposure apparatus and multi-column electron beam exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2007/056974 WO2008120391A1 (en) | 2007-03-29 | 2007-03-29 | Multi-column electron beam exposure device and multi-column electron beam exposure method |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008120391A1 true WO2008120391A1 (en) | 2008-10-09 |
Family
ID=39807982
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/056974 WO2008120391A1 (en) | 2007-03-29 | 2007-03-29 | Multi-column electron beam exposure device and multi-column electron beam exposure method |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPWO2008120391A1 (en) |
WO (1) | WO2008120391A1 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010106621A1 (en) * | 2009-03-16 | 2010-09-23 | 株式会社アドバンテスト | Multi-column electron beam lithography system and electron beam orbit adjusting method thereof |
JP2013115148A (en) * | 2011-11-25 | 2013-06-10 | Canon Inc | Scanner, drawing device, and method of manufacturing article |
JP2014016470A (en) * | 2012-07-09 | 2014-01-30 | Dainippon Screen Mfg Co Ltd | Position prediction device, position prediction method and substrate treatment apparatus |
JP2015204404A (en) * | 2014-04-15 | 2015-11-16 | 株式会社ニューフレアテクノロジー | Multi-beam drawing method and multi-beam drawing device |
CN111781508A (en) * | 2020-06-17 | 2020-10-16 | 金龙联合汽车工业(苏州)有限公司 | Hybrid vehicle-mounted battery SOC estimation method and system |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07142321A (en) * | 1993-06-17 | 1995-06-02 | Fujitsu Ltd | Method for correcting amount of deflection of electron beam exposure device |
JP2000133567A (en) * | 1998-10-23 | 2000-05-12 | Advantest Corp | Electron beam exposing method and electron beam exposure system |
JP2006278492A (en) * | 2005-03-28 | 2006-10-12 | Advantest Corp | Electron beam exposure device and method of exposing electron beam |
JP2007043083A (en) * | 2005-07-04 | 2007-02-15 | Nuflare Technology Inc | Method for correcting beam drift of electron beam, and method for drawing electron beam |
-
2007
- 2007-03-29 WO PCT/JP2007/056974 patent/WO2008120391A1/en active Application Filing
- 2007-03-29 JP JP2009507379A patent/JPWO2008120391A1/en not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07142321A (en) * | 1993-06-17 | 1995-06-02 | Fujitsu Ltd | Method for correcting amount of deflection of electron beam exposure device |
JP2000133567A (en) * | 1998-10-23 | 2000-05-12 | Advantest Corp | Electron beam exposing method and electron beam exposure system |
JP2006278492A (en) * | 2005-03-28 | 2006-10-12 | Advantest Corp | Electron beam exposure device and method of exposing electron beam |
JP2007043083A (en) * | 2005-07-04 | 2007-02-15 | Nuflare Technology Inc | Method for correcting beam drift of electron beam, and method for drawing electron beam |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010106621A1 (en) * | 2009-03-16 | 2010-09-23 | 株式会社アドバンテスト | Multi-column electron beam lithography system and electron beam orbit adjusting method thereof |
JP5475634B2 (en) * | 2009-03-16 | 2014-04-16 | 株式会社アドバンテスト | Multi-column electron beam drawing apparatus and its electron beam trajectory adjustment method |
JP2013115148A (en) * | 2011-11-25 | 2013-06-10 | Canon Inc | Scanner, drawing device, and method of manufacturing article |
JP2014016470A (en) * | 2012-07-09 | 2014-01-30 | Dainippon Screen Mfg Co Ltd | Position prediction device, position prediction method and substrate treatment apparatus |
JP2015204404A (en) * | 2014-04-15 | 2015-11-16 | 株式会社ニューフレアテクノロジー | Multi-beam drawing method and multi-beam drawing device |
CN111781508A (en) * | 2020-06-17 | 2020-10-16 | 金龙联合汽车工业(苏州)有限公司 | Hybrid vehicle-mounted battery SOC estimation method and system |
CN111781508B (en) * | 2020-06-17 | 2022-10-11 | 金龙联合汽车工业(苏州)有限公司 | Method and system for estimating SOC of hybrid vehicle-mounted battery |
Also Published As
Publication number | Publication date |
---|---|
JPWO2008120391A1 (en) | 2010-07-15 |
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