WO2008120331A1 - 電子線描画装置およびそのステージ機構 - Google Patents

電子線描画装置およびそのステージ機構 Download PDF

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Publication number
WO2008120331A1
WO2008120331A1 PCT/JP2007/056705 JP2007056705W WO2008120331A1 WO 2008120331 A1 WO2008120331 A1 WO 2008120331A1 JP 2007056705 W JP2007056705 W JP 2007056705W WO 2008120331 A1 WO2008120331 A1 WO 2008120331A1
Authority
WO
WIPO (PCT)
Prior art keywords
positioning mechanism
vacuum chamber
electron beam
drawing apparatus
beam drawing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2007/056705
Other languages
English (en)
French (fr)
Inventor
Hiroaki Kitahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pioneer Corp
Original Assignee
Pioneer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pioneer Corp filed Critical Pioneer Corp
Priority to US12/593,259 priority Critical patent/US20100084578A1/en
Priority to PCT/JP2007/056705 priority patent/WO2008120331A1/ja
Priority to CN2007800523642A priority patent/CN101641742B/zh
Priority to JP2009507323A priority patent/JP4559532B2/ja
Publication of WO2008120331A1 publication Critical patent/WO2008120331A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

　回転ステージおよび直動ステージを含む位置決め機構が真空室内に収容され、真空室の外部から位置決め機構に配管が接続される。真空室には、位置決め機構の下方に拡がる掘り込み状の空間が設けられており、位置決め機構と真空隔壁との間を結ぶ配管は、この空間内において真空室の内壁等に接触することなく直動ステージの移動に対応して変形できるように略Ｕ字形状をなして配設される。
PCT/JP2007/056705 2007-03-28 2007-03-28 電子線描画装置およびそのステージ機構 Ceased WO2008120331A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US12/593,259 US20100084578A1 (en) 2007-03-28 2007-03-28 Electron beam lithography apparatus and stage mechanism thereof
PCT/JP2007/056705 WO2008120331A1 (ja) 2007-03-28 2007-03-28 電子線描画装置およびそのステージ機構
CN2007800523642A CN101641742B (zh) 2007-03-28 2007-03-28 电子束描绘设备及其台架机构
JP2009507323A JP4559532B2 (ja) 2007-03-28 2007-03-28 電子線描画装置およびそのステージ機構

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/056705 WO2008120331A1 (ja) 2007-03-28 2007-03-28 電子線描画装置およびそのステージ機構

Publications (1)

Publication Number Publication Date
WO2008120331A1 true WO2008120331A1 (ja) 2008-10-09

Family

ID=39807924

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/056705 Ceased WO2008120331A1 (ja) 2007-03-28 2007-03-28 電子線描画装置およびそのステージ機構

Country Status (4)

Country Link
US (1) US20100084578A1 (ja)
JP (1) JP4559532B2 (ja)
CN (1) CN101641742B (ja)
WO (1) WO2008120331A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103252571A (zh) * 2013-04-11 2013-08-21 苏州瑞森硬质合金有限公司 一种高精度金属工件加工工具

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001297967A (ja) * 2000-04-13 2001-10-26 Canon Inc 配管およびそれを用いた位置決め装置
JP2002257268A (ja) * 2001-02-28 2002-09-11 Sony Corp 真空配管装置
JP2005352302A (ja) * 2004-06-11 2005-12-22 Sony Corp 電子ビーム照射装置
JP2006134921A (ja) * 2004-11-02 2006-05-25 Sendai Nikon:Kk 保持装置、ステージ装置、露光装置、及びデバイスの製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001242300A (ja) * 2000-03-02 2001-09-07 Sony Corp 電子ビーム照射装置
US6686597B2 (en) * 2000-09-04 2004-02-03 Pioneer Corporation Substrate rotating device, and manufacturing method and apparatus of recording medium master

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001297967A (ja) * 2000-04-13 2001-10-26 Canon Inc 配管およびそれを用いた位置決め装置
JP2002257268A (ja) * 2001-02-28 2002-09-11 Sony Corp 真空配管装置
JP2005352302A (ja) * 2004-06-11 2005-12-22 Sony Corp 電子ビーム照射装置
JP2006134921A (ja) * 2004-11-02 2006-05-25 Sendai Nikon:Kk 保持装置、ステージ装置、露光装置、及びデバイスの製造方法

Also Published As

Publication number Publication date
US20100084578A1 (en) 2010-04-08
JPWO2008120331A1 (ja) 2010-07-15
CN101641742A (zh) 2010-02-03
JP4559532B2 (ja) 2010-10-06
CN101641742B (zh) 2012-09-05

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