WO2008111533A1 - Patterned insulating fine particle film, electronic component using the patterned insulating fine particle film, micromachine, optical component, and process for producing patterned insulating fine particle film - Google Patents

Patterned insulating fine particle film, electronic component using the patterned insulating fine particle film, micromachine, optical component, and process for producing patterned insulating fine particle film Download PDF

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Publication number
WO2008111533A1
WO2008111533A1 PCT/JP2008/054211 JP2008054211W WO2008111533A1 WO 2008111533 A1 WO2008111533 A1 WO 2008111533A1 JP 2008054211 W JP2008054211 W JP 2008054211W WO 2008111533 A1 WO2008111533 A1 WO 2008111533A1
Authority
WO
WIPO (PCT)
Prior art keywords
fine particle
insulating fine
particle film
patterned insulating
film
Prior art date
Application number
PCT/JP2008/054211
Other languages
French (fr)
Japanese (ja)
Inventor
Kazufumi Ogawa
Yoshiaki Watanabe
Original Assignee
Kazufumi Ogawa
Yoshiaki Watanabe
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kazufumi Ogawa, Yoshiaki Watanabe filed Critical Kazufumi Ogawa
Publication of WO2008111533A1 publication Critical patent/WO2008111533A1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H01L21/02285—Langmuir-Blodgett techniques
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites

Abstract

This invention provides a patterned single layer insulating fine particle film, comprising a patterned single layer of insulating fine particles arranged on a surface of any desired base material without sacrificing the function inherent in the insulating fine particles, and a patterned insulating fine particle built-up film comprising a plurality of layers built up on top of each other, and a process for producing these films. In the patterned insulating fine particle films (1, 3), a single insulating fine particle layer comprising arranged reactive fine particles (42) covered with a film formed of a first coupling reaction group-containing first coupling agent, which forms a bond upon a coupling reaction with the first functional group, is bonded and fixed through a bond formed by the coupling reaction onto the surface of a base material (14) covered with a patterned film formed of a first functional group-containing first film compound. Alternatively, fine particles (34) and reactive fine particles (42) covered with a film formed of a film compound reactive with the first coupling reaction group are further alternately bonded and fixed thereonto.
PCT/JP2008/054211 2007-03-09 2008-03-07 Patterned insulating fine particle film, electronic component using the patterned insulating fine particle film, micromachine, optical component, and process for producing patterned insulating fine particle film WO2008111533A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-060363 2007-03-09
JP2007060363A JP5611503B2 (en) 2007-03-09 2007-03-09 Patterned insulating fine particle film, method for producing the same, electronic component, micromachine, and optical component using the same

Publications (1)

Publication Number Publication Date
WO2008111533A1 true WO2008111533A1 (en) 2008-09-18

Family

ID=39759471

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/054211 WO2008111533A1 (en) 2007-03-09 2008-03-07 Patterned insulating fine particle film, electronic component using the patterned insulating fine particle film, micromachine, optical component, and process for producing patterned insulating fine particle film

Country Status (2)

Country Link
JP (1) JP5611503B2 (en)
WO (1) WO2008111533A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150175411A1 (en) * 2013-12-19 2015-06-25 Sk Innovation Co., Ltd. Method for fabricating nano structure including dielectric particle supporters

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1166654A (en) * 1997-08-18 1999-03-09 Hitachi Ltd Formation of fine structure, fine structure, magnetic sensor, magnetic recording medium and magneto-optical recording medium
JPH11350153A (en) * 1998-06-09 1999-12-21 Mitsuboshi Belting Ltd Production of substrate modified with fine metal particles
JP2001184620A (en) * 1999-12-27 2001-07-06 Toshiba Corp Recording medium and method of manufacturing it
US6420086B1 (en) * 1999-02-19 2002-07-16 Micron Technology, Inc. Methods of forming patterned constructions, methods of patterning semiconductive substrates, and methods of forming field emission displays
JP2003168606A (en) * 2001-01-24 2003-06-13 Matsushita Electric Ind Co Ltd Fine particle array, its manufacturing method and device using the method
JP2007118276A (en) * 2005-10-26 2007-05-17 Kagawa Univ Single-layer fine particle film, cumulated fine particle film and manufacturing method of them

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL138988A (en) * 2000-10-12 2005-09-25 Yissum Res Dev Co Dendritically amplified detection method
WO2004059347A2 (en) * 2002-12-20 2004-07-15 Minerva Biotechnologies Corporation Optical devices and methods involving nanoparticles
JP4412052B2 (en) * 2003-10-28 2010-02-10 富士ゼロックス株式会社 Composite material and method for producing the same
JP4444713B2 (en) * 2004-03-29 2010-03-31 株式会社アドバネクス Releasable mold, method for producing the same, and method for producing molded product

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1166654A (en) * 1997-08-18 1999-03-09 Hitachi Ltd Formation of fine structure, fine structure, magnetic sensor, magnetic recording medium and magneto-optical recording medium
JPH11350153A (en) * 1998-06-09 1999-12-21 Mitsuboshi Belting Ltd Production of substrate modified with fine metal particles
US6420086B1 (en) * 1999-02-19 2002-07-16 Micron Technology, Inc. Methods of forming patterned constructions, methods of patterning semiconductive substrates, and methods of forming field emission displays
JP2001184620A (en) * 1999-12-27 2001-07-06 Toshiba Corp Recording medium and method of manufacturing it
JP2003168606A (en) * 2001-01-24 2003-06-13 Matsushita Electric Ind Co Ltd Fine particle array, its manufacturing method and device using the method
JP2007118276A (en) * 2005-10-26 2007-05-17 Kagawa Univ Single-layer fine particle film, cumulated fine particle film and manufacturing method of them

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150175411A1 (en) * 2013-12-19 2015-06-25 Sk Innovation Co., Ltd. Method for fabricating nano structure including dielectric particle supporters
US9725313B2 (en) * 2013-12-19 2017-08-08 Sk Innovation Co., Ltd. Method for fabricating NANO structure including dielectric particle supporters

Also Published As

Publication number Publication date
JP5611503B2 (en) 2014-10-22
JP2008226990A (en) 2008-09-25

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