WO2008087944A1 - Appareil de traitement de gaz - Google Patents

Appareil de traitement de gaz Download PDF

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Publication number
WO2008087944A1
WO2008087944A1 PCT/JP2008/050371 JP2008050371W WO2008087944A1 WO 2008087944 A1 WO2008087944 A1 WO 2008087944A1 JP 2008050371 W JP2008050371 W JP 2008050371W WO 2008087944 A1 WO2008087944 A1 WO 2008087944A1
Authority
WO
WIPO (PCT)
Prior art keywords
upstream
downstream
electrode
processing apparatus
honeycomb structure
Prior art date
Application number
PCT/JP2008/050371
Other languages
English (en)
Japanese (ja)
Inventor
Yasuhiro Oya
Masayuki Iwata
Toshimaru Iguchi
Original Assignee
Yamatake Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yamatake Corporation filed Critical Yamatake Corporation
Publication of WO2008087944A1 publication Critical patent/WO2008087944A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B01J19/248—Reactors comprising multiple separated flow channels
    • B01J19/2485—Monolithic reactors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0809—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes employing two or more electrodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

Des structures de nid d'abeille (4) sont agencées par intervalles le long d'une conduite (1) de l'entrée vers la sortie de celle-ci. Une électrode amont (8) est agencée en amont de la structure de nid d'abeille (4-1) agencée le plus en amont parmi les structures de nid d'abeille (4), et une électrode aval (9) est agencée en aval de la structure de nid d'abeille (4-4) la plus en aval. Une haute tension est appliquée entre l'électrode amont (8) et l'électrode aval (9), et un plasma est généré dans un espace (12) entre un trou traversant (4a) de la structure de nid d'abeille (4) et la structure de nid d'abeille.
PCT/JP2008/050371 2007-01-15 2008-01-15 Appareil de traitement de gaz WO2008087944A1 (fr)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2007-006376 2007-01-15
JP2007006382 2007-01-15
JP2007006379 2007-01-15
JP2007-006379 2007-01-15
JP2007-006382 2007-01-15
JP2007006376 2007-01-15

Publications (1)

Publication Number Publication Date
WO2008087944A1 true WO2008087944A1 (fr) 2008-07-24

Family

ID=39635948

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/050371 WO2008087944A1 (fr) 2007-01-15 2008-01-15 Appareil de traitement de gaz

Country Status (1)

Country Link
WO (1) WO2008087944A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010234262A (ja) * 2009-03-31 2010-10-21 Yamatake Corp ガス処理装置
JP2010234256A (ja) * 2009-03-31 2010-10-21 Yamatake Corp ガス処理装置
JP2010234255A (ja) * 2009-03-31 2010-10-21 Yamatake Corp ガス処理装置
JP2010234260A (ja) * 2009-03-31 2010-10-21 Yamatake Corp ガス処理装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03237982A (ja) * 1990-02-16 1991-10-23 Tdk Corp 殺菌脱臭装置
WO2004114729A1 (fr) * 2003-06-20 2004-12-29 Ngk Insulators, Ltd. Electrode generatrice de plasma, dispositif generateur de plasma et appareil d'epuration de gaz d'echappement
WO2005001249A1 (fr) * 2003-06-27 2005-01-06 Ngk Insulators, Ltd. Electrode de production de plasma, reacteur a plasma et epurateur de gaz d'echappement
JP2006175422A (ja) * 2004-06-29 2006-07-06 Mitsubishi Electric Corp 揮発性有機化合物処理装置
JP2006261040A (ja) * 2005-03-18 2006-09-28 Ngk Insulators Ltd プラズマ反応器

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03237982A (ja) * 1990-02-16 1991-10-23 Tdk Corp 殺菌脱臭装置
WO2004114729A1 (fr) * 2003-06-20 2004-12-29 Ngk Insulators, Ltd. Electrode generatrice de plasma, dispositif generateur de plasma et appareil d'epuration de gaz d'echappement
WO2005001249A1 (fr) * 2003-06-27 2005-01-06 Ngk Insulators, Ltd. Electrode de production de plasma, reacteur a plasma et epurateur de gaz d'echappement
JP2006175422A (ja) * 2004-06-29 2006-07-06 Mitsubishi Electric Corp 揮発性有機化合物処理装置
JP2006261040A (ja) * 2005-03-18 2006-09-28 Ngk Insulators Ltd プラズマ反応器

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010234262A (ja) * 2009-03-31 2010-10-21 Yamatake Corp ガス処理装置
JP2010234256A (ja) * 2009-03-31 2010-10-21 Yamatake Corp ガス処理装置
JP2010234255A (ja) * 2009-03-31 2010-10-21 Yamatake Corp ガス処理装置
JP2010234260A (ja) * 2009-03-31 2010-10-21 Yamatake Corp ガス処理装置

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