WO2008084653A1 - Binder resin for near-infrared absorbing film, and near-infrared absorbing filter using the same - Google Patents

Binder resin for near-infrared absorbing film, and near-infrared absorbing filter using the same Download PDF

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Publication number
WO2008084653A1
WO2008084653A1 PCT/JP2007/074657 JP2007074657W WO2008084653A1 WO 2008084653 A1 WO2008084653 A1 WO 2008084653A1 JP 2007074657 W JP2007074657 W JP 2007074657W WO 2008084653 A1 WO2008084653 A1 WO 2008084653A1
Authority
WO
WIPO (PCT)
Prior art keywords
infrared absorbing
binder resin
polymer
same
film
Prior art date
Application number
PCT/JP2007/074657
Other languages
French (fr)
Japanese (ja)
Inventor
Fumiaki Kobayashi
Rie Ootsu
Original Assignee
Soken Chemical & Engineering Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Soken Chemical & Engineering Co., Ltd. filed Critical Soken Chemical & Engineering Co., Ltd.
Priority to CN2007800485246A priority Critical patent/CN101573409B/en
Publication of WO2008084653A1 publication Critical patent/WO2008084653A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/29Compounds containing one or more carbon-to-nitrogen double bonds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • C08L33/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

Disclosed is a binder resin for near-infrared absorbing films, which exhibits good adhesion to a transparent film as the base, while stably containing a near-infrared absorbent. This binder resin itself is hard to be cured. Also disclosed is a near-infrared absorbing film using such a binder resin. The binder resin for near-infrared absorbing films is obtained by adding a near-infrared absorbing dye (C) having an absorption maximum wavelength of 800-1200 nm to a resin composition containing 20-80% by mass of a (meth)acrylic polymer (A) having a Tg of from -65˚C to 20˚C and a weight average molecular weight of not more than 100,000 and 80-20% by mass of a (meth)acrylic polymer (B) having a Tg of from 50˚C to 180˚C. This binder resin for near-infrared absorbing films is characterized in that the polymer (A) contains a polymer (a) which has a crosslinkable functional group at two or more ends of the polymer chain.
PCT/JP2007/074657 2006-12-26 2007-12-21 Binder resin for near-infrared absorbing film, and near-infrared absorbing filter using the same WO2008084653A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2007800485246A CN101573409B (en) 2006-12-26 2007-12-21 Binder resin for near-infrared absorbing film, and near-infrared absorbing filter using the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006-348770 2006-12-26
JP2006348770A JP2008156539A (en) 2006-12-26 2006-12-26 Binder resin for near-ir absorptive film and near-ir absorptive filter utilizing the same

Publications (1)

Publication Number Publication Date
WO2008084653A1 true WO2008084653A1 (en) 2008-07-17

Family

ID=39608550

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/074657 WO2008084653A1 (en) 2006-12-26 2007-12-21 Binder resin for near-infrared absorbing film, and near-infrared absorbing filter using the same

Country Status (4)

Country Link
JP (1) JP2008156539A (en)
KR (1) KR20090102748A (en)
CN (1) CN101573409B (en)
WO (1) WO2008084653A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017104735A1 (en) * 2015-12-18 2017-06-22 富士フイルム株式会社 Near-infrared absorbing composition, near-infrared cut filter, method of manufacturing near-infrared cut filter, solid-state imaging device, camera module, and image display device
CN107365401A (en) * 2017-06-15 2017-11-21 东南大学 A kind of near-infrared response backbone chain type liquid crystal elastomer and preparation method thereof

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101942284A (en) * 2010-09-05 2011-01-12 苏州达信科技电子有限公司 Adhesive and manufacturing method thereof
CN102031047B (en) * 2010-11-17 2013-04-10 南京工业大学 Near-infrared absorption film material with night vision compatible characteristic and preparation method thereof
KR101618689B1 (en) * 2012-12-24 2016-05-09 제일모직 주식회사 Photosensitive resin composition for color filter and color filter using the same
WO2016088850A1 (en) * 2014-12-03 2016-06-09 コニカミノルタ株式会社 Laminated film
KR101904500B1 (en) 2016-02-24 2018-11-28 주식회사 엘엠에스 Optical article and optical filter containing the same
KR101976660B1 (en) * 2016-07-13 2019-05-09 삼성에스디아이 주식회사 Photosensitive resin composition, photosensitive resin layer using the same and display device
KR102087261B1 (en) * 2017-02-16 2020-03-10 삼성에스디아이 주식회사 Photosensitive resin composition, black pixel defining layer using the same and display device
KR102364239B1 (en) * 2017-12-21 2022-02-16 동우 화인켐 주식회사 Colored photosensitive composition, color filter and image display device
CN108388040B (en) * 2018-02-08 2020-09-22 苏州市联超光电科技有限公司 Resin optical filter and preparation method thereof
JP2020126982A (en) * 2019-02-06 2020-08-20 日立化成株式会社 Film-like adhesive and adhesive sheet

Citations (5)

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Publication number Priority date Publication date Assignee Title
JPH1180249A (en) * 1996-11-28 1999-03-26 Kanegafuchi Chem Ind Co Ltd Preparation of (meth)acrylate-based polymer having hydroxyl group at terminal
JP2000053723A (en) * 1998-08-11 2000-02-22 Kanegafuchi Chem Ind Co Ltd Polymer composition having hydroxy terminal, and use
JP2006220906A (en) * 2005-02-10 2006-08-24 Toray Ind Inc Optical film
JP2007070605A (en) * 2005-08-12 2007-03-22 Nippon Shokubai Co Ltd Near infrared absorbing composition
JP2007298667A (en) * 2006-04-28 2007-11-15 Hitachi Chem Co Ltd Optical filter

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100424121C (en) * 2003-09-09 2008-10-08 3M创新有限公司 (Meth)acrylic film, and making film and receptor sheet using the same
JP4682299B2 (en) * 2003-11-17 2011-05-11 綜研化学株式会社 Pressure sensitive adhesive for protective sheet
US7285313B2 (en) * 2004-01-20 2007-10-23 Lg Chem Ltd. Acrylic pressure-sensitive adhesive composition for polarizing film

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1180249A (en) * 1996-11-28 1999-03-26 Kanegafuchi Chem Ind Co Ltd Preparation of (meth)acrylate-based polymer having hydroxyl group at terminal
JP2000053723A (en) * 1998-08-11 2000-02-22 Kanegafuchi Chem Ind Co Ltd Polymer composition having hydroxy terminal, and use
JP2006220906A (en) * 2005-02-10 2006-08-24 Toray Ind Inc Optical film
JP2007070605A (en) * 2005-08-12 2007-03-22 Nippon Shokubai Co Ltd Near infrared absorbing composition
JP2007298667A (en) * 2006-04-28 2007-11-15 Hitachi Chem Co Ltd Optical filter

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017104735A1 (en) * 2015-12-18 2017-06-22 富士フイルム株式会社 Near-infrared absorbing composition, near-infrared cut filter, method of manufacturing near-infrared cut filter, solid-state imaging device, camera module, and image display device
JPWO2017104735A1 (en) * 2015-12-18 2018-09-13 富士フイルム株式会社 Near-infrared absorbing composition, near-infrared cut filter, method for producing near-infrared cut filter, solid-state imaging device, camera module, and image display device
US10989846B2 (en) 2015-12-18 2021-04-27 Fujifilm Corporation Near infrared absorbing composition, near infrared cut filter, method of manufacturing near infrared cut filter, solid image pickup element, camera module, and image display device
CN107365401A (en) * 2017-06-15 2017-11-21 东南大学 A kind of near-infrared response backbone chain type liquid crystal elastomer and preparation method thereof
CN107365401B (en) * 2017-06-15 2019-09-10 东南大学 A kind of near-infrared response backbone chain type liquid crystal elastomer and preparation method thereof

Also Published As

Publication number Publication date
JP2008156539A (en) 2008-07-10
CN101573409B (en) 2011-09-07
CN101573409A (en) 2009-11-04
KR20090102748A (en) 2009-09-30

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