WO2008078185A3 - Antireflective coating compositions - Google Patents
Antireflective coating compositions Download PDFInfo
- Publication number
- WO2008078185A3 WO2008078185A3 PCT/IB2007/004198 IB2007004198W WO2008078185A3 WO 2008078185 A3 WO2008078185 A3 WO 2008078185A3 IB 2007004198 W IB2007004198 W IB 2007004198W WO 2008078185 A3 WO2008078185 A3 WO 2008078185A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coating compositions
- antireflective coating
- etch
- regulated
- composition
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L81/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
- C08L81/06—Polysulfones; Polyethersulfones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/20—Polysulfones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L65/00—Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D165/00—Coating compositions based on macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D181/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur, with or without nitrogen, oxygen, or carbon only; Coating compositions based on polysulfones; Coating compositions based on derivatives of such polymers
- C09D181/06—Polysulfones; Polyethersulfones
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/948—Radiation resist
- Y10S438/952—Utilizing antireflective layer
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Materials For Photolithography (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Paints Or Removers (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polyethers (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP07859255A EP2102287A2 (en) | 2006-12-20 | 2007-12-19 | Antireflective coating compositions |
JP2009542269A JP5487501B2 (en) | 2006-12-20 | 2007-12-19 | Antireflection film composition |
KR1020097012584A KR101442865B1 (en) | 2006-12-20 | 2007-12-19 | Antireflective coating compositions |
CN2007800472922A CN101605854B (en) | 2006-12-20 | 2007-12-19 | Antireflective coating compositions |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/613,410 | 2006-12-20 | ||
US11/613,410 US7759046B2 (en) | 2006-12-20 | 2006-12-20 | Antireflective coating compositions |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2008078185A2 WO2008078185A2 (en) | 2008-07-03 |
WO2008078185A3 true WO2008078185A3 (en) | 2008-08-28 |
WO2008078185A8 WO2008078185A8 (en) | 2009-07-09 |
Family
ID=39491493
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IB2007/004198 WO2008078185A2 (en) | 2006-12-20 | 2007-12-19 | Antireflective coating compositions |
Country Status (7)
Country | Link |
---|---|
US (2) | US7759046B2 (en) |
EP (1) | EP2102287A2 (en) |
JP (1) | JP5487501B2 (en) |
KR (1) | KR101442865B1 (en) |
CN (1) | CN101605854B (en) |
TW (1) | TWI419947B (en) |
WO (1) | WO2008078185A2 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7550249B2 (en) * | 2006-03-10 | 2009-06-23 | Az Electronic Materials Usa Corp. | Base soluble polymers for photoresist compositions |
WO2012005806A2 (en) * | 2010-05-10 | 2012-01-12 | The Penn State Research Foundation | Signal-responsive plastics |
JP5266299B2 (en) * | 2010-12-01 | 2013-08-21 | 信越化学工業株式会社 | Resist underlayer film material and pattern forming method using the same |
US8623589B2 (en) * | 2011-06-06 | 2014-01-07 | Az Electronic Materials Usa Corp. | Bottom antireflective coating compositions and processes thereof |
JP6157160B2 (en) * | 2013-03-15 | 2017-07-05 | アーゼッド・エレクトロニック・マテリアルズ(ルクセンブルグ)ソシエテ・ア・レスポンサビリテ・リミテ | Upper layer film forming composition and resist pattern forming method using the same |
US9296922B2 (en) * | 2013-08-30 | 2016-03-29 | Az Electronic Materials (Luxembourg) S.A.R.L. | Stable metal compounds as hardmasks and filling materials, their compositions and methods of use |
US9274426B2 (en) * | 2014-04-29 | 2016-03-01 | Az Electronic Materials (Luxembourg) S.A.R.L. | Antireflective coating compositions and processes thereof |
US11474430B2 (en) * | 2017-08-26 | 2022-10-18 | Irresistible Materials Ltd | Multiple trigger monomer containing photoresist compositions and method |
JP2021519844A (en) * | 2018-03-26 | 2021-08-12 | ジョージア テック リサーチ コーポレイション | Transient polymer formulations, articles thereof, and methods of making and using them. |
CN113930151B (en) * | 2021-10-14 | 2022-06-21 | 厦门恒坤新材料科技股份有限公司 | Anti-reflective coating composition containing self-crosslinkable mercaptomelamine polymer, preparation method thereof and pattern forming method |
Citations (5)
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---|---|---|---|---|
US3792026A (en) * | 1970-09-08 | 1974-02-12 | Dow Chemical Co | High molecular weight olefin polysulfone resins and process for their preparation |
WO1996014806A1 (en) * | 1994-11-16 | 1996-05-23 | Hercules Incorporated | Medical devices composed of low ceiling temperature polymers |
US5919598A (en) * | 1995-08-21 | 1999-07-06 | Brewer Science, Inc. | Method for making multilayer resist structures with thermosetting anti-reflective coatings |
US6479879B1 (en) * | 2000-11-16 | 2002-11-12 | Advanced Micro Devices, Inc. | Low defect organic BARC coating in a semiconductor structure |
JP2007279459A (en) * | 2006-04-07 | 2007-10-25 | Asahi Kasei Corp | Refractive index control thin film |
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KR100882409B1 (en) | 2003-06-03 | 2009-02-05 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Antireflective Silicone Resin, Antireflective Film Material, and Antireflective Film and Pattern Formation Method Using the Same |
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US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
US20050214674A1 (en) * | 2004-03-25 | 2005-09-29 | Yu Sui | Positive-working photoimageable bottom antireflective coating |
US7537879B2 (en) | 2004-11-22 | 2009-05-26 | Az Electronic Materials Usa Corp. | Photoresist composition for deep UV and process thereof |
KR101137812B1 (en) * | 2004-12-20 | 2012-04-18 | 주식회사 동진쎄미켐 | Organic polymer for forming organic anti-reflective coating layer, and organic composition including the same |
JP5296297B2 (en) | 2005-04-04 | 2013-09-25 | 東レ・ファインケミカル株式会社 | Silicone copolymer having condensed polycyclic hydrocarbon group and process for producing the same |
US7550249B2 (en) | 2006-03-10 | 2009-06-23 | Az Electronic Materials Usa Corp. | Base soluble polymers for photoresist compositions |
US8026040B2 (en) | 2007-02-20 | 2011-09-27 | Az Electronic Materials Usa Corp. | Silicone coating composition |
-
2006
- 2006-12-20 US US11/613,410 patent/US7759046B2/en not_active Expired - Fee Related
-
2007
- 2007-12-06 TW TW096146552A patent/TWI419947B/en not_active IP Right Cessation
- 2007-12-19 CN CN2007800472922A patent/CN101605854B/en not_active Expired - Fee Related
- 2007-12-19 KR KR1020097012584A patent/KR101442865B1/en not_active IP Right Cessation
- 2007-12-19 WO PCT/IB2007/004198 patent/WO2008078185A2/en active Application Filing
- 2007-12-19 JP JP2009542269A patent/JP5487501B2/en not_active Expired - Fee Related
- 2007-12-19 EP EP07859255A patent/EP2102287A2/en not_active Withdrawn
-
2010
- 2010-06-10 US US12/797,949 patent/US8211621B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3792026A (en) * | 1970-09-08 | 1974-02-12 | Dow Chemical Co | High molecular weight olefin polysulfone resins and process for their preparation |
WO1996014806A1 (en) * | 1994-11-16 | 1996-05-23 | Hercules Incorporated | Medical devices composed of low ceiling temperature polymers |
US5919598A (en) * | 1995-08-21 | 1999-07-06 | Brewer Science, Inc. | Method for making multilayer resist structures with thermosetting anti-reflective coatings |
US6479879B1 (en) * | 2000-11-16 | 2002-11-12 | Advanced Micro Devices, Inc. | Low defect organic BARC coating in a semiconductor structure |
JP2007279459A (en) * | 2006-04-07 | 2007-10-25 | Asahi Kasei Corp | Refractive index control thin film |
Non-Patent Citations (1)
Title |
---|
R.E. COOK, E.A.: "Effect of olefin structure on the ceiling temperature for olefin polysulfone frmation", JOURNAL OF POLYMER SCIENCE, vol. 26, 1957, pages 351 - 364, XP002484599 * |
Also Published As
Publication number | Publication date |
---|---|
US8211621B2 (en) | 2012-07-03 |
WO2008078185A8 (en) | 2009-07-09 |
JP5487501B2 (en) | 2014-05-07 |
CN101605854B (en) | 2012-07-25 |
CN101605854A (en) | 2009-12-16 |
US7759046B2 (en) | 2010-07-20 |
JP2010513650A (en) | 2010-04-30 |
KR20090106473A (en) | 2009-10-09 |
KR101442865B1 (en) | 2014-09-19 |
EP2102287A2 (en) | 2009-09-23 |
US20080153035A1 (en) | 2008-06-26 |
TWI419947B (en) | 2013-12-21 |
WO2008078185A2 (en) | 2008-07-03 |
US20100248137A1 (en) | 2010-09-30 |
TW200838957A (en) | 2008-10-01 |
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