WO2008075546A1 - Glass for substrate - Google Patents
Glass for substrate Download PDFInfo
- Publication number
- WO2008075546A1 WO2008075546A1 PCT/JP2007/073157 JP2007073157W WO2008075546A1 WO 2008075546 A1 WO2008075546 A1 WO 2008075546A1 JP 2007073157 W JP2007073157 W JP 2007073157W WO 2008075546 A1 WO2008075546 A1 WO 2008075546A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- glass
- less
- substrate
- wavelength
- geo
- Prior art date
Links
- 239000011521 glass Substances 0.000 title claims abstract description 53
- 239000000758 substrate Substances 0.000 title claims abstract description 39
- 238000002834 transmittance Methods 0.000 claims abstract description 10
- 230000009477 glass transition Effects 0.000 claims abstract description 4
- 239000000203 mixture Substances 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 4
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 abstract 8
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 abstract 6
- 229910052593 corundum Inorganic materials 0.000 abstract 3
- QZQVBEXLDFYHSR-UHFFFAOYSA-N gallium(III) oxide Inorganic materials O=[Ga]O[Ga]=O QZQVBEXLDFYHSR-UHFFFAOYSA-N 0.000 abstract 3
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 3
- 238000004031 devitrification Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 238000001514 detection method Methods 0.000 description 6
- 230000008018 melting Effects 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical group 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000005387 chalcogenide glass Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000005383 fluoride glass Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/253—Silica-free oxide glass compositions containing germanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
- C03C3/068—Glass compositions containing silica with less than 40% silica by weight containing boron containing rare earths
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/10—Compositions for glass with special properties for infrared transmitting glass
Definitions
- the present invention is a sensor for detecting concentration of CO gas, CO gas, NO gas, etc., which transmits infrared rays.
- the present invention relates to a glass for a substrate suitable for a substrate or the like.
- Infrared light with a wavelength of 4 ⁇ m is used for CO gas detection and CO gas detection.
- Infrared rays with a wavelength of 3-5 m are used for temperature detection.
- An infrared filter in which a multilayer film is formed on a substrate that transmits rays is used.
- a substrate a germanium substrate or a silicon substrate is widely used. These substrates are expensive and an alternative material is required.
- Bi O -PbO-ZnO-CdF glass is a thermally stable glass that transmits infrared light.
- Patent Document 1 Bi 2 O 3 —ZnO—R 2 O glass (R is an alkali metal.
- Patent Document 2
- Patent Document 1 Japanese Patent Laid-Open No. 8-188445
- Patent Document 2 JP-A-8-133779
- the BiO-PbO-ZnO-CdF-based glass is not preferable in that it contains PbO.
- the BiO-ZnO-R ⁇ glass has high light transmission up to the infrared region with a wavelength of 7.5 ⁇ m.
- An object of the present invention is to provide a glass for a substrate that can solve such problems.
- BiO is 10 to 55%
- GeO is 20 to 8 in terms of mol% based on the following oxides.
- Substrate glass (Aspect A glass) containing 50% or more of O + GeO and not containing MgO
- GaO gallium arsphide
- “contains 0-19% GaO” means that GaO is not essential, but 19%
- a glass for substrates is obtained that has a high Tg (glass transition point), is thermally stable, has a high transmittance at a wavelength of 5.5 111, and a low transmittance at a wavelength of 7 am.
- the glass for a substrate of the present invention (hereinafter, the glass of the present invention and V) is suitable for a glass substrate of a gas analyzer, a radiation thermometer, an infrared sensor or the like.
- the Tg of the glass of the present invention is preferably 400 ° C or higher. Below 400 ° C, the substrate may be deteriorated when detecting relatively high-temperature infrared rays, or the substrate may be deformed in the vapor deposition process for forming the multilayer film.
- the glass of the present invention has a light transmittance (T) of 50% or more at a wavelength of 5.5 m at a thickness of lmm.
- O ⁇ m at a thickness of lmm is preferably 10% or less.
- T force is less than 3 ⁇ 40%, the necessary amount of light may not be obtained.
- a substrate made of the glass of the present invention a concentration detection sensor substrate such as NO gas, a high temperature sensor
- the transmittance (T) of the light of a wavelength of 6.5 m at a thickness lmm of the glass of the present invention is 4% or less! /. If it exceeds 4%, light of unnecessary wavelength is blocked.
- BiO is an essential component. If its content is less than 10%, the melting temperature becomes high, and
- GeO is a network former and a component that lowers T and is essential
- T becomes high or devitrification tends to occur. More preferable
- T may decrease if the total content of BiO and GeO is less than 50%.
- Ga 2 O nor Al 2 O is a component that suppresses devitrification, although it is not essential.
- Ga may be contained in a range of 19% or less and 15% or less, respectively.
- GaO is 16% or less, and AlO is 12% or less.
- the total content of GaO and AlO is preferably 2 to 30%.
- the devitrification suppressing effect of the glass may be insufficient.
- the glass tends to be devitrified. More preferably, it is 25% or less, particularly preferably 22% or less.
- the BiO content is 15% or more
- the GeO content is 80% or less
- GeO + A10 is preferably 60% or more. T less than 60%, for example 4
- the glass of the present invention does not impair the object of the present invention, and BiO, GeO, GaO and
- Components other than 2 3 2 2 3 and Al 2 O may be contained. In the following, such components are illustratively described.
- the total content of BiO, GeO, GaO and AlO is preferably 70% or more, T
- MgO, CaO, SrO and BaO are essential, but may be contained in a total content of 25% or less in order to suppress devitrification. If it exceeds 25%, the glass tends to be easily devitrified. Preferably it is 20% or less.
- MgO + CaO + SrO is typically 0-8%.
- MgO, CaO, SrO and BaO When MgO, CaO, SrO and BaO are contained, their content is preferably 10% or less, 15% or less, 15% or less, and 20% or less, respectively, typically 7% or less, % Or less, 7% or less, 18% or less.
- Ga 2 O + MgO When MgO is contained, Ga 2 O + MgO must be 20% or less. 20%
- ZnO is not essential, but may be contained up to 20% in order to suppress devitrification. If it exceeds 20%, devitrification tends to occur. Typically less than 15%.
- V which may contain up to 25% of total content. If it exceeds 25%, chemical durability may be reduced. Preferably it is 20% or less, typically 15% or less.
- CeO is not essential, but Bi O precipitates as metallic bismuth in the glass melt
- the glass may be contained up to 2%. If it exceeds 2%, the glass tends to be devitrified. Preferably it is 1% or less, More preferably, it is 0.5% or less.
- the content is preferably 0.05% or more, more preferably 0.1% or more.
- the oxide may be contained.
- the total content of these components is 10% The following is preferable. If it exceeds 10%, devitrification tends to occur. Typically less than 5%.
- O + Y O + Nb O + ZnO is preferably 15% or less. More than 15% is devitrified
- SiO When SiO is contained, its content is preferably 1% or less. Over 1%
- the content is preferably 1% or less. Over 1%
- P o is typically not included.
- the glass of the aspect A is essentially composed of Bi O and GeO, which are essential components, and any one component.
- Quasi-essential components that must contain GaO, AlO and optional components CaO, Sr
- the total content of such components is preferably 15% or less, more preferably 10% or less, typically 5% or less.
- examples of such components include TiO, ZrO, InO, LaO, YO, and the like described above as examples.
- NbO is typical, and the above explanation regarding SiO, B 2 O, and P 2 O applies as well.
- Na 2 O + K 0 is 0-20%.
- the method for producing the glass of the present invention is not particularly limited.
- raw materials are prepared and mixed, and then placed in a gold crucible, platinum crucible, alumina crucible, or quartz crucible, and 800 to; air at 1300 ° C.
- the sol-gel method may be manufactured by a method other than the melting method such as a vapor deposition method.
- a glass having a composition indicated by% is produced by a melting method.
- Examples;! -47 are examples, examples 48-5 3 is a comparative example.
- Tg, T, ⁇ , and ⁇ were estimated by calculation from the force not produced by the melting method, that is, from the composition.
- the substrate glass of the present invention is a concentration detection sensor for CO gas, CO gas, NO gas, etc.
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
Disclosed is a glass for a substrate, which shows a transmittance of light having a wavelength of 5.5 μm of 50% or more and a transmittance of light having a wavelength of 7.0 μm of 10% or less when prepared in a thickness of 1 mm. Specifically disclosed is a glass for a substrate, which comprises (by mole, in terms of oxide): 10 to 55% of Bi2O3; 20 to 85% of GeO2; 0 to 19% of Ga2O3; and 0 to 15% of Al2O3, wherein the sum total of Bi2O3 and GeO2 accounts for 50% or more and, when MgO is contained, the sum total of Ga2O3 and MgO accounts for 20% or less. In the glass, the content of Bi2O3 may be 15% or more, the content of GeO2 may be 80% or less, and the sum total of Ga2O3 and Al2O3 may account for 2 to 30%. In the glass, the sum total of GeO2 and Al2O3 may account for 60% or more. The glass may have a glass transition temperature of 400˚C or higher.
Description
明 細 書 Specification
基板用ガラス Substrate glass
技術分野 Technical field
[0001] 本発明は、赤外線を透過し、 COガス、 COガス、 NO ガス等の濃度検知センサー [0001] The present invention is a sensor for detecting concentration of CO gas, CO gas, NO gas, etc., which transmits infrared rays.
2 X 2 X
基板などに好適な基板用ガラスに関する。 The present invention relates to a glass for a substrate suitable for a substrate or the like.
背景技術 Background art
[0002] COガス検知、 COガス検知には波長が 4 μ m帯の赤外線が利用され、比較的高 [0002] Infrared light with a wavelength of 4 μm is used for CO gas detection and CO gas detection.
2 2
温の検出には波長が 3〜5 mの赤外線が利用されている。 Infrared rays with a wavelength of 3-5 m are used for temperature detection.
COガスまたは COガスの濃度検知センサーにおいては 5 μ m以上の波長の赤外 In the case of CO gas or CO gas concentration detection sensors, infrared light with a wavelength of 5 μm or more
2 2
線を透過する基板上に多層膜が形成された赤外線フィルタが使用されている。このよ うな基板としてはゲルマニウム基板やシリコン基板が広く用いられている力 それら基 板は高価であり代替材料が求められている。 An infrared filter in which a multilayer film is formed on a substrate that transmits rays is used. As such a substrate, a germanium substrate or a silicon substrate is widely used. These substrates are expensive and an alternative material is required.
[0003] そのような材料としてフッ化物ガラスおよびカルコゲン化物ガラスが知られているが 、これらガラスのガラス転移点 (Tg)はいずれも低ぐ熱的に不安定であるという問題 力 sある。 [0003] While such fluoride glass and chalcogenide glass as a material is known, the glass transition point of the glass (Tg) of issues force s that any one is low immediately thermally unstable.
熱的に安定で赤外線を透過するガラスとしては、 Bi O -PbO-ZnO-CdF系ガ Bi O -PbO-ZnO-CdF glass is a thermally stable glass that transmits infrared light.
2 3 2 ラス(特許文献 1参照)、 Bi O -ZnO-R O系ガラス (Rはアルカリ金属。特許文献 2 2 3 2 glass (see Patent Document 1), Bi 2 O 3 —ZnO—R 2 O glass (R is an alkali metal. Patent Document 2
2 3 2 2 3 2
参照)などが知られている。 For example).
[0004] 特許文献 1:特開平 8— 188445号公報 [0004] Patent Document 1: Japanese Patent Laid-Open No. 8-188445
特許文献 2:特開平 8— 133779号公報 Patent Document 2: JP-A-8-133779
発明の開示 Disclosure of the invention
発明が解決しょうとする課題 Problems to be solved by the invention
[0005] 前記 Bi O -PbO-ZnO-CdF系ガラスは PbOを含有する点で好ましくなかった [0005] The BiO-PbO-ZnO-CdF-based glass is not preferable in that it contains PbO.
2 3 2 2 3 2
〇 Yes
前記 Bi O -ZnO-R〇系ガラスは波長 7. 5 μ mの赤外域まで高い光透過性を The BiO-ZnO-R ○ glass has high light transmission up to the infrared region with a wavelength of 7.5 μm.
2 3 2 2 3 2
有するので、ガスセンサーなどの基板に用いる場合には、たとえば波長が 7 m以上 の不要な赤外線まで透過する。そのため、ガスセンサーの感度を上げようとすれば不
要な波長の光を基板上に多層膜を形成して、または別のフィルタ一により遮断しなけ ればならない問題があった。 Therefore, when used for a substrate such as a gas sensor, it transmits even unnecessary infrared rays having a wavelength of 7 m or more. Therefore, it is not possible to increase the sensitivity of the gas sensor. There is a problem that light of a necessary wavelength must be blocked by forming a multilayer film on the substrate or by another filter.
本発明はこのような問題を解決できる基板用ガラスの提供を目的とする。 課題を解決するための手段 An object of the present invention is to provide a glass for a substrate that can solve such problems. Means for solving the problem
[0006] 本発明は、下記酸化物基準のモル%表示で、 Bi Oを 10〜55%、 GeOを 20〜8 [0006] In the present invention, BiO is 10 to 55%, GeO is 20 to 8 in terms of mol% based on the following oxides.
2 3 2 2 3 2
5%、 Ga Oを 0〜; 19%、 Al Oを 0〜; 15%含有し、 Bi O +GeO力 ¾0%以上であ 5%, GaO 0 ~; 19%, AlO 0 ~; 15%, BiO + GeO force ¾0% or more
2 3 2 3 2 3 2 り、 MgOを含有する場合 Ga O +MgOが 20%以下である基板用ガラスを提供する 2 3 2 3 2 3 2 Thus, in the case of containing MgO, a glass for a substrate having Ga O + MgO of 20% or less is provided.
2 3 twenty three
〇 Yes
特に、下記酸化物基準のモル%表示で、 Bi O 10—55%, GeO 20—85%, In particular, Bi O 10—55%, GeO 20—85%
2 3 2 2 3 2
Ga〇を 0〜18. 9%、 Ga〇 +A1〇 2—30%, CaO + SrO + BaO 0—25%, Ga〇 0 to 18.9%, Ga〇 + A1〇 2—30%, CaO + SrO + BaO 0—25%,
2 3 2 3 2 3 2 3 2 3 2 3
ZnO 0〜20%、Na〇 + K〇 0〜25%、 Ce〇 0〜2%、力、ら本質白勺になり、 Bi ZnO 0-20%, Na〇 + K〇0-25%, Ce〇0-2%, force, etc.
2 2 2 2 2 2 2 2
O +GeOが 50%以上であり、 MgOを含有しない基板用ガラス(態様 Aのガラス)をSubstrate glass (Aspect A glass) containing 50% or more of O + GeO and not containing MgO
3 2 3 2
提供する。 provide.
なお、たとえば「Ga Oを 0〜19%含有する」とは、 Ga Oは必須ではないが 19% For example, “contains 0-19% GaO” means that GaO is not essential, but 19%
2 3 2 3 2 3 2 3
以下の範囲で含有してもよい、の意である。 It may be contained in the following range.
発明の効果 The invention's effect
[0007] Tg (ガラス転移点)が高く熱的に安定であり、波長 5. 5 111での透過率が高ぐ波 長 7 a mでの透過率が低レ、基板用ガラスが得られる。 [0007] A glass for substrates is obtained that has a high Tg (glass transition point), is thermally stable, has a high transmittance at a wavelength of 5.5 111, and a low transmittance at a wavelength of 7 am.
発明を実施するための最良の形態 BEST MODE FOR CARRYING OUT THE INVENTION
[0008] 本発明の基板用ガラス(以下、本発明のガラスと V、う。 )はガス分析機器、放射温度 計、赤外線センサー等のガラス基板に好適である。 [0008] The glass for a substrate of the present invention (hereinafter, the glass of the present invention and V) is suitable for a glass substrate of a gas analyzer, a radiation thermometer, an infrared sensor or the like.
本発明のガラスの Tgは 400°C以上であることが好ましい。 400°C未満では比較的 高温の赤外線を検出するときに基板が劣化するおそれ、または多層膜を形成するた めの蒸着工程で基板が変形するおそれがある。 The Tg of the glass of the present invention is preferably 400 ° C or higher. Below 400 ° C, the substrate may be deteriorated when detecting relatively high-temperature infrared rays, or the substrate may be deformed in the vapor deposition process for forming the multilayer film.
[0009] 本発明のガラスは、厚み lmmでの波長 5. 5 mの光の透過率(T )が 50%以上 [0009] The glass of the present invention has a light transmittance (T) of 50% or more at a wavelength of 5.5 m at a thickness of lmm.
5. 5 5.5
、かつ厚み lmmでの波長 7. O ^ mの光の透過率(T )が 10%以下であることが好 In addition, the transmittance (T) of light having a wavelength of 7. O ^ m at a thickness of lmm is preferably 10% or less.
7. 0 7. 0
ましレ、。 T 力 ¾0%未満では必要な光量が得られなくなるおそれがある。また、 T Masle. If the T force is less than ¾0%, the necessary amount of light may not be obtained. T
5. 5 7. 5 が 10%超では不要な波長の光を遮断するために酸化物膜や金属膜などの多層膜を
蒸着積層する処理が必要となるおそれがある。この好まし!/、態様のガラスからなる基 板はサファイア基板 (T = 73%、 T = 5%)の代替品として使用することが可能と 5.5. If 7.5 exceeds 10%, a multilayer film such as an oxide film or metal film is used to block light of unnecessary wavelengths. There is a risk that a process for vapor deposition lamination may be required. This preferred! / Substrate made of glass can be used as an alternative to sapphire substrates (T = 73%, T = 5%)
5. 5 7. 0 5. 5 7. 0
なる。 Become.
[0010] 本発明のガラスからなる基板を NOガス等の濃度検知センサー基板、高温センサ [0010] A substrate made of the glass of the present invention, a concentration detection sensor substrate such as NO gas, a high temperature sensor
X X
一基板などに用いる場合、本発明のガラスの厚み lmmでの波長 6. 5 mの光の透 過率 (T )は 4%以下であることが好まし!/、。 4%超では不要な波長の光を遮断する When used on a single substrate, it is preferred that the transmittance (T) of the light of a wavelength of 6.5 m at a thickness lmm of the glass of the present invention is 4% or less! /. If it exceeds 4%, light of unnecessary wavelength is blocked.
6. 5 6.5
ための多層膜をガラス基板に蒸着しなければならなくなるおそれがある。 Therefore, there is a possibility that a multilayer film must be deposited on the glass substrate.
[0011] 次に、本発明のガラスの成分と含有量を説明する。「モル%」は単に「%」と表示す Next, the components and contents of the glass of the present invention will be described. "Mole%" is simply displayed as "%"
Bi Oは必須成分である。その含有量が 10%未満では溶解温度が高くなる、またBiO is an essential component. If its content is less than 10%, the melting temperature becomes high, and
2 3 twenty three
は分相しやすくなる。好ましくは 13%以上、より好ましくは 15%以上、特に好ましくは 18%以上、典型的には 20%以上である。 55%超ではガラス化が困難になる。好まし くは 50%以下、典型的には 45%以下である。 Becomes easier to separate. It is preferably 13% or more, more preferably 15% or more, particularly preferably 18% or more, and typically 20% or more. If it exceeds 55%, vitrification becomes difficult. Preferably it is 50% or less, typically 45% or less.
[0012] GeOはネットワークフォーマであり、また T を低下させる成分であり、必須である [0012] GeO is a network former and a component that lowers T and is essential
2 7. 0 2 7. 0
。その含有量が 20%未満では T が高くなる、または失透しやすくなる。より好ましく . If the content is less than 20%, T becomes high or devitrification tends to occur. More preferable
7. 0 7. 0
は 25%以上である。 85%超では失透しやすくなる。より好ましくは 80%以下、典型 的には 75%以下である。 Is over 25%. If it exceeds 85%, it tends to be devitrified. More preferably, it is 80% or less, and typically 75% or less.
Bi Oおよび GeOの含有量の合計が 50%未満では T が低下するおそれがある T may decrease if the total content of BiO and GeO is less than 50%.
2 3 2 5. 5 2 3 2 5.5
。典型的には 55%以上である。 . Typically 55% or more.
[0013] Ga Oおよび Al Oはいずれも必須ではないが失透を抑制する成分であり、そのよ [0013] Neither Ga 2 O nor Al 2 O is a component that suppresses devitrification, although it is not essential.
2 3 2 3 2 3 2 3
うな目的などのためにそれぞれ 19%以下、 15%以下の範囲で含有してもよい。 Ga For such purposes, it may be contained in a range of 19% or less and 15% or less, respectively. Ga
2 2
Oが 19%超または Al Oが 15%超ではかえつてガラスが失透しやすくなる。典型的If O exceeds 19% or Al O exceeds 15%, the glass tends to devitrify. Typical
3 2 3 3 2 3
には Ga〇は 16%以下、 Al〇は 12%以下である。 GaO is 16% or less, and AlO is 12% or less.
2 3 2 3 2 3 2 3
[0014] Ga Oおよび Al Oの少なくともいずれか一方を含有することが好ましぐその場合 [0014] In that case, it is preferable to contain at least one of Ga 2 O and Al 2 O
2 3 2 3 2 3 2 3
の Ga〇および Al〇の含有量の合計 Ga〇 +A1〇は 2〜30%であることが好ま The total content of GaO and AlO is preferably 2 to 30%.
2 3 2 3 2 3 2 3 2 3 2 3 2 3 2 3
しい。 Ga O +A1 O力 未満ではガラスの失透抑制効果が不十分となるおそれ That's right. If less than Ga O + A1 O force, the devitrification suppressing effect of the glass may be insufficient.
2 3 2 3 2 3 2 3
がある。より好ましくは 4%以上である。 30%超ではかえつてガラスが失透しやすくな る。より好ましくは 25%以下、特に好ましくは 22%以下である。
典型的には、 Bi O含有量が 15%以上、 GeO含有量が 80%以下かつ Ga O + There is. More preferably, it is 4% or more. If it exceeds 30%, the glass tends to be devitrified. More preferably, it is 25% or less, particularly preferably 22% or less. Typically, the BiO content is 15% or more, the GeO content is 80% or less, and GaO +
2 3 2 2 3 2 3 2 2 3
A1〇力 ¾〜30%である。 A1 0 force ¾ to 30%.
2 3 twenty three
[0015] GeO +A1〇は 60%以上であることが好ましい。 60%未満では T をたとえば 4 [0015] GeO + A10 is preferably 60% or more. T less than 60%, for example 4
2 2 3 6. 5 2 2 3 6. 5
%以下にすることが困難になるおそれがある。 It may be difficult to make it below%.
[0016] 本発明のガラスは本発明の目的を損なわない範囲で、 Bi O 、 GeO 、 Ga Oおよ [0016] The glass of the present invention does not impair the object of the present invention, and BiO, GeO, GaO and
2 3 2 2 3 び Al O以外の成分を含有してもよい。以下ではそのような成分を例示的に説明す Components other than 2 3 2 2 3 and Al 2 O may be contained. In the following, such components are illustratively described.
2 3 twenty three
る力 Bi〇、 GeO 、 Ga〇および Al〇の含有量の合計は好ましくは 70%以上、 T The total content of BiO, GeO, GaO and AlO is preferably 70% or more, T
2 3 2 2 3 2 3 2 3 2 2 3 2 3
力 以下である態様などにおいては典型的には 90%以上である。 In an embodiment that is less than force, it is typically 90% or more.
6. 5 6.5
[0017] MgO、 CaO、 SrOおよび BaOはいずれも必須ではないが、失透を抑制するために 含有量合計が 25%以下の範囲で含有してもよい。 25%超ではかえつてガラスが失 透しやすくなるおそれがある。好ましくは 20%以下である。 MgO + CaO + SrOは典 型的には 0〜8%である。 [0017] None of MgO, CaO, SrO and BaO is essential, but may be contained in a total content of 25% or less in order to suppress devitrification. If it exceeds 25%, the glass tends to be easily devitrified. Preferably it is 20% or less. MgO + CaO + SrO is typically 0-8%.
MgO、 CaO、 SrO、 BaOを含有する場合それらの含有量はそれぞれ 10%以下、 1 5%以下、 15%以下、 20%以下であることが好ましぐ典型的にはそれぞれ 7%以下 、 7%以下、 7%以下、 18%以下である。 When MgO, CaO, SrO and BaO are contained, their content is preferably 10% or less, 15% or less, 15% or less, and 20% or less, respectively, typically 7% or less, % Or less, 7% or less, 18% or less.
なお、 MgOを含有する場合 Ga O +MgOは 20%以下でなければならない。 20% When MgO is contained, Ga 2 O + MgO must be 20% or less. 20%
2 3 twenty three
超ではガラスがかえって失透しやすくなる。 If it is too high, the glass tends to devitrify.
[0018] ZnOは必須ではないが、失透を抑制するために 20%まで含有してもよい。 20%超 ではかえって失透しやすくなるおそれがある。典型的には 15%以下である。 [0018] ZnO is not essential, but may be contained up to 20% in order to suppress devitrification. If it exceeds 20%, devitrification tends to occur. Typically less than 15%.
[0019] Na Oおよび K Oはいずれも必須ではないが、失透を抑制するためにこれら成分の [0019] Both Na 2 O and K 2 O are not essential, but in order to suppress devitrification, these components
2 2 twenty two
含有量の合計が 25%以下の範囲で含有してもよ V、。 25%超では化学的耐久性が 低下するおそれがある。好ましくは 20%以下、典型的には 15%以下である。 V, which may contain up to 25% of total content. If it exceeds 25%, chemical durability may be reduced. Preferably it is 20% or less, typically 15% or less.
[0020] CeOは必須ではないが、 Bi Oがガラス融液中で金属ビスマスとなって析出する [0020] CeO is not essential, but Bi O precipitates as metallic bismuth in the glass melt
2 2 3 2 2 3
のを防止するなどのために 2%まで含有してもよい。 2%超では、ガラスが失透しやす くなる。好ましくは 1 %以下、より好ましくは 0. 5%以下である。 CeOを含有する場合 In order to prevent this, it may be contained up to 2%. If it exceeds 2%, the glass tends to be devitrified. Preferably it is 1% or less, More preferably, it is 0.5% or less. When containing CeO
2 2
、その含有量は 0. 05%以上であることが好ましぐより好ましくは 0. 1 %以上である。 The content is preferably 0.05% or more, more preferably 0.1% or more.
[0021] TiO 、 ZrO、 In O 、 La O、 Y Oおよび Nb O力、らなる群から選ばれる 1種以上 [0021] One or more kinds selected from the group consisting of TiO, ZrO, InO, LaO, YO and NbO forces
2 2 2 3 2 3 2 3 2 3 2 2 2 3 2 3 2 3 2 3
の酸化物を含有してもよい場合がある。この場合これら成分の含有量の合計は 10%
以下であることが好ましい。 10%超では失透しやすくなるおそれがある。典型的には 5%以下である。 In some cases, the oxide may be contained. In this case, the total content of these components is 10% The following is preferable. If it exceeds 10%, devitrification tends to occur. Typically less than 5%.
これら成分のいずれ力、 1種以上と ZnOを含有する場合、 TiO +ZrO +In O +La If any of these components contain one or more types and ZnO, TiO + ZrO + In O + La
2 2 2 3 2 2 2 3
O +Y O +Nb O +ZnOは 15%以下であることが好ましい。 15%超では失透しO + Y O + Nb O + ZnO is preferably 15% or less. More than 15% is devitrified
2 3 2 3 2 3 2 3 2 3 2 3
やすくなるおそれがある。典型的には 10%以下である。 May be easier. Typically less than 10%.
[0022] なお、 SiOを含有する場合その含有量は 1 %以下であることが好ましい。 1 %超で [0022] When SiO is contained, its content is preferably 1% or less. Over 1%
2 2
は T が低下するおそれがある。典型的には SiOは含有しない。 May decrease T. Typically no SiO.
5. 5 2 5. 5 2
また、 B Oを含有する場合その含有量は 1 %以下であることが好ましい。 1 %超で When B 2 O is contained, the content is preferably 1% or less. Over 1%
2 3 twenty three
は T が低下するおそれがある。典型的には B Oは含有しない。 May decrease T. Typically no B 2 O is contained.
5. 5 2 3 5. 5 2 3
また、 P oは典型的には含有しない。 P o is typically not included.
2 5 twenty five
[0023] 前記態様 Aのガラスは本質的に、必須成分たる Bi O、 GeOと、いずれか一成分 [0023] The glass of the aspect A is essentially composed of Bi O and GeO, which are essential components, and any one component.
2 3 2 2 3 2
を含有しなければならない準必須成分たる Ga O、 Al Oと、任意成分たる CaO、 Sr Quasi-essential components that must contain GaO, AlO and optional components CaO, Sr
2 3 2 3 2 3 2 3
〇、 Ba〇、 Zn〇、 Na〇、 K〇、 CeOとからなる力 本発明の目的を損なわない範囲 〇, Ba〇, Zn〇, Na〇, K〇, CeO
2 2 2 2 2 2
でその他の成分を含有してもよい。この場合、そのような成分の含有量の合計は 15 %以下であることが好ましぐより好ましくは 10%以下、典型的には 5%以下である。 そのような成分としては上記例示的に説明した TiO、 ZrO 、 In O、 La O 、 Y O 、 And may contain other components. In this case, the total content of such components is preferably 15% or less, more preferably 10% or less, typically 5% or less. Examples of such components include TiO, ZrO, InO, LaO, YO, and the like described above as examples.
2 2 2 3 2 3 2 3 2 2 2 3 2 3 2 3
Nb Oなどが典型的であり、 SiO、 B O 、 P Oに関する上記説明も同様に適用さNbO is typical, and the above explanation regarding SiO, B 2 O, and P 2 O applies as well.
2 3 2 2 3 2 5 2 3 2 2 3 2 5
れる。 It is.
態様 Aにおいては典型的には、 Bi〇力 0〜55%、 GeO力 0〜75%、 Ga〇 In aspect A, typically, Bi 0 force 0 to 55%, GeO force 0 to 75%, Ga 0
2 3 2 2 3 2 3 2 2 3
+ A1〇力 〜 25%、 Ca〇が 0〜15%、 Sr〇カ 0〜15%、 Ba〇が 0〜20%、 Zn〇カ+ A1 0 force -25%, Ca 0 0-15%, Sr 0 0-15%, Ba 0 0-20%, Zn 0
2 3 twenty three
0—15%, Na O + K〇が 0〜20%、である。 0—15%, Na 2 O + K 0 is 0-20%.
2 2 twenty two
[0024] 本発明のガラスの製造方法については特に制限はなぐたとえば、原料を調合して 混合し、金ルツボ、白金ルツボ、アルミナルツボまたは石英ルツボの中に入れ、 800 〜; 1300°Cで空気中で溶解して製造できる(溶融法)。また、ゾルゲル法ゃ気相蒸着 法など溶融法以外の方法で製造してもよレ、。 [0024] The method for producing the glass of the present invention is not particularly limited. For example, raw materials are prepared and mixed, and then placed in a gold crucible, platinum crucible, alumina crucible, or quartz crucible, and 800 to; air at 1300 ° C. Can be manufactured by dissolving in the melt (melting method) In addition, the sol-gel method may be manufactured by a method other than the melting method such as a vapor deposition method.
実施例 Example
[0025] 表;!〜 6の例;!〜 53について例 47を除き、各表の Bi O力、ら CeOまでの欄にモル [0025] Table; Examples of! ~ 6; Except for Example 47 of! ~ 53, the Bi O force, etc.
2 3 2 2 3 2
%表示で示す組成となるガラスを溶融法で作製した。例;!〜 47は実施例、例 48〜5
3は比較例である。 A glass having a composition indicated by% is produced by a melting method. Examples;! -47 are examples, examples 48-5 3 is a comparative example.
例 1〜46について Tg (単位: °C)、T (単位:%)、T (単位:%)、Τ (単位:% Examples 1 to 46 Tg (unit: ° C), T (unit:%), T (unit:%), Τ (unit:%)
5. 5 6. 5 7. 0 5. 5 6. 5 7. 0
)を測定した。なお、 *を付したものは測定を行わず組成から推定したものである。 例 47の組成のガラスは、溶融法による作製は行わな力、つたが組成から計算によつ て Tg、T 、Τ 、Τ を推定した。 ) Was measured. Those marked with * are those estimated from the composition without measurement. For the glass having the composition of Example 47, Tg, T, Τ, and Τ were estimated by calculation from the force not produced by the melting method, that is, from the composition.
5. 5 6. 5 7. 0 5. 5 6. 5 7. 0
例 48〜53のガラスは失透したので Tgなどの測定は行わなかった。 Since the glasses of Examples 48 to 53 were devitrified, Tg and the like were not measured.
[表 1] [table 1]
賺/υ/ O-ε卜 02τ1 ϋ800ίAV 賺 / υ / O-ε 卜 02τ1 ϋ800ίAV
0030
0030
本発明の基板用ガラスは、 COガス、 COガス、 NOガス等の濃度検知センサーな The substrate glass of the present invention is a concentration detection sensor for CO gas, CO gas, NO gas, etc.
2 X 2 X
どのガスセンサー基板に利用される。 なお、 2006年 12月 19曰に出願された曰本特許出願 2006— 340941及び 2007 年 7月 2日に出願された日本特許出願 2007— 174262号の明細書、特許請求の範 囲、図面及び要約書の全内容をここに引用し、本発明の明細書の開示として、取り入 れるものである。
Used for any gas sensor substrate. The specification, claim scope, drawings and abstract of Japanese Patent Application 2006-340941 filed on December 19, 2006 and Japanese Patent Application 2007-174262 filed on July 2, 2007 The entire contents of this document are hereby incorporated herein by reference as the disclosure of the specification of the present invention.
Claims
[1] 下記酸化物基準のモル0 /0表示で、 Bi Oを 10〜55%、 GeOを 20〜85%、 Ga O [1] in a molar 0/0 based on the following oxides, Bi O 10 to 55%, the GeO 20 to 85%, Ga O
2 3 2 2 を 0〜; 19%、 Al Oを 0〜; 15%含有し、 Bi O +GeO力 50%以上であり、 MgOを 2 3 2 2 0 ~; 19%, AlO 0 ~; 15%, BiO + GeO force 50% or more, MgO
3 2 3 2 3 2 3 2 3 2 3 2
含有する場合 Ga O + MgOが 20%以下であることを特徴とする基板用ガラス。 When it contains, Glass for substrates characterized by GaO + MgO being 20% or less.
2 3 twenty three
[2] Ga Oおよび Al Oの少なくともいずれか一方を含有する請求項 1に記載の基板 [2] The substrate according to claim 1, containing at least one of Ga 2 O and Al 2 O
2 3 2 3 2 3 2 3
用ガラス。 Glass.
[3] Bi O含有量が 15%以上、 GeO含有量が 80%以下、 Ga O +A1 O力 ¾〜30% [3] BiO content is 15% or more, GeO content is 80% or less, GaO + A1O force ¾-30%
2 3 2 2 3 2 3 である請求項 1に記載の基板用ガラス。 The glass for a substrate according to claim 1, which is 2 3 2 2 3 2 3.
[4] GeO +A1 O力 60%以上である請求項 1、 2または 3に記載の基板用ガラス。 [4] The glass for a substrate according to claim 1, 2 or 3, wherein the GeO + A1 O force is 60% or more.
2 2 3 2 2 3
[5] CeOを 0〜2%以下含有する請求項 1〜4のいずれかに記載の基板用ガラス。 [5] The glass for a substrate according to any one of [1] to [4], containing 0 to 2% or less of CeO.
2 2
[6] SiOを含有しないか、または SiOを 1 %以下含有する請求項;!〜 5のいずれかに [6] A claim that does not contain SiO or contains 1% or less of SiO;
2 2 twenty two
記載の基板用ガラス。 The glass for a board | substrate of description.
[7] B Oを含有しないか、または 1 %以下含有する請求項 1〜6のいずれかに記載の [7] The composition according to any one of claims 1 to 6, which does not contain B 2 O or contains 1% or less.
2 3 twenty three
基板用ガラス。 Glass for substrates.
[8] ガラス転移点が 400°C以上である請求項 1〜7のいずれかに記載の基板用ガラス。 8. The glass for a substrate according to any one of claims 1 to 7, wherein the glass transition point is 400 ° C or higher.
[9] 厚み lmmでの波長 5· 5 μ mの光の透過率が 50%以上、波長 7· 0 μ mの光の透 過率が 10%以下である請求項 1〜8のいずれかの基板用ガラス。 [9] The transmittance of light having a wavelength of 5.5 μm at a thickness of lmm is 50% or more, and the transmittance of light having a wavelength of 7.0 μm is 10% or less. Glass for substrates.
[10] 厚み lmmでの波長 6. 5 mの光の透過率が 4%以下である請求項 9に記載の基 板用ガラス。
10. The glass for a substrate according to claim 9, wherein the transmittance of light having a wavelength of 6.5 m at a thickness of 1 mm is 4% or less.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006340941 | 2006-12-19 | ||
JP2006-340941 | 2006-12-19 | ||
JP2007174262A JP2008174440A (en) | 2006-12-19 | 2007-07-02 | Glass for use as substrate |
JP2007-174262 | 2007-07-02 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008075546A1 true WO2008075546A1 (en) | 2008-06-26 |
Family
ID=39536180
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/073157 WO2008075546A1 (en) | 2006-12-19 | 2007-11-30 | Glass for substrate |
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WO (1) | WO2008075546A1 (en) |
Cited By (3)
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---|---|---|---|---|
CN102432174A (en) * | 2011-09-08 | 2012-05-02 | 中国科学院上海光学精密机械研究所 | Infrared window glass |
CN102674690A (en) * | 2012-05-31 | 2012-09-19 | 中国科学院上海光学精密机械研究所 | 3 mu m rare earth ion doped bismuth-germinate laser glass and preparation method thereof |
FR3002530A1 (en) * | 2013-02-28 | 2014-08-29 | Centre Nat Rech Scient | GLASSES AND VITROCERAMICS TRANSPARENT NANOSTRUCTURES IN VISIBLE AND INFRARED |
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JPH05201745A (en) * | 1990-11-28 | 1993-08-10 | Corning Inc | Glass having excellent radiation transmission properties and optical nonlinearity |
JP2005239476A (en) * | 2004-02-26 | 2005-09-08 | Sumita Optical Glass Inc | Optical glass for precision press forming |
JP2006518325A (en) * | 2003-02-20 | 2006-08-10 | ショット アクチエンゲゼルシャフト | Bismuth oxide glass and process for producing the same |
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2007
- 2007-11-30 WO PCT/JP2007/073157 patent/WO2008075546A1/en active Application Filing
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JPH05201745A (en) * | 1990-11-28 | 1993-08-10 | Corning Inc | Glass having excellent radiation transmission properties and optical nonlinearity |
JP2006518325A (en) * | 2003-02-20 | 2006-08-10 | ショット アクチエンゲゼルシャフト | Bismuth oxide glass and process for producing the same |
JP2005239476A (en) * | 2004-02-26 | 2005-09-08 | Sumita Optical Glass Inc | Optical glass for precision press forming |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102432174A (en) * | 2011-09-08 | 2012-05-02 | 中国科学院上海光学精密机械研究所 | Infrared window glass |
CN102674690A (en) * | 2012-05-31 | 2012-09-19 | 中国科学院上海光学精密机械研究所 | 3 mu m rare earth ion doped bismuth-germinate laser glass and preparation method thereof |
FR3002530A1 (en) * | 2013-02-28 | 2014-08-29 | Centre Nat Rech Scient | GLASSES AND VITROCERAMICS TRANSPARENT NANOSTRUCTURES IN VISIBLE AND INFRARED |
WO2014131881A1 (en) * | 2013-02-28 | 2014-09-04 | Centre National De La Recherche Scientifique (Cnrs) | Nanostructured lenses and vitroceramics that are transparent in visible and infrared ranges |
CN105102389A (en) * | 2013-02-28 | 2015-11-25 | 国家科学研究中心 | Nanostructured lenses and vitroceramics that are transparent in visible and infrared ranges |
JP2016508480A (en) * | 2013-02-28 | 2016-03-22 | サントル ナスィオナル ド ラ ルシェルシュ スィアンティフィク(セ.エン.エル.エス.) | Nanostructured glasses and glass-ceramics that are transparent in the visible and infrared ranges |
US9593039B2 (en) | 2013-02-28 | 2017-03-14 | Centre National De La Recherche Scientifique (Cnrs) | Nanostructured glasses and vitroceramics that are transparent in visible and infra-red ranges |
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