WO2008060148A3 - Atomizer for atomizing a doping solution and a method for treating a substrate - Google Patents

Atomizer for atomizing a doping solution and a method for treating a substrate Download PDF

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Publication number
WO2008060148A3
WO2008060148A3 PCT/NL2007/050561 NL2007050561W WO2008060148A3 WO 2008060148 A3 WO2008060148 A3 WO 2008060148A3 NL 2007050561 W NL2007050561 W NL 2007050561W WO 2008060148 A3 WO2008060148 A3 WO 2008060148A3
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
doping solution
atomizing
treating
atomizer
Prior art date
Application number
PCT/NL2007/050561
Other languages
French (fr)
Other versions
WO2008060148A2 (en
Inventor
Cornelius Hendrik Kant
Martin Dinant Bijker
Original Assignee
Otb Group Bv
Cornelius Hendrik Kant
Martin Dinant Bijker
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Otb Group Bv, Cornelius Hendrik Kant, Martin Dinant Bijker filed Critical Otb Group Bv
Publication of WO2008060148A2 publication Critical patent/WO2008060148A2/en
Publication of WO2008060148A3 publication Critical patent/WO2008060148A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/0012—Apparatus for achieving spraying before discharge from the apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electroluminescent Light Sources (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Photovoltaic Devices (AREA)

Abstract

Atomizer for atomizing a doping solution for treating a substrate therewith, wherein the atomizer comprises an atomizing element with a liquid compartment for receiving the doping solution to be atomized, wherein the atomizing element is an atomizing element functioning on the basis of an air flow. The invention further relates to a method for treating a substrate, wherein the method comprises the following steps: - providing a substrate; - atomizing a doping solution; - supplying the atomized doping solution to the substrate to treat the substrate therewith, wherein the doping solution is atomized by passing an air flow over the doping solution.
PCT/NL2007/050561 2006-11-13 2007-11-13 Atomizer for atomizing a doping solution and a method for treating a substrate WO2008060148A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL1032854 2006-11-13
NL1032854A NL1032854C2 (en) 2006-11-13 2006-11-13 Nebulizer for atomizing a dopant solution and a method for treating a substrate.

Publications (2)

Publication Number Publication Date
WO2008060148A2 WO2008060148A2 (en) 2008-05-22
WO2008060148A3 true WO2008060148A3 (en) 2008-07-24

Family

ID=38171985

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/NL2007/050561 WO2008060148A2 (en) 2006-11-13 2007-11-13 Atomizer for atomizing a doping solution and a method for treating a substrate

Country Status (3)

Country Link
NL (1) NL1032854C2 (en)
TW (1) TW200911382A (en)
WO (1) WO2008060148A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI413038B (en) * 2009-10-02 2013-10-21 Innolux Corp Method of fabricating flexible display device
US8565364B2 (en) * 2009-11-16 2013-10-22 General Electric Company Water based dispersions of boron or boron compounds for use in coating boron lined neutron detectors
WO2015019468A1 (en) 2013-08-08 2015-02-12 東芝三菱電機産業システム株式会社 Atomizer

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4116387A (en) * 1976-05-11 1978-09-26 Eastfield Corporation Mist generator
US4251033A (en) * 1978-06-12 1981-02-17 Eastfield Corporation Mist generating structure and molding apparatus therefor
US4273950A (en) * 1979-05-29 1981-06-16 Photowatt International, Inc. Solar cell and fabrication thereof using microwaves
EP0627266A2 (en) * 1993-06-04 1994-12-07 Medic-Aid Limited Nebuliser
US5527389A (en) * 1992-08-07 1996-06-18 Ase Americas, Inc. Apparatus for forming diffusion junctions in solar cell substrates
US6405944B1 (en) * 1997-08-25 2002-06-18 Sarl Prolitec Spraying attachment and appliance
US20040042969A1 (en) * 2002-08-30 2004-03-04 Atusi Sakaida Method and apparatus for generation of fine particles

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4116387A (en) * 1976-05-11 1978-09-26 Eastfield Corporation Mist generator
US4251033A (en) * 1978-06-12 1981-02-17 Eastfield Corporation Mist generating structure and molding apparatus therefor
US4273950A (en) * 1979-05-29 1981-06-16 Photowatt International, Inc. Solar cell and fabrication thereof using microwaves
US5527389A (en) * 1992-08-07 1996-06-18 Ase Americas, Inc. Apparatus for forming diffusion junctions in solar cell substrates
EP0627266A2 (en) * 1993-06-04 1994-12-07 Medic-Aid Limited Nebuliser
US6405944B1 (en) * 1997-08-25 2002-06-18 Sarl Prolitec Spraying attachment and appliance
US20040042969A1 (en) * 2002-08-30 2004-03-04 Atusi Sakaida Method and apparatus for generation of fine particles

Also Published As

Publication number Publication date
TW200911382A (en) 2009-03-16
NL1032854C2 (en) 2008-05-14
WO2008060148A2 (en) 2008-05-22

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