WO2008035324A3 - Apparatus for fluid treatment - Google Patents

Apparatus for fluid treatment Download PDF

Info

Publication number
WO2008035324A3
WO2008035324A3 PCT/IL2006/001094 IL2006001094W WO2008035324A3 WO 2008035324 A3 WO2008035324 A3 WO 2008035324A3 IL 2006001094 W IL2006001094 W IL 2006001094W WO 2008035324 A3 WO2008035324 A3 WO 2008035324A3
Authority
WO
WIPO (PCT)
Prior art keywords
fluid
pressure
contact
cushion
support surface
Prior art date
Application number
PCT/IL2006/001094
Other languages
French (fr)
Other versions
WO2008035324A2 (en
Inventor
Yuval Yassour
Original Assignee
Coreflow Scient Solutions Ltd
Yuval Yassour
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coreflow Scient Solutions Ltd, Yuval Yassour filed Critical Coreflow Scient Solutions Ltd
Priority to PCT/IL2006/001094 priority Critical patent/WO2008035324A2/en
Priority to TW095143276A priority patent/TW200816294A/en
Publication of WO2008035324A2 publication Critical patent/WO2008035324A2/en
Publication of WO2008035324A3 publication Critical patent/WO2008035324A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B08B11/02—Devices for holding articles during cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

A non-contact support apparatus for fluid treatment of a stationary or traveling object while supporting the object without contact by fluid- cushion induced forces. The apparatus comprises substantially opposite non-contact platforms having support surfaces, each support surface comprising a plurality of basic cells each cell having a plurality of pressure outlets and a plurality of fluid-evacuation channels. Each of the pressure outlets is fluidically connected through a flow restrictor to a high-pressure fluid supply, the pressure outlets providing pressurized fluid for generating pressure induced forces, maintaining a fluid-cushion between the object and the support surface of the platform The flow restrictor characteristically exhibits fluidic return spring behavior. Each of the plurality of fluid- evacuation channels has an inlet and outlet, for locally balancing mass flow for a plurality of basic cells.
PCT/IL2006/001094 2006-09-19 2006-09-19 Apparatus for fluid treatment WO2008035324A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
PCT/IL2006/001094 WO2008035324A2 (en) 2006-09-19 2006-09-19 Apparatus for fluid treatment
TW095143276A TW200816294A (en) 2006-09-19 2006-11-22 Apparatus for fluid treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/IL2006/001094 WO2008035324A2 (en) 2006-09-19 2006-09-19 Apparatus for fluid treatment

Publications (2)

Publication Number Publication Date
WO2008035324A2 WO2008035324A2 (en) 2008-03-27
WO2008035324A3 true WO2008035324A3 (en) 2009-04-09

Family

ID=39200948

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IL2006/001094 WO2008035324A2 (en) 2006-09-19 2006-09-19 Apparatus for fluid treatment

Country Status (2)

Country Link
TW (1) TW200816294A (en)
WO (1) WO2008035324A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010024263A1 (en) * 2010-06-18 2011-12-22 Festo Ag & Co. Kg Air storage facility
US10513011B2 (en) * 2017-11-08 2019-12-24 Core Flow Ltd. Layered noncontact support platform
CN111270468B (en) * 2020-03-18 2020-10-27 威马汽车科技集团有限公司 Automobile cushion finishing machine

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3251139A (en) * 1965-03-10 1966-05-17 Us Dynamics Mfg Corp Dynamic insulating systems
US3599851A (en) * 1970-05-08 1971-08-17 Buckbee Mears Co Hydrodynamic turnover mechanisms
US5317778A (en) * 1991-07-31 1994-06-07 Shin-Etsu Handotai Co., Ltd. Automatic cleaning apparatus for wafers
US20010038783A1 (en) * 2000-04-17 2001-11-08 Hitachi Kokusai Electric Inc. Dual loading port semiconductor processing equipment
US20030102015A1 (en) * 1998-01-09 2003-06-05 Halbmaier David L. Wafer container washing apparatus
US20050126605A1 (en) * 2003-12-15 2005-06-16 Coreflow Scientific Solutions Ltd. Apparatus and method for cleaning surfaces
US20050195381A1 (en) * 2004-03-04 2005-09-08 Asml Netherlands B.V. Moveable object carrier, lithographic apparatus comprising the moveable object carrier and device manufacturing method
US20060050262A1 (en) * 2004-09-09 2006-03-09 Nikon Corporation Non-contact pneumatic transfer for stages with small motion
US20060054774A1 (en) * 2001-12-27 2006-03-16 Yuval Yassour High-performance non-contact support platforms

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3251139A (en) * 1965-03-10 1966-05-17 Us Dynamics Mfg Corp Dynamic insulating systems
US3599851A (en) * 1970-05-08 1971-08-17 Buckbee Mears Co Hydrodynamic turnover mechanisms
US5317778A (en) * 1991-07-31 1994-06-07 Shin-Etsu Handotai Co., Ltd. Automatic cleaning apparatus for wafers
US20030102015A1 (en) * 1998-01-09 2003-06-05 Halbmaier David L. Wafer container washing apparatus
US20010038783A1 (en) * 2000-04-17 2001-11-08 Hitachi Kokusai Electric Inc. Dual loading port semiconductor processing equipment
US20060054774A1 (en) * 2001-12-27 2006-03-16 Yuval Yassour High-performance non-contact support platforms
US20050126605A1 (en) * 2003-12-15 2005-06-16 Coreflow Scientific Solutions Ltd. Apparatus and method for cleaning surfaces
US20050195381A1 (en) * 2004-03-04 2005-09-08 Asml Netherlands B.V. Moveable object carrier, lithographic apparatus comprising the moveable object carrier and device manufacturing method
US20060050262A1 (en) * 2004-09-09 2006-03-09 Nikon Corporation Non-contact pneumatic transfer for stages with small motion

Also Published As

Publication number Publication date
WO2008035324A2 (en) 2008-03-27
TW200816294A (en) 2008-04-01

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