WO2008034478A1 - Substrats munis de caractéristiques de sécurité et procédé pour leur fabrication - Google Patents

Substrats munis de caractéristiques de sécurité et procédé pour leur fabrication Download PDF

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Publication number
WO2008034478A1
WO2008034478A1 PCT/EP2007/006285 EP2007006285W WO2008034478A1 WO 2008034478 A1 WO2008034478 A1 WO 2008034478A1 EP 2007006285 W EP2007006285 W EP 2007006285W WO 2008034478 A1 WO2008034478 A1 WO 2008034478A1
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WO
WIPO (PCT)
Prior art keywords
layer
substrate
metal
evaporation
semitransparent
Prior art date
Application number
PCT/EP2007/006285
Other languages
German (de)
English (en)
Inventor
Wolfgang Lohwasser
André Wisard
Original Assignee
Alcan Technology & Management Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcan Technology & Management Ltd. filed Critical Alcan Technology & Management Ltd.
Priority to EP07786087A priority Critical patent/EP2067063A1/fr
Publication of WO2008034478A1 publication Critical patent/WO2008034478A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/373—Metallic materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
    • B42D25/29—Securities; Bank notes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0808—Mirrors having a single reflecting layer
    • B42D2033/10—
    • B42D2033/30—
    • B42D2035/24—

Definitions

  • the present invention relates to substrates which are equipped with optically perceptible security features and to methods for producing substrates equipped with optically perceptible security features and to the use of the substrates.
  • EP 1 504 923 it is known from EP 1 504 923, for example, to provide substrates such as plastic films with security features.
  • a PET substrate is exposed to a semitransparent adsorber layer, a dielectric layer and a reflective metal layer. From the coated substrates, portions of securities, such as banknotes, may be generated.
  • a process for the production of a Fabry-Perot filter for use on decorative films has become known.
  • a thin coating of three layers deposited on a substrate is described.
  • Deposited on the substrate is a first opaque reflective layer of a base material, lying thereon an intermediate layer of the base material with another material and then thereon another partially transparent reflective layer of the base material.
  • Object of the present invention is to overcome the disadvantages mentioned and to propose substrates with security features with new layer sequences and an improved manufacturing process for such security features.
  • the layer sequence a) comprises a semitransparent layer of chromium which, together with the substrate, has an optical transparency of 30 to 55% in the case of a light wave.
  • the semitransparent layer a) consists of chromium, occasionally with process-typical impurities.
  • x is the number 2 and y is the number 3.
  • the layer c) is, for example, a reflective layer comprising aluminum, titanium, vanadium, chromium, iron, cobalt, nickel, copper, rhodium, palladium, silver, tin, zinc, tungsten, platinum or gold or mixtures or alloys thereof, or stainless steel alloys contains or consists of.
  • Aluminum is preferred.
  • the layers arranged on the substrate a) the semitransparent layer of the abovementioned metals can have a thickness of 2 to 50 nm (nanometers), b) the layer of Al x O y , can have a thickness of 20 to 1000 nm, and c) the reflective layer of a metal may have a thickness of 20 to 200 nm.
  • Optical transmission is understood to mean the transmittance of an incident radiation flux, in the present case light waves of the wavelength of 550 nm, which completely penetrates the substrate and the semitransparent layer.
  • optical density is meant the perceptual logarithmically formulated opacity and thus a measure of the attenuation or blackening of a radiation, in the present case light of a wavelength of 550 nm.
  • the layer sequence a) is the semi-transparent layer
  • b is the layer of Al x Oy
  • the substrate is advantageously a film of a plastic, which is in particular transparent or at least translucent.
  • the substrate may also be only partially transparent or only partially translucent. However, the desired optical effect only becomes effective in the transparent or translucent areas.
  • the substrate may contain one or more layers.
  • it can be a polyester film, for example a polyethylene terephthalate film (PET), a polyamide film, eg an oriented polyamide film (OPA), a polyolefin film, eg an oriented polypropylene film (OPP) or a film or layer containing an acid-denatured polyolefin.
  • PET polyethylene terephthalate film
  • OPA oriented polyamide film
  • OPP polyolefin film
  • the base film may be two or more mutually adhesive-laminated, extrusion-laminated and / or hot calendered layers, resp.
  • Adhesive-laminated layers or films can be processed with aqueous, solvent-based and / or solvent-free adhesives.
  • the thickness of the substrate may be from 12 to 500 .mu.m, suitably from 15 to 250 .mu.m. Typical thicknesses of individual films are 12, 15, 20, 23 and 25 ⁇ m.
  • the optional layer d) may be applied to the reflective layer (layer c) as at least one further layer. It may be a paint, a plastic layer, a plastic film, a plastic film composite, a metal foil, a paper, etc., or a combination of two or more of the materials. Material examples of plastic layers, plastic films and plastic film composites can be found in the material lists given for the substrates. The materials can be transparent, translucent or opaque.
  • the lacquer may be an alkyd resin, epoxy resin, acrylic resin, polyester, polyurethane lacquer, a cellulosic lacquer, etc.
  • the plastic layers may be extruded or laminated layers. Plastic films and composites as well as metal foils can be laminated or glued on.
  • metal foils iron and non-ferrous metal foils such as foils of iron, steel, nickel, copper, etc. may be used.
  • the metal foils have a thickness of, for example, 12 to 200 .mu.m, suitably 20 to 200 .mu.m, preferably 25 to 75 .mu.m and in particular 40 to 50 .mu.m. It is also possible to use composites of the cited plastics and the metal foils mentioned. Furthermore, papers, kraft papers or coated papers or combinations of papers with plastics and / or metal foils can be used.
  • the said layers of metal and Al x Oy can be applied by physical deposition methods.
  • physical deposition methods are vacuum evaporation methods and sputtering.
  • the substrate in a vacuum chamber in a vacuum, as a single sheets and particularly useful of unwound from a roll, roll or coil, exposed to an atmosphere of substantially vaporized or chipped metal.
  • the metal-containing vapor precipitates in a 0.1 to 1000 nm thick layer on at least one side of the substrate.
  • the substrate coated with the metal can be rewound onto an opposite winding, roll or coil.
  • the semitransparent layer a) is made of Ti, V, Cr, Fe, Co, Ni, Cu, Rh, Pa, Ag, Sn, Zn, W, Pt or Au or alloys thereof or mixtures thereof or stainless steel alloys.
  • Cr and Cu are alone or in a mixture of the two metals and most preferably Cr.
  • the starting materials are selected from substances containing or consisting of the above-mentioned element (s).
  • the metal is placed in a vacuum chamber and evaporated by means of electron beam gun which is directed onto the target material, or sputtered by means of a sputtering cathode.
  • the semitransparent layer a) preferably consists of chromium.
  • the chromium is preferably evaporated in vacuo by means of an electron beam gun and then deposited on the substrate as the semitransparent layer.
  • the target material is for example a plate of the metal to be evaporated.
  • a mixture of metals is to be deposited, a mixture of the corresponding metals or multiple metal plates of the corresponding metals may be vaporized or sputtered.
  • the vaporized or sputtered metal deposits on the surface of the substrate in the specified thickness.
  • thicknesses of 2 to 20 nm are deposited.
  • the thickness of the metal deposit can be u.a. about the passage speed of the metal foil and the strength of the electron beam, resp. the power of the sputtering cathode, control.
  • the layer of metal c) may, for example, be composed of Al, Ti, V, Cr, Fe, Co, Ni, Cu, Rh, Pa, Ag, Sn, Zn, W, Pt or Au or alloys thereof or of mixtures thereof. see it.
  • AI preferably, AI.
  • the starting materials are selected from substances containing or consisting of the above-mentioned elements.
  • the metal is placed in a vacuum chamber and vaporized by means of electron beam gun which is directed onto the target material, or preferably sputtered by means of a sputtering cathode.
  • the target material is for example a plate of the metal to be evaporated.
  • a mixture of the corresponding metals or multiple metal plates of the corresponding metals may be vaporized or sputtered.
  • the vaporized or sputtered metal deposits on the surface of the substrate in the specified thickness.
  • thicknesses of 20 to 200 nm are deposited.
  • the thickness of the metal deposition can be, inter alia, on the flow rate of the metal foil and by the strength of the electron beam, respectively. the power of the sputtering cathode, control.
  • the layer of Al x O y b) can be obtained or produced, for example, from aluminum, from aluminum alloys or from aluminum-containing compounds.
  • oxygen-containing compounds such as Al 2 O 3
  • oxygen or an oxygen-containing gas is introduced into the vacuum chamber, in particular directly into the evaporation and deposition area of the aluminum.
  • the vapor phase elements or compounds may react to Al x O y and strike down on the surface of the layer a) already on the substrate.
  • the previously evaporated aluminum can precipitate on the substrate and form the Al x O y immediately afterwards with the supplied oxygen molecules or ions.
  • the layer of Al x O y can be in thicknesses of 20 be deposited to 1000 nm.
  • the layer is advantageously transparent and the thickness applied may also depend on the wavelength of the light to be reflected. Depending on the wavelength of the incident and to be reflected light takes place in layer b) a gain or attenuation of the passage of light. Particularly preferred is a layer thickness of the layer b) of 300 to 800 nm, with a layer thickness of 450 to 550 nm is particularly preferred. Also advantageous is a thickness of the layer b), the ⁇ , ⁇ / 2 or ⁇ / 4 or an integer multiple thereof, wherein ⁇ means the wavelength of the light to be reflected.
  • the layer structure on the substrate equipped according to the invention leads to color effects due to the incident and partially reflected light.
  • layer thicknesses of Al x O y on the order of 20 to 1000 nm, and in particular in a range of 500 nm, are desired.
  • a metal other than aluminum is used as a semitransparent metal layer, the achievable color palette can be extended.
  • the substrate equipped according to the invention additionally has a perceptible pattern.
  • the pattern may be any raster, such as a dot or line raster, any motif or motif sequence, characters, a font, or a letter or number sequence, etc.
  • the pattern represents on the side of the substrate with the layer sequence a) the semitransparent layer, b) the layer of Al x O y, and c) the reflective layer, partially etched through the layers a), b) and c).
  • the layer sequence a) the semitransparent layer On the side of the substrate on which the layer sequence a) the semitransparent layer, b) the layer of Al x O x , and c) the reflective layer is deposited, and may partially the layer sequence a), b) and c) in the form of a pattern are etched away.
  • the pattern can be produced, for example, by coating, for example printing, on the free side of the layer c) with the negative of the pattern coated on the free side of the layer c) with the negative of the pattern on the free side of the layer c), and then the Substrate is treated with an etching solution such that the unprotected by the paint sites, the layers a), b) and c) are etched away and there only the substrate remains at the protected areas by the paint layer sequence a), b) and c ) remains intact.
  • a sensitive lacquer can be applied over the entire surface of the layer c). For example, if the resist is light-sensitive, the substrate may be exposed to the pattern and the unexposed portions of the resist removed.
  • the surface can be etched, wherein the no longer protected by the paint parts of the layers a, b) and c) are etched away.
  • the etching may be acidic or alkaline, with an acid etching solution being preferred.
  • the pattern may also be generated by the application of controlled energetic radiation, such as a laser beam, and the partial removal of the layers a), b) and c) by the intended pattern with the energetic radiation.
  • the semitransparent metal layer were exposed to the outside atmosphere, there would be a risk of a chemical reaction, such as oxidation. As a result, the color effects can diminish or disappear.
  • the double-sided coating prevents this.
  • the outer, ie free, side of the reflective layer c) applied to the substrate, which is made of a metal can be protected from external influences by the optionally to be applied layer d) and also the mechanical strength can be increased.
  • the thickness of the deposits from the vapor phase can be, inter alia, on the flow rate of the substrate and by the strength of the electron beam, resp. the power of the sputtering cathode, control.
  • Particularly expedient proves to be a plasma pretreatment with, for example, argon (Ar), nitrogen (N 2 ), NH 3 , NO x (nitrogen oxides) and preferably by means of oxygen plasma, the substrate in the vacuum system.
  • the pre-treatment can be carried out directly in the vacuum system before the first coating and occasionally before each coating treatment.
  • the plasma pretreatment for a particularly good layer adhesion of the layers with each other and the layer on the substrate.
  • the semitransparent layer of metal and the reflective layer of metal are preferably produced by sputtering and the Al x Oy by electron beam evaporation.
  • Particularly preferred is a plasma pretreatment by means of oxygen plasma. More preferably, the semitransparent layer of chromium and the reflective layer of aluminum are produced by sputtering.
  • the respective vapor is deposited on only the free side of the substrate which does not touch the coating roller.
  • the present invention also relates to a method for producing substrates equipped with optically perceptible security features.
  • a substrate is exposed to the coating treatments in at least one vacuum chamber under vacuum conditions at least two evaporation devices, the substrate by means of a first evaporation device with a) a semitransparent layer of titanium, vanadium, chromium, iron, cobalt, nickel, copper, rhodium, palladium, silver , Tin, zinc, tungsten, platinum or gold or alloys thereof or of mixtures thereof, ie coated, by means of a second evaporation b) an AI x Oy - coated layer, ie coated, and by a further evaporation method with c), a reflective layer of a metal, applied, ie coated, is.
  • the substrate is subjected to the coating treatments of two evaporators in a vacuum chamber under vacuum conditions, the substrate being a first evaporator having a) the semitransparent layer of titanium, vanadium, chromium, iron, cobalt, nickel, copper, rhodium, palladium , Silver, tin, zinc, tungsten, platinum or gold or alloys thereof or mixtures thereof, acted upon by a second evaporation device with b) the Al x Oy - layer and in a further vacuum chamber under vacuum conditions by a further evaporation process with the other Layer c), the reflective layer of a metal, is applied.
  • the substrate being a first evaporator having a) the semitransparent layer of titanium, vanadium, chromium, iron, cobalt, nickel, copper, rhodium, palladium , Silver, tin, zinc, tungsten, platinum or gold or alloys thereof or mixtures thereof, acted upon by a second evaporation device with
  • the substrate is subjected to the coating treatments of two evaporation devices in a vacuum chamber under vacuum conditions, the substrate being heated by means of a first evaporation device comprising a), the semitransparent layer of titanium, vanadium, chromium, iron, cobalt, nickel, copper, Rhodium, palladium, silver,
  • the substrate acted upon by the layer a) and the layer b) in the further evaporation process in the vacuum chamber under vacuum conditions in at least one of the evaporation devices with the layer c), the reflective layer of a metal is applied.
  • a particularly preferred method is characterized in that the substrate is subjected to the coating treatments in at least one vacuum chamber under vacuum. At least two evaporation devices are exposed to the conditions in which the substrate is subjected to a) a semitransparent layer of chromium in a first evaporation device by evaporation of chromium by electron beam, so that the optical transparency of the semitransparent layer, measured or determined together with the substrate, is maintained in a second evaporation device by evaporation of aluminum by means of electron beam with the addition of oxygen gas with b) an Al x Oy layer and by another evaporation method, by means of electron beam or thermally, with aluminum, ruthenium or silver up to an optical density of greater than 0.7 at a wavelength of 550 nm with c) a reflective layer is applied.
  • the substrate may also be acted upon on one side by the a) semi-transparent layer, b) the Al x O y layer, and c) the reflective layer, and finally on the layer c) by a layer d), preferably a plastic layer , a plastic film, a plastic film composite, a metal foil, a paper or a combination of two or more of the materials, for example by laminating, molding, gluing, etc., are applied.
  • a layer d preferably a plastic layer , a plastic film, a plastic film composite, a metal foil, a paper or a combination of two or more of the materials, for example by laminating, molding, gluing, etc.
  • present, according to the invention equipped, resp. coated substrates are, for example, as indications of origin, tamper evidence, tamper evident, markings, etc.
  • the equipped substrates can packaging, packaging materials, seals, banderoles, closures, securities, banknotes, identity cards, lottery tickets, access cards, tickets, prepaid cards, driving and air tickets, etc Processed or can be attached to such objects. Therefore, the present invention also relates to the use of the substrates for the stated purposes, an application for banknotes being preferred.
  • Figure 1 shows a section through a possible embodiment of the equipped with visually perceptible security features substrate.
  • FIG. 2 shows a section through a variant of a device for producing the substrates equipped according to the invention.
  • the substrate 6 shown in FIG. 1 has the following superimposed layers in section:
  • the equipped with the security features substrate (6) contains a substrate (1), such as a transparent or translucent plastic layer, respectively.
  • a substrate (1) such as a transparent or translucent plastic layer, respectively.
  • - Foil. A semitransparent layer a) of a metal (2) from the series titan, vanadium, chromium, iron, cobalt, nickel, copper, rhodium, palladium, silver, tin, zinc, tungsten, platinum or gold or alloys thereof or aus Mixtures thereof, a layer b) of Al x O y (3), a reflective metal layer c) (4) and occasionally a further layer d) (5).
  • the further layer (5) can represent a functional layer which can influence the properties of the overlying layers, for example with regard to strength, bendability, or acts as a separating or adhering intermediate layer to underlying further materials.
  • FIG. 2 shows an example of a unit for producing the substrates according to the invention. It is an evacuable space, the vacuum chamber (10). Within the vacuum chamber (10), a supply roll (12) or coil with the substrate (1 1) is arranged. The substrate (11) is continuously unwound and fed to a chill roll (13). At the cooling roller (13), the plasma treatment by means of the corresponding device (14). The plasma-treated substrate (11) is then, still on the circumference of the cooling roller 13, which is also the coating roller, located, a sputtering treatment by means of a sputtering device (15) for Coating with the semitransparent layer a) supplied.
  • a sputtering treatment by means of a sputtering device (15) for Coating with the semitransparent layer a) supplied.
  • an electron beam gun is advantageously used for evaporation.
  • the once-coated substrate (11) leaves the chamber part (16) and is fed to a chamber part (17) separated by chamber walls.
  • the substrate (11) also runs in the chamber part (17) via a cooling roller (18), resp. Coating roll.
  • an electron beam crown (15) whose beam is directed to a supply of target material (19) and thereby the target material (19) evaporates.
  • the target material is usually as ramming mass, debris or as a metal plate on a displacement device.
  • the electron beam scans, ie it oscillates over the target material and vaporizes it in layers.
  • the vaporized material strikes the substrate (11), which is acted upon by the Al x 0y layer.
  • the target material (19) may be, for example, Al 2 O 3 or a mixture of aluminum and an oxygen carrier, such as a solid compound.
  • the target material (19) may also be aluminum. In the latter case, oxygen must be supplied. This can be done by a gas supply (20). By the gas supply (20) under, over or stoichiometric amounts of oxygen in the form of oxygen-containing gases or oxygen in the chamber part (17) are passed. Expediently, the gas supply (20) is located in the region of the cloud of vapor between the target material (19) and the cooling roller (18). The now doubly coated substrate (11) now leaves the chamber part (17) to finally be wound up on the take-up roll (21).
  • the vacuum chamber (10) is vented and the take-up roll (21) can be removed from the vacuum chamber (10) and placed in the same vacuum chamber at the location of the supply roll (12) and, after evacuation and, subsequently, sputtering the now twice coated substrate (11) with the other, the reflective layer c), are applied. Thereafter, the vacuum chamber (10) vented and that with the security features coated substrate (11) are removed.
  • the substrate can also be removed for coating with the reflective layer c) from a metal of the first vacuum chamber and fed to another vacuum chamber and coated there.
  • the substrate (11) may be unwound from the supply roll (12) and coated with the layers a) and b).
  • the twice-coated substrate (11) is wound on the take-up roll (21) to then reverse the running direction of the twice-coated substrate (11).
  • an Al x O y coating can take place in the chamber part (17), wherein the layer b) is further reinforced.
  • the metal to be vaporized for the layer a) has been replaced by another metal, namely that of the layer c), or a sputtering device arranged in parallel has been activated and the reflecting one becomes Layer of metal c) in the same manner as layer a), but usually in a considerable greater thickness on the layer b), the Al x O y , deposited and then the substrate (11) on the supply roll (12) is wound up again.
  • the vacuum chamber (10) is vented and the coated with the security features substrate (11).

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Business, Economics & Management (AREA)
  • Accounting & Taxation (AREA)
  • Finance (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laminated Bodies (AREA)

Abstract

Substrats munis de caractéristiques de sécurité observables de manière optique, contenant une pellicule de matière synthétique sur laquelle sont déposées une couche semi-transparente en métal, au moins une couche diélectrique et une couche réfléchissante en métal. Les couches sont déposées successivement les unes sur les autres sur un côté du substrat, grâce à un procédé de métallisation sous vide en la suite de couches : a) couche semi-transparente en titane, vanadium, chrome, fer, cobalt, nickel, cuivre, rhodium, palladium, argent, étain, zinc, tungstène, platine ou or, ou à base d'alliages ou de mélanges de ceux-ci, b) une couche en AlxOy, où x:y = 0,5 à 1, et c) une couche réfléchissante en un métal. Les substrats conviennent particulièrement comme indicateurs d'origine, indicateurs d'originalité, protection contre les contrefaçons, marquages, par exemple en tant que titres, billets de banque, emballages, etc., ou bien dans ou sur ces derniers.
PCT/EP2007/006285 2006-09-22 2007-07-16 Substrats munis de caractéristiques de sécurité et procédé pour leur fabrication WO2008034478A1 (fr)

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CH01516/06 2006-09-22
CH15162006 2006-09-22
CH15762006 2006-10-03
CH01576/06 2006-10-03
CH00119/07 2007-01-25
CH1192007 2007-01-25

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2246824A3 (fr) * 2009-04-28 2011-07-27 OOO "Novye Energeticheskie Tehnologii" Elément de sécurité pour le contrôle d'authenticité d'un objet de sécurité et procédé de contrôle d'authenticité de celui-ci
CN102501500A (zh) * 2011-12-09 2012-06-20 中钞特种防伪科技有限公司 一种光学防伪元件
CN110597422A (zh) * 2019-09-02 2019-12-20 海宁钟江智能科技有限公司 铝金属网格电容触控薄膜及其制作方法
AT523060B1 (de) * 2020-05-12 2021-05-15 Hueck Folien Gmbh Sicherheitselement

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4779898A (en) * 1986-11-21 1988-10-25 Optical Coating Laboratory, Inc. Thin film optically variable article and method having gold to green color shift for currency authentication
US5059245A (en) * 1979-12-28 1991-10-22 Flex Products, Inc. Ink incorporating optically variable thin film flakes
US5437931A (en) * 1993-10-20 1995-08-01 Industrial Technology Research Institute Optically variable multilayer film and optically variable pigment obtained therefrom
EP0879899A1 (fr) * 1997-05-21 1998-11-25 Alusuisse Technology & Management AG Matériau d'emballage
DE19834734A1 (de) * 1998-07-31 2000-02-10 Fraunhofer Ges Forschung Folienverbund
WO2005085780A1 (fr) * 2004-03-01 2005-09-15 Applied Materials Gmbh & Co. Kg Substrat pourvu d'un filtre fabry-perot et procede pour appliquer ce filtre sur ledit substrat

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5059245A (en) * 1979-12-28 1991-10-22 Flex Products, Inc. Ink incorporating optically variable thin film flakes
US4779898A (en) * 1986-11-21 1988-10-25 Optical Coating Laboratory, Inc. Thin film optically variable article and method having gold to green color shift for currency authentication
US5437931A (en) * 1993-10-20 1995-08-01 Industrial Technology Research Institute Optically variable multilayer film and optically variable pigment obtained therefrom
EP0879899A1 (fr) * 1997-05-21 1998-11-25 Alusuisse Technology & Management AG Matériau d'emballage
DE19834734A1 (de) * 1998-07-31 2000-02-10 Fraunhofer Ges Forschung Folienverbund
WO2005085780A1 (fr) * 2004-03-01 2005-09-15 Applied Materials Gmbh & Co. Kg Substrat pourvu d'un filtre fabry-perot et procede pour appliquer ce filtre sur ledit substrat

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2246824A3 (fr) * 2009-04-28 2011-07-27 OOO "Novye Energeticheskie Tehnologii" Elément de sécurité pour le contrôle d'authenticité d'un objet de sécurité et procédé de contrôle d'authenticité de celui-ci
CN102501500A (zh) * 2011-12-09 2012-06-20 中钞特种防伪科技有限公司 一种光学防伪元件
CN102501500B (zh) * 2011-12-09 2014-09-24 中钞特种防伪科技有限公司 一种光学防伪元件
CN110597422A (zh) * 2019-09-02 2019-12-20 海宁钟江智能科技有限公司 铝金属网格电容触控薄膜及其制作方法
CN110597422B (zh) * 2019-09-02 2023-01-06 海宁光圣晶体材料有限公司 铝金属网格电容触控薄膜及其制作方法
AT523060B1 (de) * 2020-05-12 2021-05-15 Hueck Folien Gmbh Sicherheitselement
AT523060A4 (de) * 2020-05-12 2021-05-15 Hueck Folien Gmbh Sicherheitselement

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