WO2008034092A3 - System and method for detecting non-cathode arcing in a plasma generation apparatus - Google Patents

System and method for detecting non-cathode arcing in a plasma generation apparatus Download PDF

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Publication number
WO2008034092A3
WO2008034092A3 PCT/US2007/078548 US2007078548W WO2008034092A3 WO 2008034092 A3 WO2008034092 A3 WO 2008034092A3 US 2007078548 W US2007078548 W US 2007078548W WO 2008034092 A3 WO2008034092 A3 WO 2008034092A3
Authority
WO
WIPO (PCT)
Prior art keywords
generation apparatus
plasma generation
cathode
arcing
detecting non
Prior art date
Application number
PCT/US2007/078548
Other languages
French (fr)
Other versions
WO2008034092A2 (en
WO2008034092A8 (en
Inventor
Alan F Krauss
Original Assignee
Schneider Automation
Alan F Krauss
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schneider Automation, Alan F Krauss filed Critical Schneider Automation
Publication of WO2008034092A2 publication Critical patent/WO2008034092A2/en
Publication of WO2008034092A3 publication Critical patent/WO2008034092A3/en
Publication of WO2008034092A8 publication Critical patent/WO2008034092A8/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H01J2237/0206—Extinguishing, preventing or controlling unwanted discharges

Abstract

A system and method for detecting the potential of non-cathode arcing in a plasma generation apparatus, such as a physical vapor deposition chamber. The system and method involve computing a statistical parameter of cathode-arcing event data in the chamber and performing a pattern recognition technique to a moving average of the statistical parameter.
PCT/US2007/078548 2006-09-15 2007-09-14 System and method for detecting non-cathode arcing in a plasma generation apparatus WO2008034092A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US84485206P 2006-09-15 2006-09-15
US60/844,852 2006-09-15

Publications (3)

Publication Number Publication Date
WO2008034092A2 WO2008034092A2 (en) 2008-03-20
WO2008034092A3 true WO2008034092A3 (en) 2008-05-08
WO2008034092A8 WO2008034092A8 (en) 2008-08-14

Family

ID=39092582

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/078548 WO2008034092A2 (en) 2006-09-15 2007-09-14 System and method for detecting non-cathode arcing in a plasma generation apparatus

Country Status (2)

Country Link
TW (1) TW200835923A (en)
WO (1) WO2008034092A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7981257B2 (en) 2002-04-12 2011-07-19 Schneider Electric USA, Inc. Current-based method and apparatus for detecting and classifying arcs
US7988833B2 (en) 2002-04-12 2011-08-02 Schneider Electric USA, Inc. System and method for detecting non-cathode arcing in a plasma generation apparatus
US20090308734A1 (en) * 2008-06-17 2009-12-17 Schneider Automation Inc. Apparatus and Method for Wafer Level Arc Detection
CN102473660B (en) 2009-06-30 2015-03-18 朗姆研究公司 Automatic fault detection and classification in a plasma processing system and methods thereof
TWI588498B (en) * 2015-11-18 2017-06-21 致茂電子股份有限公司 Electric motor winding defect detecter and detecting method thereof
CN106802393B (en) * 2015-11-26 2019-11-05 致茂电子(苏州)有限公司 The detection device and its detection method of motor coil defect
GB2546553B (en) 2016-01-25 2020-08-26 Ge Aviat Systems Ltd Circuit and method for detecting arc faults
WO2019226462A1 (en) * 2018-05-25 2019-11-28 Lam Research Corporation Heater fault determination during processing
US10699631B2 (en) * 2018-09-12 2020-06-30 Prilit Optronics, Inc. LED sensing system and display panel sensing system

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5611899A (en) * 1994-11-19 1997-03-18 Leybold Aktiengesellschaft Device for suppressing flashovers in cathode sputtering installations
WO1999014699A1 (en) * 1997-09-17 1999-03-25 Tokyo Electron Limited System and method for monitoring and controlling gas plasma processes
WO1999014394A1 (en) * 1997-09-17 1999-03-25 Tokyo Electron Limited Device and method for detecting and preventing arcing in rf plasma systems
US5993615A (en) * 1997-06-19 1999-11-30 International Business Machines Corporation Method and apparatus for detecting arcs
WO2003088445A2 (en) * 2002-04-12 2003-10-23 Schneider Automation Inc. Apparatus and method for arc detection
WO2004001094A1 (en) * 2002-06-19 2003-12-31 Tosoh Smd, Inc. Sputter target monitoring system
WO2004003968A2 (en) * 2002-06-28 2004-01-08 Tokyo Electron Limited Method and system for arc suppression in a plasma processing system

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5611899A (en) * 1994-11-19 1997-03-18 Leybold Aktiengesellschaft Device for suppressing flashovers in cathode sputtering installations
US5993615A (en) * 1997-06-19 1999-11-30 International Business Machines Corporation Method and apparatus for detecting arcs
WO1999014699A1 (en) * 1997-09-17 1999-03-25 Tokyo Electron Limited System and method for monitoring and controlling gas plasma processes
WO1999014394A1 (en) * 1997-09-17 1999-03-25 Tokyo Electron Limited Device and method for detecting and preventing arcing in rf plasma systems
WO2003088445A2 (en) * 2002-04-12 2003-10-23 Schneider Automation Inc. Apparatus and method for arc detection
WO2004001094A1 (en) * 2002-06-19 2003-12-31 Tosoh Smd, Inc. Sputter target monitoring system
WO2004003968A2 (en) * 2002-06-28 2004-01-08 Tokyo Electron Limited Method and system for arc suppression in a plasma processing system

Also Published As

Publication number Publication date
WO2008034092A2 (en) 2008-03-20
TW200835923A (en) 2008-09-01
WO2008034092A8 (en) 2008-08-14

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