WO2008024721A3 - Ethylene terephthalate polymer retaining ring for a chemical mechanical polishing head - Google Patents

Ethylene terephthalate polymer retaining ring for a chemical mechanical polishing head Download PDF

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Publication number
WO2008024721A3
WO2008024721A3 PCT/US2007/076331 US2007076331W WO2008024721A3 WO 2008024721 A3 WO2008024721 A3 WO 2008024721A3 US 2007076331 W US2007076331 W US 2007076331W WO 2008024721 A3 WO2008024721 A3 WO 2008024721A3
Authority
WO
WIPO (PCT)
Prior art keywords
retaining ring
mechanical polishing
chemical mechanical
ethylene terephthalate
polishing head
Prior art date
Application number
PCT/US2007/076331
Other languages
French (fr)
Other versions
WO2008024721A2 (en
Inventor
Gerard Stephen Moloney
Peter Lao
Original Assignee
Ebara Tech Inc
Gerard Stephen Moloney
Peter Lao
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Tech Inc, Gerard Stephen Moloney, Peter Lao filed Critical Ebara Tech Inc
Publication of WO2008024721A2 publication Critical patent/WO2008024721A2/en
Publication of WO2008024721A3 publication Critical patent/WO2008024721A3/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/27Work carriers
    • B24B37/30Work carriers for single side lapping of plane surfaces
    • B24B37/32Retaining rings

Abstract

Embodiments of a retaining ring for use with a chemical mechanical polishing process with a body including a polyethylene terephthalate polymer or polymer including ethylene terephthalate monomers are disclosed.
PCT/US2007/076331 2006-08-22 2007-08-20 Ethylene terephthalate polymer retaining ring for a chemical mechanical polishing head WO2008024721A2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US83955206P 2006-08-22 2006-08-22
US60/839,552 2006-08-22
US11/542,303 US20080051011A1 (en) 2006-08-22 2006-10-02 Ethylene terephthalate polymer retaining ring for a chemical mechanical polishing head
US11/542,303 2006-10-02

Publications (2)

Publication Number Publication Date
WO2008024721A2 WO2008024721A2 (en) 2008-02-28
WO2008024721A3 true WO2008024721A3 (en) 2008-07-24

Family

ID=39107569

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/076331 WO2008024721A2 (en) 2006-08-22 2007-08-20 Ethylene terephthalate polymer retaining ring for a chemical mechanical polishing head

Country Status (3)

Country Link
US (1) US20080051011A1 (en)
TW (1) TW200815155A (en)
WO (1) WO2008024721A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8740673B2 (en) * 2010-10-05 2014-06-03 Strasbaugh CMP retaining ring with soft retaining ring insert
US9050700B2 (en) 2012-01-27 2015-06-09 Applied Materials, Inc. Methods and apparatus for an improved polishing head retaining ring
US9597771B2 (en) * 2013-12-19 2017-03-21 Taiwan Semiconductor Manufacturing Co., Ltd. Carrier head having retainer ring, polishing system including the carrier head and method of using the polishing system

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6899610B2 (en) * 2001-06-01 2005-05-31 Raytech Innovative Solutions, Inc. Retaining ring with wear pad for use in chemical mechanical planarization
US7086939B2 (en) * 2004-03-19 2006-08-08 Saint-Gobain Performance Plastics Corporation Chemical mechanical polishing retaining ring with integral polymer backing

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6899610B2 (en) * 2001-06-01 2005-05-31 Raytech Innovative Solutions, Inc. Retaining ring with wear pad for use in chemical mechanical planarization
US7086939B2 (en) * 2004-03-19 2006-08-08 Saint-Gobain Performance Plastics Corporation Chemical mechanical polishing retaining ring with integral polymer backing

Also Published As

Publication number Publication date
TW200815155A (en) 2008-04-01
WO2008024721A2 (en) 2008-02-28
US20080051011A1 (en) 2008-02-28

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