WO2008024721A3 - Ethylene terephthalate polymer retaining ring for a chemical mechanical polishing head - Google Patents
Ethylene terephthalate polymer retaining ring for a chemical mechanical polishing head Download PDFInfo
- Publication number
- WO2008024721A3 WO2008024721A3 PCT/US2007/076331 US2007076331W WO2008024721A3 WO 2008024721 A3 WO2008024721 A3 WO 2008024721A3 US 2007076331 W US2007076331 W US 2007076331W WO 2008024721 A3 WO2008024721 A3 WO 2008024721A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- retaining ring
- mechanical polishing
- chemical mechanical
- ethylene terephthalate
- polishing head
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
- B24B37/32—Retaining rings
Abstract
Embodiments of a retaining ring for use with a chemical mechanical polishing process with a body including a polyethylene terephthalate polymer or polymer including ethylene terephthalate monomers are disclosed.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US83955206P | 2006-08-22 | 2006-08-22 | |
US60/839,552 | 2006-08-22 | ||
US11/542,303 US20080051011A1 (en) | 2006-08-22 | 2006-10-02 | Ethylene terephthalate polymer retaining ring for a chemical mechanical polishing head |
US11/542,303 | 2006-10-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2008024721A2 WO2008024721A2 (en) | 2008-02-28 |
WO2008024721A3 true WO2008024721A3 (en) | 2008-07-24 |
Family
ID=39107569
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2007/076331 WO2008024721A2 (en) | 2006-08-22 | 2007-08-20 | Ethylene terephthalate polymer retaining ring for a chemical mechanical polishing head |
Country Status (3)
Country | Link |
---|---|
US (1) | US20080051011A1 (en) |
TW (1) | TW200815155A (en) |
WO (1) | WO2008024721A2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8740673B2 (en) * | 2010-10-05 | 2014-06-03 | Strasbaugh | CMP retaining ring with soft retaining ring insert |
US9050700B2 (en) | 2012-01-27 | 2015-06-09 | Applied Materials, Inc. | Methods and apparatus for an improved polishing head retaining ring |
US9597771B2 (en) * | 2013-12-19 | 2017-03-21 | Taiwan Semiconductor Manufacturing Co., Ltd. | Carrier head having retainer ring, polishing system including the carrier head and method of using the polishing system |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6899610B2 (en) * | 2001-06-01 | 2005-05-31 | Raytech Innovative Solutions, Inc. | Retaining ring with wear pad for use in chemical mechanical planarization |
US7086939B2 (en) * | 2004-03-19 | 2006-08-08 | Saint-Gobain Performance Plastics Corporation | Chemical mechanical polishing retaining ring with integral polymer backing |
-
2006
- 2006-10-02 US US11/542,303 patent/US20080051011A1/en not_active Abandoned
-
2007
- 2007-08-17 TW TW096130397A patent/TW200815155A/en unknown
- 2007-08-20 WO PCT/US2007/076331 patent/WO2008024721A2/en active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6899610B2 (en) * | 2001-06-01 | 2005-05-31 | Raytech Innovative Solutions, Inc. | Retaining ring with wear pad for use in chemical mechanical planarization |
US7086939B2 (en) * | 2004-03-19 | 2006-08-08 | Saint-Gobain Performance Plastics Corporation | Chemical mechanical polishing retaining ring with integral polymer backing |
Also Published As
Publication number | Publication date |
---|---|
TW200815155A (en) | 2008-04-01 |
WO2008024721A2 (en) | 2008-02-28 |
US20080051011A1 (en) | 2008-02-28 |
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