WO2008011014A3 - System and method for processing high puruity materials - Google Patents

System and method for processing high puruity materials Download PDF

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Publication number
WO2008011014A3
WO2008011014A3 PCT/US2007/016181 US2007016181W WO2008011014A3 WO 2008011014 A3 WO2008011014 A3 WO 2008011014A3 US 2007016181 W US2007016181 W US 2007016181W WO 2008011014 A3 WO2008011014 A3 WO 2008011014A3
Authority
WO
WIPO (PCT)
Prior art keywords
unit operation
material stream
unit
standby unit
standby
Prior art date
Application number
PCT/US2007/016181
Other languages
French (fr)
Other versions
WO2008011014A2 (en
Inventor
David Kandiyeli
Todd Graves
Rhey Yang
Original Assignee
Celerity Inc
David Kandiyeli
Todd Graves
Rhey Yang
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Celerity Inc, David Kandiyeli, Todd Graves, Rhey Yang filed Critical Celerity Inc
Priority to EP07810529A priority Critical patent/EP2046531A2/en
Priority to JP2009520804A priority patent/JP2009543691A/en
Publication of WO2008011014A2 publication Critical patent/WO2008011014A2/en
Publication of WO2008011014A3 publication Critical patent/WO2008011014A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Abstract

Systems and methods for processing high purity materials are disclosed. A unit operation processes a material stream, an operational parameter of the unit operation is monitored, and a standby unit is charged with pressurized gas to achieve system pressure. The material stream is diverted to the standby unit in response to the operational parameter of the unit operation registering a threshold value. Flow exiting the standby unit is first vented via an outlet, and then directed toward a point of use after the pressurized gas has been purged. The unit operation may then be serviced and subsequently brought back online. A second unit operation may process a second material stream simultaneously, and the second material stream may be periodically diverted to the standby unit in like manner, thus reducing line pressure variation. The disclosed method may be performed manually or implemented automatically through use of a controller.
PCT/US2007/016181 2006-07-17 2007-07-17 System and method for processing high puruity materials WO2008011014A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP07810529A EP2046531A2 (en) 2006-07-17 2007-07-17 System and method for processing high purity materials
JP2009520804A JP2009543691A (en) 2006-07-17 2007-07-17 System and method for processing high purity materials

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US83135706P 2006-07-17 2006-07-17
US60/831,357 2006-07-17

Publications (2)

Publication Number Publication Date
WO2008011014A2 WO2008011014A2 (en) 2008-01-24
WO2008011014A3 true WO2008011014A3 (en) 2008-03-20

Family

ID=38957317

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/016181 WO2008011014A2 (en) 2006-07-17 2007-07-17 System and method for processing high puruity materials

Country Status (6)

Country Link
EP (1) EP2046531A2 (en)
JP (1) JP2009543691A (en)
KR (1) KR20090039784A (en)
CN (1) CN101489724A (en)
TW (1) TW200822960A (en)
WO (1) WO2008011014A2 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999029505A1 (en) * 1997-12-08 1999-06-17 Ebara Corporation Polishing solution feeder
WO2004113023A1 (en) * 2003-06-20 2004-12-29 Fujitsu Limited Chemical-solution supplying apparatus
WO2005072338A2 (en) * 2004-01-26 2005-08-11 Tbw Industries, Inc. Multi-step pad conditioningh system and method for chemical planarization

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999029505A1 (en) * 1997-12-08 1999-06-17 Ebara Corporation Polishing solution feeder
WO2004113023A1 (en) * 2003-06-20 2004-12-29 Fujitsu Limited Chemical-solution supplying apparatus
WO2005072338A2 (en) * 2004-01-26 2005-08-11 Tbw Industries, Inc. Multi-step pad conditioningh system and method for chemical planarization

Also Published As

Publication number Publication date
JP2009543691A (en) 2009-12-10
KR20090039784A (en) 2009-04-22
TW200822960A (en) 2008-06-01
CN101489724A (en) 2009-07-22
EP2046531A2 (en) 2009-04-15
WO2008011014A2 (en) 2008-01-24

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