WO2007106395A3 - Arc quenching circuit to mitigate ion beam disruption - Google Patents

Arc quenching circuit to mitigate ion beam disruption Download PDF

Info

Publication number
WO2007106395A3
WO2007106395A3 PCT/US2007/006073 US2007006073W WO2007106395A3 WO 2007106395 A3 WO2007106395 A3 WO 2007106395A3 US 2007006073 W US2007006073 W US 2007006073W WO 2007106395 A3 WO2007106395 A3 WO 2007106395A3
Authority
WO
WIPO (PCT)
Prior art keywords
high voltage
ion beam
switches
ion
supplies
Prior art date
Application number
PCT/US2007/006073
Other languages
French (fr)
Other versions
WO2007106395A2 (en
Inventor
Que Weiguo
Yongzhang Huang
John Ye
David Tao
Original Assignee
Axcelis Tech Inc
Que Weiguo
Yongzhang Huang
John Ye
David Tao
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Axcelis Tech Inc, Que Weiguo, Yongzhang Huang, John Ye, David Tao filed Critical Axcelis Tech Inc
Priority to JP2009500395A priority Critical patent/JP2009530769A/en
Publication of WO2007106395A2 publication Critical patent/WO2007106395A2/en
Publication of WO2007106395A3 publication Critical patent/WO2007106395A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
    • H01J37/241—High voltage power supply or regulation circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H01J2237/0206—Extinguishing, preventing or controlling unwanted discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/248—Components associated with the control of the tube
    • H01J2237/2485—Electric or electronic means

Abstract

The present invention is directed to a circuit (100) for quenching an arc that may form between high voltage extraction or suppression electrodes associated with an ion source (120) of an ion implantation system to mitigate an erratic ion beam current and avoid non-uniform ion implantations, for example. High voltage high speed switching circuits (104) are added in series with the high voltage supplies (102) for the suppression and/or extraction electrodes to extinguish the harmful arcs which may nearly discharge the high voltage capacitors of such HV power supplies, which dramatically affects the ion beam current and takes considerable time thereafter to recover. The high voltage switches are controlled by trigger circuits (108) which detect current or voltages changes in the HV supplies (102) to the electrodes. The arc quenching circuit also comprises protection circuits (110,115) for the HV switches that absorb excess energy from reactive components and clamp any overvoltages to protect the HV switches (104).
PCT/US2007/006073 2006-03-14 2007-03-09 Arc quenching circuit to mitigate ion beam disruption WO2007106395A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009500395A JP2009530769A (en) 2006-03-14 2007-03-09 Arc extinction circuit to mitigate ion beam splitting

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US78197706P 2006-03-14 2006-03-14
US60/781,977 2006-03-14

Publications (2)

Publication Number Publication Date
WO2007106395A2 WO2007106395A2 (en) 2007-09-20
WO2007106395A3 true WO2007106395A3 (en) 2007-12-13

Family

ID=38457657

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/006073 WO2007106395A2 (en) 2006-03-14 2007-03-09 Arc quenching circuit to mitigate ion beam disruption

Country Status (3)

Country Link
JP (1) JP2009530769A (en)
TW (1) TW200809901A (en)
WO (1) WO2007106395A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7566887B2 (en) * 2007-01-03 2009-07-28 Axcelis Technologies Inc. Method of reducing particle contamination for ion implanters
US8766209B2 (en) * 2011-07-21 2014-07-01 Varian Semiconductor Equipment Associates, Inc. Current limiter for high voltage power supply used with ion implantation system
CN204189670U (en) * 2014-03-07 2015-03-04 广州市金矢电子有限公司 Current feedback electronic arc-suppressor
US10515780B1 (en) * 2018-12-19 2019-12-24 Axcelis Technologies, Inc. System and method of arc detection using dynamic threshold
CN114600212A (en) * 2019-09-11 2022-06-07 电弧抑制技术公司 Electric contact electrode surface plasma treatment

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5192894A (en) * 1991-08-20 1993-03-09 Leybold Aktiengesellschaft Device for the suppression of arcs
US6452196B1 (en) * 1999-12-20 2002-09-17 Axcelis Technologies, Inc. Power supply hardening for ion beam systems
US6577479B1 (en) * 2000-08-28 2003-06-10 The Regents Of The University Of California Arc suppression circuit
WO2006047564A2 (en) * 2004-10-25 2006-05-04 Epion Corporation Method and apparatus for arc suppression in scanned ion beam processing equipment

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5192894A (en) * 1991-08-20 1993-03-09 Leybold Aktiengesellschaft Device for the suppression of arcs
US6452196B1 (en) * 1999-12-20 2002-09-17 Axcelis Technologies, Inc. Power supply hardening for ion beam systems
US6577479B1 (en) * 2000-08-28 2003-06-10 The Regents Of The University Of California Arc suppression circuit
WO2006047564A2 (en) * 2004-10-25 2006-05-04 Epion Corporation Method and apparatus for arc suppression in scanned ion beam processing equipment

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DEVRIES G J ET AL: "Ion source metal-arc fault current protection circuit", REVIEW OF SCIENTIFIC INSTRUMENTS USA, vol. 62, no. 12, December 1991 (1991-12-01), pages 3098 - 3099, XP002450179, ISSN: 0034-6748 *

Also Published As

Publication number Publication date
TW200809901A (en) 2008-02-16
JP2009530769A (en) 2009-08-27
WO2007106395A2 (en) 2007-09-20

Similar Documents

Publication Publication Date Title
WO2007111822A3 (en) A method of ion beam control for glitch recovery
WO2007106395A3 (en) Arc quenching circuit to mitigate ion beam disruption
WO2005083742A3 (en) A tandem ion-trap time-of-flight mass spectrometer
US8319136B2 (en) Arcing fault and arc flash protection system having a high-speed switch
JP5438519B2 (en) How to reduce particle contamination in ion implanters
TW200629335A (en) Wafer-scanning ion implanter having fast beam deflection apparatus for beam glitch recovery
TW200705497A (en) Arc suppression arrangement
EP2369902B1 (en) Plasma generation apparatus
WO2006047564A3 (en) Method and apparatus for arc suppression in scanned ion beam processing equipment
EP3739706A4 (en) Control and protection system for mechanical high-voltage direct current circuit breaker, and control method for same
DE602005007341D1 (en) ELECTRIC MEDIA OR HIGH VOLTAGE SWITCHING DEVICE
CA2991433A1 (en) Interrupter device for interrupting a direct current
UA100437C2 (en) Low-voltage, medium-voltage or high-voltage assembly
US20110248002A1 (en) Plasma generation apparatus
RU2013147691A (en) VOLTAGE PROTECTION DEVICE
Sandolache et al. Switching of capacitive current with vacuum interrupters
MX2007001044A (en) Overvoltage protection device with improved interrupting capacity.
AU2017293049B2 (en) Switch having an arc-quenching device
Roscoe et al. Arc-flash energy mitigation by fast energy capture
KR102404376B9 (en) Arc Fault Circuit Interrupters implemented as modular extension
EP4089709A4 (en) Operating mechanism of 2p2 modulus electromagnetic residual current circuit breaker with overcurrent protection
UA112404C2 (en) METHOD OF CONTROL OF THE SUPPLY OF THE CURRENT FOR ELECTRONIC BEAM OF THE ELECTRONIC BEAM cannon
US10600603B2 (en) Switching device and switch-off method for operating a switching device
Roscoe et al. Fast energy capture
CN201877352U (en) Vacuum arc-extinguishing device

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 2009500395

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 07752751

Country of ref document: EP

Kind code of ref document: A2

122 Ep: pct application non-entry in european phase

Ref document number: 07752751

Country of ref document: EP

Kind code of ref document: A2