WO2007099519A2 - Dispositif d'application d'un matériau nanostructuré sur des objets, en particulier des carreaux, du verre et similaire - Google Patents

Dispositif d'application d'un matériau nanostructuré sur des objets, en particulier des carreaux, du verre et similaire Download PDF

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Publication number
WO2007099519A2
WO2007099519A2 PCT/IB2007/051147 IB2007051147W WO2007099519A2 WO 2007099519 A2 WO2007099519 A2 WO 2007099519A2 IB 2007051147 W IB2007051147 W IB 2007051147W WO 2007099519 A2 WO2007099519 A2 WO 2007099519A2
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WO
WIPO (PCT)
Prior art keywords
station
precursor
nanostructured material
tiles
rotating roll
Prior art date
Application number
PCT/IB2007/051147
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English (en)
Other versions
WO2007099519A3 (fr
Inventor
Andrea Capucci
Gianluca Passerini
Original Assignee
Andrea Capucci
Gianluca Passerini
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Application filed by Andrea Capucci, Gianluca Passerini filed Critical Andrea Capucci
Publication of WO2007099519A2 publication Critical patent/WO2007099519A2/fr
Publication of WO2007099519A3 publication Critical patent/WO2007099519A3/fr

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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001General methods for coating; Devices therefor
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23Oxides
    • C03C17/25Oxides by deposition from the liquid phase
    • C03C17/256Coating containing TiO2
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5025Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with ceramic materials
    • C04B41/5041Titanium oxide or titanates
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81Coating or impregnation
    • C04B41/85Coating or impregnation with inorganic materials
    • C04B41/87Ceramics
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208Oxides, e.g. ceramics
    • C23C18/1216Metal oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125Process of deposition of the inorganic material
    • C23C18/1291Process of deposition of the inorganic material by heating of the substrate
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/212TiO2
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/70Properties of coatings
    • C03C2217/71Photocatalytic coatings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/11Deposition methods from solutions or suspensions
    • C03C2218/113Deposition methods from solutions or suspensions by sol-gel processes
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/11Deposition methods from solutions or suspensions
    • C03C2218/118Deposition methods from solutions or suspensions by roller-coating
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/30Aspects of methods for coating glass not covered above
    • C03C2218/32After-treatment
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2111/00Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
    • C04B2111/20Resistance against chemical, physical or biological attack
    • C04B2111/2038Resistance against physical degradation
    • C04B2111/2061Materials containing photocatalysts, e.g. TiO2, for avoiding staining by air pollutants or the like

Definitions

  • the present invention relates to an apparatus for applying a nanostructured material onto articles, in particular tiles, glass and the like.
  • the titanium dioxide is obtained by spontaneous oxidation or, in order to make the thickness controllable, by anodization.
  • Such a compound is usually amorphous, however, operating in very particular anodization conditions, it is possible to obtain crystal oxygen, maintaining the aesthetic properties of the anodized titanium dioxide.
  • the crystal oxygen can assume various microstructures (for example rutile, anatase, brookite) .
  • the anatase presents the most relevant antibacterial and anti-polluting properties.
  • the titanium dioxide is a semiconductor material, stable to the light and to corrosion processes, which in the colloidal form or in . thin film reacts to the radiation of wavelength lower than 430 nm (UV spectrum) . Due to this reaction, called photocatalytic process, the organic, inorganic substances and the bacteria which deposit on the film, are decomposed and removed at room temperature as a result of irradiation of natural and/or artificial light.
  • Hydrogen peroxide and OH radicals produced locally as the results of the oxidation and reduction processes, trigger oxidizing processes, which lead to the mineralization of organic pollutants, to the denaturation of the bacteria and to the neutralization of inorganic toxic compounds, such as Nox.
  • the titanium dioxide if activated by irradiation, has antibacterial and anti-polluting properties .
  • researches have proved the efficiency of titanium dioxide in giving different materials for civil uses the property of reducing the pollution either organic or inorganic in close and open environments.
  • the Italian Patent Application No. MO2003A 000117 (Gambarelli S.r.l.) describes three types of tiles in glazed stoneware obtained substantially by mixing engobe with the titanium dioxide in the form of rutile.
  • the object of the present invention is to propose an apparatus for applying a nanostructured material, which material presents a considerable photocatalytic activity, onto articles, in particular, tiles, glass and the like.
  • Another object of the present invention is to propose an apparatus, which allows to reduce, even to completely eliminate, any wastes of nanocrystal material.
  • an apparatus for applying a nanostructured material onto articles, in particular tiles, glass and the like, coming from a production line characterized in that it includes: a first station 50 for applying a film of a liquid precursor 10 onto an article 1; a group 67, situated downstream of said first station 50 and aimed at gelatinizing said liquid precursor 10 and at converting the precursor into said nanostructured material.
  • Figure 1 is a schematic, lateral view of the proposed apparatus
  • Figure IA is a schematic, top view of the same apparatus.
  • the reference numeral 100 indicates a preferred embodiment of the proposed apparatus for applying a nanostructured material onto articles, in particular tiles, glass and the like.
  • the apparatus 100 includes a first station 50, for application of a liquid precursor 10 e.g. to tiles 1.
  • the liquid precursor 10 is obtained by partial or total hydrolysis of a tetravalent titanium compound under conditions in which the gelation is avoided.
  • An operational group 67 is placed downstream of the first station 50 and includes a second station 60 and a third station 70, described in the following.
  • the second station 60 situated downstream of the first station 50, provides for the gelation of the liquid precursor 10 applied previously to each tile 1.
  • the third station 70 situated downstream of the second station 60, provides for converting the liquid precursor 10, applied to each tile 1, into a nanostructured material, e.g. titanium dioxide in the form of nanocrystal anatase.
  • the first station 50 includes means for storing the liquid precursor 10, cooperating with means for transferring the latter from the storing means to the tile 1.
  • the transferring means include a rotating roll 21, disposed with horizontal axis, covered with a first layer of elastic polyurethane, about lcm thick, and a second layer of silicone, about 2-3mm thick, and highly water-repellent.
  • Cavities are made in the second layer by laser technique.
  • the cavities are preferably distributed in a uniform way and have a diameter, for example, from 0,05mm to 0,1mm, and depth from 0,1mm to 0,2mm.
  • the roll 21 presses elastically the tile 1.
  • a doctor blade 2, made of plastic material, is suitably situated in such a way, as to operate on the outer surface of the roll 21.
  • the storing means are preferably a container 3, aimed at releasing a selected quantity of liquid precursor 10 onto the roll 21.
  • the second station 60 includes at least one light source, aimed at emitting an intermittent beam of light with a selected wavelength, e.g. an infrared ray lamp 4.
  • the third station 70 includes a furnace 6 (or a dryer), aimed at heating the compound product formed by each tile 1 and the relative precursor 10.
  • the furnace 6 includes: a first chamber for pre-heating the compound product formed by each tile 1 and the precursor deposited thereon; a second chamber, situated downstream of the first one, aimed at burning the product; and a third chamber, situated downstream of the second one and aimed at progressive cooling the product.
  • the apparatus 100 is advantageously provided with a conveying belt 30, operated in step relation with the roll 21, to move the tiles 1 in a forward direction W ( Figure 1) .
  • the peripheral speed of the roll 21 coincides with the forward movement speed W of the tiles 1.
  • the precursor 10, contained in the container 3, is deposited, by gravity, on the upper portion of the roll 21 and is distributed uniformly in the cavities by the doctor blade 2.
  • the film of precursor 10 applied to the surface of each tile 1, is arranged autonomously according to a plurality of micro-cones, which subsequently spread and further on tend to agglomerate forming drops, generating a colloid layer of about 400nm.
  • the precursor 10 gelation process is accelerated by conveying the tiles 1 to the second station 60.
  • the tiles 1 are subjected to intermittent irradiation by the infrared lamps 4 for a selected time. Such irradiation, which occurs preferably at temperatures in a range from 80 0 C to 120 0 C, causes at least superficial heating of the film of precursor 10 applied to the tile 1, with consequent at least partial gelation of the precursor.
  • the tiles 1 are conveyed to the furnace 6 and stay there preferably 10 minutes in the first chamber, 20 minutes in the second chamber with a temperature in a range from 550 0 C to about 650 0 C, and finally 10 minutes in the third chamber.
  • the titanium dioxide is transformed into nanocrystal anatase.
  • the precursor can be applied to the tiles by the known technique, 1 the so-called double transfer.
  • the second station 60 can advantageously include, in a region corresponding to the infrared lamps 4, suction means 41, which remove possible gases emitted by the precursor 10 applied to the tile 1, if the precursor 10 contains solvents. Then, the gases are conveyed, by the same suction means 41, to the furnace 6, where they are burnt.
  • the dimensions and the number of the cavities made in the outer surface of the roll 21 vary in accordance with the surface characteristics (opacity, roughness, etc.) of the tiles 1 to be treated.
  • the apparatus is provided with a lamp, which irradiates the sample, and with a device for measuring the reduction of Nox caused by the tiles.
  • FIG. 1 Experimental measure of the concentrations of NO, NO 2 and NO x for the sample tile il (white with a brown pattern) at the outlet of the reactor. .
  • Figure 3 Percentage conversion of NO, NO 2 and NO x of the sample #1, white tile with a brown pattern, corresponding to the data of Figure 2. During the irradiation, the tile becomes super hydrophilic.
  • Irradiation time minutes Figure 4. Percentage conversion of NO, NO 2 and NO x of the sample #2, sugar-paper-blue tile. During irradiation , the tile becomes super hydrophilic, but less than the sample #1.
  • the proposed apparatus allows to obtain the coating of the tiles 1 surface (or glass) with a nanocrystal film of pure anatase, stable and uniform: this confers the antibacterial and high hydrophilic properties to the surface irradiated with light having selected wavelength.
  • a further advantage of the present invention lies in the fact that the nanocrystal anatase film, coating the tiles 1 surface presents excellent mechanical features and high photocatalytic activity.
  • the proposed apparatus assuring the uniform coating of the entire tile 1 surface, allows to obtain a high efficiency in the reduction of polluting substances.
  • the particular technique of transferring the precursor onto the tiles 1 allows also to avoid waste of material, which results in obvious economic advantages .
  • the articles, to which the nanocrystal material is applied are finished products and do not need to be pre- treated, as it is often required in case of the applications carried out with known techniques . It is understood that the proposed invention has been described, with reference to the enclosed figures, as a mere, not limiting example. Therefore, it is obvious that any changes or variants applied thereto remain within the protective scope defined by the following claims.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Structural Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

Le dispositif selon l'invention servant à appliquer un matériau nanostructuré sur des objets, en particulier des carreaux, du verre et similaires, comprend : une première station (50) pour l'application d'une pellicule d'un précurseur liquide (10) sur un objet (1) ; un groupe opérationnel (67) situé en aval de la première station (50) et provoquant la gélification du précurseur liquide (10) et la conversion de ce dernier en le matériau nanostructuré.
PCT/IB2007/051147 2006-03-03 2007-03-01 Dispositif d'application d'un matériau nanostructuré sur des objets, en particulier des carreaux, du verre et similaire WO2007099519A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ITBO2006A000151 2006-03-03
ITBO20060151 ITBO20060151A1 (it) 2006-03-03 2006-03-03 Impianto per l'applicazione di un materiale nanostruttura su articoli, in particolare piastrelle, vetri e simili.

Publications (2)

Publication Number Publication Date
WO2007099519A2 true WO2007099519A2 (fr) 2007-09-07
WO2007099519A3 WO2007099519A3 (fr) 2007-12-06

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IT (1) ITBO20060151A1 (fr)
WO (1) WO2007099519A2 (fr)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2208874A (en) * 1987-08-20 1989-04-19 Central Glass Co Ltd Method of forming coating film of titanium containing oxide by using alkoxide solution
EP0677364A1 (fr) * 1994-03-29 1995-10-18 SYFAL S.r.l. Machine rotative d'émaillage et de décoration, en particulier pour carreaux en céramique
US5510141A (en) * 1995-01-26 1996-04-23 Central Glass Company, Limited Coating composition and method for forming thin film on substrate using same
US5639517A (en) * 1992-07-09 1997-06-17 Commissariat A L'energie Atomique Process for the production of thin films having optical properties
US5891509A (en) * 1995-03-13 1999-04-06 Fujitsu Limited Method of applying a coating material to a plate with conveying rollers clamping side edges of the plate
EP1034905A2 (fr) * 1999-03-05 2000-09-13 Ronflette S.A. Dispositif pour déposer des couches d'émail et de matériaux similaires sur des objets en céramique
US6326079B1 (en) * 1995-09-15 2001-12-04 Saint-Gobain Glass France Substrate with a photocatalytic coating
US20020098293A1 (en) * 2001-01-23 2002-07-25 Kokoschke Jeffrey L. Method and apparatus for coating a substrate

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2208874A (en) * 1987-08-20 1989-04-19 Central Glass Co Ltd Method of forming coating film of titanium containing oxide by using alkoxide solution
US5639517A (en) * 1992-07-09 1997-06-17 Commissariat A L'energie Atomique Process for the production of thin films having optical properties
EP0677364A1 (fr) * 1994-03-29 1995-10-18 SYFAL S.r.l. Machine rotative d'émaillage et de décoration, en particulier pour carreaux en céramique
US5510141A (en) * 1995-01-26 1996-04-23 Central Glass Company, Limited Coating composition and method for forming thin film on substrate using same
US5891509A (en) * 1995-03-13 1999-04-06 Fujitsu Limited Method of applying a coating material to a plate with conveying rollers clamping side edges of the plate
US6326079B1 (en) * 1995-09-15 2001-12-04 Saint-Gobain Glass France Substrate with a photocatalytic coating
EP1034905A2 (fr) * 1999-03-05 2000-09-13 Ronflette S.A. Dispositif pour déposer des couches d'émail et de matériaux similaires sur des objets en céramique
US20020098293A1 (en) * 2001-01-23 2002-07-25 Kokoschke Jeffrey L. Method and apparatus for coating a substrate

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ITBO20060151A1 (it) 2007-09-04

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