WO2007031225A2

WO2007031225A2 - Method for producing evaporation glass layers and products produced according to said method

Info

Publication number: WO2007031225A2
Application number: PCT/EP2006/008715
Authority: WO
Inventors: Clemens Ottermann; Jörn POMMEREHNE
Original assignee: Schott Ag
Priority date: 2005-09-15
Filing date: 2006-09-07
Publication date: 2007-03-22
Also published as: DE102005044246A1

Abstract

The invention relates to a method for producing a glass layer on a surface of a support, in order to improve the properties of evaporation glass layers on supports. According to the invention, glass is thermally evaporated and the vapour is precipitated on the support as a layer. A polymer-containing layer is applied to the support whereon the glass layer is precipitated.

Description

Process for producing vapor-deposited glass layers and product produced according to the method

description

The invention generally relates to the deposition of glass layers, in particular the production of glass layers by vapor deposition.

When vapor deposition of glass layers, a variety of problems can occur. Thus, the surface of particles may be occupied, whereby often no uniform layer, and no homogeneously dense layer is obtained. It comes, especially with materials whose thermal

Coefficient of expansion of which the vapor-deposited glass layer is different, for the formation of stresses,. whereby both compressive and tensile stresses can arise. Furthermore, under mechanical stress, for example bending, damage to the vapor-deposited glass layer can rapidly occur, especially since cracks can spread unhindered. This problem is particularly significant in flexible substrates. Finally, the adhesion of the glass layer to different surfaces can be very different and can lead to partial cracking, delamination or cracking.

The invention is therefore based on the object to eliminate the above-mentioned problems in the deposition of glass layers by vapor deposition. This task is already in a surprisingly simple way by the subject of the independent claims. Advantageous embodiments and further developments of the invention are specified in the dependent claims. Accordingly, the invention provides a method for producing a glass layer on a surface of a substrate, in which glass is thermally evaporated and the vapor is deposited on the substrate as a layer, characterized in that on the substrate, a polymer-containing layer is applied, to which the glass layer is deposited.

A product which can be produced by the process according to the invention accordingly comprises a substrate, a polymer-containing layer applied thereto and a vapor-deposited glass layer deposited on the polymer-containing layer.

Particularly preferably, at least one binary glass is vapor-deposited to produce the glass layer. The product in this case accordingly has a glass layer with at least one binary glass. At least binary glass is understood as meaning a material which represents a synthesis of at least two chemical compounds and has a glass-like structure, that is to say a structure of a melt solidified without or at least without an essential crystal structure. Such a binary vitreous system has the advantageous property of forming particularly dense layers. This is especially true when such a binary glass is evaporated, which is alkaline. The alkali metal may be preferably in oxidic form part of the glass. Alkali metals can

Fill gaps in the matrix of the glass very well, creating a very dense structure. Good properties for the vapor deposition, ie the deposition of the vapor phase by means of thermal evaporation of the starting material (s), are in particular achieved with borosilicate Glasses, preferably achieved borosilicate glasses containing alkali. Preferred glasses are not only binary, but have more than two components in order to achieve advantageous processing and layer properties.

Glasses which have the following compositional ranges in weight percent have proved to be particularly suitable as vapor-deposition glass for the process according to the invention and the products which can be produced therewith:

Components Glass section 1 Glass section 2

SiO ₂ 75-85 65-75

B ₂ O ₃ 10 - 15 20 - 30

Na ₂ O 1 -5 0.1 - 1

Li ₂ O 0.1 - 1 0.1 - 1

K ₂ O 0.1 - 1 0.5 - 5

Al ₂ O ₃ 1 - 5 0.5 - 5

Preferred vapor-deposited glasses from these groups are glasses having the following composition in percent by weight:

Components Glass 1 Glass 2

SiO ₂ 84.1% 71%

B ₂ O ₃ 11.0% 26%

Na ₂ O 2% 0.5%

Li ₂ O «0.3% 0.5%

K ₂ O «0.3% 1.0%

Al ₂ O ₃ «2.6% 1.0%

It should be noted that said compositions do not relate to the deposited layers. The composition may also change during vapor deposition. The preferred glasses used have in particular the properties listed in the table below:

Particularly suitable for vapor deposition of porous glass layers, the evaporation glass Type 8329 Schott has proven, which has the following composition in weight percent:

SiO ₂ 84, 1%

B ₂ O ₃ 11, o%

Na ₂ O «2, 0% 1

K ₂ O 0, 3% 2,3

Li ₂ O 0, 3% J

Al ₂ O ₃ «2.6 The evaporation process and the different volatility of the components of this system result in slightly different stoichiometries between the target material and the vapor deposited layer. Slightly deviating compositions having a slightly increased alkali content of 3.3 percent by weight compared to 2.3 percent by weight in the vapor deposition material and a reduced Al ₂ O ₃ content in the layer of 0.5 percent by weight were found in the deposited layer.

The electrical resistance of the starting material is approximately 10 ¹⁰ Ω / cm (at 100 ⁰ C),

This glass also has a refractive index of about 1.470 in pure form.

The dielectric constant ε is about 4.8 (at 25 ⁰ C, IMHz), tgδ is about 45 x 10 ^"4 (at 25 ° C, 1 MHz).

Another advantage of the invention is that the polymer-containing interlayer improves the toughness and strength of the composite so that even flexible documents can be used. This layer can also have an advantageous insulating effect. Electrically insulating properties are important, inter alia, if the coating according to the invention is used for components with contacts or feedthroughs arranged in parallel, which must not short-circuit.

In order to improve the adhesion of the vapor-deposited glass layer, the surface of the polymer-containing layer can be advantageously activated before the deposition of the glass layer. A suitable method for this is among other things the activation with a plasma treatment. For example, can to a glow discharge are used. A corona discharge can also be used to increase the surface energy of the polymer-containing layer. By means of a plasma treatment, in order to improve the adhesion of the glass layer, it is also possible to partially oxidize the surface of the polymer-containing layer. This can be done for example in an oxygen-containing plasma.

The deposition of the glass layer is preferably done by electron beam evaporation. In this way, the heating energy can be locally well limited by suitable focusing of the electron beam. This is advantageous, inter alia, in order to limit the radiant heat emitted by the glass target and thus also the heating of the substrate to be coated.

Also particularly suitable is a polymer-containing layer having a thickness in the range from 0.25 μm to 200 μm, preferably in the range from 0.5 μm to 100 μm. With

Layer thicknesses in these areas can still cover typical particle deposits on the surface.

In addition to the usual application methods for polymer layers is also thought to use vacuum processes for the deposition of the polymer-containing layer. For this purpose, plasma polymerization, in particular in conjunction with a deposition of the layer on the substrate by means of plasma-assisted chemical vapor deposition (PECVD = "plasma-enhanced chemical vapor deposition"), can take place from a plasma in a process gas. The PICVD method ("plasma pulse chemical vapor deposition"), in which a pulsed plasma is generated by electromagnetic pulses in a process gas atmosphere, is preferably used for this purpose Layer, for example by means of PECVD offers, inter alia, the advantage that the vapor deposition of the glass layer can take place in the same device. Also, activation of such a layer in the vacuum chamber can be accomplished by generating a plasma without having to transfer the pad to another device.

Furthermore, it is particularly preferable to deposit a polymer-containing layer containing silicon. For example, a polymer-containing layer can be deposited with a SiO _x Hy-containing polymer. Specifically, such a layer may contain silicone. Among other such SiO _x H _y polymers offer the advantage that they can be produced in a vacuum coating process on the substrate. So can such layers by means of

Plasma polymerization, preferably PICVD (plasma pulse-induced chemical vapor deposition) are deposited with a HMDSO-containing process gas (HMDSO = hexamethyldisiloxane) as a precursor to the substrate.

Silicon atoms present in the polymer-containing layer are favorable due to the good bonding of oxidic constituents of the vapor-deposited glass to these atoms. In this connection, activation, in particular oxidation in an oxygen plasma, in which Si-O bonds are produced on the surface, is particularly suitable. The particular advantage here is the chemical similarity to the subsequently applied glass layer and, associated therewith, good compatibility at the interface.

In addition to pure plastic phases, for example, polymeric blend systems can be deposited as part of the polymer-containing layer. Furthermore, the properties of the polymer-containing layer can also be advantageously changed by fillers and the conditions be adjusted. It is especially thought of nanoparticles. These can be embedded, inter alia, in the polymer-containing layer. For example, a polymer-containing layer containing nanotubes can be applied. Such particles may include the

Significantly improve the thermal conductivity of the polymer-containing layer.

In order to obtain a silicon-containing polymer-containing layer, it is also possible to deposit a polymer-containing layer which contains silicon-containing particles. These particles may in particular be silicon particles and / or SiO particles.

Also, the surface of the polymer-containing layer can be coated with nanoparticles to the

Surface properties of coated with the polymer-containing layer substrate for the deposition of the glass layer to influence low. The deposition can be carried out from the liquid, more preferably but anhydrous phase, for example by printing, dipping or other known to those skilled application techniques. In order to cover the surface with nanoparticles, an electrocoating process is particularly suitable in which the particles are attracted to the surface of the polymer-containing layer when occupied by different charges on the surface and particles. In this case, the deposition is preferably carried out from the vapor phase. Furthermore, the nanoparticles can also be applied in solid or powder form to the surface and then incorporated into the surface, for example, by lamination. According to a further embodiment of the invention it is provided that nanoparticles are embedded in the glass layer. For this purpose, nanoparticles and glass can be applied simultaneously.

The nanoparticles arranged in and / or under the glass layer surprisingly result in novel mechanical properties of the deposited glass layers. This shows a significantly reduced cracking tendency. Apparently, the cracks are stopped by the randomly distributed in the glass layer particles. Also shows a greater hardness of the glass layer.

According to a further embodiment of the invention, before the deposition of the glass layer, an adhesion-promoting layer is produced on the polymer-containing layer in order to improve the adhesion of the glass layer deposited thereon. Of course, in addition, the surface of the polymer-containing layer can be activated, for example by near-surface oxidation in one

Oxygen plasma and / or by a corona discharge. The adhesion promoter layer is thereby produced on the polymer-containing layer with a thickness of less than 50 nm, preferably less than 20 nm, particularly preferably less than 10 nm. The adhesion promoter layer, in order to achieve a good adhesion of the subsequent glass layer, at least one of

ingredients

a metal, in particular Si, Al, B, Ti, V, Cr,

an oxide, in particular an alkali or alkaline earth oxide, or an oxide of Si, Al, B, Ti, V, Cr, a halide, in particular an alkali or alkaline earth metal halide, a layer-forming compound, in particular M0S ₂ . According to one development of the invention, a layer on the polymer-containing layer is deposited with a free-cursor compound which, when heated, converts into an adhesion-promoting compound to produce a primer layer. Such a layer may in particular contain a precursor compound which forms an alkali oxide when heated. This is possible, for example, with alkali formates.

The invention is described below with reference to

Embodiments and with reference to the accompanying drawings explained in more detail. The same reference numbers refer to the same or similar parts.

Show it:

1 to 3 based on schematic cross-sectional views of process steps for the production of inventive products,

4 shows a variant of the product shown in FIG. 3 with nanoparticles embedded in the glass layer, FIG.

5 shows a variant of the products shown in FIGS. 3 and 4 with nanoparticles applied to the surface of the polymer-containing layer,

6 shows an exemplary embodiment with additional adhesion promoter layer,

Fig. 7 and 8 application examples of the invention.

The invention consists in producing a suitable surface for a deposition glass layer to be deposited, through which the following problems can be solved or at least mitigated:

• A general problem is the unwanted occupancy of the surface with particles. This can lead to the formation of an inhomogeneous and non-uniform glass layer.

• It comes, especially with materials whose thermal expansion coefficient is different from that of the deposited glass layer, to the formation of stress, depending on whether tensile or compressive stresses are generated.

• In the case of mechanical stress, for example bending, damage to the glass layer, in particular cracks, may occur.

• If the surface is inhomogeneous and the adhesion of the glass layer is partially different, this may result in partial cracking, peeling or cracking of the glass layer.

The method described below with reference to FIGS. 1 to 3 for avoiding these problems is based on the fact that glass is thermally evaporated and the vapor is deposited on a substrate as a layer, wherein on the substrate, a polymer-containing layer is applied, to which the glass layer is deposited.

1 shows in cross-section such a base 3 with opposite sides 31, 32. On the side 31 of the base, a polymer-containing layer 5 is applied, which comprises a polymer matrix 7 with nanoparticles 9 embedded therein. The nanoparticles 9 serve as

Filler. Preferably, silicon-containing particles are used in the form of silicon or SiO _x particles. These particles give the layer increased durability and strength. In addition, the particles 9 improve the connection the later applied glass layer. In addition to Si or SiO _x particles, nanotubes, for example, can also be added to improve the thermal conductivity of the polymer-containing layer 5.

To produce the layer 5 in the embodiment shown schematically in FIG. 1, the fillers can simply be added to the matrix material and then processed together with the matrix material. The polymer matrix 7 of the layer 5 is preferably applied with a wet process, or from the liquid phase. In this case, the particles located on the surface are uniformly covered when the thickness of the layer 5 is at least comparable to the maximum diameters of particles present on the surface of the substrate. Likewise, the defects present on the surface of the base 3, or in this case on the side 31, such as microcracks, scratches and heels are filled in and thereby smoothed out.

The polymer-containing layer 5 preferably has a thickness in the range from 0.25 μm to 200 μm, preferably in the range from 0.5 μm to 100 μm. The preparation of the polymer-containing layer leads to the formation of a new, virgin surface 51, which underlies from the vapor-deposition materials

Making a good connection can be perfectly covered.

The material used for the matrix 7 is preferably a SiO _x H _y -containing polymer or a polymer of the composition SiO _x H _y , such as silicone. A polymer blend system, in particular with a SiO _x H _y polymer or silicone as constituent, can also be used. Such silicon-containing constituents of the polymer-containing layer 5 are, inter alia, favorable for a good connection of the subsequently applied layers, in particular the glass layer to achieve. Alternatively, such a layer can also be produced by deposition by means of PECVD and plasma polymerization.

In a subsequent step, shown in FIG. 2, before the deposition of the glass layer, the surface of the polymer-containing layer 5 is activated. The activation preferably comprises a plasma treatment. A corona discharge can also be used. In both cases, molecules in a near-surface layer 11 are decomposed and can form radicals on which other molecules easily accumulate.

The plasma or corona treatment increases the surface energy of the surface 51. In the example shown in FIG. 2, the polymer-containing layer 5 in the near-surface layer 11 is partially oxidized. This is achieved by treatment in an oxygen-containing plasma. By the oxidation it comes to

Formation of Si-O groups in the silicon-containing matrix material in the layer 11 by a chemical reaction. Si-O-containing groups of constituents of the vapor-deposited glass can easily be attached to these Si-O groups. The particular advantage here is the chemical similarity of the surface 51 to the forming vapor-deposited glass layer, whereby a good compatibility is achieved.

Fig. 3 shows the finished product 1 after the deposition of the glass layer 15. The deposition of the

Glass layer 15 is made by thermal evaporation of a glass target by electron beam evaporation and precipitation of the generated vapor on the surface 51. As a target to this is particularly preferably a binary glass with at least two different metal oxide constituents used, wherein the glass particularly preferably also contains alkali metal oxide, such as Na ₂ O and / or K ₂ O. The glass may in particular be an alkali-containing borosilicate glass with the composition ranges given above. The alkali ions then fill gaps in the structure of the deposited glass layer so that a particularly dense structure with very low permeability is obtained. This layer also has very good passivation properties for the substrate.

FIG. 4 shows a variant of the product 1 shown in FIG. 3. In this variant, the nanoparticles 9 were not applied together with the matrix 7 for the polymer-containing layer 5, but simultaneously with the glass of the glass layer 15. Preferably, the nanoparticles 9 are deposited as particles from the vapor phase. Thus, a glass layer 15 with embedded nanoparticles 9 is obtained.

Fig. 5 shows a further variant of the products shown in Fig. 3 and 4 1. In fig. 5, the surface 51 of the polymer-containing layer 5 has been coated with particles, in particular with nanoparticles 9. For example, the particles can be deposited from a dispersion or suspension applied to the surface. Furthermore, they can also be applied as a powder and laminated. In the occupancy surface and particles 9 can also be charged differently, so that the nanoparticles 9 are attracted to the surface 51. This is advantageous, for example, when applied from an aerosol or generally from the vapor phase.

On the applied nanoparticles 9 and the underlying surface 51 of the polymer-containing layer 5, the glass layer 15 is then deposited. Again, as can be seen with reference to FIG. 5, the nanoparticles 9 are at least partially embedded in the glass layer 15. As a result of the embedded nanoparticles, for example Si or, in particular, SiO _x particles, the glass layer 15 of the exemplary embodiments shown in FIGS. 4 and 5 becomes more resistant and more resistant to cracking overall. The nanoparticles 9 on the surface 51 can also act as a bonding agent for better adhesion of the glass layer 15.

Of course, the respective different arrangements of the nanoparticles, as shown in FIGS. 3 to 5, can also be combined with each other. Thus, in the in Figs. 4 and 5 shown

Embodiments of course also be additionally embedded nanoparticles in the matrix 7 of the polymer-containing layer 5.

6 shows an exemplary embodiment of a product according to the invention, in which, before the deposition of the glass layer 15, an adhesion promoter layer 20 has been produced on the polymer-containing layer 3 in order to further match the surface which comes into contact with the glass layer 15 to the properties of the glass. The adhesion promoter layer can be kept thin, wherein in general a thickness of less than 50 nm, preferably less than 20 nm, more preferably less than 10 nm is already sufficient. The adhesion promoter layer 20 may, for example, consist of an oxide. Suitable oxides are alkali or alkaline earth oxides, or an oxide of Si, Al, B, Ti, V, Cr, and mixed oxides. Also, halide layers, especially with alkali or alkaline earth halides, or layers with layer-forming compounds, such as M0S ₂ are suitable. One more option consists of using metals such as Si, Al, B, Ti, V, Cr or alloys with these elements as adhesion promoter layers.

Furthermore, the abovementioned materials can also be combined with one another or with further layer constituents. According to one development of the invention, to produce the adhesion promoter layer 20, first a layer with a precursor compound on the polymer-containing

Layer deposited. The precursor compound then converts upon heating in an adhesion-promoting compound. The conversion can also be advantageously caused by the heating caused or set during vapor deposition. An example is a precursor compound which forms an alkali oxide when heated. Among other things, alkali formate can be used as a layer constituent.

Among other things, the method according to the invention is particularly suitable for encapsulating electrical or electronic, in particular optoelectronic components. The vapor-deposited glass layer is almost impermeable, and the deposition rates are higher than with other coating methods, such as sputtering.

FIG. 7 shows such a product with an electrical or electronic, in particular optoelectronic component. The base 3 is in this case a semiconductor substrate 21, wherein on the side 31, a sensor surface 22, for example in the form of a matrix-shaped pixel arrangement is present. On the side 31 also pads 24 for contacting the sensor surface 22 are provided. Electrically conductive Contact channels 26 connect the pads 24 to the back side 32 of the substrate.

On the channels 26 solder bumps 28 can still be applied to attach and connect the component in SMT technology. The side 31 with the sensor surface 22 is provided in this example according to the invention with a polymer-containing layer 5 and a glass layer deposited thereon by vapor deposition. In this way, a hermetic encapsulation of the active side 31 of the device is achieved.

It is also possible to encapsulate organic electronic or optoelectronic components, such as, among others, OLED components, such as light-emitting elements, organic displays, as well as organic photovoltaic elements, organic circuits and / or organic field effect transistors (FET), using the method according to the invention. An example of a correspondingly encapsulated OLED element is shown in FIG. 8. On the side 31 of the transparent substrate 39 here, an OLED layer system 40 is applied. This layer system 40 comprises a first electrode layer 41, an organic electroluminescent layer 42 and a further electrode layer 43, wherein the organic electroluminescent layer 42 is located between the two electrode layers 41, 43. This layer sequence of an OLED is to be understood as a simple example. Thus, an OLED may comprise further layers between the electrode layers 41, 43. For example, the electroluminescent layer 42 itself may again be a multilayer system with at least one electroluminescent layer. Thus, in addition to a layer with the electroluminescent material to increase the efficiency of electron and hole-conducting Layers used, between which the electroluminescent material is arranged. The structure and the layer sequence of such an OLED are known to the person skilled in the art.

The electrode layer 41 is formed as a transparent conductive layer, for example in the form of an indium-tin oxide layer or a fluorine-doped tin oxide layer. The light emitted by the electroluminescent layer 42 may then exit through the electrode layer 41 and the substrate 39 on the side 32 of the substrate. According to the invention, the sensitive OLED layer system 40 is encapsulated with a polymer-containing layer 5 and a glass layer 15 deposited thereon by vapor deposition, wherein the outside of the electrode layer 43 forms the coated side of the substrate 3 with substrate 39 and OLED layer system 40.

Furthermore, since the glass layer 15 is transparent, it is also possible to select an inverse structure of the OLED layer system in which the electrode layer 43 is transparent and the light passes through the vapor-deposited glass layer 15 to the outside. In this case also the substrate 39 need not be transparent. In conjunction with a transparent substrate, it is even possible to create a transparent component both with a normal and with an inverse layer structure.

It will be apparent to those skilled in the art that the above-described embodiments are to be understood as illustrative, and that the invention is not limited thereto, but that it can be varied in many ways without departing from the spirit of the invention.

Claims

claims

Anspruch [en] A method for producing a glass layer on a surface of a substrate, in which glass is thermally evaporated and the vapor is deposited on the substrate as a layer, characterized in that a polymer-containing layer is applied to the substrate on which the glass layer is deposited ,

2. The method according to claim 1, characterized in that an at least binary glass is evaporated.

3. The method according to claim 2, characterized in that an alkali-containing binary glass is evaporated.

4. The method according to any one of the preceding claims, characterized in that the surface of the polymer-containing layer is activated prior to the deposition of the glass layer.

5. The method according to claim 4, characterized in that the activation comprises a plasma treatment.

6. The method according to claim 4 or 5, characterized in that the activation comprises a corona discharge.

7. The method according to any one of the preceding claims, characterized in that the surface of the

Polymer-containing layer is partially oxidized.

8. The method according to claim 7, characterized in that the surface of the polymer-containing layer is oxidized in an oxygen-containing plasma.

9. The method according to any one of the preceding claims, characterized in that the glass is evaporated by means of electron beam evaporation.

10. The method according to any one of the preceding claims, characterized in that the polymer-containing layer having a thickness in the range of 0.25 .mu.m to 200 .mu.m, preferably in the range of 0.5 .mu.m to 100 .mu.m is deposited.

11. The method according to any one of the preceding claims, characterized in that a polymer-containing layer containing silicon is deposited.

12. The method according to claim 11, characterized in that a polymer-containing layer is deposited with a SiO _x Hy-containing polymer.

13. The method according to claim 11 or 12, characterized in that a polymer-containing layer containing silicone is deposited.

14. The method according to any one of the preceding claims, characterized in that a polymeric blend system is deposited.

15. The method according to any one of the preceding claims, characterized in that a polymer-containing layer is deposited with at least one filler.

16. The method according to any one of the preceding claims, characterized in that a polymer-containing Layer is applied, which contains nanoparticles.

17. The method according to claim 16, characterized in that a polymer-containing layer is applied, which contains nanotubes.

18. The method according to any one of the preceding claims, characterized in that the surface of the polymer-containing layer is coated with particles, in particular with nanoparticles.

19. The method according to claim 18, characterized in that the particles are attracted by the surface of the polymer-containing layer in the occupancy by different charges on the surface and particles.

20. The method according to any one of the preceding claims, characterized in that nanoparticles and glass are applied simultaneously.

21. The method according to any one of the preceding claims, characterized in that a polymer-containing layer is deposited, which contains silicon-containing particles.

22. The method according to claim 21, characterized in that a polymer-containing layer is deposited, which contains silicon particles or SiO particles.

23. The method according to any one of the preceding claims, characterized in that before the deposition of Glass layer, a primer layer on the polymer-containing layer is produced.

24. The method according to any one of the preceding claims, characterized in that before the deposition of the glass layer, a primer layer on the polymer-containing layer having a thickness of less than 50 nm, preferably less than 20 nm, more preferably less than 10 nm is generated.

25. ^' Method according to one of the preceding claims, characterized in that a layer is deposited on the polymer-containing layer before the deposition of the glass layer, which at least one of the constituents

a metal, in particular Si, Al, B, Ti, V, Cr, an oxide, in particular an alkali or alkaline earth oxide, or an oxide of Si, Al, B, Ti, V, Cr, a halide, in particular a Alkali or alkaline earth halide,

contains a layer-forming compound, in particular M0S2.

26. The method according to any one of the preceding claims, characterized in that before the deposition of the

Glass layer is deposited a layer on the polymer-containing layer with a precursor compound, which converts when heated in an adhesion-promoting compound.

27. The method according to claim 26, characterized in that a layer on the polymer-containing layer with a precursor compound, in particular a Alkaliformiat, which forms an alkali oxide when heated.

28. The method according to any one of the preceding claims, characterized in that the polymer-containing layer is deposited by means of plasma-assisted chemical vapor deposition on the substrate.

29. Product, in particular producible with a

Method according to one of the preceding claims, comprising a support, a polymer-containing layer applied thereto and a vapor-deposited glass layer deposited on the polymer-containing layer.

30. Product according to claim 29, characterized in that the glass layer comprises an at least binary glass.

31. A product according to claim 29 or 30, characterized in that the glass layer comprises an alkaline glass.

32. Product according to one of the preceding claims, characterized in that the surface of the

Polymer-containing layer is partially oxidized.

33. Product according to one of the preceding claims, characterized in that the polymer-containing layer has a thickness in the range of 0.25 μm to 200 μm, preferably in the range of 0.5 μm to 100 μm.

34. Product according to one of the preceding claims, characterized in that the polymer-containing layer contains silicon.

35. A product according to claim 34, characterized in that the polymer-containing layer comprises a SiO _x H _y -containing polymer.

36. A product according to claim 34 or 35, characterized in that the polymer-containing layer contains silicone.

37. Product according to one of the preceding claims, characterized in that the polymer-containing layer comprises a polymeric blend system.

38. Product according to one of the preceding claims, characterized in that the polymer-containing

Layer contains at least one filler.

39. Product according to one of the preceding claims, characterized in that the polymer-containing layer contains nanoparticles.

40. Product according to claim 39, characterized in that the polymer-containing layer contains nanotubes.

41. Product according to claim 39 or 40, characterized in that the polymer-containing layer contains silicon-containing particles, in particular silicon particles or SiO particles.

42. Product according to one of the preceding claims, characterized in that the surface of the polymer-containing layer is coated with particles, in particular with nanoparticles, and the glass layer is deposited over the nanoparticles.

43. Product according to one of the preceding claims, characterized in that nanoparticles are embedded in the glass layer.

44. Product according to one of the preceding claims, characterized in that the glass layer is deposited on an adhesive layer arranged on the polymer-containing layer.

45. Product according to claim 44, characterized in that the adhesion promoter layer has a thickness smaller

50 nm, preferably less than 20 nm, more preferably less than 10 nm.

46. Product according to one of the preceding claims, characterized in that the glass layer on a disposed on the polymer-containing layer of adhesive layer, which at least one of the constituents

a layer-forming compound, in particular M0S2 contains, is applied.

47. Product according to one of the preceding claims, characterized in that the glass layer is deposited on a disposed on the polymer-containing layer of adhesion promoter layer containing alkali metal oxide, in particular alkali metal formate.

48. Product according to one of the preceding claims, comprising an electrical or elektonisches, in particular optoelectronic device.

49. Product according to one of the preceding claims, comprising an OLED element.

50. A product according to any one of the preceding claims, comprising an organic display or an organic photovoltaic element or an organic circuit or an organic FET

51. Method for the encapsulation of electrical or electronic, in particular optoelectronic components, characterized in that the component is provided with a method according to one of claims 1 to 28 with a glass layer.