WO2007015380A1 - Particules fines conductrices transparentes, leur procede de production, et dispositif electro-optique - Google Patents

Particules fines conductrices transparentes, leur procede de production, et dispositif electro-optique Download PDF

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Publication number
WO2007015380A1
WO2007015380A1 PCT/JP2006/314535 JP2006314535W WO2007015380A1 WO 2007015380 A1 WO2007015380 A1 WO 2007015380A1 JP 2006314535 W JP2006314535 W JP 2006314535W WO 2007015380 A1 WO2007015380 A1 WO 2007015380A1
Authority
WO
WIPO (PCT)
Prior art keywords
fine particles
transparent conductive
powder
thin film
particles
Prior art date
Application number
PCT/JP2006/314535
Other languages
English (en)
Japanese (ja)
Inventor
Takayuki Abe
Yuuji Honda
Original Assignee
Youtec Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Youtec Co., Ltd. filed Critical Youtec Co., Ltd.
Publication of WO2007015380A1 publication Critical patent/WO2007015380A1/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/223—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating specially adapted for coating particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

L'invention concerne des particules ultrafines conductrices transparentes ayant une haute conductivité et une transmittance ou des particules fines conductrices transparentes produites par enduction de fines particules d'un mince film conducteur transparent. L'invention concerne également leur procédé de production et un dispositif électro-optique. Les fines particules conductrices transparentes sont caractérisées en ce que les surfaces de fines particules (3) sont respectivement recouvertes de particules ultrafines conductrices transparentes au diamètre inférieur à celui des fines particules ou d'un mince film conducteur transparent par rotation d'un contenant à vide (1) ayant une coupe transversale interne polygonale autour de l'axe de rotation sensiblement perpendiculaire à la coupe transversale, ce qui entraîne une pulvérisation pendant le brassage ou la rotation des fines particules (3) dans le contenant à vide (1).
PCT/JP2006/314535 2005-08-03 2006-07-18 Particules fines conductrices transparentes, leur procede de production, et dispositif electro-optique WO2007015380A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005225147A JP2007042419A (ja) 2005-08-03 2005-08-03 透明導電性微粒子及びその製造方法、電気光学装置
JP2005-225147 2005-08-03

Publications (1)

Publication Number Publication Date
WO2007015380A1 true WO2007015380A1 (fr) 2007-02-08

Family

ID=37708659

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2006/314535 WO2007015380A1 (fr) 2005-08-03 2006-07-18 Particules fines conductrices transparentes, leur procede de production, et dispositif electro-optique

Country Status (2)

Country Link
JP (1) JP2007042419A (fr)
WO (1) WO2007015380A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016108618A (ja) * 2014-12-05 2016-06-20 国立大学法人豊橋技術科学大学 成膜用原料粉体およびセラミックス膜

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4999167B2 (ja) * 2007-06-15 2012-08-15 株式会社アルバック 同軸型真空アーク蒸着源を用いるナノ粒子の担持方法
JP5661965B1 (ja) * 2014-06-17 2015-01-28 株式会社ジーエル・マテリアルズホールディングス 有機系太陽電池用材料及びそれを用いた有機系太陽電池、並びに、その材料の製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10121102A (ja) * 1996-10-15 1998-05-12 Nisshin Steel Co Ltd 白色導電性複合粉末
JPH11273872A (ja) * 1998-01-22 1999-10-08 Kawaguchiko Seimitsu Kk エレクトロルミネッセンス
JP2001303036A (ja) * 2000-04-19 2001-10-31 Kasei Optonix Co Ltd 蛍光体の表面処理方法及び蛍光膜
WO2004059031A1 (fr) * 2002-12-25 2004-07-15 Youtec Co.,Ltd. Dispositif de projection a tube polygonal, procede de projection faisant appel a un tube polygonal, particules enrobees formees par le biais du dispositif et du procede susmentionnes, microcapsule et procede de fabrication de cette microcapsule
WO2005004545A1 (fr) * 2003-07-02 2005-01-13 Matsushita Electric Industrial Co., Ltd. Element electroluminescent et dispositif d'affichage

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10121102A (ja) * 1996-10-15 1998-05-12 Nisshin Steel Co Ltd 白色導電性複合粉末
JPH11273872A (ja) * 1998-01-22 1999-10-08 Kawaguchiko Seimitsu Kk エレクトロルミネッセンス
JP2001303036A (ja) * 2000-04-19 2001-10-31 Kasei Optonix Co Ltd 蛍光体の表面処理方法及び蛍光膜
WO2004059031A1 (fr) * 2002-12-25 2004-07-15 Youtec Co.,Ltd. Dispositif de projection a tube polygonal, procede de projection faisant appel a un tube polygonal, particules enrobees formees par le biais du dispositif et du procede susmentionnes, microcapsule et procede de fabrication de cette microcapsule
WO2005004545A1 (fr) * 2003-07-02 2005-01-13 Matsushita Electric Industrial Co., Ltd. Element electroluminescent et dispositif d'affichage

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016108618A (ja) * 2014-12-05 2016-06-20 国立大学法人豊橋技術科学大学 成膜用原料粉体およびセラミックス膜

Also Published As

Publication number Publication date
JP2007042419A (ja) 2007-02-15

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