WO2006136352A3 - Objektiv mit relativer positionsbestimmung optischer elemente - Google Patents
Objektiv mit relativer positionsbestimmung optischer elemente Download PDFInfo
- Publication number
- WO2006136352A3 WO2006136352A3 PCT/EP2006/005855 EP2006005855W WO2006136352A3 WO 2006136352 A3 WO2006136352 A3 WO 2006136352A3 EP 2006005855 W EP2006005855 W EP 2006005855W WO 2006136352 A3 WO2006136352 A3 WO 2006136352A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- relative position
- lens
- optical elements
- determination
- optical element
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/003—Alignment of optical elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/12—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means
- G01D5/14—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means influencing the magnitude of a current or voltage
- G01D5/20—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means influencing the magnitude of a current or voltage by varying inductance, e.g. by a movable armature
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/12—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means
- G01D5/14—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means influencing the magnitude of a current or voltage
- G01D5/24—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means influencing the magnitude of a current or voltage by varying capacitance
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/62—Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/021—Mountings, adjusting means, or light-tight connections, for optical elements for lenses for more than one lens
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/028—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/14—Mountings, adjusting means, or light-tight connections, for optical elements for lenses adapted to interchange lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lens Barrels (AREA)
Abstract
Die Erfindung betrifft ein Objektiv mit mehreren in einem Objektivgehäuse angeordneten optischen Elementen, wobei zur relativen Positionsbestimmung zwischen einem ersten optischen Element und einem zweiten optischen Element oder zwischen einem lasttragenden Strukturelement des Objektivs und einem zweiten optischen Element wenigstens eine Sensoranordnung mit wenigstens einer kapazitiven Sensoreinheit und/oder wenigstens einer induktiven Sensoreinheit vorgesehen ist.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/916,470 US8717534B2 (en) | 2005-06-20 | 2006-06-19 | Lens comprising a plurality of optical element disposed in a housing |
US14/227,107 US9097985B2 (en) | 2005-06-20 | 2014-03-27 | Lens comprising a plurality of optical element disposed in a housing |
US14/796,661 US9551940B2 (en) | 2005-06-20 | 2015-07-10 | Lens comprising a plurality of optical element disposed in a housing |
US15/411,391 US20170199465A1 (en) | 2005-06-20 | 2017-01-20 | Lens comprising a plurality of optical element disposed in a housing |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US69208005P | 2005-06-20 | 2005-06-20 | |
US60/692,080 | 2005-06-20 |
Related Child Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/916,470 A-371-Of-International US8717534B2 (en) | 2005-06-20 | 2006-06-19 | Lens comprising a plurality of optical element disposed in a housing |
US12/916,470 Continuation US8818000B2 (en) | 2008-04-25 | 2010-10-29 | System, device, and method utilizing an integrated stereo array microphone |
US14/227,107 Continuation US9097985B2 (en) | 2005-06-20 | 2014-03-27 | Lens comprising a plurality of optical element disposed in a housing |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2006136352A2 WO2006136352A2 (de) | 2006-12-28 |
WO2006136352A3 true WO2006136352A3 (de) | 2007-03-08 |
Family
ID=36933430
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2006/005855 WO2006136352A2 (de) | 2005-06-20 | 2006-06-19 | Objektiv mit relativer positionsbestimmung optischer elemente |
Country Status (2)
Country | Link |
---|---|
US (4) | US8717534B2 (de) |
WO (1) | WO2006136352A2 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8717534B2 (en) | 2005-06-20 | 2014-05-06 | Carl Zeiss Smt Gmbh | Lens comprising a plurality of optical element disposed in a housing |
DE102008032853A1 (de) | 2008-07-14 | 2010-01-21 | Carl Zeiss Smt Ag | Optische Einrichtung mit einem deformierbaren optischen Element |
CN102722016B (zh) * | 2012-06-21 | 2014-08-20 | 中国科学院长春光学精密机械与物理研究所 | 光学元件Z、tip、tilt三自由度微动调整装置 |
DE102013204494A1 (de) * | 2013-03-14 | 2014-10-02 | Carl Zeiss Smt Gmbh | Positionssensor, sensoranordnung und lithographieanlage mit positionssensor |
CN106443936A (zh) * | 2016-10-09 | 2017-02-22 | 中国科学院长春光学精密机械与物理研究所 | 一种光学元件的五自由度微动调整机构 |
CN107505684B (zh) * | 2017-08-25 | 2020-04-28 | 南京理工大学 | 一种镜组的装调方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1245984A2 (de) * | 2001-03-27 | 2002-10-02 | Nikon Corporation | Optisches Projektionssystem sowie Projektionsbelichtungsgerät und -verfahren |
US20040239904A1 (en) * | 2000-02-25 | 2004-12-02 | Nikon Corporation | Exposure apparatus and exposure method capable of controlling illumination distribution |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2747999A (en) | 1998-03-26 | 1999-10-18 | Nikon Corporation | Projection exposure method and system |
JP3805323B2 (ja) * | 2003-05-21 | 2006-08-02 | キヤノン株式会社 | 露光装置、収差低減方法及び光学部材調整機構 |
US8717534B2 (en) | 2005-06-20 | 2014-05-06 | Carl Zeiss Smt Gmbh | Lens comprising a plurality of optical element disposed in a housing |
-
2006
- 2006-06-19 US US11/916,470 patent/US8717534B2/en active Active
- 2006-06-19 WO PCT/EP2006/005855 patent/WO2006136352A2/de active Application Filing
-
2014
- 2014-03-27 US US14/227,107 patent/US9097985B2/en active Active
-
2015
- 2015-07-10 US US14/796,661 patent/US9551940B2/en active Active
-
2017
- 2017-01-20 US US15/411,391 patent/US20170199465A1/en not_active Abandoned
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040239904A1 (en) * | 2000-02-25 | 2004-12-02 | Nikon Corporation | Exposure apparatus and exposure method capable of controlling illumination distribution |
EP1245984A2 (de) * | 2001-03-27 | 2002-10-02 | Nikon Corporation | Optisches Projektionssystem sowie Projektionsbelichtungsgerät und -verfahren |
Also Published As
Publication number | Publication date |
---|---|
US8717534B2 (en) | 2014-05-06 |
US20160041473A1 (en) | 2016-02-11 |
US20110051110A1 (en) | 2011-03-03 |
US20170199465A1 (en) | 2017-07-13 |
US9097985B2 (en) | 2015-08-04 |
WO2006136352A2 (de) | 2006-12-28 |
US20140293253A1 (en) | 2014-10-02 |
US9551940B2 (en) | 2017-01-24 |
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