WO2006069368A2 - Method and system for performing die attach using a flame - Google Patents
Method and system for performing die attach using a flame Download PDFInfo
- Publication number
- WO2006069368A2 WO2006069368A2 PCT/US2005/046999 US2005046999W WO2006069368A2 WO 2006069368 A2 WO2006069368 A2 WO 2006069368A2 US 2005046999 W US2005046999 W US 2005046999W WO 2006069368 A2 WO2006069368 A2 WO 2006069368A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- die
- substrate
- flame
- heat
- back side
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/01—Manufacture or treatment
- H10D64/011—Manufacture or treatment of electrodes ohmically coupled to a semiconductor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W95/00—Packaging processes not covered by the other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/016—Manufacture or treatment of strap connectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/072—Connecting or disconnecting of bump connectors
- H10W72/07202—Connecting or disconnecting of bump connectors using auxiliary members
- H10W72/07204—Connecting or disconnecting of bump connectors using auxiliary members using temporary auxiliary members, e.g. sacrificial coatings
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/072—Connecting or disconnecting of bump connectors
- H10W72/07231—Techniques
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/072—Connecting or disconnecting of bump connectors
- H10W72/07231—Techniques
- H10W72/07236—Soldering or alloying
Definitions
- the disclosed embodiments relate generally to the packaging of semiconductor devices and, more particularly, to a method and system for attaching a die to a substrate using a flame or other heat source.
- An integrated circuit (IC) die may be attached, both mechanically and electrically, to a package substrate.
- the IC die may have an array of bond pads on the die's "front" side, and a solder bump or other lead may be affixed to each of these bond pads.
- a mating array of lands is disposed on the package substrate, and the die is placed face down on the substrate such that the array of solder bumps extending from the die are aligned with the mating array of lands on the substrate. The solder bumps extending from the IC die are then coupled to their respective lands on the substrate.
- the package substrate may include multiple layers of conductors (e.g., traces), and these conductors can route electrical signals (running to and from the die) to locations on the package substrate where electrical connections can be established with a next-level component (e.g., a motherboard, a computer system, a circuit board, another IC device, etc.).
- a next-level component e.g., a motherboard, a computer system, a circuit board, another IC device, etc.
- the substrate circuitry may route all signal lines to a ball-grid array (or, alternatively, a pin-grid array) formed on a lower surface of the package substrate, and this ball- or pin- grid array then electrically couples the packaged IC die to the next-level component, which includes a mating array of terminals (e.g., lands, pin sockets, etc.).
- C4 Controlled Collapse Chip Connect
- an array of solder bumps extends from the front side of the IC die - each of these solder bumps being coupled with a bond pad on the die - and these solder bumps are coupled with a mating array of lands on the package substrate.
- the assembly e.g., die and substrate
- the assembly may be placed in an oven and heated to reflow the solder bumps.
- the reflow temperature may be approximately 225 degrees Celsius, and for lead-free solder compositions the reflow temperature may be approximately 260 degrees Celsius.
- both the die and substrate may be heated to the reflow temperature, which can lead to thermal expansion of these components.
- the coefficient of thermal expansion (CTE) of the IC die may be substantially different than the CTE of the package substrate.
- a die made of silicon will have a CTE of
- an organic substrate may have a CTE of approximately 3 ppm/°C, whereas an organic substrate may have a CTE of approximately
- the IC die's interconnect structure may be formed from a low-k dielectric material - which generally has lower mechanical strength in comparison to materials having a higher dielectric constant - and an interconnect structure formed from these low-k dielectric materials may be especially sensitive to cracking as a result of the above-described differential thermal displacement.
- FIG. 1 is a schematic diagram illustrating an embodiment of a method of attaching a die to a substrate using a flame or other heat source.
- FIGS. 2A-2E are schematic diagrams illustrating further embodiments of the method shown in FIG. 1.
- FIG. 3 is a graph showing one embodiment of the relationship between absorbed heat flux and pulse duration.
- FIG. 4 is a schematic diagram illustrating one embodiment of a system for attaching a die to a substrate using a flame or other heat source.
- FIG. 1 Illustrated in FIG. 1 is an embodiment of a method 100 of attaching an integrated circuit (IC) die to a substrate using a flame or other heat source. Embodiments of the method 100 of FIG. 1 are further illustrated in FIGS. 2A through 2E, and reference should be made to these figures as called out in the text below.
- FIG. 2A shows a die 220 that has been placed on a substrate 210.
- Substrate 210 may comprise a package substrate or other die carrier, a circuit board, or any other suitable board or substrate.
- the substrate 210 comprises a multilayer substrate including a number of alternating layers of metallization and dielectric material.
- Each layer of metallization comprises a number of conductors (e.g., traces), and these conductors may comprise any suitable conductive material, such as copper.
- each metal layer is separated from adjacent metal layers by the dielectric layers, and adjacent metal layers may be electrically interconnected by conductive vias.
- the dielectric layers may comprise any suitable insulating material - e.g., polymers, including both thermoplastic and thermosetting resins or epoxies, ceramics, etc. - and the alternating layers of metal and dielectric material may be built-up over a core layer of a dielectric material.
- the die 220 may comprise any type of integrated circuit device.
- the die 220 comprises a microprocessor, a network processor, an application specific integrated circuit (ASIC), a field programmable gate array (FPGA), or other processing system or device. It should, however, be understood that the disclosed embodiments are not limited to the aforementioned processing devices and, further, that the die 220 may comprise any other type of device (e.g., a wireless communication device, a chip set, a memory device, etc.).
- Die 220 includes a "front” side 221 and an opposing "back” side 222.
- the labels "front” side and “back” side are arbitrary, and the opposing surfaces 221, 222 of die 220 may be referenced by any other suitable terminology or nomenclature.
- the die 220 may, in one embodiment, have a layer of metal (or other material) disposed on the back side 222.
- the die back side 222 has no back side metallization.
- the back side surface may be in the "as is” condition after IC fabrication (e.g., a polished surface).
- an array of conductive bumps 230 or other conductive leads extends from the front side 221 of die 220, each of the conductive bumps being electrically connected to a bond pad (not shown in figures) on the die.
- the conductive bumps 230 comprise solder; however, in other embodiments the conductive bumps may comprise other materials (e.g., copper, aluminum, etc.).
- the array of conductive bumps 230 mates with a corresponding array of conductive lands (not shown in figures) formed on an upper surface 211 of the substrate 210.
- conductive bumps 230 When the conductive bumps 230 are connected with their respective lands on substrate 210 (e.g., by a reflow process, as described below), electrical communication can be established between the die and substrate. It should be noted that, in other embodiments, an array of conductive bumps (or other leads) may extend from the substrate 210, and this array of leads mates with a corresponding array of bond pads on the die.
- a heat shield is placed over and/or around the die. This is illustrated in FIGS. 2B and 2C, which shows a heat shield 250 that has been disposed around the die 220.
- the heat shield 250 comprises a rectangular-shaped plate having an aperture 255 that is sized and oriented to receive the die 220.
- the back side 222 of die 220 will be subjected to a flame (or other heat source) during a die-attach process, and the heat shield may, in one embodiment, minimize heat transfer to the underlying substrate 210.
- the heat shield 250 may function to reduce thermal expansion of the substrate 210 — and, accordingly, differential thermal expansion between the die 220 and the substrate - as well as to protect the substrate 210 from excessive heat and/or heat-induced damage (e.g., charring, etc.).
- the aperture 255 in heat shield 250 functions to align the die 220 relative to substrate 210.
- Heat shield 250 may comprise any suitable material (or combination of materials), such as copper, aluminum, stainless steel, or a ceramic material. It should be understood that the heat shield 250 shown in the figures is US2005/046999
- the heat shield may comprise any suitable device, may be of any suitable shape or configuration, and may be constructed from any suitable materials or combination of materials.
- a flame or other heat source is applied to the back side of the die to initiate reflow or bonding of the die leads (and/or reflow or bonding of leads extending from the package substrate).
- FIG. 2D a flame 275 originating from a source 270 is applied to the back side 222 of die 220.
- the flame 275 may, in one embodiment, extend down to the die back side 222. In another embodiment, the flame 275 is in close proximity to the die back side 222.
- the flame encompasses substantially all of the die back side 222, whereas in a further embodiment the flame encompasses a portion of the die back side 222 and/or is targeted at a specific region of the die back side.
- the flame is directed at the die 220, and a substantial portion of the heat shield is not directly subjected to the flame (although portions of the heat shield proximate the aperture 255 may be directly subjected to the flame 275), which may result in localized heating of the die. In other embodiments, however, the flame 275 may extend down to and over a substantial portion of the heat shield 250.
- the flame 275 may be produced by any suitable source 270.
- the flame may be produced by combustion of acetylene, butane, propane, MAPP (methylacetylene propadiene), or other combustible gas.
- the flame is produced by a combustible liquid (e.g., kerosene) or a combustible solid material.
- the disclosed embodiments are not limited to a heat source that produces a flame.
- the heat source may comprise super heated air, plasma, or steam.
- the flame 275 should heat the die 220 to a temperature sufficient to initiate reflow of the solder bumps 230 (or, more generally, to initiate bonding of the die leads to the substrate).
- the temperature at the die front side 221 reaches approximately 225 degrees Celsius, or greater. In a further embodiment, the temperature at the die front side 221 does not exceed approximately 415 degrees Celsius during reflow.
- the flame 275 (or, more generally, the supplied energy) may be localized at the die 220, which can help to minimize heat transfer to the substrate 210 (and heat shield 250). Heat transfer to, and heating of, the substrate 210 can also be reduced by minimizing the duration of the applied flame (or other energy pulse).
- FIG. 3 illustrated is an exemplary embodiment of a relationship between absorbed heat flux (at the die back surface 222) and heat pulse duration. As can be observed from this graph, as the pulse duration decreases, the absorbed heat flux needed at the die surface will increase. However, although the absorbed heat flux increases, heat transfer to the substrate is still minimized due to the short pulse duration.
- the flame 275 is applied for a pulse duration of approximately 2 seconds, or less.
- the absorbed heat flux at the die back side 222 is approximately 40 W/cm 2 , or greater.
- the absorbed heat flux (and incident heat flux) spatially varies across the die back surface 222.
- the absorbed heat flux may be greatest proximate the die's periphery and decrease toward the center of the die. It should be noted that the thermal efficiency of heat transfer from the flame to the die will likely not achieve 100 percent - and, in practice, may be much less than 100 percent - and the incident heat flux needed at the die back surface 222 may be significantly greater than the absorbed heat flux.
- the absorbed heat flux and pulse duration will be dependent upon the die material, die thickness, and die size, as well as other factors, and the actual values of these and other parameters will vary on a case-by-case basis. Thus, no unnecessary limitations should be drawn from FIG. 3 and the examples set forth above. [0019] According to one embodiment, while the die 220 is heated to a temperature sufficient to initiate reflow or bonding, the substrate 210 is not substantially heated (and/or only minimal portions of the substrate 210 are substantially heated). Reduced heating of the substrate 210 results, at least in part, from the use of heat shield 250, from the localized heating of the die 220, and/or from the rapid heating (e.g., short pulse duration) of the die.
- the substrate 210 is not substantially heated, the thermal expansion of this component during die attach is significantly reduced (or, perhaps, eliminated). Thus, the residual stresses - and the resultant damage, such as die cracking or warpage - that can be caused by differential thermal displacement between the die and substrate is minimized.
- the die 220 is both mechanically and electrically attached to the substrate 210. This is illustrated in FIG. 2E, which shows an assembly 200 including the die 220 and substrate 210, wherein the reflowed solder bumps 230 now form solid interconnects between the die and substrate.
- a cleaning process may be performed.
- the flame attach process may produce by-products, such as oxides and/or carbon- or hydrocarbon-containing substances, and a cleaning process may be employed to remove these by-products. Any suitable cleaning process or cleaning solutions may be used to clean the assembly 200.
- the assembly 200 may be cleaned by rinsing the assembly using - or by immersing the assembly in - a solvent or flux.
- the by-products of the flame attach process may be cleaned using a solution including alcohol, acetone, or water.
- a cool down period may be needed prior to cleaning.
- the system 400 includes a device 405 (e.g., a tray, chuck, clamp, etc.) for holding a substrate 410.
- System 400 also includes a pick-and-place machine 490.
- the pick-and-place machine may include a first tool 401 for holding and moving a die 420 (that is to be placed on substrate 410).
- Pick- and-place machine 490 may include a second tool 402 for holding and moving a heat shield 450 (that is to be placed over and/or around the die 420 during die attach).
- the heat shield 450 includes an aperture 455 that is sized and oriented to receive the die 420.
- the pick-and-place machine 490 may further include a third tool 403 for moving and/or supplying a flame source 470 (or other heat source).
- the pick-and-place machine 490 may position the die 420 on substrate 410, and this machine may also position the heat shield 450 over and/or around the die 420. Either the die 420 or heat shield 450 may first be placed over the substrate 410, and the aperture 455 in heat shield 450 may function to align the die 420 on the substrate.
- the flame source 470 is also positioned by pick-and-place machine 490 at the desired position relative to the die and substrate.
- the pick-and-place machine may further be used to place the substrate 410 on holding device 405. With the substrate 410, die 420, heat shield 450, and heat source 470 appropriately positioned, attachment of the die 420 to substrate 410 may be performed using a flame produced by source 470, as described above (see FIGS. 1-3 and the accompanying text).
Landscapes
- Wire Bonding (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Die Bonding (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/020,433 US7288472B2 (en) | 2004-12-21 | 2004-12-21 | Method and system for performing die attach using a flame |
| US11/020,433 | 2004-12-21 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2006069368A2 true WO2006069368A2 (en) | 2006-06-29 |
| WO2006069368A3 WO2006069368A3 (en) | 2006-10-26 |
Family
ID=36596470
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US2005/046999 Ceased WO2006069368A2 (en) | 2004-12-21 | 2005-12-21 | Method and system for performing die attach using a flame |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7288472B2 (en) |
| KR (1) | KR100891314B1 (en) |
| CN (1) | CN100474540C (en) |
| TW (1) | TWI283901B (en) |
| WO (1) | WO2006069368A2 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007180457A (en) * | 2005-12-28 | 2007-07-12 | Toyota Industries Corp | Soldering method, semiconductor module manufacturing method, and soldering apparatus |
| US20100047962A1 (en) * | 2008-08-19 | 2010-02-25 | Silverbrook Research Pty Ltd | Multi-chip printhead assembler |
| US9196573B2 (en) * | 2012-07-31 | 2015-11-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Bump on pad (BOP) bonding structure |
| US9673161B2 (en) | 2012-08-17 | 2017-06-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Bonded structures for package and substrate |
| TWI607587B (en) * | 2016-09-13 | 2017-12-01 | 台灣琭旦股份有限公司 | Solid crystal stabilization process |
| US11804467B2 (en) * | 2020-06-25 | 2023-10-31 | Micron Technology, Inc. | Radiative heat collective bonder and gangbonder |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3614832A (en) * | 1966-03-09 | 1971-10-26 | Ibm | Decal connectors and methods of forming decal connections to solid state devices |
| US3836745A (en) * | 1969-03-13 | 1974-09-17 | Argus Eng Co | Soldering method |
| US3735911A (en) * | 1971-04-30 | 1973-05-29 | Ibm | Integrated circuit chip repair tool |
| US4017963A (en) * | 1973-02-26 | 1977-04-19 | Signetics Corporation | Semiconductor assembly and method |
| DE2714483A1 (en) | 1975-09-15 | 1978-10-12 | Siemens Ag | Semi-automatic contacting device for semiconductor systems - has fluxless solder placed between contact parts |
| US4278867A (en) * | 1978-12-29 | 1981-07-14 | International Business Machines Corporation | System for chip joining by short wavelength radiation |
| JPS577145A (en) | 1980-06-16 | 1982-01-14 | Toshiba Corp | Soldering method of terminal for electronic parts |
| JPS5720441A (en) * | 1980-07-11 | 1982-02-02 | Hitachi Ltd | Exchanging device for semiconductor element |
| US4506139A (en) * | 1983-04-04 | 1985-03-19 | Honeywell Inc. | Circuit chip |
| US4582975A (en) * | 1983-04-04 | 1986-04-15 | Honeywell Inc. | Circuit chip |
| JPH01217935A (en) * | 1988-02-26 | 1989-08-31 | Hitachi Ltd | Manufacture of semiconductor device and apparatus thereof |
| KR100377981B1 (en) * | 1994-06-07 | 2003-05-27 | 텍사스 인스트루먼츠 인코포레이티드 | Optical Curing Process for Integrated Circuit Packge Assembly |
| US5532457A (en) * | 1994-06-22 | 1996-07-02 | International Business Machines Corporation | Modified quartz plate to provide non-uniform light source |
| US5514247A (en) | 1994-07-08 | 1996-05-07 | Applied Materials, Inc. | Process for plasma etching of vias |
| US6730541B2 (en) | 1997-11-20 | 2004-05-04 | Texas Instruments Incorporated | Wafer-scale assembly of chip-size packages |
| JP2000260815A (en) * | 1999-03-10 | 2000-09-22 | Mitsubishi Electric Corp | Method and apparatus for melting bump and method for manufacturing semiconductor device |
| US6384366B1 (en) * | 2000-06-12 | 2002-05-07 | Advanced Micro Devices, Inc. | Top infrared heating for bonding operations |
| US6496559B1 (en) * | 2000-06-28 | 2002-12-17 | Advanced Micro Devices, Inc. | Sample preparation for inspection of ball contacts and internal vias |
| US6442234B1 (en) * | 2000-10-03 | 2002-08-27 | Advanced Micro Devices, Inc. | X-ray inspection of ball contacts and internal vias |
| US6713318B2 (en) * | 2001-03-28 | 2004-03-30 | Intel Corporation | Flip chip interconnection using no-clean flux |
| US6926190B2 (en) * | 2002-03-25 | 2005-08-09 | Micron Technology, Inc. | Integrated circuit assemblies and assembly methods |
| US6861278B2 (en) * | 2002-04-11 | 2005-03-01 | Nordson Corporation | Method and apparatus for underfilling semiconductor devices |
| US7064004B2 (en) * | 2003-12-29 | 2006-06-20 | Intel Corporation | Induction-based heating for chip attach |
-
2004
- 2004-12-21 US US11/020,433 patent/US7288472B2/en not_active Expired - Fee Related
-
2005
- 2005-12-21 WO PCT/US2005/046999 patent/WO2006069368A2/en not_active Ceased
- 2005-12-21 KR KR1020077014149A patent/KR100891314B1/en not_active Expired - Fee Related
- 2005-12-21 CN CNB2005800440960A patent/CN100474540C/en not_active Expired - Fee Related
- 2005-12-21 TW TW094145572A patent/TWI283901B/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| US7288472B2 (en) | 2007-10-30 |
| KR100891314B1 (en) | 2009-04-01 |
| WO2006069368A3 (en) | 2006-10-26 |
| KR20070086526A (en) | 2007-08-27 |
| CN100474540C (en) | 2009-04-01 |
| CN101084576A (en) | 2007-12-05 |
| TW200636879A (en) | 2006-10-16 |
| US20060134830A1 (en) | 2006-06-22 |
| TWI283901B (en) | 2007-07-11 |
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