WO2006060360A3 - Module de retrecissement de ligne - Google Patents

Module de retrecissement de ligne Download PDF

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Publication number
WO2006060360A3
WO2006060360A3 PCT/US2005/043056 US2005043056W WO2006060360A3 WO 2006060360 A3 WO2006060360 A3 WO 2006060360A3 US 2005043056 W US2005043056 W US 2005043056W WO 2006060360 A3 WO2006060360 A3 WO 2006060360A3
Authority
WO
WIPO (PCT)
Prior art keywords
center wavelength
laser light
dispersive
wavelength selection
light pulse
Prior art date
Application number
PCT/US2005/043056
Other languages
English (en)
Other versions
WO2006060360A2 (fr
Inventor
Martin J Algots
Robert A Bergstedt
Walter D Gillespie
Vladimir A Kulgeyko
William N Partlo
German E Rylov
Richard L Sandstrom
Brian D Strate
Timothy S Dyer
Original Assignee
Cymer Inc
Martin J Algots
Robert A Bergstedt
Walter D Gillespie
Vladimir A Kulgeyko
William N Partlo
German E Rylov
Richard L Sandstrom
Brian D Strate
Timothy S Dyer
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer Inc, Martin J Algots, Robert A Bergstedt, Walter D Gillespie, Vladimir A Kulgeyko, William N Partlo, German E Rylov, Richard L Sandstrom, Brian D Strate, Timothy S Dyer filed Critical Cymer Inc
Priority to JP2007544429A priority Critical patent/JP5030786B2/ja
Priority to EP13179720.1A priority patent/EP2665141B1/fr
Priority to KR1020077012317A priority patent/KR101147316B1/ko
Priority to KR1020127002413A priority patent/KR101235047B1/ko
Priority to EP05826233.8A priority patent/EP1831974B1/fr
Publication of WO2006060360A2 publication Critical patent/WO2006060360A2/fr
Publication of WO2006060360A3 publication Critical patent/WO2006060360A3/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08059—Constructional details of the reflector, e.g. shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2251—ArF, i.e. argon fluoride is comprised for lasing around 193 nm

Abstract

Procédé de rétrécissement de ligne et module pour laser de décharge de gaz à haute vitesse de répétition haute puissance DUV à bande étroite produisant des impulsions de faisceau d'impulsion de lumière laser sous forme de rafales d'impulsions, le module comprenant un trajet optique nominal susceptible de comprendre: des éléments optiques de sélection de longueur d'onde au centre par dispersion montés de manière détachable au sein d'un trajet optique du module de rétrécissement de ligne, afin de sélectionner au moins une longueur d'onde de centre pour chaque impulsion déterminée au moins partiellement par l'angle d'incidence du faisceau d'impulsion de lumière laser contenant l'impulsion respective sur les éléments optiques de sélection de longueur d'onde par dispersion; un premier mécanisme d'accord servant partiellement à sélectionner un angle d'incidence du fait de l'impulsion de lumière laser contenant l'impulsion respective sur les éléments otiques de sélection de longueur d'onde au centre par dispersion au moyen de la sélection d'un angle de transmission du faisceau d'impulsion de lumière laser contenant l'impulsion dirigée vers les éléments optiques de sélection de longueur d'onde au centre par dispersion; un second mécanisme d'accord servant partiellement à sélectionner un angle d'incidence du faisceau d'impulsion de lumière laser contenant l'impulsion respective au moyen de la modification de la position des éléments otiques de sélection par rapport au trajet optique nominal du module de rétrécissement de ligne; un second mécanisme d'accord sélectionne grossièrement une valeur pour la longueur d'onde au centre alors que le premier mécanisme d'accord effectue une sélection plus précise de la valeur de la longueur d'onde au centre.
PCT/US2005/043056 2004-11-30 2005-11-28 Module de retrecissement de ligne WO2006060360A2 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2007544429A JP5030786B2 (ja) 2004-11-30 2005-11-28 線狭帯域化モジュール
EP13179720.1A EP2665141B1 (fr) 2004-11-30 2005-11-28 Module de rétrécissement de ligne
KR1020077012317A KR101147316B1 (ko) 2004-11-30 2005-11-28 라인 내로우잉 모듈
KR1020127002413A KR101235047B1 (ko) 2004-11-30 2005-11-28 라인 내로우잉 모듈
EP05826233.8A EP1831974B1 (fr) 2004-11-30 2005-11-28 Module de retrecissement de ligne

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/000,684 2004-11-30
US11/000,684 US7366219B2 (en) 2004-11-30 2004-11-30 Line narrowing module

Publications (2)

Publication Number Publication Date
WO2006060360A2 WO2006060360A2 (fr) 2006-06-08
WO2006060360A3 true WO2006060360A3 (fr) 2006-10-26

Family

ID=36565613

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/043056 WO2006060360A2 (fr) 2004-11-30 2005-11-28 Module de retrecissement de ligne

Country Status (6)

Country Link
US (4) US7366219B2 (fr)
EP (2) EP2665141B1 (fr)
JP (1) JP5030786B2 (fr)
KR (2) KR101235047B1 (fr)
TW (1) TWI281296B (fr)
WO (1) WO2006060360A2 (fr)

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US8837536B2 (en) 2010-04-07 2014-09-16 Cymer, Llc Method and apparatus for controlling light bandwidth
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WO2016075806A1 (fr) * 2014-11-14 2016-05-19 ギガフォトン株式会社 Module à rétrécissement de bande, dispositif laser à rétrécissement de bande, et procédé de positionnement d'un module à rétrécissement de bande
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WO2018229854A1 (fr) 2017-06-13 2018-12-20 ギガフォトン株式会社 Appareil laser et procédé de fabrication d'un élément optique
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WO2021133568A1 (fr) 2019-12-23 2021-07-01 Cymer, Llc Filtre à lit tassé pour piégeage de poussière de fluorure métallique dans des chambres de décharge laser
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Also Published As

Publication number Publication date
US20110194580A1 (en) 2011-08-11
JP2008522439A (ja) 2008-06-26
EP1831974A4 (fr) 2010-11-24
KR20120025004A (ko) 2012-03-14
JP5030786B2 (ja) 2012-09-19
US20100097704A1 (en) 2010-04-22
EP2665141B1 (fr) 2019-04-03
KR20070084624A (ko) 2007-08-24
KR101147316B1 (ko) 2012-05-18
US20060114957A1 (en) 2006-06-01
US7653112B2 (en) 2010-01-26
US8126027B2 (en) 2012-02-28
WO2006060360A2 (fr) 2006-06-08
TW200627736A (en) 2006-08-01
TWI281296B (en) 2007-05-11
KR101235047B1 (ko) 2013-02-21
US7366219B2 (en) 2008-04-29
EP1831974A2 (fr) 2007-09-12
EP1831974B1 (fr) 2017-02-08
EP2665141A1 (fr) 2013-11-20
US20080151944A1 (en) 2008-06-26

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