WO2006059415A1 - Polyimide, polyimide film and laminated body - Google Patents

Polyimide, polyimide film and laminated body Download PDF

Info

Publication number
WO2006059415A1
WO2006059415A1 PCT/JP2005/016200 JP2005016200W WO2006059415A1 WO 2006059415 A1 WO2006059415 A1 WO 2006059415A1 JP 2005016200 W JP2005016200 W JP 2005016200W WO 2006059415 A1 WO2006059415 A1 WO 2006059415A1
Authority
WO
WIPO (PCT)
Prior art keywords
polyimide
film
component
starting
dianhydride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2005/016200
Other languages
French (fr)
Other versions
WO2006059415A8 (en
Inventor
Hiroaki Yamaguchi
Masato Murakami
Masafumi Kohda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to US11/667,372 priority Critical patent/US8518550B2/en
Priority to CN2005800413361A priority patent/CN101068851B/en
Publication of WO2006059415A1 publication Critical patent/WO2006059415A1/en
Anticipated expiration legal-status Critical
Publication of WO2006059415A8 publication Critical patent/WO2006059415A8/en
Ceased legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1042Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
    • C08G73/1071Wholly aromatic polyimides containing oxygen in the form of ether bonds in the main chain
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12556Organic component
    • Y10T428/12569Synthetic resin
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31678Of metal
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31678Of metal
    • Y10T428/31681Next to polyester, polyamide or polyimide [e.g., alkyd, glue, or nylon, etc.]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31721Of polyimide

Definitions

  • the present invention relates to a novel polyimide, a polyimide film and a laminated body and, more specifically, it relates to a polyimide with a high moisture permeation rate and improved adhesion, wherein the starting tetracarboxylic dianhydride component is a tetracarboxylic dianhydride comprising 3, 3',4,4'- biphenyltetracarboxylic dianhydride as an essential component and the starting diamine component is a diamine comprising an aromatic diamine with a specific structure as an essential component, as well as to a polyimide film having a polyimide layer composed of the polyimide on at least one side, and a laminated body thereof.
  • the starting tetracarboxylic dianhydride component is a tetracarboxylic dianhydride comprising 3, 3',4,4'- biphenyltetracarboxylic dianhydride as an essential component
  • the starting diamine component is a diamine comprising
  • Films made of such polyimides have excellent thermal properties and electrical properties and are therefore widely employed in electronic devices.
  • a high adhesive strength cannot be obtained with adhesives ordinarily used in the field of electronics, and laminated bodies with high peel strengths cannot be obtained by forming metal layers by metal vapor deposition or sputtering.
  • a film composed of such a polyimide has low saturated water absorptivity and a low hygroscopic expansion coefficient and therefore has the advantage of dimensional stability against environmental changes.
  • the trace moisture remaining on the base cannot parmeate the cover lay film and causes foaming or peeling at the adhesive interface.
  • polyimide films with improved adhesion which comprise 0.02-1 wt% of compounds of tin, bismuth or antimony (Japanese Unexamined Patent Publication HEI No. 4-261466, Japanese Unexamined Patent Publication HEI No. 6-299883, Japanese Patent Public Inspection HEI No. 7-503984) .
  • such polyimide films potentially exhibit poorer electrical properties such as electrical insulation.
  • techniques for improving the adhesion of polyimide films by plasma discharge treatment Japanese Unexamined Patent Publication SHO No. 59-86634, Japanese Unexamined Patent Publication HEI No. 2-134241) .
  • the invention relates to a novel polyimide wherein a tetracarboxylic dianhydride comprising 3, 3' , 4, 4 ' -biphenyltetracarboxylic dianhydride as the essential component is the starting tetracarboxylic dianhydride component, and an amine comprising between 0.5 and 30 mole percent of a diamine represented by the following general formula is the starting diamine component.
  • Ri-R 4 each represent a substituent selected from among hydrogen, hydroxyl, carboxyl, Cl- ⁇ hydrocarbon groups, Cl-6 alkoxy groups and carboalkoxy groups, at least one of Ri and R2 is not hydrogen and at least one of R 3 and R 4 is not hydrogen.
  • the invention further relates to a film having on at least one side thereof a layer made of the aforementioned polyimide.
  • the invention still further relates to a laminated body obtained by laminating a base either directly or via a heat-resistant adhesive, onto at least one side of a layer made of the aforementioned polyimide.
  • the polyimide of the invention can yield a molded article with an improved surface adhesion property and moisture permeation rate, and even with a high elastic modulus, without surface treatment of the molded article.
  • the polyimide film of the invention can also exhibit an improved surface adhesion property and moisture permeation rate even with a high elastic modulus, without surface treatment.
  • the laminated body of the invention comprises a novel polyimide film with improvement in adhesion with the base and the moisture permeation rate, while maintaining heat resistance, a high elastic modulus and a low linear expansion coefficient, and is therefore resistant to foaming and peeling at the adhesion interface during high-temperature treatment steps.
  • the aforementioned polyimide wherein the saturated water absorptivity is between 1.3% and 3%.
  • the aforementioned polyimide film wherein the elastic modulus is at least 400 kg/mm 2 and less than 900 kg/mm 2 .
  • the aforementioned laminated body wherein the base is a metal layer.
  • the aforementioned laminated body wherein the base is a metal foil, and particularly a copper foil.
  • the polyimide precursor composition used to obtain the polyimide of the invention may be obtained by using an organic solvent for polymerization of, for example, a tetracarboxylic dianhydride comprising 3, 3',4,4'- biphenyltetracarboxylic dianhydride as the essential component, and a diamine component comprising an aromatic diamine represented by the aforementioned general formula at 0.5-30 mole percent and preferably 1-20 mole percent of the total diamines.
  • tetracarboxylic dianhydride there may be mentioned 3, 3' , 4, 4 ' -biphenyltetracarboxylic dianhydride and pyromellitic dianhydride.
  • diamine component other than an aromatic diamine represented by the aforementioned general formula for the diamine component there may be mentioned para-phenylenediamine.
  • the tetracarboxylic dianhydride preferably comprises 3, 3' , 4, 4 ' -biphenyltetracarboxylic dianhydride at 7.5-100 mole percent and especially 15-100 mole percent and pyromellitic dianhydride at 0-92.5 mole percent and especially 0-85 mole percent, based on the total aromatic tetracarboxylic dianhydrides, among which the use of 3, 3', 4, 4 ' -biphenyltetracarboxylic dianhydride alone is particularly preferred.
  • the polyimide precursor is preferably present at 1- 20 wt% in the organic solvent solution containing the polyimide precursor.
  • an aromatic tetracarboxylic dianhydride including 3, 3', 4, 4 ' -biphenyltetracarboxylic dianhydride as the starting acid dianhydride component, and a combination of para-phenylenediamine and an aromatic diamine with a structure represented by the aforementioned general formula in the proportion mentioned above as the starting diamine component, in order to obtain a polyimide and polyimide film with a high elastic modulus, a high moisture permeation rate and improved adhesion.
  • the polyimide precursor composition which yields a polyimide according to the invention may be obtained by mixing (a) a polyimide precursor solution prepared by polymerization of 3,3',4,4'- biphenyltetracarboxylic dianhydride and para- phenylenediamine in an organic solvent, at 70-99.5 wt% and preferably 80-99 wt% of the total weight of the polyimide precursor, and (b) a polyimide precursor solution prepared by polymerization of 3,3',4,4'- biphenyltetracarboxylic dianhydride and an aromatic diamine represented by the aforementioned general formula in an organic solvent, at 0.5-30 wt% and preferably 1-20 wt% of the total weight of the polyimide precursor.
  • the (a) polyimide precursor solution and (b) polyimide precursor solution are preferably prepared by reacting the carboxylic dianhydride component and diamine component in equimolar amounts, but in some cases either (a) or (b) may have an acid excess and the other a diamine excess.
  • the process of imidization of the polyimide precursor by heating causes breakage and reformation of the bonds of the polymer chain to yield a copolymerized polyimide with block bonding or a random sequence.
  • the heating results in an initial increase in viscosity, further heating results in a drastic lowering of the viscosity, and still further heating produces a high viscosity, finally yielding a polyimide film composed of a high-molecular weight polyimide.
  • the aforementioned aromatic tetracarboxylic dianhydride and aromatic diamine are preferably used in proportions within the ranges mentioned above, with other additional diamine components and/or other acid components in a range which does not adversely affect the elastic modulus and linear expansion, and for example, 3, 3', 4,4'- benzophenonetetracarboxylic dianhydride, 2,2-bis(3,4- dicarboxyphenyl)propane, bis (3, 4-dicarboxyphenyl)methane, bis (3, 4-dicarboxyphenyl) ether or 2,3', 3,4'- biphenyltetracarboxylic dianhydride may be used.
  • crosslinking group A in the aforementioned general formula for the aromatic diamine there may be mentioned oxygen, sulfur, methylene, carbonyl, sulfoxyl, sulfone, 1, l'-ethylidene, 1,2-ethylidene, 2,2'- isopropylidene, 2,2'-hexafluoroisopropylidene, cyclohexylidene, phenylene, 1, 3-phenylenedimethylene, 1, 4-phenylenedimethylene, 1, 3-phenylenediethylidene, 1,4- phenylenediethylidene, 1, 3-phenylenedipropylidene, 1,4- phenylenedipropylidene, 1, 3-phenylenedioxy, 1,4- phenylenedioxy, biphenylenedioxy, methylenediphenoxy, ethylidenediphenoxy, propylidenediphenoxy, hexafluoropropylidenediphenoxy, oxy
  • Ri-R 4 in the aforementioned general formula for the aromatic diamine each represent a substituent selected from among hydrogen, Cl-6 hydrocarbon groups, hydroxyl, carboxyl, Cl-6 alkoxy groups and carboalkoxy groups, and at least one of Ri and R 2 is not hydrogen while at least one of R 3 and R 4 is not hydrogen.
  • R 1 -R 4 in the aforementioned general formula for the aromatic diamine there may be mentioned hydrocarbon groups such as hydrogen, methyl, ethyl, n-propyl, i-propyl, n-butyl, s-butyl, i-butyl, t- butyl, pentyl, cyclohexyl and phenyl, alkoxy groups such as hydroxyl, methoxy, ethoxy, propoxy and butoxy, and carboalkoxy groups such as carboxyl, carbomethoxy, carboethoxy, carbopropoxy and carbobutoxy.
  • Ri-R 4 may all be identical, or they may independently differ.
  • aromatic diamines represented by the aforementioned general formula there may be mentioned 3, 3' -dimethyl-4, 4 ' -diaminobiphenyl, 3, 3' -dihydroxy-4, 4 '-diaminobiphenyl, 3, 3' -dicarboxy-4, 4 '- diaminobiphenyl, 3,3' -dimethoxy-4, 4 ' -diaminobiphenyl, 3, 3" , 5, 5 ' -tetramethyl-4, 4 ' -diaminobiphenyl, 4,4'- methylene-bis (2-methylaniline) , 4,4' -methylene-bis (2- ethylaniline) , 4,4 '-methylene-bis (2-isopropylaniline) , 4, 4 ' -methylene-bis (2, 6-dimethylaniline) , 4, 4 '-methylene- bis (2, 6-diethylaniline) , 4,4' -methylene-methylene-
  • a dicarboxylic anhydride such as phthalic anhydride or its substituted form (for example, 3-methyl or 4-methylphthalic anhydride) , hexahydrophthalic anhydride or its substituted form or succinic anhydride or its substituted form, and phthalic anhydride is a typical example.
  • a phosphorus-based stabilizer for example, triphenyl phosphite or triphenyl phosphate
  • triphenyl phosphite or triphenyl phosphate may be added in a range of 0.01-1% with respect to the solid (polymer) concentration during polymerization of the polyamic acid.
  • An imidization catalyst may also be added to the dope solution in order to accelerate imidization.
  • imidazole, 1-methylimidazole, 2-methylimidazole, 1,2-dimethylimidazole, 2-phenylimidazole, benzimidazole, isoquinoline or a substituted pyridine may be used in a proportion of 0.05-10 wt% and especially 0.1-2 wt% with respect to the polyimide precursor. These will allow imidization to be completed at a relatively low temperature.
  • the organic solvent used for production of the polyimide precursor may be N- methyl-2-pyrrolidone, N,N' -dimethylformamide, N,N- dimethylacetamide, N,N-diethylacetamide, dimethylsulfoxide, hexamethylphosphoramide or N- methylcaprolactam. These organic solvents may be used alone or in combinations of two or more.
  • a polyimide of the invention may be produced by using the components mentioned above for polymerization of the diamine components and tetracarboxylic dianhydrides which produce the polyimide precursors of (a) and (b) , in their respective organic solvents at a temperature of 0-100 0 C and preferably 5-50 0 C, to prepare solutions of the polyimide precursors (which may be partially imidized so long as a uniform solution state is maintained) , mixing both polyimide precursor solutions, and forming a coating or film, drying, imidizing and heat drying (curing) the polyimide precursor solution, wherein the acid component and diamine component of the finally obtained polyimide precursor are in an equimolar ratio and the proportion of the components is within the aforementioned range.
  • the maximum heat treatment temperature for heat drying is preferably in the range of 350-600°C and especially 400-550 0 C .
  • the polyimide of the invention may be applied as a coating agent or a film (by heat treating an uncured film using a pin tenter and substantially applying a draft) .
  • the film thickness is approximately 5-200 ⁇ m.
  • the thickness is approximately 0.1-2 ⁇ m.
  • a polyimide film with an improved adhesion property and an improved moisture permeation rate it is possible to obtain a polyimide film with an improved adhesion property and an improved moisture permeation rate.
  • an aromatic diamine with the specific structure represented by the aforementioned general formula into the combination of 3, 3 ' , 4, 4 ' -biphenyltetracarboxylic dianhydride and para- phenylenediamine as a preferred example of the invention, it is possible to obtain a polyimide film with an improved adhesion property and an improved moisture permeation rate while maintaining the characteristics of heat resistance, large elastic modulus and low linear expansion coefficient.
  • the polyimide film preferably has a large elastic modulus and a low linear expansion coefficient, with an elastic modulus of at least 400 kg/mm 2 and less than 900 kg/mm 2 , and especially at least 500 kg/mm 2 and less than 850 kg/mm 2 , a breaking stress of at least 20 kg/mm 2 and especially between 20 kg/mm 2 and 50 kg/mm 2 , and a linear expansion coefficient (100-250°C) of 1 x 10 ⁇ 5 - 3 x 10 "5 cm/cm/°C and especially 1 x 10 ⁇ 5 - 2.5 x 10 ⁇ 5 cm/cm/ o C.
  • the polyimide film is preferably a polyimide film with a saturated water absorptivity of 1.3-3% and especially 1.5-2.5%.
  • the polyimide film has a relative moisture permeation rate of not lower than 2.5, particularly not lower than 4, especially 4-20.
  • the polyimide of the invention may also be applied as a modified polyimide layer serving as the surface layer on a core layer composed of a heat-resistant polyimide.
  • the polyimide precursor solution used to produce the polyimide core layer composed of the heat-resistant polyimide may be cast and dried onto a support to form a self-supporting film, and then the surface layer polyimide precursor solution which produces the polyimide of the invention is coated and dried onto both sides thereof to a dry thickness of about 0.1-2 ⁇ m, if necessary with coating and drying of the surface layer polyimide precursor solution composition to a dry thickness of about 0.1-2 ⁇ m on the other side, followed by heating, removal of the solvent and imidization, to produce a surface-modified polyimide film.
  • the polyimide film preferably has a thickness of about 5-150 ⁇ m and especially about 10-125 ⁇ m.
  • the polyimide of the heat-resistant polyimide layer may be a polyimide obtained by polymerization and imidization from an aromatic tetracarboxylic dianhydride comprising 7.5-100 mole percent of 3, 3', 4,4'- biphenyltetracarboxylic dianhydride and 0-92.5 mole percent of pyromellitic dianhydride, with 15-100 mole percent of p-phenylenediamine and 0-85 mole percent of 4, 4 ' -diaminodiphenylether, a polyimide obtained by copolymerizing pyromellitic dianhydride with 4,4'- diaminodiphenylether and p-phenylenediamine in a proportion (molar ratio) of 90/10-10/90, or a polyimide obtained by polymerizing and imidizing an aromatic tetracarboxylic dianhydride comprising 7.5-100 mole percent of 3, 3' , 4, 4 '-bipheny
  • a laminated base according to the invention is obtained by laminating a metal layer, and preferably a copper layer, on the polyimide surface layer of the invention on a polyimide film, either directly or via an adhesive.
  • the metal layer may be laminated on one or both sides of the polyimide film.
  • the metal layer may be obtained by laminating a metal foil by a lamination method, or by forming a metal thin-film and a copper plated layer using a thin-film forming method and an electroplating method.
  • the lamination method for the copper layer whereby a metal thin-film and a copper plated layer are formed using a thin-film forming method and an electroplating method, may be any publicly known method.
  • the laminated body of the invention may also be obtained by casting a polyimide precursor solution which produces a polyimide of the invention onto a metal foil, and then conducting thorough heating, drying and imidization.
  • a heat- resistant adhesive layer is formed on one or both sides of the polyimide film and a metal foil is layered thereover, and then heating and pressurization are carried out to obtain a laminated body.
  • the heat- resistant adhesive is not particularly restricted so long as it is a heat-resistant adhesive used in the field of electronics, and for example, there may be mentioned polyimide-based adhesives, epoxy-modified polyimide-based adhesives, phenol resin-modified epoxy resin adhesives, epoxy-modified acrylic resin-based adhesives and epoxy- modified polyamide-based adhesives.
  • the heat-resistant adhesive layer may be formed by any method which is employed in the field of electronics, and for example, an adhesive solution may be coated and dried onto the aforementioned polyimide film and molded article, or a separately formed film-like adhesive may be attached thereto.
  • the metal layer used for the invention may be a simple metal or an alloy, and for example, there may be mentioned copper, aluminum, gold, silver, nickel and stainless steel metal foils and metal plating layers (preferably using any of numerous publicly known technologies including a vapor deposition metal base layer-metal plating layer or chemical metal plating layer) ; however, a rolled copper foil, electrolytic copper foil or copper plated layer may be mentioned as preferred.
  • the thickness of the metal foil is not particularly restricted but is preferably 0.1 ⁇ m to 10 mm, and especially 5-18 ⁇ m.
  • the laminated base has a novel polyimide layer, with an improved adhesion property and moisture permeation rate while maintaining the characteristics of heat resistance, a large elastic modulus and a low linear expansion coefficient, and it is therefore resistant to foaming and peeling at the adhesion interface during high-temperature treatment steps.
  • base materials for example, ceramics, glass bases, silicon wafers, or molded articles of metals or polyimide films of the same or different type, may also be attached to the laminated body of the invention with additional heat-resistant adhesives.
  • the laminated base serving as the laminated body of the invention may be suitably used as the base sheet for an electronic part.
  • it may be suitably used as a printed circuit board, power circuit board, flexible heater or resistor base.
  • insulating films and protective films which are formed on materials with low linear expansion coefficients, such as LSIs and other base materials.
  • N,N-dimethylacetamide (DMAc) was added to a reaction vessel, and then para-phenylenedian ⁇ ine (PPD) was added while stirring and circulating nitrogen, and the temperature was kept at 50°C for complete dissolution.
  • PPD para-phenylenedian ⁇ ine
  • the solution was designated as solution 2.
  • Examples 1-5 Solution 1 was mixed with solutions 2-6 in the proportions shown in Table 1, each mixture was coated onto a glass panel to a final film thickness of about 25 ⁇ m, heated at 135°C for 3 minutes to form a solidified film, released from the glass panel and then spread on a pin tenter and heated at 130°C for 5 minutes, 180°C for 5 minutes, 210°C for 5 minutes and 320°C for 2 minutes, after which the temperature was increased to 450°C within 5 minutes and kept at 45O 0 C for 2 minutes for heat treatment to obtain a polyimide film.
  • the obtained polyimide film was dried to a constant weight under a dry nitrogen atmosphere and then immersed in purified water at 23°C for 24 hours and, after wiping off the adhered water, the saturated water absorptivity was determined from the change in weight.
  • the obtained polyimide film was dried to a constant weight under a dry nitrogen atmosphere and then the change in weight at 27 0 C, 55% RH was measured, to determine the relative moisture absorption rate.
  • the. tensile properties of the obtained polyimide film, at a thickness of 25 ⁇ m were evaluated according to ASTM D882 method.
  • an acrylic-based adhesive PYRALUX
  • a single-layer polyimide film (25 ⁇ m) was obtained in the same manner as Example 1, except for using solution 1 alone.
  • the polyimide film was evaluated in the same manner as in Example 1. Table 1
  • Solution " 1 was mixed with solution 3 in the proportions shown in Table 2, and then each mixture was coated onto a glass panel to a final film thickness of 25 ⁇ m and 50 ⁇ m and heated at 135°C for 3 minutes (final thickness: 25 ⁇ m) or 5 minutes (final thickness: 50 ⁇ m) to form solidified films, released from the glass panel and spread on a pin tenter and heated at 130°C for 5 minutes, 18O 0 C for 5 minutes, 210°C for 5 minutes and 320°C for 2 minutes, after which the temperature was increased to 450 0 C within 5 minutes and kept at 450°C for 2 minutes for heat treatment to obtain a polyimide film.
  • the obtained polyimide film was dried to a constant weight under a dry nitrogen atmosphere and then immersed in purified water at 23°C for 24 hours and, after wiping off the adhered water, the saturated water absorptivity was determined from the change in weight.
  • the obtained polyimide film was dried to a constant weight under a dry nitrogen atmosphere and then the change in weight at 27°C, 55% RH was measured, to determine the relative moisture absorption rate.
  • the tensile properties of the obtained polyimide film, at a thickness of 25 ⁇ m were evaluated according to ASTM D882 method. The results are shown in Table 2. Comparative Example 2
  • a polyimide film was obtained in the same manner as Example 6, except for using solution A alone.
  • the polyimide film was evaluated in the same manner as in Example 6. Table 2
  • the film was then spread on a pin tenter and heated at 130 0 C for 5 minutes, 180 0 C for 5 minutes, 21O 0 C for 5 minutes and 320 0 C for 2 minutes, after which the temperature was increased to
  • the thicknesses of the layers of the obtained trilayer polyimide film were 2 ⁇ m/21 ⁇ m/2 ⁇ m.
  • the obtained polyimide film was dried to a constant weight under a dry nitrogen atmosphere and then immersed in purified water at 23°C for 24 hours and the saturated water absorptivity was determined from the change in weight after wiping off the adhered water.
  • the obtained polyimide film was dried to a constant weight under a dry nitrogen atmosphere and then the change in weight at 27°C, 55% RH was measured to determine the relative moisture absorption rate.
  • the tensile properties of the obtained polyimide film, at a thickness of 25 ⁇ m were evaluated according to ASTM D882 method.
  • Example 13 The same evaluation was conducted as in Example 13, except that the coating thicknesses were adjusted so that the thicknesses of the layers of the trilayer polyimide film were 1 ⁇ m/10 ⁇ m/1 ⁇ m. The results are shown in Table 3.
  • Example 13 The same evaluation was conducted as in Example 13, except that the base layer was formed using a solution obtained by adding 1,2-dimethylimidazole to solution 1 at 2 wt% with respect to the polyimide precursor. The results are shown in Table 3.
  • Example 13 The same evaluation was conducted as in Example 13, except that only a base layer was formed, using a solution obtained by adding 1,2-dimethylimidazole to solution 1 at 2 wt% with respect to the polyimide precursor. The results are shown in Table 3.
  • the present invention provides a polyimide molded film with a large elastic modulus and an improved surface adhesion property and an improved moisture permeation rate, and is therefore of high industrial utility.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Laminated Bodies (AREA)

Abstract

A novel polyimide wherein a tetracarboxylic dianhydride comprising 3,3',4,4'-biphenyltetracarboxylic dianhydride as the essential component is the starting tetracarboxylic dianhydride component, and an amine comprising between 0.5 and 30 mole percent of a diamine represented by the following general formula is the starting diamine component. (wherein A is a direct bond or a crosslinking group, and R1-R4 each represent a substituent). It is possible to obtain a polyimide, a polyimide film and a laminated body with an improved adhesion property and an improved moisture permeation rate, even without surface treatment, comprising, as the essential tetracarboxylic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride which has conventionally only yielded polyimides with low adhesive strength.

Description

DESCRIPTION
POLYIMIDE, POLYIMIDE FILM AND LAMINATED BODY
Technical Field
The present invention relates to a novel polyimide, a polyimide film and a laminated body and, more specifically, it relates to a polyimide with a high moisture permeation rate and improved adhesion, wherein the starting tetracarboxylic dianhydride component is a tetracarboxylic dianhydride comprising 3, 3',4,4'- biphenyltetracarboxylic dianhydride as an essential component and the starting diamine component is a diamine comprising an aromatic diamine with a specific structure as an essential component, as well as to a polyimide film having a polyimide layer composed of the polyimide on at least one side, and a laminated body thereof. Background Art As 3, 3' , 4, 4 '-biphenyltetracarboxylic dianhydride- based polyimides, which yield heat-resistant polyimides, there are known polyimides comprising 3, 3', 4,4'- biphenyltetracarboxylic dianhydride and para- phenylenediamine as the starting acid dianhydride component and the starting diamine component, respectively, and these yield polyimides with low linear expansion coefficients and large elastic moduli.
Films made of such polyimides have excellent thermal properties and electrical properties and are therefore widely employed in electronic devices. However, a high adhesive strength cannot be obtained with adhesives ordinarily used in the field of electronics, and laminated bodies with high peel strengths cannot be obtained by forming metal layers by metal vapor deposition or sputtering. A film composed of such a polyimide has low saturated water absorptivity and a low hygroscopic expansion coefficient and therefore has the advantage of dimensional stability against environmental changes. However, because of its extremely low moisture absorption rate, if it is exposed to high temperature in subsequent soldering steps when it is used as a cover lay film or the like, the trace moisture remaining on the base cannot parmeate the cover lay film and causes foaming or peeling at the adhesive interface.
Attempts have been made to improve the low adhesion of such polyimide films. For example, polyimide films with improved adhesion are known which comprise 0.02-1 wt% of compounds of tin, bismuth or antimony (Japanese Unexamined Patent Publication HEI No. 4-261466, Japanese Unexamined Patent Publication HEI No. 6-299883, Japanese Patent Public Inspection HEI No. 7-503984) . However, such polyimide films potentially exhibit poorer electrical properties such as electrical insulation. Also known are techniques for improving the adhesion of polyimide films by plasma discharge treatment (Japanese Unexamined Patent Publication SHO No. 59-86634, Japanese Unexamined Patent Publication HEI No. 2-134241) .
However, discharge treatment often has an insufficient effect on improving the polyimide film adhesion, and productivity is low because of the requirement for complex post-treatment steps. It has also been attempted to improve the gas permeability of such polyimide films. For example, polyimide films with improved gas permeability are known which use polyimides obtained from diamines having bulky trimethylsilyl groups bonded to the aromatic rings (Japanese Unexamined Patent Publication No. 2004-224889) . Also, it has been attempted to use polyimides with bulky CF3 groups on the aromatic rings to increase the distance between molecular chains and improve the gas permeability (W.J. Koros, G.K. Fleming, Journal of Membrane Science, Holland, 1993, Vol.83, p.1-80) . However, such starting materials are expensive and cannot be easily applied to industrial use. Disclosure of the Invention
It is an object of the present invention to provide a polyimide, a polyimide film and a laminated body with an improved adhesion property and moisture permeation rate, even without surface treatment, comprising, as the essential tetracarboxylic dianhydride, 3,3',4,4'- biphenyltetracarboxylic dianhydride which has conventionally has only yielded polyimides with low adhesion. Specifically, the invention relates to a novel polyimide wherein a tetracarboxylic dianhydride comprising 3, 3' , 4, 4 ' -biphenyltetracarboxylic dianhydride as the essential component is the starting tetracarboxylic dianhydride component, and an amine comprising between 0.5 and 30 mole percent of a diamine represented by the following general formula is the starting diamine component.
Figure imgf000004_0001
(wherein A is a direct bond or a crosslinking group, Ri-R4 each represent a substituent selected from among hydrogen, hydroxyl, carboxyl, Cl-β hydrocarbon groups, Cl-6 alkoxy groups and carboalkoxy groups, at least one of Ri and R2 is not hydrogen and at least one of R3 and R4 is not hydrogen.) The invention further relates to a film having on at least one side thereof a layer made of the aforementioned polyimide.
The invention still further relates to a laminated body obtained by laminating a base either directly or via a heat-resistant adhesive, onto at least one side of a layer made of the aforementioned polyimide.
The polyimide of the invention can yield a molded article with an improved surface adhesion property and moisture permeation rate, and even with a high elastic modulus, without surface treatment of the molded article. The polyimide film of the invention can also exhibit an improved surface adhesion property and moisture permeation rate even with a high elastic modulus, without surface treatment.
In addition, the laminated body of the invention comprises a novel polyimide film with improvement in adhesion with the base and the moisture permeation rate, while maintaining heat resistance, a high elastic modulus and a low linear expansion coefficient, and is therefore resistant to foaming and peeling at the adhesion interface during high-temperature treatment steps. Best Mode for Carrying Out the Invention
The following may be mentioned as preferred modes of the invention.
1) The aforementioned polyimide wherein the starting diamine component is para-phenylenediamine. 2) The aforementioned polyimide wherein the starting tetracarboxylic dianhydride component is 3,3',4,4'- biphenyltetracarboxylic dianhydride.
3) The aforementioned polyimide wherein the saturated water absorptivity is between 1.3% and 3%. 4) The aforementioned polyimide film wherein the elastic modulus is at least 400 kg/mm2 and less than 900 kg/mm2.
5) The aforementioned laminated body wherein the base is a metal layer. 6) The aforementioned laminated body wherein the base is a metal foil, and particularly a copper foil.
The polyimide precursor composition used to obtain the polyimide of the invention may be obtained by using an organic solvent for polymerization of, for example, a tetracarboxylic dianhydride comprising 3, 3',4,4'- biphenyltetracarboxylic dianhydride as the essential component, and a diamine component comprising an aromatic diamine represented by the aforementioned general formula at 0.5-30 mole percent and preferably 1-20 mole percent of the total diamines.
For the tetracarboxylic dianhydride there may be mentioned 3, 3' , 4, 4 ' -biphenyltetracarboxylic dianhydride and pyromellitic dianhydride. As a diamine component other than an aromatic diamine represented by the aforementioned general formula for the diamine component there may be mentioned para-phenylenediamine. In particular, the tetracarboxylic dianhydride preferably comprises 3, 3' , 4, 4 ' -biphenyltetracarboxylic dianhydride at 7.5-100 mole percent and especially 15-100 mole percent and pyromellitic dianhydride at 0-92.5 mole percent and especially 0-85 mole percent, based on the total aromatic tetracarboxylic dianhydrides, among which the use of 3, 3', 4, 4 ' -biphenyltetracarboxylic dianhydride alone is particularly preferred.
The polyimide precursor is preferably present at 1- 20 wt% in the organic solvent solution containing the polyimide precursor.
According to the invention, it is preferred to use an aromatic tetracarboxylic dianhydride including 3, 3', 4, 4 ' -biphenyltetracarboxylic dianhydride as the starting acid dianhydride component, and a combination of para-phenylenediamine and an aromatic diamine with a structure represented by the aforementioned general formula in the proportion mentioned above as the starting diamine component, in order to obtain a polyimide and polyimide film with a high elastic modulus, a high moisture permeation rate and improved adhesion.
In particular, the polyimide precursor composition which yields a polyimide according to the invention may be obtained by mixing (a) a polyimide precursor solution prepared by polymerization of 3,3',4,4'- biphenyltetracarboxylic dianhydride and para- phenylenediamine in an organic solvent, at 70-99.5 wt% and preferably 80-99 wt% of the total weight of the polyimide precursor, and (b) a polyimide precursor solution prepared by polymerization of 3,3',4,4'- biphenyltetracarboxylic dianhydride and an aromatic diamine represented by the aforementioned general formula in an organic solvent, at 0.5-30 wt% and preferably 1-20 wt% of the total weight of the polyimide precursor.
The (a) polyimide precursor solution and (b) polyimide precursor solution are preferably prepared by reacting the carboxylic dianhydride component and diamine component in equimolar amounts, but in some cases either (a) or (b) may have an acid excess and the other a diamine excess.
In either case, the process of imidization of the polyimide precursor by heating causes breakage and reformation of the bonds of the polymer chain to yield a copolymerized polyimide with block bonding or a random sequence. In the step of heating and drying the cast polyimide precursor solution, the heating results in an initial increase in viscosity, further heating results in a drastic lowering of the viscosity, and still further heating produces a high viscosity, finally yielding a polyimide film composed of a high-molecular weight polyimide.
According to the invention, the aforementioned aromatic tetracarboxylic dianhydride and aromatic diamine are preferably used in proportions within the ranges mentioned above, with other additional diamine components and/or other acid components in a range which does not adversely affect the elastic modulus and linear expansion, and for example, 3, 3', 4,4'- benzophenonetetracarboxylic dianhydride, 2,2-bis(3,4- dicarboxyphenyl)propane, bis (3, 4-dicarboxyphenyl)methane, bis (3, 4-dicarboxyphenyl) ether or 2,3', 3,4'- biphenyltetracarboxylic dianhydride may be used. As the crosslinking group A in the aforementioned general formula for the aromatic diamine there may be mentioned oxygen, sulfur, methylene, carbonyl, sulfoxyl, sulfone, 1, l'-ethylidene, 1,2-ethylidene, 2,2'- isopropylidene, 2,2'-hexafluoroisopropylidene, cyclohexylidene, phenylene, 1, 3-phenylenedimethylene, 1, 4-phenylenedimethylene, 1, 3-phenylenediethylidene, 1,4- phenylenediethylidene, 1, 3-phenylenedipropylidene, 1,4- phenylenedipropylidene, 1, 3-phenylenedioxy, 1,4- phenylenedioxy, biphenylenedioxy, methylenediphenoxy, ethylidenediphenoxy, propylidenediphenoxy, hexafluoropropylidenediphenoxy, oxydiphenoxy, thiodiphenoxy and sulfonediphenoxy, but direct bonding without a crosslinking group is also possible.
Ri-R4 in the aforementioned general formula for the aromatic diamine each represent a substituent selected from among hydrogen, Cl-6 hydrocarbon groups, hydroxyl, carboxyl, Cl-6 alkoxy groups and carboalkoxy groups, and at least one of Ri and R2 is not hydrogen while at least one of R3 and R4 is not hydrogen.
As specific examples of R1-R4 in the aforementioned general formula for the aromatic diamine there may be mentioned hydrocarbon groups such as hydrogen, methyl, ethyl, n-propyl, i-propyl, n-butyl, s-butyl, i-butyl, t- butyl, pentyl, cyclohexyl and phenyl, alkoxy groups such as hydroxyl, methoxy, ethoxy, propoxy and butoxy, and carboalkoxy groups such as carboxyl, carbomethoxy, carboethoxy, carbopropoxy and carbobutoxy. Ri-R4 may all be identical, or they may independently differ. As specific examples of aromatic diamines represented by the aforementioned general formula there may be mentioned 3, 3' -dimethyl-4, 4 ' -diaminobiphenyl, 3, 3' -dihydroxy-4, 4 '-diaminobiphenyl, 3, 3' -dicarboxy-4, 4 '- diaminobiphenyl, 3,3' -dimethoxy-4, 4 ' -diaminobiphenyl, 3, 3" , 5, 5 ' -tetramethyl-4, 4 ' -diaminobiphenyl, 4,4'- methylene-bis (2-methylaniline) , 4,4' -methylene-bis (2- ethylaniline) , 4,4 '-methylene-bis (2-isopropylaniline) , 4, 4 ' -methylene-bis (2, 6-dimethylaniline) , 4, 4 '-methylene- bis (2, 6-diethylaniline) , 4,4' -methylene-bis (2, 6- diisopropylaniline) , 3,3' -dihydroxy-4, 4 ' - diaminodiphenylmethane, 3,3' -dicarboxy-4, 4 '- diaminodiphenylmethane, 3,3' -dicarboxy-4, 4 ' -diaitιino-5, 5' - dimethyldiphenylmethane and o-tolidinesulfone, among which 4, 4 ' -methylene-bis (2, β-dimethylaniline) is preferred.
After mixing both components of the polyimide precursor solution, in cases where it is necessary to cap the amine ends of the polyimide precursor, there may be added a small amount of a dicarboxylic anhydride such as phthalic anhydride or its substituted form (for example, 3-methyl or 4-methylphthalic anhydride) , hexahydrophthalic anhydride or its substituted form or succinic anhydride or its substituted form, and phthalic anhydride is a typical example. In order to control gelling of the film, a phosphorus-based stabilizer, for example, triphenyl phosphite or triphenyl phosphate, may be added in a range of 0.01-1% with respect to the solid (polymer) concentration during polymerization of the polyamic acid. An imidization catalyst may also be added to the dope solution in order to accelerate imidization. For example, imidazole, 1-methylimidazole, 2-methylimidazole, 1,2-dimethylimidazole, 2-phenylimidazole, benzimidazole, isoquinoline or a substituted pyridine may be used in a proportion of 0.05-10 wt% and especially 0.1-2 wt% with respect to the polyimide precursor. These will allow imidization to be completed at a relatively low temperature.
The organic solvent used for production of the polyimide precursor, for both (a) and (b) , may be N- methyl-2-pyrrolidone, N,N' -dimethylformamide, N,N- dimethylacetamide, N,N-diethylacetamide, dimethylsulfoxide, hexamethylphosphoramide or N- methylcaprolactam. These organic solvents may be used alone or in combinations of two or more.
A polyimide of the invention may be produced by using the components mentioned above for polymerization of the diamine components and tetracarboxylic dianhydrides which produce the polyimide precursors of (a) and (b) , in their respective organic solvents at a temperature of 0-1000C and preferably 5-500C, to prepare solutions of the polyimide precursors (which may be partially imidized so long as a uniform solution state is maintained) , mixing both polyimide precursor solutions, and forming a coating or film, drying, imidizing and heat drying (curing) the polyimide precursor solution, wherein the acid component and diamine component of the finally obtained polyimide precursor are in an equimolar ratio and the proportion of the components is within the aforementioned range. The maximum heat treatment temperature for heat drying is preferably in the range of 350-600°C and especially 400-5500C .
The polyimide of the invention may be applied as a coating agent or a film (by heat treating an uncured film using a pin tenter and substantially applying a draft) . For application as a film, the film thickness is approximately 5-200 μm. For application as a coating agent, the thickness is approximately 0.1-2 μm.
According to the invention it is possible to obtain a polyimide film with an improved adhesion property and an improved moisture permeation rate. In particular, by further introducing an aromatic diamine with the specific structure represented by the aforementioned general formula into the combination of 3, 3 ' , 4, 4 ' -biphenyltetracarboxylic dianhydride and para- phenylenediamine as a preferred example of the invention, it is possible to obtain a polyimide film with an improved adhesion property and an improved moisture permeation rate while maintaining the characteristics of heat resistance, large elastic modulus and low linear expansion coefficient. The polyimide film preferably has a large elastic modulus and a low linear expansion coefficient, with an elastic modulus of at least 400 kg/mm2 and less than 900 kg/mm2, and especially at least 500 kg/mm2 and less than 850 kg/mm2, a breaking stress of at least 20 kg/mm2 and especially between 20 kg/mm2 and 50 kg/mm2, and a linear expansion coefficient (100-250°C) of 1 x 10~5 - 3 x 10"5 cm/cm/°C and especially 1 x 10~5 - 2.5 x 10~5 cm/cm/oC.
According to a preferred example of the invention, the polyimide film is preferably a polyimide film with a saturated water absorptivity of 1.3-3% and especially 1.5-2.5%.
Preferably, the polyimide film has a relative moisture permeation rate of not lower than 2.5, particularly not lower than 4, especially 4-20.
The polyimide of the invention may also be applied as a modified polyimide layer serving as the surface layer on a core layer composed of a heat-resistant polyimide. In this case, the polyimide precursor solution used to produce the polyimide core layer composed of the heat-resistant polyimide may be cast and dried onto a support to form a self-supporting film, and then the surface layer polyimide precursor solution which produces the polyimide of the invention is coated and dried onto both sides thereof to a dry thickness of about 0.1-2 μm, if necessary with coating and drying of the surface layer polyimide precursor solution composition to a dry thickness of about 0.1-2 μm on the other side, followed by heating, removal of the solvent and imidization, to produce a surface-modified polyimide film. The polyimide film preferably has a thickness of about 5-150 μm and especially about 10-125 μm.
The polyimide of the heat-resistant polyimide layer may be a polyimide obtained by polymerization and imidization from an aromatic tetracarboxylic dianhydride comprising 7.5-100 mole percent of 3, 3', 4,4'- biphenyltetracarboxylic dianhydride and 0-92.5 mole percent of pyromellitic dianhydride, with 15-100 mole percent of p-phenylenediamine and 0-85 mole percent of 4, 4 ' -diaminodiphenylether, a polyimide obtained by copolymerizing pyromellitic dianhydride with 4,4'- diaminodiphenylether and p-phenylenediamine in a proportion (molar ratio) of 90/10-10/90, or a polyimide obtained by polymerizing and imidizing an aromatic tetracarboxylic dianhydride comprising 7.5-100 mole percent of 3, 3' , 4, 4 '-biphenyltetracarboxylic dianhydride and 0-92.5 mole percent of pyromellitic dianhydride, with o-tolidine.
A laminated base according to the invention is obtained by laminating a metal layer, and preferably a copper layer, on the polyimide surface layer of the invention on a polyimide film, either directly or via an adhesive. The metal layer may be laminated on one or both sides of the polyimide film.
The metal layer may be obtained by laminating a metal foil by a lamination method, or by forming a metal thin-film and a copper plated layer using a thin-film forming method and an electroplating method.
The lamination method for the copper layer, whereby a metal thin-film and a copper plated layer are formed using a thin-film forming method and an electroplating method, may be any publicly known method. The laminated body of the invention may also be obtained by casting a polyimide precursor solution which produces a polyimide of the invention onto a metal foil, and then conducting thorough heating, drying and imidization. In the lamination method mentioned above, a heat- resistant adhesive layer is formed on one or both sides of the polyimide film and a metal foil is layered thereover, and then heating and pressurization are carried out to obtain a laminated body. The heat- resistant adhesive is not particularly restricted so long as it is a heat-resistant adhesive used in the field of electronics, and for example, there may be mentioned polyimide-based adhesives, epoxy-modified polyimide-based adhesives, phenol resin-modified epoxy resin adhesives, epoxy-modified acrylic resin-based adhesives and epoxy- modified polyamide-based adhesives. The heat-resistant adhesive layer may be formed by any method which is employed in the field of electronics, and for example, an adhesive solution may be coated and dried onto the aforementioned polyimide film and molded article, or a separately formed film-like adhesive may be attached thereto.
The metal layer used for the invention may be a simple metal or an alloy, and for example, there may be mentioned copper, aluminum, gold, silver, nickel and stainless steel metal foils and metal plating layers (preferably using any of numerous publicly known technologies including a vapor deposition metal base layer-metal plating layer or chemical metal plating layer) ; however, a rolled copper foil, electrolytic copper foil or copper plated layer may be mentioned as preferred. The thickness of the metal foil is not particularly restricted but is preferably 0.1 μm to 10 mm, and especially 5-18 μm.
According to a preferred example of the invention, the laminated base has a novel polyimide layer, with an improved adhesion property and moisture permeation rate while maintaining the characteristics of heat resistance, a large elastic modulus and a low linear expansion coefficient, and it is therefore resistant to foaming and peeling at the adhesion interface during high-temperature treatment steps.
Other base materials, for example, ceramics, glass bases, silicon wafers, or molded articles of metals or polyimide films of the same or different type, may also be attached to the laminated body of the invention with additional heat-resistant adhesives.
The laminated base serving as the laminated body of the invention may be suitably used as the base sheet for an electronic part. For example, it may be suitably used as a printed circuit board, power circuit board, flexible heater or resistor base. It is also useful for insulating films and protective films which are formed on materials with low linear expansion coefficients, such as LSIs and other base materials.
Examples and comparative examples will now be explained for a more detailed description of the invention. Starting Dope Synthesis Example 1
N,N-dimethylacetamide (DMAc) was added to a reaction vessel, and then para-phenylenedianαine (PPD) was added while stirring and circulating nitrogen, and the temperature was kept at 50°C for complete dissolution. Next, 3, 3 ' , 4, 4 '-biphenyltetracarboxylic dianhydride
(BPDA) , in a proportion for an equimolar amount of the diamine component and dicarboxylic acid component in the solution, was gradually added while noting any heat release, and after completion of the addition, reaction was continued for 3 hours with the temperature kept at 50°C, to obtain a polyimide precursor solution with a monomer concentration of 18 wt% (yellow viscous liquid, solution viscosity at 25°C = approximately 1000 poise) . The solution was designated as solution 1. Starting Dope Synthesis Example 2
Reaction was conducted in the same manner as Synthesis Example 1 except for adding 3, 3' -dicarboxy- 4, 4 ' -diaminodiphenylmethane (MBAA) instead of PPD, to obtain a polyimide precursor solution with a monomer concentration of 18 wt% (light brown viscous liquid, solution viscosity at 25°C = approximately 500 poise) . The solution was designated as solution 2. Starting Dope Synthesis Example 3 Reaction was conducted in the same manner as Synthesis Example 1 except for adding 4, 4 ' -methylene- bis (2, 6-dimethylaniline) (MDX) instead of PPD, to obtain a polyimide precursor solution with a monomer concentration of 18 wt% (light brown viscous liquid, solution viscosity at 25°C = approximately 1000 poise) . The solution was designated as solution 3. Starting Dope Synthesis Example 4
Reaction was conducted in the same manner as Synthesis Example 1 except for adding 4, 4 ' -methylene- bis (2-methylaniline) (MDT) instead of PPD, to obtain a polyimide precursor solution with a monomer concentration of 18 wt% (dark red viscous liquid, solution viscosity at 25°C = approximately 1000 poise) . The solution was designated as solution 4.
Starting Dope Synthesis Example 5
Reaction was conducted in the same manner as Synthesis Example 1 except for adding 3, 3' -dimethoxy-
4, 4 ' -diaminobiphenyl (DANS) instead of PPD, to obtain a polyimide precursor solution with a monomer concentration of 18 wt% (light blackish brown viscous liquid, solution viscosity at 25°C = approximately 1500 poise) . The solution was designated as solution 5. Starting Dope Synthesis Example 6 Reaction was conducted in the same manner as Synthesis Example 1 except for adding 3,3 ' -dimethyl-4, 4 ' - diaminobiphenyl (TB) instead of PPD, to obtain a polyimide precursor solution with a monomer concentration of 18 wt% (light brown viscous liquid, solution viscosity at 25°C = approximately 800 poise) . The solution was designated as solution 6. Examples 1-5 Solution 1 was mixed with solutions 2-6 in the proportions shown in Table 1, each mixture was coated onto a glass panel to a final film thickness of about 25 μm, heated at 135°C for 3 minutes to form a solidified film, released from the glass panel and then spread on a pin tenter and heated at 130°C for 5 minutes, 180°C for 5 minutes, 210°C for 5 minutes and 320°C for 2 minutes, after which the temperature was increased to 450°C within 5 minutes and kept at 45O0C for 2 minutes for heat treatment to obtain a polyimide film. The obtained polyimide film was dried to a constant weight under a dry nitrogen atmosphere and then immersed in purified water at 23°C for 24 hours and, after wiping off the adhered water, the saturated water absorptivity was determined from the change in weight. Next, the obtained polyimide film was dried to a constant weight under a dry nitrogen atmosphere and then the change in weight at 270C, 55% RH was measured, to determine the relative moisture absorption rate. Also, the. tensile properties of the obtained polyimide film, at a thickness of 25 μm, were evaluated according to ASTM D882 method. Next, an acrylic-based adhesive (PYRALUX) by DuPont Corp. and a rolled copper foil (BHY-13H-T foil, Ra: 0.18 μm, product of Nikko Materials Co., Ltd.) were laminated on the obtained polyimide film, compression bonded for 1 minute with a press at 1800C, 30 Kgf/cm2, and further heat treated at 1800C for 60 minutes to obtain a laminated sheet. The 90° peel strength at the interface of the laminated sheet was measured to evaluate the adhesive strength. The results are shown in Table 1. None of the films exhibited a distinct glass transition temperature at below 4500C.
Comparative Example 1
A single-layer polyimide film (25 μm) was obtained in the same manner as Example 1, except for using solution 1 alone. The polyimide film was evaluated in the same manner as in Example 1. Table 1
Figure imgf000017_0001
Side A: Air side during casting (free side) Side B: Base side during casting
Examples 6-12
Solution"1 was mixed with solution 3 in the proportions shown in Table 2, and then each mixture was coated onto a glass panel to a final film thickness of 25 μm and 50 μm and heated at 135°C for 3 minutes (final thickness: 25 μm) or 5 minutes (final thickness: 50 μm) to form solidified films, released from the glass panel and spread on a pin tenter and heated at 130°C for 5 minutes, 18O0C for 5 minutes, 210°C for 5 minutes and 320°C for 2 minutes, after which the temperature was increased to 4500C within 5 minutes and kept at 450°C for 2 minutes for heat treatment to obtain a polyimide film. The obtained polyimide film was dried to a constant weight under a dry nitrogen atmosphere and then immersed in purified water at 23°C for 24 hours and, after wiping off the adhered water, the saturated water absorptivity was determined from the change in weight. Next, the obtained polyimide film was dried to a constant weight under a dry nitrogen atmosphere and then the change in weight at 27°C, 55% RH was measured, to determine the relative moisture absorption rate. Also, the tensile properties of the obtained polyimide film, at a thickness of 25 μm, were evaluated according to ASTM D882 method. The results are shown in Table 2. Comparative Example 2
A polyimide film was obtained in the same manner as Example 6, except for using solution A alone. The polyimide film was evaluated in the same manner as in Example 6. Table 2
Figure imgf000019_0001
OD I
Example 13
Solution 1 was coated onto a glass panel to a final thickness of about 21 μm and heated at 135°C for 3 minutes to form a solidified film (base layer) , and then a polyimide precursor solution obtained by mixing solution 1:solution 3 = 90:10 (molar ratio) and adjusted to a monomer concentration of 5 wt% was coated onto side A to a final film thickness of 2 μm and heated at 135°C for 1 minute, after which it was released from the glass panel, and then side B was coated in the same manner and heated at 135°C for 1 minute, and the solidified film was released from the glass panel. The film was then spread on a pin tenter and heated at 1300C for 5 minutes, 1800C for 5 minutes, 21O0C for 5 minutes and 3200C for 2 minutes, after which the temperature was increased to
450°C within 5 minutes and kept at 4500C for 2 minutes for heat treatment to obtain a polyimide film. The thicknesses of the layers of the obtained trilayer polyimide film were 2 μm/21 μm/2 μm. The obtained polyimide film was dried to a constant weight under a dry nitrogen atmosphere and then immersed in purified water at 23°C for 24 hours and the saturated water absorptivity was determined from the change in weight after wiping off the adhered water. Next, the obtained polyimide film was dried to a constant weight under a dry nitrogen atmosphere and then the change in weight at 27°C, 55% RH was measured to determine the relative moisture absorption rate. Also, the tensile properties of the obtained polyimide film, at a thickness of 25 μm, were evaluated according to ASTM D882 method.
Next, an acrylic-based adhesive (PYRALUX) by DuPont Corp. and a rolled copper foil (BHY-13H-T foil, Ra: 0.18 μm, product of Nikko Materials Co., Ltd.) were laminated on the obtained polyimide film, compression bonded for 1 minute with a press at 18O0C, 30 Kgf/cm2, and further heat treated at 180°C for 60 minutes to obtain a laminated sheet. The 90° peel strength at the interface of the laminated sheet was measured to evaluate the adhesive strength. The results are shown in Table 3. Example 14
The same evaluation was conducted as in Example 13, except that the coating thicknesses were adjusted so that the thicknesses of the layers of the trilayer polyimide film were 1 μm/10 μm/1 μm. The results are shown in Table 3.
Example 15
The same evaluation was conducted as in Example 13, except that the base layer was formed using a solution obtained by adding 1,2-dimethylimidazole to solution 1 at 2 wt% with respect to the polyimide precursor. The results are shown in Table 3.
Comparative Example 3
The same evaluation was conducted as in Example 13, except that only a base layer was formed, using a solution obtained by adding 1,2-dimethylimidazole to solution 1 at 2 wt% with respect to the polyimide precursor. The results are shown in Table 3.
Table 3
Figure imgf000022_0001
The laminated sheets obtained in Examples 1-5, Comparative Example 1, Examples 13-15 and Comparative Example 3 were evaluated in regard to foaming and peeling at the adhesion interface during the high-temperature treatment steps, by the following evaluation method.
Evaluation method: The laminated body bonded on one side to a copper foil was immersed in purified water at 230C for 24 hours, and after wiping off the adhered water, it was immersed for 10 seconds in a soldering bath at 28O0C. The results were as follows.
Foaming and peeling found: Comparative Examples 1, 3
Slight foaming found: Example 5
No foaming found: Examples 1-4, Examples 13-15
Industrial Applicability The present invention provides a polyimide molded film with a large elastic modulus and an improved surface adhesion property and an improved moisture permeation rate, and is therefore of high industrial utility.

Claims

1. A novel polyimide wherein a tetracarboxylic dianhydride comprising 3, 3' , 4, 4 '-biphenyltetracarboxylic dianhydride as the essential component is the starting tetracarboxylic dianhydride component, and an amine comprising between 0.5 and 30 mole percent of a diamine represented by the following general formula is the starting diamine component.
Figure imgf000024_0001
R4 R2 (wherein A is a direct bond or a crosslinking group, Ri-R4 each represent a substituent selected from among hydrogen, Cl-6 hydrocarbon groups, hydroxyl, carboxyl, Cl-β alkoxy groups and carboalkoxy groups, at least one of Ri and R2 is not hydrogen and at least one of R3 and R4 is not hydrogen.)
2. A polyimide according to claim 1, wherein the starting diamine component is para-phenylenediamine.
3. A polyimide according to claim 1 or 2, wherein the starting dicarboxylic dianhydride component is 3, 3 ', 4, 4 ' -biphenyltetracarboxylic dianhydride.
4. A polyimide according to any one of claims 1 to 3, wherein the saturated water absorptivity is 1.3-3%.
5. A polyimide film having on at least one side a layer comprising a polyimide according to any one of claims 1 to 4.
6. A polyimide film according to claim 5, characterized in that the elastic modulus is at least 400 kg/mm2 and less than 900 kg/mm2.
7. A laminated body obtained by laminating a base onto at least one side of a layer comprising a polyimide according to any one of claims 1 to 4, either directly or via a heat-resistant adhesive.
8. A laminated body according to claim 7, wherein the base is a metal layer.
9. A laminated body according to claim 8, wherein the base is a metal foil and, particularly, a copper foil.
PCT/JP2005/016200 2004-12-03 2005-08-30 Polyimide, polyimide film and laminated body Ceased WO2006059415A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US11/667,372 US8518550B2 (en) 2004-12-03 2005-08-30 Polyimide, polyimide film and laminated body
CN2005800413361A CN101068851B (en) 2004-12-03 2005-08-30 Polyimide, polyimide film and laminated body

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004-350773 2004-12-03
JP2004350773 2004-12-03

Publications (2)

Publication Number Publication Date
WO2006059415A1 true WO2006059415A1 (en) 2006-06-08
WO2006059415A8 WO2006059415A8 (en) 2007-06-21

Family

ID=35355474

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2005/016200 Ceased WO2006059415A1 (en) 2004-12-03 2005-08-30 Polyimide, polyimide film and laminated body

Country Status (4)

Country Link
US (1) US8518550B2 (en)
KR (1) KR100895848B1 (en)
CN (1) CN101068851B (en)
WO (1) WO2006059415A1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4224086B2 (en) * 2006-07-06 2009-02-12 三井金属鉱業株式会社 Wiring board and semiconductor device excellent in folding resistance
JP5233298B2 (en) * 2008-02-01 2013-07-10 宇部興産株式会社 Polyimide film and method for producing polyimide film
JP5727885B2 (en) * 2010-09-07 2015-06-03 Jfeケミカル株式会社 Polyimide and polyimide film
TWI573691B (en) * 2011-06-14 2017-03-11 宇部興產股份有限公司 Method for producing polyimide laminate and polyimide laminate
JP2013046903A (en) * 2011-07-28 2013-03-07 Fujifilm Corp Gas separation composite membrane, and gas separation module, gas separation apparatus and gas separation method using the same
JP2013046902A (en) * 2011-07-28 2013-03-07 Fujifilm Corp Gas separation composite membrane, and gas separation module, gas separation apparatus and gas separation method using the same
EP2831146A4 (en) * 2012-03-28 2015-11-04 Basf Se POLYIMIDES AS DIELECTRICS
JP2015000939A (en) * 2013-06-14 2015-01-05 ソマール株式会社 Solvent-soluble polyimide copolymer
JP2015156460A (en) * 2014-02-21 2015-08-27 東京エレクトロン株式会社 Polymerization film forming method and film forming apparatus
CN108137806B (en) * 2015-10-19 2021-05-28 宇部兴产株式会社 Polyimide precursor, polyimide with cross-linked structure and method for producing the same
KR102810002B1 (en) * 2022-11-30 2025-05-19 피아이첨단소재 주식회사 Solvent soluble polyimide

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07307114A (en) * 1994-05-13 1995-11-21 Hitachi Ltd Method for forming polyimide insulation film
US5868949A (en) * 1994-11-14 1999-02-09 Hitachi, Ltd. Metalization structure and manufacturing method thereof
JP2004224889A (en) * 2003-01-22 2004-08-12 Mitsubishi Rayon Co Ltd Gas permeable polyimide membrane and method for producing the same

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5986634A (en) 1982-11-10 1984-05-18 Shin Etsu Chem Co Ltd Surface modification method for plastic molded products
JPH0735106B2 (en) 1988-11-15 1995-04-19 信越化学工業株式会社 Method of manufacturing polyimide film type flexible printed circuit board
US5218034A (en) 1990-09-21 1993-06-08 E. I. Du Pont De Nemours And Company Polyimide film with tin or tin salt incorporation resulting in improved adhesion
JP3430549B2 (en) 1993-04-13 2003-07-28 マツダ株式会社 Engine intake system
JP2865198B2 (en) 1996-07-19 1999-03-08 宇部興産株式会社 Flexible wiring board with polymer film
JPH10265760A (en) 1997-03-24 1998-10-06 Sumitomo Bakelite Co Ltd Film adhesive and its production
KR20000035259A (en) * 1998-11-05 2000-06-26 다케다 마사토시 Polyimide film and electric/electronic equipment bases with the use thereof
US7267883B2 (en) * 2002-09-25 2007-09-11 Kaneka Corporation Polyimide film and laminate having metal layer and same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07307114A (en) * 1994-05-13 1995-11-21 Hitachi Ltd Method for forming polyimide insulation film
US5868949A (en) * 1994-11-14 1999-02-09 Hitachi, Ltd. Metalization structure and manufacturing method thereof
JP2004224889A (en) * 2003-01-22 2004-08-12 Mitsubishi Rayon Co Ltd Gas permeable polyimide membrane and method for producing the same

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 1996, no. 03 29 March 1996 (1996-03-29) *
PATENT ABSTRACTS OF JAPAN vol. 2003, no. 12 5 December 2003 (2003-12-05) *
WU, T.M.; CHVALUN, S. N. ; BLACKWELL, J.; CHENG, S. Z. D. ; WU, Z.; HARRIS, F. W.: "Effect of draw ratio on the structure of aromatic copolymimide fibers of random monomer sequence", ACTA POLYMERICA, vol. 46, no. 3, 1995, pages 261 - 266, XP009057721 *

Also Published As

Publication number Publication date
KR20070085724A (en) 2007-08-27
US8518550B2 (en) 2013-08-27
CN101068851B (en) 2011-10-19
KR100895848B1 (en) 2009-05-06
US20080044681A1 (en) 2008-02-21
CN101068851A (en) 2007-11-07
WO2006059415A8 (en) 2007-06-21

Similar Documents

Publication Publication Date Title
US8043697B2 (en) Polyimide film-laminated body
KR100417030B1 (en) Polyimide/metal composite sheet
KR101550005B1 (en) Multilayer polyimide film, laminate and metal-clad laminate
TWI500501B (en) Second layer double sided flexible metal laminated board and manufacturing method thereof
TW200409569A (en) Copper-clad laminate
JPS61111359A (en) Polyamic acid solution composition and polyimide film
JP4957059B2 (en) Polyimide film laminate
US7811660B2 (en) Polyimide film having high adhesiveness and method for producing same
JP3102622B2 (en) Metal foil laminated polyimide film
US8518550B2 (en) Polyimide, polyimide film and laminated body
KR20210038331A (en) Polyimide film, metal clad laminate and circuit board
CN101695222A (en) Preparation method of non-curling high-adhesiveness glue-free flexible copper-clad plate
JP3786157B2 (en) Polyimide film with improved adhesion, process for producing the same, and laminate
JP5110242B2 (en) Polyimide, polyimide film and laminate
EP2145910A1 (en) Linear polyimide precursor having asymmetric structure, polyimide, and their production methods
KR20060042029A (en) Flexible metal foil polyimide laminate and its manufacturing method
TWI877695B (en) Polyimide film, manufacturing method of the same, flexible metal foil laminate and electronic components including the same
JP5244303B2 (en) Polyesterimide and method for producing the same
JPS61111182A (en) Manufacture of polyimide-metallic foil composite film
JPS61111181A (en) Manufacture of polyimide-metallic foil composite film
TWI866624B (en) Multilayer polyimide film, flexible metal foil clad laminate and electronic component comprising the same
JP3295952B2 (en) Method for manufacturing flexible wiring board
KR102773837B1 (en) Polyimide Film and Method for Preparing the Same
TWI836750B (en) Multilayer polyimide film, flexible metal clad laminate and electronic parts including the same
JP2004315601A (en) Polyimide film having improved adhesion, method for producing the same, and laminate

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS KE KG KM KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NG NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU LV MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 11667372

Country of ref document: US

WWE Wipo information: entry into national phase

Ref document number: 200580041336.1

Country of ref document: CN

WWE Wipo information: entry into national phase

Ref document number: 1020077012584

Country of ref document: KR

NENP Non-entry into the national phase

Ref country code: DE

WWP Wipo information: published in national office

Ref document number: 11667372

Country of ref document: US

122 Ep: pct application non-entry in european phase

Ref document number: 05781571

Country of ref document: EP

Kind code of ref document: A1

WWW Wipo information: withdrawn in national office

Ref document number: 5781571

Country of ref document: EP