WO2006057050A1 - Substrate holding device - Google Patents

Substrate holding device Download PDF

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Publication number
WO2006057050A1
WO2006057050A1 PCT/JP2004/017689 JP2004017689W WO2006057050A1 WO 2006057050 A1 WO2006057050 A1 WO 2006057050A1 JP 2004017689 W JP2004017689 W JP 2004017689W WO 2006057050 A1 WO2006057050 A1 WO 2006057050A1
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WO
WIPO (PCT)
Prior art keywords
substrate
slider
pair
force
blades
Prior art date
Application number
PCT/JP2004/017689
Other languages
French (fr)
Japanese (ja)
Inventor
Kazuyuki Matsumura
Tetsunori Otaguro
Original Assignee
Hirata Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hirata Corporation filed Critical Hirata Corporation
Priority to JP2006546511A priority Critical patent/JPWO2006057050A1/en
Priority to PCT/JP2004/017689 priority patent/WO2006057050A1/en
Publication of WO2006057050A1 publication Critical patent/WO2006057050A1/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance

Definitions

  • the present invention relates to a substrate gripping device, and more particularly to a centering type substrate gripping device used for gripping a substrate such as a semiconductor wafer and transporting it between a cassette carrier and an inspection device.
  • gripping of a semiconductor wafer includes a suction hand that holds the back surface of the wafer by suction, and an edge clamp node that grips the edge of the wafer. Since the suction hand has an adverse effect on the back surface of the wafer, in recent years, the edge clamp hand has been frequently used as a wafer gripping device.
  • this edge clamp node is gripped by pinching with a holding member having one as a fixed portion and the other as a movable portion (refer to Japanese Patent Application Laid-Open No. 2004-6534).
  • a grip so-called centering method; refer to Japanese Utility Model Publication No. 6-37906 that presses the substrate evenly.
  • the former gripping operation is performed by moving the movable part after the gripping member that is opened larger than the wafer size approaches the wafer under the force of the wafer so that the wafer comes into contact with one end fixing part.
  • the center position is shifted again by the gripping operation.
  • the suction holding force of the inspection apparatus or the like receives the wafer, the timing of releasing the suction is bad, and it is difficult to hold it well.
  • the clamp mechanism described in Japanese Patent Publication No. 6-37906 performs a centering operation by pulling the two levers, Y-shaped and T-shaped, close to each other, with the pin that engages with the long hole of the lever. Because the long holes naturally have backlash, the movement distances of the Y-shaped and T-shaped levers are not necessarily the same.
  • the gripping operation of the edge clamp node grips the wafer using the biasing force of the spring and suppresses the spring force by operating the actuator to release the gripping. In this case, a cylinder with a force exceeding the spring force is required. However, if this is housed in the wrist of an edge clamp hand, the wrist part will inevitably become large. Therefore, the edge clamp node is difficult to use for delivering a substrate to a device having a narrow loading / unloading port.
  • Patent Document 1 Japanese Patent Application Laid-Open No. 2004-6534
  • Patent Document 2 Japanese Utility Model Publication No. 6-37906
  • the invention of the present application solves the above-mentioned problems of the conventional substrate gripping device, and can transfer the substrate to a narrow V, carry-in / out port, and can perform accurate centering. It is an object to provide an apparatus.
  • the substrate gripping device is a substrate gripping device used for gripping and transporting a substrate such as a semiconductor wafer, and includes a slider, a moving mechanism of the slider, and a moving direction of the slider.
  • a pair of left and right blades having gripping portions gripping from both sides in the right and left direction orthogonal to each other, and a link mechanism that rotatably connects the left and right side ends of the slider and the base end portions of the pair of left and right blades on the left and right sides
  • the pair of left and right blades move left and right by the same amount in conjunction with the advance and retreat, so that they can move toward and away from each other.
  • the advancing / retreating mechanism of the slider includes an actuator and an elastic body that exerts an urging force that interferes with the acting force of the actuator, and the slider includes the actuator.
  • the forward movement is caused by the resultant damping force of the actuator acting force and the urging force of the elastic body, but the forward movement causes the pair of left and right blades to approach each other and their gripping portions abut against the substrate. Even after stopping, the pair of left and right blurs continue to receive the resultant force that gradually decreases.
  • the substrate gripping apparatus is characterized in that both grip portions of the door can grip the substrate with a predetermined strength.
  • the pair of left and right blades move left and right by an equal amount and approach each other by the forward movement of the slider, and the substrate can be gripped by both side forces in the left and right direction.
  • the forward thrust is due to the resultant damping force of the acting force of the actuator and the biasing force of the elastic body that interferes with this, and the slider advances and the pair of left and right blades approach each other. Even if the slider stops due to contact with the substrate, the gripping force of the pair of left and right blades will continue to receive the resultant force that gradually decreases so that the substrate is gripped with a predetermined strength. Can do.
  • the slider moves backward due to the biasing force of the elastic body, and the pair of left and right blades move left and right by equal amounts. They can be separated from each other to release the substrate.
  • the substrate is gripped using the biasing force of the spring, and the actuator is operated to suppress the spring biasing force and release the gripping of the substrate. Since the acting force of the actuator is small, the actuator can be reduced in size, and if this is stored in the wrist portion of the substrate gripping device, the wrist portion will not be enlarged. . As a result, the substrate gripping apparatus can be satisfactorily used for delivering a substrate to an apparatus having a narrow carry-in / out opening.
  • the substrate is gripped only by the acting force of the actuator, there is a manufacturing error in the substrate, and therefore there is a possibility of breaking the substrate.
  • the acting force of the actuator Since the slider moves forward and the pair of left and right blades approach each other and their gripping portions abut against the substrate, the slider stops and is gradually relaxed by the urging force of the interference elastic body.
  • the gripping force of the substrate which is the resultant force, is also reduced as the gripping progresses, so that the gripping portions of the pair of left and right blades can grip the substrate with a predetermined strength, eliminating the possibility of breaking the substrate.
  • the operation of one actuator causes the substrate to be sandwiched between the pair of left and right blades, and all the grip points of the blades of the pair of left and right blades have the same timing toward the center position of the substrate. So that the same distance can be moved accurately.
  • the center position is shifted again due to the gripping operation, it is a must! ,.
  • each grip portion of the pair of left and right blades has a recess that receives the edge of the substrate, and the eccentric receiving seating force whose fixed position is variable about the eccentric shaft is obtained.
  • the arrangement of all the gripping portions on the pair of left and right blades matches the contour shape of the substrate of a predetermined shape such as a circle, so that it can be gripped without backlash. By rotating the receiving seat, it is easy to adjust the position of the grip.
  • the elastic body has a spring force.
  • this is interposed between the actuator and the slider, and the thrust of the actuator and the elastic body biasing force are gradually attenuated. It is possible to simplify the configuration for obtaining the resultant force.
  • the substrate gripping device of the invention of the present application like the conventional centering type substrate gripping device, the substrate is gripped using the biasing force of the spring, and the actuator is operated to actuate the spring. Since it is not intended to release the gripping of the board by suppressing the urging force, the acting force of the actuator can be reduced, and the actuator can be miniaturized and stored in the wrist part of the board gripping device. As a result, the wrist portion does not increase in size. As a result, the substrate gripping apparatus can be satisfactorily used for delivering a substrate to an apparatus having a narrow carry-in / out opening.
  • the substrate is held only by the acting force of the actuator, there is a manufacturing error in the substrate, and there is a possibility that the substrate may be broken.
  • the acting force of the actuator advances the slider. Even after the pair of left and right blades approach each other and their gripping portions come into contact with the base plate and the slider stops, the slider is gradually relaxed by the urging force of the interference elastic body. The gripping force is also eased as the gripping progresses, so that the gripping portions of the pair of left and right blades can grip the substrate with a predetermined strength, and the possibility of breaking the substrate is eliminated.
  • the operation of sandwiching the substrate between the pair of left and right blades by the operation of one actuator is performed.
  • the centering of the pair of left and right blades can be performed accurately at the same timing and with the same distance, so that all gripping points of each pair of left and right blades can move toward the center of the board.
  • each gripping portion of the pair of left and right blades has four portions for receiving the edge of the substrate, and the eccentric receiving seating force whose fixed position is variable about the eccentric shaft is assumed.
  • the eccentric receiving seats are arranged so that the arrangement of all the gripping portions on the pair of left and right blades matches the contour shape of the substrate of a predetermined shape such as a circle and can be gripped without backlash. By rotating the, it is easy to adjust the position of the grip portion.
  • the effects as described above can be achieved.
  • FIG. 1 is a diagram showing an overview of the overall configuration of a substrate gripping apparatus of the present embodiment, in which (a) is a plan view showing the drive unit removed, and (b) is a side sectional view.
  • FIG. 1 is a diagram showing an overview of the overall configuration of a substrate gripping apparatus of the present embodiment, in which (a) is a plan view showing the drive unit removed, and (b) is a side sectional view.
  • FIG. 2 is a perspective view of the drive unit, with one blade removed.
  • FIG. 3 is an exploded perspective view of a slider advance / retreat mechanism portion of the drive unit.
  • FIG. 4 is a view showing an eccentric receiving seat constituting a substrate gripping portion fixed on a blade of the substrate gripping device, wherein (a) is a side view thereof and (b) is a plan view.
  • FIG. 5 is a diagram for explaining the operating state of the drive unit over time.
  • propulsion catching member 19— guide rail, 20 ... motion conversion Mechanisms, 21a, 21b... A pair of left and right link mechanisms, 22a, 22b- A pair of left and right slide mechanisms, 23a—1, 23a—2,... A pair of front and rear guide levers, 23b—1, 23 b—2—Front and rear A pair of guide rails, 24 ... travel block, 30 ... wafer presence sensor.
  • a substrate gripping device used for gripping and transporting a substrate such as a semiconductor wafer grips a slider, a slider advancing / retreating mechanism, and a substrate from both sides in the left-right direction perpendicular to the advancing / retreating direction of the slider.
  • a pair of left and right blades having a gripping portion, and a link mechanism that rotatably connects the left and right ends of the slider and the base ends of the pair of left and right blades on the left and right sides, and the slider moves forward and backward In conjunction with the forward and backward movement, the pair of left and right blades move left and right by the same amount so that they can approach and separate from each other!
  • the advance / retreat mechanism of the slider includes an actuator and a spring that exerts an urging force that interferes with the acting force of the actuator. Even if the pair of left and right blades move forward and come close to each other and stop when their gripping parts come into contact with the substrate, they continue to receive a resultant force that gradually attenuates and both grips the pair of left and right blades.
  • the unit is configured to be able to grip the substrate with a predetermined strength.
  • Each gripping part of the pair of left and right blades has a recess for receiving the edge of the substrate, and is constituted by an eccentric receiving seat that has a fixed position variable about the eccentric shaft.
  • FIG. 1 is a diagram showing an overview of the overall configuration of the substrate gripping apparatus according to the present embodiment.
  • FIG. 1 (a) is a plan view showing the drive unit removed
  • FIG. 1 (b) is a side sectional view.
  • FIG. 3 is a perspective view of the drive unit, with one blade removed
  • FIG. 3 is an exploded perspective view of a slider advance / retreat mechanism portion of the drive unit
  • FIG. 4 is a blade of the substrate gripping device.
  • FIGS. 5A and 5B are diagrams showing an eccentric receiving seat constituting a substrate gripping part fixed on the top, wherein FIG. 5A is a side view, FIG. 5B is a plan view, and FIG. FIG.
  • the forward / backward direction of the slider is defined as the front / rear direction
  • the direction orthogonal thereto is defined as the left / right direction.
  • the substrate gripping device (edge clamp node) 1 of this embodiment is used for holding a substrate such as a semiconductor wafer and transporting it between a cassette liner and an inspection device.
  • the outline of the configuration is a pair of left and right blades 2a, 2b and their drive. It consists of mechanism 3.
  • the pair of left and right blades 2a and 2b are precisely symmetrical.
  • a total of three eccentric receiving seats 4 are fixed by bolt fastening, one at the tip and two at the root.
  • the two eccentric receiving seats 4 are attached to the roots of the blades 2a and 2b, respectively, in order to use one of them as an auxiliary when the notch or the like of the wafer 5 comes into contact with the eccentric receiving seat of the root part. It is.
  • the eccentric receiving seat 4 is a portion that forms a gripping portion of the wafer 5, and is made of a grease material and has a recess 4c that is constricted in a V shape at the center as shown in FIG. It also becomes a member.
  • This seat member has an upper inverted truncated cone part 4a above and a lower truncated cone part 4b below, with a central equal-diameter recess 4c as a boundary.
  • the lower truncated cone part 4b has a larger diameter than the upper inverted truncated cone part 4a.
  • the fixing portion is also eccentric with a circular central force. Therefore, the fixing position of the eccentric receiving seat 4 can be changed to a desired rotational position by loosening the fixing by bolt tightening or the like, rotating it by a desired amount around the eccentric shaft 4d, and fixing it again.
  • the substrate gripping device 1 is assembled, even if it is necessary to adjust the fixed position of each eccentric receiving seat 4 to match the contour shape of the wafer 5, the adjustment is easily performed. be able to. Through such adjustment, the substrate gripping apparatus 1 is able to grip the wafer 5 evenly.
  • the drive mechanism 3 includes a slider advance / retreat mechanism 10 and a motion change mechanism 20 for converting the advance / retreat of the slider 13 by the operation of the slider advance / retreat mechanism 10 into the left / right movement of the pair of left and right blades 2a, 2b.
  • the motion variable structure 20 is composed of a pair of left and right link mechanisms 21a and 21b, and a pair of left and right blades 2a. 2b also has a force with a pair of left and right slide mechanisms 22a, 22b for smooth left-right movement.
  • a pair of left and right A wafer presence sensor 30 for detecting the presence of the wafer 5 on the blades 2a and 2b is provided.
  • the slider advance / retreat mechanism 10 includes a slider 13, an actuator for moving the slider 13 forward and backward, and a spring 16 that exerts a biasing force that interferes with the acting force of the actuator. .
  • a coil spring is used as the spring 16.
  • the slider 13 is composed of a block body formed in a shape having a concave-shaped recess 13a when viewed from the front, and is a guide rail laid in the front-rear direction on the support plate 6. It is mounted on the guide rail 19 and is pushed or pushed back by the resultant force of the acting force of the actuator and the urging force of the interference spring 16, and the piston rod 12 and spring restraint described later are pressed. It moves forward and backward while avoiding interference with member 15.
  • the actuator is a portion that serves as a drive source for the slider advance / retreat mechanism 10, is configured by a cylinder / viston mechanism, and includes an air cylinder 11 and a piston rod 12.
  • the cylinder 11 is fixed to the upper surface of the central portion of the support plate 6, and the piston rod 12 projects forward from the air cylinder 11.
  • a disc-shaped spring restraining member 15 is fixed to the tip of the piston rod 12, and the piston rod 12 holds the compression force to the spring 16 through the spring restraining member 15, and the spring 16 Can be restored.
  • the spring 16 is accommodated in a diamond-shaped recess 13 a of the slider 13, and the rear end thereof is in contact with the spring holding member 15, and the front end thereof is in contact with the back surface of the engagement member 14.
  • This engagement member 14 is ported on the side surface of the slider 13 opposite to the air cylinder 11 so as to close the diamond-shaped recess 13a of the slider 13, and a circular hole is formed in the central portion thereof. 14a.
  • the propulsion saddle member 17 has a cylindrical main body portion excluding the flange portion at the front end of the engagement member 14.
  • Corrected paper (Rule S1) It is slidably inserted into a circular hole 14a formed in the central portion, passes through the inside of the coiled spring 16 and abuts against the front surface of the spring restraining member 15, and has the same axial center. It is fixed.
  • the length of the cylindrical body portion of the propulsion fill member 17 is sufficiently longer than the natural length of the spring 16. Therefore, when the piston rod 12 is retracted, the flange portion of the propelling member 17 is brought into contact with the engaging member 14 and the slider 13 is retracted. The spring 16 at this time is not compressed because the length of the cylindrical body portion of the propulsion Ml member 17 is sufficiently longer than the natural length of the spring 16.
  • the pair of left and right blades 2a, 2b approach each other as the slider 13 moves forward, and the eccentric seats 4 on the blades 2a, 2b are placed on the corresponding edge portions of the wafer 5. Even after the slider 13 stops due to contact, the piston rod 12 can still advance a small distance while compressing the spring 16.
  • the maximum forward position is a position where the resultant force of the acting force of the actuator (cylinder and piston mechanism) and the urging force (repulsive force) based on the compression deformation of the spring 16 becomes zero.
  • the motion conversion mechanism 20 is for converting the forward / backward movement of the slider 13 due to the operation of the slider advance / retreat mechanism 10 into the left / right movement of the pair of left and right blades 2a, 2b.
  • the motion conversion mechanism 20 includes a pair of left and right link mechanisms 21a and 21b that rotatably connect the left and right ends of the slider 13 and the bases of the pair of left and right blades 2a and 2b on the left and right sides, A pair of left and right slide mechanisms 22a and 22b for smoothly moving the pair of left and right blades 2a and 2b to the left and right are provided.
  • the pair of left and right slide mechanisms 22a, 22b are a pair of front and rear guide rails 23a-1, 23a- laid respectively on the front and rear of the left half and right half of the bottom surface 6c of the support plate 6. 2, 23b-1 and 23b-2, and two traveling block bodies 24 slidably mounted on the guide rails, respectively.
  • the pair of left and right blades 2a and 2b are connected to these traveling block bodies 24 at a total of four locations, two in each of the front and rear portions of the base.
  • the link mechanisms 21a, 21b are forced to move the blades 2a, 2b along with the forward movement of the slider 13.
  • the blades 2a, 2b are Since it can only move left and right according to the slide mechanisms 22a and 22b, it tries to maintain the respective link lengths while moving the blades 2a and 2b close to each other. Therefore, the approaching amount of the blades 2a and 2b, in other words, the advancement amount of the slider 13 corresponds to the diameter of the wafer 5 and the gripping force of the wafer 5 by adjusting the compression force of the spring 16. Can be adjusted.
  • the support plate 6 has a plate shape with a convex shape in plan view, and a protruding surrounding wall 6a is formed around the portion excluding the rear protruding portion 6b.
  • the guide rail 19 and the pair of left and right slide mechanisms 22a and 22b are installed on the inner bottom surface 6c surrounded by the wall of the rear projecting portion 6b.
  • the air cylinder 11 is installed across the rear surface 6c of the support plate 6 over the bottom surface 6c! / All parts constituting the drive mechanism 3 are covered with a cover (not shown).
  • the piston rod 12 still pushes the propulsion ML member 17 as long as the spring 16 sandwiched between the restraining member 15 and the engagement member 14 allows, so the propulsion ffiSi member 17 continues to advance, and the piston rod 12 continues to press the slider 13 via the spring 16.
  • the force that the piston rod 12 pushes the propulsion fill member 17, that is, the resultant force of the acting force of the actuator and the repulsive force based on the compression deformation of the spring 16 gradually attenuates and eventually becomes zero, so the propulsion ffiSl member
  • the forward movement of 17 stops, and the pressing of the slider 13 via the spring 16 of the piston rod 12 also stops while maintaining the maximum pressing force. As a result, the increase in the force with which the blades 2a and 2b grip the wafer 5 is also stopped.
  • the wafer 5 is gripped by a mechanical force, a cracking force S will be generated, but conversely, if the wafer 5 is simply touched, the wafer 5 may be dropped. Therefore, as described above, the wafer 5 is preferably held while being reduced only by the mechanical force of the actuator 16 and reduced by the force of the spring 16.
  • the theoretical thrust of the actuator is a force of about 0.57 kg.
  • the repulsive force of the spring 16 reduces the theoretical thrust to about 0.46 kg.
  • This force is distributed to the blades 2a and 2b, and the load applied from one blade to the wafer 5 is about 294 g (generally, the load on the wafer 5 is up to 300 g).
  • the amount of expansion / contraction of 16 is 23 mm in the free state, 10.5 mm when installed in the equipment, and about 8.5 mm in the final compressed state where the thrust of the actuator is applied.
  • the substrate gripping apparatus 1 of the present embodiment is configured as described above, the following effects can be obtained.
  • the substrate is gripped using the biasing force of the spring, and the actuator is not operated to suppress the spring biasing force and release the gripping of the substrate.
  • the acting force of the actuator can be small, and the actuator can be made small. If this is housed in the wrist portion of the substrate gripping device 1, the wrist portion does not become large. This allows wafers 5 to be placed into equipment with a narrow entrance / exit.
  • the operation of one actuator causes the wafer 5 to be sandwiched between the pair of left and right blades 2a and 2b, and the gripping force of all the blades of the pair of left and right blades 2a and 2b is the wafer. Since the same distance can be accurately moved to the center position of 5 at the same timing, the center position is shifted again due to the gripping operation when receiving the centered Ueno 5 There is no.
  • each gripping part of the pair of left and right blade blades 2a, 2b has a recess 4c that receives the edge of the wafer 5, and an eccentric receiving seat 4 whose fixed position is variable about the eccentric shaft 4d. Therefore, when the substrate gripping device 1 is assembled, the arrangement of all the gripping portions on the pair of left and right blades 2a and 2b matches the contour shape of the wafer 5 having a predetermined shape such as a circle. It is easy to adjust the position of the grip portion so that the grip portion can be gripped without play.

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  • Engineering & Computer Science (AREA)
  • Robotics (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manipulator (AREA)

Abstract

[PROBLEMS] To provide a substrate holding device capable of delivering a substrate to a narrow entrance and performing accurate centering. [MEANS FOR SOLVING PROBLEMS] This substrate holding device (1) for semiconductor wafers comprises a slider (13), a slider advance/retreat mechanism (10), a pair of right and left side blades (2a) and (2b), and link mechanisms (21a) and (21b) rotatably connecting the slider (13) to the base end parts of the blades (2a) and (2b) on both right and left sides. When the slider (13) advances or retreats, the blades (2a) and (2b) laterally move close to or apart from each other. The advance/retreat mechanism (10) comprises actuators (11) and (12) and a spring (16). The slider (13) is moved forward by a gradually attenuating resultant force of the action forces of the actuators (11) and (12) and the energization force of the spring (16) and, even if both holding parts of the blades (2a) and (2b) are brought into contact with the substrate (5) and the slider is stopped, continuously receives the gradually attenuating resultant force so that the both holding parts can hold the substrate (5) with a prescribed strength.

Description

基板把持装置  Substrate gripping device
技術分野  Technical field
[0001] 本願の発明は、基板把持装置に関し、特に半導体ウェハ等の基板を把持してカセ ットゃァライナー、検査装置間で搬送するのに使用されるセンタリング方式の基板把 持装置に関する。  The present invention relates to a substrate gripping device, and more particularly to a centering type substrate gripping device used for gripping a substrate such as a semiconductor wafer and transporting it between a cassette carrier and an inspection device.
背景技術  Background art
[0002] 従来、半導体ウェハの把持には、ウェハの裏面を吸着保持する吸着ハンドと、ゥェ ハの端縁を把持するエッジクランプノヽンドとがある。吸着ハンドは、ウェハの裏面に悪 影響を与えるため、近年は、エッジクランプハンドがウェハの把持装置として使用され ることが多くなつた。  Conventionally, gripping of a semiconductor wafer includes a suction hand that holds the back surface of the wafer by suction, and an edge clamp node that grips the edge of the wafer. Since the suction hand has an adverse effect on the back surface of the wafer, in recent years, the edge clamp hand has been frequently used as a wafer gripping device.
[0003] ところで、このエッジクランプノヽンドには、一方を固定部とし、他方を可動部とした把 持部材による挟み込みによる把持 ( 、わゆる片寄せ方式。特開 2004— 6534号公報 参照。)と、基板の外周端力 均等に押さえ込む把持 (いわゆるセンタリング方式。実 公平 6— 37906号公報参照。)とがある。  [0003] By the way, this edge clamp node is gripped by pinching with a holding member having one as a fixed portion and the other as a movable portion (refer to Japanese Patent Application Laid-Open No. 2004-6534). There is also a grip (so-called centering method; refer to Japanese Utility Model Publication No. 6-37906) that presses the substrate evenly.
[0004] 前者の把持動作は、ウェハ寸より大きく開いた把持部材がウェハの下力 ウェハを 掬い上げるようにして接近し、一端固定部にウェハを当接させた後、可動部の移動に よりウェハを挟み込むのである力 この場合、位置決め装置等で芯出しが行われた 状態のウェハを受け取るに際して、その把持動作により再び中心位置をずらしてしま うことになる。また、検査装置などの吸着保持部力もウェハを受け取るに際しては、吸 着解除のタイミングが悪 、と、上手く把持することが困難となる。  [0004] The former gripping operation is performed by moving the movable part after the gripping member that is opened larger than the wafer size approaches the wafer under the force of the wafer so that the wafer comes into contact with one end fixing part. In this case, when a wafer having been centered by a positioning device or the like is received, the center position is shifted again by the gripping operation. In addition, when the suction holding force of the inspection apparatus or the like receives the wafer, the timing of releasing the suction is bad, and it is difficult to hold it well.
[0005] 後者の場合は、このような問題がないが、複数の把持部材がハンドの中心に向け、 同等に移動する必要がある。実公平 6— 37906号公報に記載されて 、るクランプ機 構は、レバーの長孔に係合するピンが Y字形と T字形の 2つのレバーを互いに接近 する方向に引き寄せることでセンタリング動作を行っている力 長孔には当然にガタ があるため、 Y字形、 T字形の各レバーの移動距離は、必ずしも同等だとは言えない [0006] また、エッジクランプノヽンドの把持動作は、これら 2つの公報に記載のもののように、 ばねの付勢力を利用してウェハを把持し、ァクチユエータの作動でばね力を抑えて 把持の解除を行うものが多ぐこの場合、ばね力を越える力をもったシリンダ等が必要 となるが、これをエッジクランプハンドの手首に収容すると、どうしてもその手首部分が 大きくならざるを得ない。したがって、狭い搬出入口を持つ装置への基板の受渡しに は、エッジクランプノヽンドは使用しにく 、と 、う問題を抱えて 、た。 In the latter case, there is no such problem, but a plurality of gripping members need to move equally toward the center of the hand. In fact, the clamp mechanism described in Japanese Patent Publication No. 6-37906 performs a centering operation by pulling the two levers, Y-shaped and T-shaped, close to each other, with the pin that engages with the long hole of the lever. Because the long holes naturally have backlash, the movement distances of the Y-shaped and T-shaped levers are not necessarily the same. [0006] As described in these two publications, the gripping operation of the edge clamp node grips the wafer using the biasing force of the spring and suppresses the spring force by operating the actuator to release the gripping. In this case, a cylinder with a force exceeding the spring force is required. However, if this is housed in the wrist of an edge clamp hand, the wrist part will inevitably become large. Therefore, the edge clamp node is difficult to use for delivering a substrate to a device having a narrow loading / unloading port.
特許文献 1:特開 2004— 6534号公報  Patent Document 1: Japanese Patent Application Laid-Open No. 2004-6534
特許文献 2 :実公平 6— 37906号公報  Patent Document 2: Japanese Utility Model Publication No. 6-37906
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0007] 本願の発明は、従来の基板把持装置が有する前記のような問題点を解決して、狭 V、搬出入口への基板の受渡しが可能で、正確なセンタリングを行うことができる基板 把持装置を提供することを課題とする。 [0007] The invention of the present application solves the above-mentioned problems of the conventional substrate gripping device, and can transfer the substrate to a narrow V, carry-in / out port, and can perform accurate centering. It is an object to provide an apparatus.
課題を解決するための手段  Means for solving the problem
[0008] 本願の発明によれば、前記のような課題は、次のような基板把持装置により解決さ れる。 [0008] According to the invention of the present application, the above-described problems can be solved by the following substrate gripping apparatus.
すなわち、その基板把持装置は、半導体ウェハ等の基板を把持して搬送するのに 使用される基板把持装置であって、スライダーと、前記スライダーの進退機構と、前 記基板を前記スライダーの進退方向とは直交する左右方向両側から把持する把持 部を有する左右一対のブレードと、前記スライダーの左右両側端と前記左右一対の ブレードの基端部とを左右各側において回動自在に連結するリンク機構とを備え、前 記スライダーが進退動するとき、その進退動に連動して、前記左右一対のブレードが 等量ずつ左右動して、互いに接近 '離反することができるようにされており、前記スラ イダーの進退機構は、ァクチユエータと、前記ァクチユエータの作用力に干渉する付 勢力を発揮する弾性体とを備え、前記スライダーは、前記ァクチユエータの作用力と 前記弾性体の付勢力との漸次減衰する合力により前進するが、前進して前記左右一 対のブレードが互いに接近し、それらの把持部が前記基板にそれぞれ当接すること により停止しても、なお、前記漸次減衰する合力を受け続けて、前記左右一対のブレ 一ドの両把持部が前記基板を所定の強度で把持することができるようにされているこ とを特徴とする基板把持装置である。 That is, the substrate gripping device is a substrate gripping device used for gripping and transporting a substrate such as a semiconductor wafer, and includes a slider, a moving mechanism of the slider, and a moving direction of the slider. A pair of left and right blades having gripping portions gripping from both sides in the right and left direction orthogonal to each other, and a link mechanism that rotatably connects the left and right side ends of the slider and the base end portions of the pair of left and right blades on the left and right sides When the slider advances and retreats, the pair of left and right blades move left and right by the same amount in conjunction with the advance and retreat, so that they can move toward and away from each other. The advancing / retreating mechanism of the slider includes an actuator and an elastic body that exerts an urging force that interferes with the acting force of the actuator, and the slider includes the actuator. The forward movement is caused by the resultant damping force of the actuator acting force and the urging force of the elastic body, but the forward movement causes the pair of left and right blades to approach each other and their gripping portions abut against the substrate. Even after stopping, the pair of left and right blurs continue to receive the resultant force that gradually decreases. The substrate gripping apparatus is characterized in that both grip portions of the door can grip the substrate with a predetermined strength.
[0009] この基板把持装置によれば、そのスライダーの前進動により、左右一対のブレード が等量ずつ左右動して互いに接近し、基板を左右方向両側力 把持することができ 、しかも、そのスライダーの前進動の推力は、ァクチユエータの作用力と、これに干渉 する弾性体の付勢力との漸次減衰する合力によっており、そのスライダーが前進して 左右一対のブレードが互いに接近し、それらの把持部が基板にそれぞれ当接するこ とによりスライダーが停止しても、なお、該漸次減衰する合力を受け続けて、左右一 対のブレードの両把持部が基板を所定の強度で把持するようにすることができる。 また、逆に、単にァクチユエータの作動を解除して、その作用力を解消することによ り、スライダーが弾性体の付勢力により後退して、左右一対のブレードが等量ずつ左 右動して互いに離反し、基板の把持を解除することができる。  According to this substrate gripping device, the pair of left and right blades move left and right by an equal amount and approach each other by the forward movement of the slider, and the substrate can be gripped by both side forces in the left and right direction. The forward thrust is due to the resultant damping force of the acting force of the actuator and the biasing force of the elastic body that interferes with this, and the slider advances and the pair of left and right blades approach each other. Even if the slider stops due to contact with the substrate, the gripping force of the pair of left and right blades will continue to receive the resultant force that gradually decreases so that the substrate is gripped with a predetermined strength. Can do. Conversely, by simply releasing the action of the actuator and canceling its acting force, the slider moves backward due to the biasing force of the elastic body, and the pair of left and right blades move left and right by equal amounts. They can be separated from each other to release the substrate.
[0010] したがって、従来のセンタリング方式の基板把持装置のように、ばねの付勢力を利 用して基板を把持し、ァクチユエータの作動でばねの付勢力を抑えて基板の把持の 解除を行うようにするものではないので、ァクチユエータの作用力は小さくて済み、ァ クチユエータの小型化が可能になり、これを基板把持装置の手首部分に収納すると して、その手首部分が大型化することがない。これにより、狭い搬出入口を持つ装置 への基板の受渡しにも、本基板把持装置を良好に使用することができる。  [0010] Therefore, as in the conventional centering type substrate gripping device, the substrate is gripped using the biasing force of the spring, and the actuator is operated to suppress the spring biasing force and release the gripping of the substrate. Since the acting force of the actuator is small, the actuator can be reduced in size, and if this is stored in the wrist portion of the substrate gripping device, the wrist portion will not be enlarged. . As a result, the substrate gripping apparatus can be satisfactorily used for delivering a substrate to an apparatus having a narrow carry-in / out opening.
[0011] また、基板の把持をァクチユエータの作用力のみで行おうとすると、基板には製造 上の寸法誤差があるので、基板を割ってしまう虞がある力 前記のとおり、ァクチユエ ータの作用力は、スライダーが前進して左右一対のブレードが互いに接近し、それら の把持部が基板にそれぞれ当接することによりスライダーが停止した後も、干渉弾性 体の付勢力で漸次緩和されるので、それらの合力である基板の把持力も、把持が進 むほど緩和されて、左右一対のブレードの両把持部が基板を所定の強度で把持する ようにすることができ、基板を割ってしまう虞が解消される。  [0011] Further, if the substrate is gripped only by the acting force of the actuator, there is a manufacturing error in the substrate, and therefore there is a possibility of breaking the substrate. As described above, the acting force of the actuator Since the slider moves forward and the pair of left and right blades approach each other and their gripping portions abut against the substrate, the slider stops and is gradually relaxed by the urging force of the interference elastic body. The gripping force of the substrate, which is the resultant force, is also reduced as the gripping progresses, so that the gripping portions of the pair of left and right blades can grip the substrate with a predetermined strength, eliminating the possibility of breaking the substrate. The
[0012] また、 1つのァクチユエータの作動で左右一対のブレードに基板を挟み込む動作を 行わせ、しかも、これら左右一対のブレードの各ブレードの全ての把持点が基板の中 心位置に向けて同じタイミングで、同じ距離を正確に移動することができるので、芯出 しされた状態の基板を受け取るに際して、その把持動作により再び中心位置をずらし てしまうと 、つたことがな!、。 [0012] Further, the operation of one actuator causes the substrate to be sandwiched between the pair of left and right blades, and all the grip points of the blades of the pair of left and right blades have the same timing toward the center position of the substrate. So that the same distance can be moved accurately. When receiving a substrate that has been processed, if the center position is shifted again due to the gripping operation, it is a must! ,.
[0013] 好ま 、実施形態では、その左右一対のブレードの各把持部が、基板の端縁を迎 え入れる凹部を有し、偏心軸を中心に固定位置を可変にされた偏心受け座力 なる ようにされる。これにより、基板把持装置を組み立てる際、左右一対のブレード上の全 ての把持部の配置が円形等所定形状の基板の輪郭形状に合致して、これをガタなく 把持することができるように偏心受け座を回転させることで、把持部の位置調整をす ることが容易になる。  [0013] Preferably, in the embodiment, each grip portion of the pair of left and right blades has a recess that receives the edge of the substrate, and the eccentric receiving seating force whose fixed position is variable about the eccentric shaft is obtained. To be done. As a result, when assembling the substrate gripping device, the arrangement of all the gripping portions on the pair of left and right blades matches the contour shape of the substrate of a predetermined shape such as a circle, so that it can be gripped without backlash. By rotating the receiving seat, it is easy to adjust the position of the grip.
[0014] また、他の好ま 、実施形態では、その弾性体が、ばね力もなるものとされる。これ により、汎用の弾性体材料を使用しつつ、これをァクチユエータとスライダーとの間に 介装して、スライダーの前進動の推力をなす、ァクチユエータの作用力と弾性体の付 勢力との漸次減衰する合力を得る構成を簡易になし得る。  [0014] In another preferred embodiment, the elastic body has a spring force. As a result, while using a general-purpose elastic material, this is interposed between the actuator and the slider, and the thrust of the actuator and the elastic body biasing force are gradually attenuated. It is possible to simplify the configuration for obtaining the resultant force.
発明の効果  The invention's effect
[0015] 前記のとおり、本願の発明の基板把持装置によれば、従来のセンタリング方式の基 板把持装置のように、ばねの付勢力を利用して基板を把持し、ァクチユエータの作動 でばねの付勢力を抑えて基板の把持の解除を行うようにするものではないので、ァク チユエータの作用力は小さくて済み、ァクチユエータの小型化が可能になり、これを 基板把持装置の手首部分に収納するとして、その手首部分が大型化することがない 。これにより、狭い搬出入口を持つ装置への基板の受渡しにも、本基板把持装置を 良好に使用することができる。  [0015] As described above, according to the substrate gripping device of the invention of the present application, like the conventional centering type substrate gripping device, the substrate is gripped using the biasing force of the spring, and the actuator is operated to actuate the spring. Since it is not intended to release the gripping of the board by suppressing the urging force, the acting force of the actuator can be reduced, and the actuator can be miniaturized and stored in the wrist part of the board gripping device. As a result, the wrist portion does not increase in size. As a result, the substrate gripping apparatus can be satisfactorily used for delivering a substrate to an apparatus having a narrow carry-in / out opening.
[0016] また、基板の把持をァクチユエータの作用力のみで行おうとすると、基板には製造 上の寸法誤差があるので、基板を割ってしまう虞がある力 ァクチユエータの作用力 は、スライダーが前進して左右一対のブレードが互いに接近し、それらの把持部が基 板にそれぞれ当接することによりスライダーが停止した後も、干渉弾性体の付勢力で 漸次緩和されるので、それらの合力である基板の把持力も、把持が進むほど緩和さ れて、左右一対のブレードの両把持部が基板を所定の強度で把持するようにするこ とができ、基板を割ってしまう虞が解消される。  [0016] If the substrate is held only by the acting force of the actuator, there is a manufacturing error in the substrate, and there is a possibility that the substrate may be broken. The acting force of the actuator advances the slider. Even after the pair of left and right blades approach each other and their gripping portions come into contact with the base plate and the slider stops, the slider is gradually relaxed by the urging force of the interference elastic body. The gripping force is also eased as the gripping progresses, so that the gripping portions of the pair of left and right blades can grip the substrate with a predetermined strength, and the possibility of breaking the substrate is eliminated.
[0017] また、 1つのァクチユエータの作動で左右一対のブレードに基板を挟み込む動作を 行わせ、し力も、これら左右一対のブレードの各ブレードの全ての把持点が基板の中 心位置に向けて同じタイミングで、同じ距離を正確に移動することができるので、芯出 しされた状態の基板を受け取るに際して、その把持動作により再ぴ中心位置をずらし てしまうと 、つたことがなレ、。 [0017] Also, the operation of sandwiching the substrate between the pair of left and right blades by the operation of one actuator is performed. The centering of the pair of left and right blades can be performed accurately at the same timing and with the same distance, so that all gripping points of each pair of left and right blades can move toward the center of the board. When receiving the substrate, if the center position is shifted again due to the gripping operation, it will be a problem.
[0018] さらに、左右一対のブレードの各把持部が、基板の端縁を迎え入れる四部を有し、 偏心軸を中心に固定位置を可変にされた偏心受け座力 なるものとされる場合には 、基板把持装置を組み立てた際、左右一対のブレード上の全ての把持部の配置が 円形等所定形状の基板の輪郭形状に合致して、これをガタなく把持することができる ように偏心受け座を回転させることで、把持部の位置調整をすることが容易になる。 その他、前記したような効果を奏することができる。 [0018] Further, in the case where each gripping portion of the pair of left and right blades has four portions for receiving the edge of the substrate, and the eccentric receiving seating force whose fixed position is variable about the eccentric shaft is assumed. When the substrate gripping device is assembled, the eccentric receiving seats are arranged so that the arrangement of all the gripping portions on the pair of left and right blades matches the contour shape of the substrate of a predetermined shape such as a circle and can be gripped without backlash. By rotating the, it is easy to adjust the position of the grip portion. In addition, the effects as described above can be achieved.
図面の簡単な説明  Brief Description of Drawings
[0019] [図 1]本実施例の基板把持装置の全体構成のあらましを示す図であって、(a)は、そ の駆動部のカバーを取り除いて示す平面図、(b)は側断面図である。  FIG. 1 is a diagram showing an overview of the overall configuration of a substrate gripping apparatus of the present embodiment, in which (a) is a plan view showing the drive unit removed, and (b) is a side sectional view. FIG.
[図 2]同駆動部の斜視図であって、片方のブレードを除去して示す図である。  FIG. 2 is a perspective view of the drive unit, with one blade removed.
[図 3]同駆動部のスライダー進退機構部分の分解斜視図である。  FIG. 3 is an exploded perspective view of a slider advance / retreat mechanism portion of the drive unit.
[図 4]同基板把持装置のブレード上に固定される基板把持部を構成する偏心受け座 を示す図であって、(a)は、その側面図、(b)は平面図である。  FIG. 4 is a view showing an eccentric receiving seat constituting a substrate gripping portion fixed on a blade of the substrate gripping device, wherein (a) is a side view thereof and (b) is a plan view.
[図 5]同駆動部の作動状態を経時的に説明するための図である。  FIG. 5 is a diagram for explaining the operating state of the drive unit over time.
符号の説明  Explanation of symbols
[0020] 1…基板把持装置、 2a、 2b…左右一対のブレード、 3· · ·駆動機構、 4…偏心受け座 、 4a…上方逆円錐台部、 4b…円錐台部、 4c…凹部、 4d…偏心軸、 5…ウェハ、 6— 支持プレート、 6a…突出囲壁、 6b…後方突出部分、 6c…底面、 10…スライダー進 退機構、 11 · ··エアシリンダ、 12…ピストンロッド、 13…スライダー、 13a…凹部、 14- 係合部材、 14a…円孔、 15· · ·ばね抑え部材、 16…ばね、 17···推進捕助部材、 19— 案内レ—ル、 20·· ·運動変換機構、 21a、 21b…左右一対のリンク機構、 22a、 22b- 左右一対のスライド機構、 23a— 1、 23a— 2···前後一対の案内レ—ノレ、 23b— 1、 23 b— 2…前後一対の案内レール、 24…走行ブロック体、 30…ウェハ在席センサ。 発明を実施するための最良の形態  [0020] 1 ... Substrate gripping device, 2a, 2b ... Pair of left and right blades, 3 ... Drive mechanism, 4 ... Eccentric receiving seat, 4a ... Upside inverted truncated cone part, 4b ... Frustum part, 4c ... Recessed part, 4d … Eccentric shaft, 5… Wafer, 6—Support plate, 6a… Projection wall, 6b… Backward projecting part, 6c… Bottom surface, 10… Slider advance / retreat mechanism, 11… Air cylinder, 12… Piston rod, 13… Slider , 13a ... concave portion, 14- engaging member, 14a ... circular hole, 15 ... spring restraining member, 16 ... spring, 17 ... propulsion catching member, 19— guide rail, 20 ... motion conversion Mechanisms, 21a, 21b… A pair of left and right link mechanisms, 22a, 22b- A pair of left and right slide mechanisms, 23a—1, 23a—2,... A pair of front and rear guide levers, 23b—1, 23 b—2—Front and rear A pair of guide rails, 24 ... travel block, 30 ... wafer presence sensor. BEST MODE FOR CARRYING OUT THE INVENTION
正された羯紙 (規則 91) [0021] 半導体ウェハ等の基板を把持して搬送するのに使用される基板把持装置が、スラ イダーと、スライダーの進退機構と、基板をスライダーの進退方向とは直交する左右 方向両側から把持する把持部を有する左右一対のブレードと、スライダーの左右両 側端と左右一対のブレードの基端部とを左右各側において回動自在に連結するリン ク機構とを備え、スライダーが進退動するとき、その進退動に連動して、左右一対の ブレードが等量ずつ左右動して、互 、に接近 ·離反することができるようにされて!、る Corrected paper (Rule 91) [0021] A substrate gripping device used for gripping and transporting a substrate such as a semiconductor wafer grips a slider, a slider advancing / retreating mechanism, and a substrate from both sides in the left-right direction perpendicular to the advancing / retreating direction of the slider. A pair of left and right blades having a gripping portion, and a link mechanism that rotatably connects the left and right ends of the slider and the base ends of the pair of left and right blades on the left and right sides, and the slider moves forward and backward In conjunction with the forward and backward movement, the pair of left and right blades move left and right by the same amount so that they can approach and separate from each other!
[0022] スライダーの進退機構は、ァクチユエータと、ァクチユエータの作用力に干渉する付 勢力を発揮するばねとを備え、スライダーは、ァクチユエータの作用力とばねの付勢 力との漸次減衰する合力により前進する力 前進して左右一対のブレードが互いに 接近し、それらの把持部が基板にそれぞれ当接することにより停止しても、なお、漸 次減衰する合力を受け続けて、左右一対のブレードの両把持部が基板を所定の強 度で把持することができるようにされて 、る。 [0022] The advance / retreat mechanism of the slider includes an actuator and a spring that exerts an urging force that interferes with the acting force of the actuator. Even if the pair of left and right blades move forward and come close to each other and stop when their gripping parts come into contact with the substrate, they continue to receive a resultant force that gradually attenuates and both grips the pair of left and right blades. The unit is configured to be able to grip the substrate with a predetermined strength.
左右一対のブレードの各把持部は、基板の端縁を迎え入れる凹部を有し、偏心軸 を中心に固定位置を可変にされた偏心受け座カゝら構成する。  Each gripping part of the pair of left and right blades has a recess for receiving the edge of the substrate, and is constituted by an eccentric receiving seat that has a fixed position variable about the eccentric shaft.
実施例  Example
[0023] 次に、本願の発明の一実施例について説明する。  Next, an embodiment of the present invention will be described.
図 1は、本実施例の基板把持装置の全体構成のあらましを示す図であって、(a)は 、その駆動部のカバーを取り除いて示す平面図、(b)は側断面図、図 2は、同駆動部 の斜視図であって、片方のブレードを除去して示す図、図 3は、同駆動部のスライダ 一進退機構部分の分解斜視図、図 4は、同基板把持装置のブレード上に固定される 基板把持部を構成する偏心受け座を示す図であって、(a)は、その側面図、(b)は平 面図、図 5は、同駆動部の作動状態を経時的に説明するための図である。なお、以 下においては、スライダーの進退方向を前後方向とし、これと直交する方向を左右方 向とする。  FIG. 1 is a diagram showing an overview of the overall configuration of the substrate gripping apparatus according to the present embodiment. FIG. 1 (a) is a plan view showing the drive unit removed, and FIG. 1 (b) is a side sectional view. FIG. 3 is a perspective view of the drive unit, with one blade removed, FIG. 3 is an exploded perspective view of a slider advance / retreat mechanism portion of the drive unit, and FIG. 4 is a blade of the substrate gripping device. FIGS. 5A and 5B are diagrams showing an eccentric receiving seat constituting a substrate gripping part fixed on the top, wherein FIG. 5A is a side view, FIG. 5B is a plan view, and FIG. FIG. In the following, the forward / backward direction of the slider is defined as the front / rear direction, and the direction orthogonal thereto is defined as the left / right direction.
[0024] 本実施例の基板把持装置 (エッジクランプノ、ンド) 1は、半導体ウェハ等の基板を把 持してカセットゃァライナー、検査装置間で搬送するのに使用される。その構成のあ らましは、図 1及び図 2に図示されるように、左右一対のブレード 2a、 2bと、その駆動 機構 3とからなっている。左右一対のブレード 2a、 2bは、正確に左右対称に構成され ている。 The substrate gripping device (edge clamp node) 1 of this embodiment is used for holding a substrate such as a semiconductor wafer and transporting it between a cassette liner and an inspection device. As shown in FIGS. 1 and 2, the outline of the configuration is a pair of left and right blades 2a, 2b and their drive. It consists of mechanism 3. The pair of left and right blades 2a and 2b are precisely symmetrical.
[0025] 左右一対のブレード 2a、 2b上には、その先端部に 1個と、その根元部に 2個、合計 3個の偏心受け座 4が、それぞれボルト締結により固定されている。ブレード 2a、 2bの 根元部に各 2個の偏心受け座 4を装着するのは、ウェハ 5のノッチ等が根元部の偏心 受け座に当接する場合に、そのうちの 1個を補助として使用するためである。  [0025] On the pair of left and right blades 2a and 2b, a total of three eccentric receiving seats 4 are fixed by bolt fastening, one at the tip and two at the root. The two eccentric receiving seats 4 are attached to the roots of the blades 2a and 2b, respectively, in order to use one of them as an auxiliary when the notch or the like of the wafer 5 comes into contact with the eccentric receiving seat of the root part. It is.
[0026] この偏心受け座 4は、ウェハ 5の把持部をなす部分であり、榭脂材料力 作られ、図 4に図示されるように、中央が V字状にくびれた凹部 4cを有する座部材カもなる。この 座部材は、中央の等径の凹部 4cを境にして、その上方に上方逆円錐台部 4a、下方 に下方円錐台部 4bを有している。下方円錐台部 4bは、上方逆円錐台部 4aよりも径 が大きい。これは、ウェハ 5の把持を行う際、先ず、ウェハ 5の端縁下面を下方円錐台 部 4bの裾野部に乗せ、そこから滑らかに上らせていき、定位置(凹部 4c)に至ったと ころで把持を行うようにするためである。  [0026] The eccentric receiving seat 4 is a portion that forms a gripping portion of the wafer 5, and is made of a grease material and has a recess 4c that is constricted in a V shape at the center as shown in FIG. It also becomes a member. This seat member has an upper inverted truncated cone part 4a above and a lower truncated cone part 4b below, with a central equal-diameter recess 4c as a boundary. The lower truncated cone part 4b has a larger diameter than the upper inverted truncated cone part 4a. This is because when the wafer 5 is gripped, the lower surface of the edge of the wafer 5 is first placed on the skirt of the lower truncated cone part 4b and smoothly raised from there, reaching a fixed position (recess 4c). This is because gripping is performed with rollers.
[0027] また、この偏心受け座 4は、平面視円形である力 これをブレード 2a、 2b上に固定 するに際しては、その固定部を円形中心力も偏心させてある。したがって、ボルト締 結等によるその固定を緩め、それを偏心軸 4dを中心に所望量回転させて、再び固定 すれば、偏心受け座 4の固定位置を所望の回転位置に変更することができる。このよ うにすることにより、基板把持装置 1の組立時、各偏心受け座 4の固定位置をウェハ 5 の輪郭形状に合わせるために調整する必要が生じた場合にも、その調整を容易に行 うことができる。このような調整を通じて、基板把持装置 1は、ウェハ 5を均等に把持す ることがでさるよう〖こなる。  [0027] Further, when the eccentric receiving seat 4 is fixed on the blades 2a and 2b with a force that is circular in plan view, the fixing portion is also eccentric with a circular central force. Therefore, the fixing position of the eccentric receiving seat 4 can be changed to a desired rotational position by loosening the fixing by bolt tightening or the like, rotating it by a desired amount around the eccentric shaft 4d, and fixing it again. In this way, when the substrate gripping device 1 is assembled, even if it is necessary to adjust the fixed position of each eccentric receiving seat 4 to match the contour shape of the wafer 5, the adjustment is easily performed. be able to. Through such adjustment, the substrate gripping apparatus 1 is able to grip the wafer 5 evenly.
[0028] 次に、駆動機構 3について、図 2及び図 3を参照しつつ、詳細に説明する。  Next, the drive mechanism 3 will be described in detail with reference to FIG. 2 and FIG.
駆動機構 3は、スライダー進退機構 10と、このスライダー進退機構 10の作動による スライダー 13の進退動を左右一対のブレード 2a、 2bの左右動に変換するための運 動変浦構 20とからなっている。運動変浦構 20は、スライダー 13の左右両側端と 左右一対のブレード 2a、 2bの基部とを左右各側において回動自在に連結する左右 一対のリンク機構 21a、 21bと、左右一対のブレード 2a、 2bの左右動を円滑に行わせ るための左右一対のスライド機構 22a、 22bと力もなつている。その他に、左右一対の ブレード 2a、 2b上にウェハ 5が在席することを検知するウェハ在席センサ 30が設けら れている。 The drive mechanism 3 includes a slider advance / retreat mechanism 10 and a motion change mechanism 20 for converting the advance / retreat of the slider 13 by the operation of the slider advance / retreat mechanism 10 into the left / right movement of the pair of left and right blades 2a, 2b. Yes. The motion variable structure 20 is composed of a pair of left and right link mechanisms 21a and 21b, and a pair of left and right blades 2a. 2b also has a force with a pair of left and right slide mechanisms 22a, 22b for smooth left-right movement. In addition, a pair of left and right A wafer presence sensor 30 for detecting the presence of the wafer 5 on the blades 2a and 2b is provided.
[0029] スライダー進退機構 10は、スライダー 13と、該スライダー 13を進退動させるァクチ ユエータと、該ァクチユエータの作用力に干渉する付勢力を発揮するばね 16とを主 要構成要素として構成されている。ばね 16としては、コイルばねが使用されている。 スライダー 13は、図 3から理解されるように、正面視ひの字状の凹部 13aを有する 形状に形成されたブロック体からなり、支持プレ一ト 6上に前後方向に敷設された案 内レール 19上に載置されていて、この案内レール 19上を、ァクチユエータの作用力 と干渉ばね 16の付勢力との合力により押されて、あるいは押し戻されて、後述するピ ストンロッド 12及ぴばね抑え部材 15との干渉を避けながら、進退動する。  [0029] The slider advance / retreat mechanism 10 includes a slider 13, an actuator for moving the slider 13 forward and backward, and a spring 16 that exerts a biasing force that interferes with the acting force of the actuator. . A coil spring is used as the spring 16. As can be understood from FIG. 3, the slider 13 is composed of a block body formed in a shape having a concave-shaped recess 13a when viewed from the front, and is a guide rail laid in the front-rear direction on the support plate 6. It is mounted on the guide rail 19 and is pushed or pushed back by the resultant force of the acting force of the actuator and the urging force of the interference spring 16, and the piston rod 12 and spring restraint described later are pressed. It moves forward and backward while avoiding interference with member 15.
[0030] ァクチユエータは、スライダー進退機構 10の駆動源となる部分であり、シリンダ 'ビス トン機構により構成されており、エアシリンダ 11と、ピストンロッド 12とを備える。ェァシ リンダ 11は、支持プレート 6の中央部上面に固定されており、ピストンロッド 12は、ェ ァシリンダ 11から前方に突出している。ピストンロッド 12の先端には、円板状のばね 抑え部材 15が固着されていて、ピストンロッド 12は、このばね抑え部材 15を介してば ね 16に圧縮力をカ卩え、また、ばね 16から復元力を受けることができる。  The actuator is a portion that serves as a drive source for the slider advance / retreat mechanism 10, is configured by a cylinder / viston mechanism, and includes an air cylinder 11 and a piston rod 12. The cylinder 11 is fixed to the upper surface of the central portion of the support plate 6, and the piston rod 12 projects forward from the air cylinder 11. A disc-shaped spring restraining member 15 is fixed to the tip of the piston rod 12, and the piston rod 12 holds the compression force to the spring 16 through the spring restraining member 15, and the spring 16 Can be restored.
[0031] ばね 16は、スライダー 13のひの字状の凹部 13aに収容されていて、その後端は、 ばね抑え部材 15に接するとともに、その前端は、係合部材 14の背面に接している。 この係合部材 14は、スライダー 13のエアシリンダ 11とは反対側の側面に、スライダー 13のひの字状の凹部 13aを塞ぐようにして、ポルト留めされており、その中央部分に は円孔 14aを有している。  The spring 16 is accommodated in a diamond-shaped recess 13 a of the slider 13, and the rear end thereof is in contact with the spring holding member 15, and the front end thereof is in contact with the back surface of the engagement member 14. This engagement member 14 is ported on the side surface of the slider 13 opposite to the air cylinder 11 so as to close the diamond-shaped recess 13a of the slider 13, and a circular hole is formed in the central portion thereof. 14a.
[0032] したがって、今、ァクチユエータが作動して、ピストンロッド 12が前進すると、その前 進動は、圧縮変形するばね 16を介して係合部材 14に伝達され、係合部材 14と一体 のスライダー 13が案内レール 19上を前方方向に走行する。もし、スライダー 13が何 らかの理由で停止し、ピストンロッド 12がさらに前進すると、ばね抑え部材 15は、スラ イダー 13の凹部 13a内に進入し、ピストンロッド 12は、ばね 16の復元力を受けながら も前進し、スライダー 13は、その走行方向に押され続ける。  Therefore, when the actuator is operated and the piston rod 12 moves forward, the forward movement is transmitted to the engagement member 14 via the spring 16 that compressively deforms, and the slider integrated with the engagement member 14 is transmitted. 13 travels forward on the guide rail 19. If the slider 13 stops for some reason and the piston rod 12 further advances, the spring restraining member 15 enters the recess 13a of the slider 13, and the piston rod 12 exerts the restoring force of the spring 16. Moving forward, the slider 13 continues to be pushed in the direction of travel.
[0033] 推進鍾部材 17は、その前方端の鰐部を除く円筒状本体部分が係合部材 14の  [0033] The propulsion saddle member 17 has a cylindrical main body portion excluding the flange portion at the front end of the engagement member 14.
正された羯紙 (規則 S1) 中央部分に貫通形成された円孔 14aに摺動自在に挿通されるとともに、コイル状の ばね 16の内部を抜けて、ばね抑え部材 15の前面に衝合し、そこに軸心を同じくして 固着されている。推進 fill部材 17の円筒状本体部分の長さは、ばね 16の自然状態 の長さよりも十分に長い。したがって、ピストンロッド 12が後退すると、推進 部材 1 7の鍔部が係合部材 14に当接し、スライダー 13を後退させる。この時のばね 16は、 推進 Ml部材 17の円筒状本体部分の長さがばね 16の自然状態の長さよりも十分に 長いので、圧縮されることはない。 Corrected paper (Rule S1) It is slidably inserted into a circular hole 14a formed in the central portion, passes through the inside of the coiled spring 16 and abuts against the front surface of the spring restraining member 15, and has the same axial center. It is fixed. The length of the cylindrical body portion of the propulsion fill member 17 is sufficiently longer than the natural length of the spring 16. Therefore, when the piston rod 12 is retracted, the flange portion of the propelling member 17 is brought into contact with the engaging member 14 and the slider 13 is retracted. The spring 16 at this time is not compressed because the length of the cylindrical body portion of the propulsion Ml member 17 is sufficiently longer than the natural length of the spring 16.
[0034] 前記したところ力 明らかなとおり、左右一対のブレード 2a、 2bがスライダー 13の前 進とともに互いに接近し、それらブレード 2a、 2b上の偏心受け座 4がウェハ 5の対応 する端縁部分に当接したことでスライダー 13が停止した後にあっても、ピストンロッド 1 2は、ばね 16を圧縮しつつ、なお、わずかな距離を前進することができる。その最大 前進位置は、ァクチユエータ (シリンダ'ピストン機構)の作用力とばね 16の圧縮変形 に基づく付勢力 (反発力)との合力が零となる位置である。この合力は、漸次減衰す るので、左右一対のブレード 2a、 2bの把持部がウェハ 5を把持する時には、その把 持力は緩和されてレヽて、ウェハ 5を所定の適切な強度で把持することができる大きさ になっており、ウェハ 5を破損力 守ることができる。  [0034] As described above, as apparent, the pair of left and right blades 2a, 2b approach each other as the slider 13 moves forward, and the eccentric seats 4 on the blades 2a, 2b are placed on the corresponding edge portions of the wafer 5. Even after the slider 13 stops due to contact, the piston rod 12 can still advance a small distance while compressing the spring 16. The maximum forward position is a position where the resultant force of the acting force of the actuator (cylinder and piston mechanism) and the urging force (repulsive force) based on the compression deformation of the spring 16 becomes zero. Since this resultant force is gradually attenuated, when the gripping portion of the pair of left and right blades 2a and 2b grips the wafer 5, the gripping force is relaxed and held to grip the wafer 5 with a predetermined appropriate strength. The wafer 5 can be protected against damage.
[0035] 次に、運動変換機構 20につ!/ヽて、図 2及ぴ図 5を参照しつつ、詳細に説明する。  [0035] Next, the motion conversion mechanism 20! In the following, a detailed explanation will be given with reference to FIG. 2 and FIG.
運動変換機構 20は、前記のとおり、スライダー進退機構 10の作動によるスライダー 13の進退動を左右一対のブレード 2a、 2bの左右動に変換するためのものである。こ のために、運動変換機構 20は、スライダー 13の左右両側端と左右一対のブレード 2 a、 2bの基部とを左右各側において回動自在に連結する左右一対のリンク機構 21a 、 21bと、左右一対のブレード 2a、 2bの左右動を円滑に行わせるための左右一対の スライド機構 22a、 22bとを備えている。  As described above, the motion conversion mechanism 20 is for converting the forward / backward movement of the slider 13 due to the operation of the slider advance / retreat mechanism 10 into the left / right movement of the pair of left and right blades 2a, 2b. For this purpose, the motion conversion mechanism 20 includes a pair of left and right link mechanisms 21a and 21b that rotatably connect the left and right ends of the slider 13 and the bases of the pair of left and right blades 2a and 2b on the left and right sides, A pair of left and right slide mechanisms 22a and 22b for smoothly moving the pair of left and right blades 2a and 2b to the left and right are provided.
[0036] 左右一対のスライド機構 22a、 22bは、支持プレート 6の底面 6cの左半部分及び右 半部分の各前方と後方とにそれぞれ敷設された前後一対の案内レール 23a— 1、 23 a— 2、 23b— 1、 23b— 2と、これらの案内レール上に滑動自在に装着された各 2個 の走行ブロック体 24と力もなつている。左右一対のブレード 2a、 2bは、その基部の前 方部分と後方部分との各 2個所、合計 4個所において、これらの走行ブロック体 24に  [0036] The pair of left and right slide mechanisms 22a, 22b are a pair of front and rear guide rails 23a-1, 23a- laid respectively on the front and rear of the left half and right half of the bottom surface 6c of the support plate 6. 2, 23b-1 and 23b-2, and two traveling block bodies 24 slidably mounted on the guide rails, respectively. The pair of left and right blades 2a and 2b are connected to these traveling block bodies 24 at a total of four locations, two in each of the front and rear portions of the base.
|1正された招鋭园 1191) 連結'固着されていて、これら 4個の走行ブロック体 24に乗って、前後一対の案内レ —ノレ 23a— 1、 23a— 2、 23b— 1、 23b_2上を、それぞれ左右に滑ら力に移動する | 1 corrected invitation 1191) Connected and fixed, ride on these four travel block bodies 24 and move to the left and right guide rails 23a-1, 23a-2, 23b-1, 23b_2 slidably to the left and right respectively
[0037] したがって、今、スライダー 13が前進するとき、リンク機構 21a、 21bは、ブレード 2a 、 2bもスライダー 13の前進動に随伴して前進するようにさせようとする力 ブレード 2a 、 2bは、スライド機構 22a、 22bに従って左右動することしかできないので、ブレード 2 a、 2bを左右動させて互いに接近させつつ、それぞれのリンク長を維持しょうとする。 したがって、ブレード 2a、 2bの接近量、換言すれば、スライダー 13の前進量は、ゥェ ノ、 5の径に対応しており、ばね 16の圧縮力を調節することにより、ウェハ 5の把持力を 調節することが可能である。 [0037] Therefore, when the slider 13 moves forward, the link mechanisms 21a, 21b are forced to move the blades 2a, 2b along with the forward movement of the slider 13. The blades 2a, 2b are Since it can only move left and right according to the slide mechanisms 22a and 22b, it tries to maintain the respective link lengths while moving the blades 2a and 2b close to each other. Therefore, the approaching amount of the blades 2a and 2b, in other words, the advancement amount of the slider 13 corresponds to the diameter of the wafer 5 and the gripping force of the wafer 5 by adjusting the compression force of the spring 16. Can be adjusted.
[0038] スライダー 13が後退するときには、ブレード 2a、 2bは、逆方向に左右動して、互い に離反し、把持していたウエノ、 5を解放する。このスライダ一 13の後退動は、単にァク チユエータの作動を解くことにより、ピストンロッド 12が後退し、ばね 16の圧縮力が解 放されつつ、ピストンロッド 12と一体の推進鐘部材 17が、その前方端の鍔部でスラ イダー 13を係合部材 14を介して係止して後退することによって、可能となる。  [0038] When the slider 13 moves backward, the blades 2a and 2b move to the left and right in the opposite direction, move away from each other, and release the gripped ueno 5. The backward movement of the slider 13 is simply by releasing the operation of the actuator, the piston rod 12 is retracted, the compression force of the spring 16 is released, and the propelling bell member 17 integrated with the piston rod 12 is This is possible by locking the slider 13 through the engaging member 14 at the collar portion at the front end and moving backward.
[0039] 支持プレ—ト 6は、平面視凸字形状の板状をなし、その後方突出部分 6bを除く部 分の周囲には、突出囲壁 6aが形成されており、この突出囲壁 6a及ぴ後方突出部分 6bの壁体により囲まれた内部の底面 6c上には、前記した案内レール 19、左右一対 のスライド機構 22a、 22b等が設置されている。エアシリンダ 11は、支持プレ一ト 6の 後方突出部分 6bの面上力 底面 6c上に跨がって設置されて!/、る。これら駆動機構 3 を構成する部品は全て、図示されないカバ一により覆われている。  [0039] The support plate 6 has a plate shape with a convex shape in plan view, and a protruding surrounding wall 6a is formed around the portion excluding the rear protruding portion 6b. The guide rail 19 and the pair of left and right slide mechanisms 22a and 22b are installed on the inner bottom surface 6c surrounded by the wall of the rear projecting portion 6b. The air cylinder 11 is installed across the rear surface 6c of the support plate 6 over the bottom surface 6c! / All parts constituting the drive mechanism 3 are covered with a cover (not shown).
[0040] 次に、左右一対のブレード 2a、 2bの動作を、図 5を参照しつつ、詳細に説明する。  Next, the operation of the pair of left and right blades 2a, 2b will be described in detail with reference to FIG.
今、ァクチユエ一タ (シリンダ'ピストン機構)を作動させると、ピストンロッド 12が前進 する。これにより、ピストンロッド 12は、抑え部材 15を介して推進 ail部材 17を前進 させる。そうすると、スライダー 13も、抑え部材 15と係合部材 14とに挟まれたばね 16 に推されて前進する。スライダー 13は、ブレード 2a、 2bにリンク機構 21a、 21bにより 連結されているので、スライダー 13の前進により、ブレード 2a、 2bは、内側に向かつ てそれぞれ左右動する(図 5 (a)、 (b) )。 [0041] スライダー 13がさらに前進して、左右一対のブレード 2a、 2bが互!/、に接近し、それ らの上の偏心受け座 4がウェハ 5の対応する端縁部分に当接すると、スライダー 13が 停止する (図 5 (c) )。 Now when the actuator (cylinder 'piston mechanism) is operated, the piston rod 12 moves forward. As a result, the piston rod 12 advances the propulsion ail member 17 through the holding member 15. Then, the slider 13 is also moved forward by the spring 16 sandwiched between the holding member 15 and the engaging member 14. Since the slider 13 is connected to the blades 2a and 2b by the link mechanisms 21a and 21b, as the slider 13 advances, the blades 2a and 2b move leftward and rightward inward (FIG. 5 (a), ( b)). [0041] When the slider 13 further moves forward, the pair of left and right blades 2a, 2b approach each other, and the eccentric receiving seat 4 above them abuts the corresponding edge portion of the wafer 5, Slider 13 stops (Fig. 5 (c)).
[0042] 他方、スライダー 13が停止しても、ピストンロッド 12は、抑え部材 15と係合部材 14と に挟まれたばね 16が許容する限り、なお、推進 Ml部材 17を推すので、推進 ffiSi 部材 17は前進を続行し、ピストンロッド 12は、ばね 16を介してスライダー 13を押圧し 続ける。しかしながら、ピストンロッド 12が推進 fill部材 17を推す力、すなわち、ァク チユエータの作用力とばね 16の圧縮変形に基づく反発力との合力は、漸次減衰し、 やがて零となるので、推進 ffiSl部材 17の前進は停止し、ピストンロッド 12のばね 16 を介したスライダー 13の押圧も、最大押圧力を保持したまま停止する。これにより、ブ レード 2a、 2bがウェハ 5を把持する力の増加も停止する。  On the other hand, even if the slider 13 stops, the piston rod 12 still pushes the propulsion ML member 17 as long as the spring 16 sandwiched between the restraining member 15 and the engagement member 14 allows, so the propulsion ffiSi member 17 continues to advance, and the piston rod 12 continues to press the slider 13 via the spring 16. However, the force that the piston rod 12 pushes the propulsion fill member 17, that is, the resultant force of the acting force of the actuator and the repulsive force based on the compression deformation of the spring 16, gradually attenuates and eventually becomes zero, so the propulsion ffiSl member The forward movement of 17 stops, and the pressing of the slider 13 via the spring 16 of the piston rod 12 also stops while maintaining the maximum pressing force. As a result, the increase in the force with which the blades 2a and 2b grip the wafer 5 is also stopped.
[0043] ウェハ 5の把持は、機械的な力で抑え付けるように行うと、割れ力 S発生してしまうが、 逆に、接触するだけの把持では、ウェハ 5を落とす虞もある。そこで、ウェハ 5の把持 は、前記のようにして、ァクチユエータの推進力による機械的な力のみで行わず、ば ね 16の力により軽減させつつ、行うようにするのが良い。  [0043] If the wafer 5 is gripped by a mechanical force, a cracking force S will be generated, but conversely, if the wafer 5 is simply touched, the wafer 5 may be dropped. Therefore, as described above, the wafer 5 is preferably held while being reduced only by the mechanical force of the actuator 16 and reduced by the force of the spring 16.
[0044] 本実施例の場合、ァクチユエータの理論推力は、約 0. 57kgである力 このとき、ば ね 16の反発力によって、約 0. 46kgまでに軽減される。この力がブレード 2a、 2bに 分散され、 1つのブレードからウェハ 5に掛かる荷重は、約 294gとなる(一般に、ゥェ ノ、 5に対する荷重は、 300gまでとされている。 )oなお、ばね 16の伸縮量は、自由状 態で 23mm、装置への組込み時で 10. 5mm,ァクチユエータの推進力が作用して いる最終時の圧縮された状態で 8. 5mm程度である。  In the present embodiment, the theoretical thrust of the actuator is a force of about 0.57 kg. At this time, the repulsive force of the spring 16 reduces the theoretical thrust to about 0.46 kg. This force is distributed to the blades 2a and 2b, and the load applied from one blade to the wafer 5 is about 294 g (generally, the load on the wafer 5 is up to 300 g). The amount of expansion / contraction of 16 is 23 mm in the free state, 10.5 mm when installed in the equipment, and about 8.5 mm in the final compressed state where the thrust of the actuator is applied.
[0045] 本実施例の基板把持装置 1は、前記のように構成されて 、るので、次のような効果 を奏することができる。  [0045] Since the substrate gripping apparatus 1 of the present embodiment is configured as described above, the following effects can be obtained.
従来のセンタリング方式の基板把持装置のように、ばねの付勢力を利用して基板を 把持し、ァクチユエータの作動でばねの付勢力を抑えて基板の把持の解除を行うよう にするものではないので、ァクチユエータの作用力は小さくて済み、ァクチユエータの 小型ィ匕が可能になり、これを基板把持装置 1の手首部分に収納するとして、その手首 部分が大型ィ匕することがない。これにより、狭い搬出入口を持つ装置へのウェハ 5の  Unlike conventional centering-type substrate gripping devices, the substrate is gripped using the biasing force of the spring, and the actuator is not operated to suppress the spring biasing force and release the gripping of the substrate. The acting force of the actuator can be small, and the actuator can be made small. If this is housed in the wrist portion of the substrate gripping device 1, the wrist portion does not become large. This allows wafers 5 to be placed into equipment with a narrow entrance / exit.
訂正された用弒' ( ®92》 [0046] また、ウェハ 5の把持をァクチユエータの作用力のみで行おうとすると、ウェハ 5には 製造上の寸法誤差があるので、ウェハ 5を割ってしまう虞がある力 ァクチユエータの 作用力は、左右一対のブレード 2a、 2bが互いに接近し、それらの上の偏心受け座 4 力 Sウェハ 5の対応する端縁部分に当接することでスライダー 13が停止した後も、干渉 ばね 16の付勢力で漸次緩和されるので、それらの合力であるウェハ 5の把持力も、 把持が進むほど緩和されて、左右一対のブレード 2a、 2bの両把持部がウェハ 5を所 定の適切な強度で把持するようにすることができ、ウェハ 5を割ってしまう虞が解消さ れる。 Corrected jar '(®92) [0046] If the wafer 5 is gripped only by the acting force of the actuator, there is a manufacturing error in the wafer 5, and there is a possibility that the wafer 5 may be broken. After the pair of blades 2a and 2b approach each other and come to contact with the corresponding edge portion of the S-wafer 5 with the eccentric receiving seat 4 force on them, the slider 13 is stopped by the biasing force of the interference spring 16 gradually. Since the gripping force of the wafer 5, which is the resultant force, is eased, the gripping force of the wafer 5 is relaxed as the gripping progresses so that the gripping portions of the pair of left and right blades 2a and 2b grip the wafer 5 with a predetermined appropriate strength. This eliminates the possibility of breaking the wafer 5.
[0047] また、 1つのァクチユエータの作動で左右一対のブレード 2a、 2bにウェハ 5を挟み 込む動作を行わせ、し力も、これら左右一対のブレード 2a、 2bの各ブレードの全ての 把持点がウェハ 5の中心位置に向けて同じタイミングで、同じ距離を正確に移動する ことができるので、芯出しされた状態のウエノ、 5を受け取るに際して、その把持動作に より再び中心位置をずらしてしまうといったことがない。  [0047] Further, the operation of one actuator causes the wafer 5 to be sandwiched between the pair of left and right blades 2a and 2b, and the gripping force of all the blades of the pair of left and right blades 2a and 2b is the wafer. Since the same distance can be accurately moved to the center position of 5 at the same timing, the center position is shifted again due to the gripping operation when receiving the centered Ueno 5 There is no.
[0048] さらに、左右一対のブレードブレード 2a、 2bの各把持部が、ウェハ 5の端縁を迎え 入れる凹部 4cを有し、偏心軸 4dを中心に固定位置を可変にされた偏心受け座 4から なるものとされているので、基板把持装置 1を組み立てた際、左右一対のブレード 2a 、 2b上の全ての把持部の配置が円形等所定形状のウェハ 5の輪郭形状に合致して 、これをガタなく把持することができるように、把持部の位置調整をすることが容易に なる。  [0048] Furthermore, each gripping part of the pair of left and right blade blades 2a, 2b has a recess 4c that receives the edge of the wafer 5, and an eccentric receiving seat 4 whose fixed position is variable about the eccentric shaft 4d. Therefore, when the substrate gripping device 1 is assembled, the arrangement of all the gripping portions on the pair of left and right blades 2a and 2b matches the contour shape of the wafer 5 having a predetermined shape such as a circle. It is easy to adjust the position of the grip portion so that the grip portion can be gripped without play.
[0049] なお、本願の発明は、以上の実施例に限定されず、その要旨を逸脱しない範囲に おいて、種々の変形が可能である。  [0049] The invention of the present application is not limited to the above embodiments, and various modifications can be made without departing from the scope of the invention.

Claims

請求の範囲 The scope of the claims
[1] 半導体ウェハ等の基板を把持して搬送するのに使用される基板把持装置であって スライダーと、  [1] A substrate gripping device used to grip and transport a substrate such as a semiconductor wafer, a slider,
前記スライダーの進退機構と、  An advance / retreat mechanism of the slider;
前記基板を前記スライダーの進退方向とは直交する左右方向両側から把持する把 持部を有する左右一対のブレードと、  A pair of left and right blades having gripping portions for gripping the substrate from both sides in the left-right direction perpendicular to the advancing / retreating direction of the slider;
前記スライダーの左右両側端と前記左右一対のブレードの基端部とを左右各側に お!、て回動自在に連結するリンク機構と  A link mechanism for connecting the left and right side ends of the slider and the base end portions of the pair of left and right blades to the left and right sides so as to be freely rotatable;
を備え、  With
前記スライダーが進退動するとき、その進退動に連動して、前記左右一対のブレー ドが等量ずつ左右動して、互 ヽに接近 ·離反することができるようにされており、 前記スライダーの進退機構は、  When the slider moves forward and backward, the pair of left and right blades move left and right by an equal amount in conjunction with the forward and backward movement so that they can approach and separate from each other. The advance / retreat mechanism
ァクチユエータと、  With the actuator
前記ァクチユエータの作用力に干渉する付勢力を発揮する弾性体と  An elastic body that exerts an urging force that interferes with the acting force of the actuator;
を備え、  With
前記スライダーは、前記ァクチユエータの作用力と前記弾性体の付勢力との漸次減 衰する合力により前進するが、前進して前記左右一対のブレードが互いに接近し、そ れらの把持部が前記基板にそれぞれ当接することにより停止しても、なお、前記漸次 減衰する合力を受け続けて、前記左右一対のブレードの両把持部が前記基板を所 定の強度で把持することができるようにされている  The slider moves forward by a resultant force that gradually decreases between the acting force of the actuator and the biasing force of the elastic body, but moves forward so that the pair of left and right blades approach each other, and their gripping portions are moved to the substrate. Even if stopped by contacting each of the blades, the gripping portion of the pair of left and right blades can continue to receive the resultant force that gradually decreases so that the substrate can grip the substrate with a predetermined strength. Have
ことを特徴とする基板把持装置。  A substrate gripping device.
[2] 前記左右一対のブレードの各把持部は、前記基板の端縁を迎え入れる凹部を有し 、偏心軸を中心に固定位置を可変にされた偏心受け座力 なることを特徴とする請 求項 1に記載の基板把持装置。  [2] Each of the gripping portions of the pair of left and right blades has a recess for receiving the edge of the substrate, and has an eccentric receiving seating force whose fixed position is variable about the eccentric shaft. Item 4. The substrate holding apparatus according to Item 1.
[3] 前記弾性体は、ばね力 なることを特徴とする請求項 1又は請求項 2に記載の基板 把持装置。  [3] The substrate holding apparatus according to claim 1 or 2, wherein the elastic body has a spring force.
PCT/JP2004/017689 2004-11-29 2004-11-29 Substrate holding device WO2006057050A1 (en)

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TWI479596B (en) * 2010-03-15 2015-04-01 Tokyo Electron Ltd Semiconductor wafer conveying hand
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