WO2006040964A1 - Method of producing silylalkoxymethyl halide - Google Patents

Method of producing silylalkoxymethyl halide Download PDF

Info

Publication number
WO2006040964A1
WO2006040964A1 PCT/JP2005/018405 JP2005018405W WO2006040964A1 WO 2006040964 A1 WO2006040964 A1 WO 2006040964A1 JP 2005018405 W JP2005018405 W JP 2005018405W WO 2006040964 A1 WO2006040964 A1 WO 2006040964A1
Authority
WO
WIPO (PCT)
Prior art keywords
halide
silylalkoxymethyl
halosilane
formula
chloride
Prior art date
Application number
PCT/JP2005/018405
Other languages
French (fr)
Inventor
Keiji Wakita
Original Assignee
Dow Corning Toray Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Toray Co., Ltd. filed Critical Dow Corning Toray Co., Ltd.
Priority to US11/577,047 priority Critical patent/US7915439B2/en
Priority to KR1020077010663A priority patent/KR101163978B1/en
Priority to CN200580034960.9A priority patent/CN101039949B/en
Priority to EP05790166A priority patent/EP1799694B1/en
Publication of WO2006040964A1 publication Critical patent/WO2006040964A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/0825—Preparations of compounds not comprising Si-Si or Si-cyano linkages
    • C07F7/083—Syntheses without formation of a Si-C bond
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides
    • C07F7/14—Preparation thereof from optionally substituted halogenated silanes and hydrocarbons hydrosilylation reactions

Definitions

  • This invention relates to a novel method of manufacturing a silylalkoxymethyl halide, the product being obtained easily and with a high yield.
  • Silylalkoxymethyl halides are publicly known. Among these compounds, trimethylsilylmethoxymethyl chloride and phenyldimethylsilylmethoxymethyl chloride in particular are very important in the synthesis of bio-active substances and natural products with complex structures as reagents that protect functional groups containing active hydrogen.
  • the by-product water is removed from the system by introducing a dehydrating agent, such as magnesium sulfate, immediately after the reaction.
  • a dehydrating agent such as magnesium sulfate
  • the implementation of this procedure on an industrial basis is cumbersome and complicated, and the product decomposition also proceeds during the time required to carry out the dehydration treatment.
  • the dehydrating agent must be separated from the product by, for example, filtration, which lengthens the process time, increases the amount of waste, raises the production costs, and lowers the yield.
  • hydrogen chloride gas is a gaseous reagent and thus is much more difficult to handle than ordinary liquid reagents. It is difficult, in particular, to measure the amount used in the reaction, making it necessary to use a large excess of the gas and thereby raising the costs and increasing the amount of waste.
  • R-OH (3) wherein R is phenylmethyl or an alkyl group having 1, 5, 8, 10 or 12 carbon atoms
  • This invention solves the problems noted above, and its object is the introduction of a high yield method of manufacturing silylalkoxymethyl halide.
  • the method does not require the use of difficult-to-handle hydrogen chloride gas, it does not generate by-product water, it does not require a dehydrating agent, it generates little solid waste, and it requires less time for manufacturing silylalkoxymethyl halide than current methods.
  • R 3 wherein Rl, R ⁇ , and R ⁇ are alkyl, cycloalkyl, aryl group, or a halogen atom, R ⁇ is divalent hydrocarbyl group having 1 to 10 carbon atoms, and X is a halogen atom, could be synthesized at good efficiencies by reacting
  • Rl, R ⁇ , and R ⁇ are alkyl, cycloalkyl, aryl, or a halogen atom, and R ⁇ is divalent hydrocarbyl group having 1 to 10 carbon atoms, with
  • R 3 wherein Rl, R ⁇ , and R ⁇ are alkyl, cycloalkyl, aryl, or a halogen atom, R ⁇ is divalent hydrocarbyl group having 1 to 10 carbon atoms, and X is a halogen atom, without using either hydrogen chloride gas or a dehydrating agent, and it does so while making it possible to reduce the amount of solid waste.
  • R ⁇ , R2, and R ⁇ in formula (2) are alkyl, cycloalkyl, aryl, or a halogen atom, while R ⁇ is a divalent hydrocarbyl group having 1 to 10 carbon atoms.
  • Rl, R2, and R ⁇ can be specifically exemplified by alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, pentyl, isopentyl, hexyl, and isohexyl; cycloalkyl groups such as cyclopentyl, cyclohexyl, and cycloheptyl; aryl groups such as phenyl, tolyl, xylyl, and naphthyl; and halogen atoms such as the chlorine atom and fluorine atom.
  • alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, pentyl, isopentyl, hexyl, and isohexyl
  • cycloalkyl groups such as cyclopentyl, cyclohexyl, and cycloheptyl
  • R ⁇ is specifically exemplified by methylene; alkylene having 2 to 10 carbon atoms such as ethylene, propylene, and butylene; cycloalkylene having 3 to 10 carbon atoms such as cyclopentylene and cyclohexylene; and arylene having 6 to 10 carbon atoms such as phenylene and naphthylene.
  • R ⁇ are preferably methyl, ethyl, propyl, isopropyl, or phenyl, and R ⁇ preferably is methylene, ethylene, or propylene, and more preferably ethylene.
  • the silyl alcohol compound represented by formula (2) can be specifically exemplified by trimethylsilylmethanol, 2- trimethylsilylethanol, 3-trimethylsilylpropanol, 2-triethylsilylethanol, 2- triisopropylsilylethanol, and 2-dimethylphenylsilylethanol. These silyl alcohol compounds can in some cases be acquired as reagents, and when necessary can also be synthesized by known procedures.
  • the (b) formaldehyde or polymer thereof is a generally known formaldehyde equivalent.
  • Usable here are, inter alia, gaseous formaldehyde, trioxane (the trimer), and paraformaldehyde (a polymer).
  • Granular paraformaldehyde is particularly preferred from the standpoints of reactivity and ease of handling.
  • Aqueous formalin solutions are undesirable due to the negative effects exercised by their water fraction.
  • the formaldehyde or polymer thereof may be used in a small excess, and preferably in the range of 1 to 1.5 equivalents, with respect to the (a) silyl alcohol compound with formula (2).
  • the (c) halosilane functions to react with the silyl alcohol compound and thereby produces the hydrogen halide required by the halomethylation reaction, and at the same time functions to scavenge the water generated as a by-product.
  • the halosilane is preferably a chlorosilane or a bromosilane, and more preferably is a chlorosilane. Specific examples are tetrachlorosilane, methyltrichlorosilane, chlorotrimethylsilane, and chlorotriethylsilane. Chlorotrimethylsilane is most preferred when one considers its ease of acquisition and ease of separation of the product after water scavenging.
  • the (c) halosilane is desirably used in excess relative to the
  • reaction is appropriately carried out by adding the (a) silyl alcohol compound represented by formula (2) dropwise to a mixture of (b) formaldehyde or polymer thereof, and the (c) halosilane.
  • the reaction temperature is preferably low, in order to avoid product decomposition and the range of 0 to 1O 0 C is most preferred.
  • the reaction does not require solvent, but a solvent inert with respect to the individual components such as toluene, xylene, and heptane can be used when necessary.
  • the target material is obtained after the reaction by distilling out, under the application of reduced pressure, the hydrogen halide, excess halosilane, and water/halosilane reaction product. Purification by distillation is desirably carried out in order to provide an additional increase in target material purity. Improvements in the silylalkoxymethyl halide purity and reaction yield can be obtained by the addition of (d) tertiary amine to this distillative purification, in order to neutralize the hydrogen halide not completely distilled out under reduced pressure, and thereby more effectively inhibit product decomposition.
  • This tertiary amine is preferably triethanolamine or diisopropylethylamine, and is more preferably diisopropylethylamine.
  • Silylalkoxymethyl halide represented by formula (1) prepared by the method in accordance with the invention can be exemplified by (trimethylsilyl)methoxyethyl chloride, 2-(trimethylsilyl)ethoxymethyl chloride, 3-(trimethylsilyl)propoxymethyl chloride, 2- (triethylsilyl)ethoxymethyl chloride, 2-(triisopropylsilyl)ethoxymethyl chloride, and 2- (dimethylphenylsilyl)ethoxymethyl chloride.
  • the invention is described by the examples provided below, but the invention is not limited to these examples.
  • the gas chromatograms and mass spectra of the reaction products were measured using a GCMS-QP5050A (Shimadzu Corporation).
  • the reaction product was identified by agreement between the measurement results obtained for the reaction product using the GCMS-QP5050A, and the measurement results for a commercially acquired 2-(trimethylsilyl)ethoxymethyl chloride reference material (from Tokyo Kasei).
  • the purity of the purified 2-(trimethylsilyl)ethoxymethyl chloride was calculated from the results of gas chromatographic measurement (GCMS-QP5050A) of the reference material and reaction product by comparing the respective peak area ratios.
  • the method in accordance with the invention is useful for the industrial production of silylalkoxymethyl halides such as trimethylsilylmethoxymethyl chloride and phenyldimethylsilylmethoxymethyl chloride.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)

Abstract

A method for making a silylalkoxymethyl halide at good yield represented by the formula: R1R2R3Si-R4-O-CH2X wherein R1, R2, and R3 are an alkyl, cycloalkyl, aryl group, or a halogen atom, R4 is a divalent hydrocarbyl group having 1 to 10 carbon atoms, and X is a halogen atom, by reacting: (a) a silyl alcohol compound with the formula R1R2R3Si-R4-OH wherein R1, R2, R3 and R4 are defined as above, with (b) formaldehyde or a polymer thereof, and (c) a halosilane.

Description

DESCRIPTION
METHOD OF PRODUCING SILYLALKOXYMETHYL HALIDE
Field of the Invention [0001] This invention relates to a novel method of manufacturing a silylalkoxymethyl halide, the product being obtained easily and with a high yield.
Background of the Invention
[0002] Silylalkoxymethyl halides are publicly known. Among these compounds, trimethylsilylmethoxymethyl chloride and phenyldimethylsilylmethoxymethyl chloride in particular are very important in the synthesis of bio-active substances and natural products with complex structures as reagents that protect functional groups containing active hydrogen.
[0003] Some examples of synthesis by several methods have already been reported for silylalkoxymethyl chlorides such as trimethylsilylmethoxymethyl chloride and phenyldimethylsilylmethoxymethyl chloride (See to Bruce H. Lipshutz et al., Tetrahedron Letters (Great Britain), Volume 21 (1980), pp. 3343-3346; Denis Guedin-Vunong et al., Bulletin de Ia Societe Chimique de France (France), No. 2 (1986), pp. 245-252; Arthur G. Schultz et al., Organic Preparations and Procedures International (US), Volume 27 (1995), pp. 572-574; and G. J. P. H. Boons et al., Tetrahedron Letters (Great Britain), Volume 31 (1990), pp. 2197-2200). These synthesis examples involve chloromethylation of the corresponding silyl alcohol using hydrogen chloride gas in the presence of a formaldehyde polymer.
[0004] However, there is a substantial problem to execute this procedure on an industrial basis. Specifically, the generation of by-product water cannot be avoided during chloromethylation using hydrogen chloride gas, and this water reacts with the product, resulting in product decomposition. The result is either a major reduction in the yield of the target silylalkoxymethyl chloride or a complete failure to obtain the target silylalkoxymethyl chloride.
[0005] In the aforementioned references, the by-product water is removed from the system by introducing a dehydrating agent, such as magnesium sulfate, immediately after the reaction. However, the implementation of this procedure on an industrial basis is cumbersome and complicated, and the product decomposition also proceeds during the time required to carry out the dehydration treatment. Moreover, the dehydrating agent must be separated from the product by, for example, filtration, which lengthens the process time, increases the amount of waste, raises the production costs, and lowers the yield.
[0006] In addition to the preceding, hydrogen chloride gas is a gaseous reagent and thus is much more difficult to handle than ordinary liquid reagents. It is difficult, in particular, to measure the amount used in the reaction, making it necessary to use a large excess of the gas and thereby raising the costs and increasing the amount of waste.
[0007] A. G. Shipov et al., Zhurnal Obshchei Khimii (formerly the USSR), Volume 59 (1989), pp. 1204-1205, describes a method for manufacturing alkoxymethyl chloride by the reaction of an aryl alcohol or alkyl alcohol with formula (3) R-OH (3) wherein R is phenylmethyl or an alkyl group having 1, 5, 8, 10 or 12 carbon atoms, with paraformaldehyde in chlorotrimethylsilane. However, this reference does neither describe nor suggest the use of a silyl alcohol as a starting material.
Summary of the Invention
[0009] This invention solves the problems noted above, and its object is the introduction of a high yield method of manufacturing silylalkoxymethyl halide. The method does not require the use of difficult-to-handle hydrogen chloride gas, it does not generate by-product water, it does not require a dehydrating agent, it generates little solid waste, and it requires less time for manufacturing silylalkoxymethyl halide than current methods.
[0010] As a result, in accordance with the invention, it has been discovered that a silylalkoxymethyl halide represented by formula (1): R1
R2 Si R4 O ChfcX (1)
R3 wherein Rl, R^, and R^ are alkyl, cycloalkyl, aryl group, or a halogen atom, R^ is divalent hydrocarbyl group having 1 to 10 carbon atoms, and X is a halogen atom, could be synthesized at good efficiencies by reacting
(a) a silyl alcohol compound represented by formula (2):
Figure imgf000004_0001
wherein Rl, R^, and R^ are alkyl, cycloalkyl, aryl, or a halogen atom, and R^ is divalent hydrocarbyl group having 1 to 10 carbon atoms, with
(b) formaldehyde or a polymer thereof, and
(c) a halosilane. It was also discovered that high purity silylalkoxymethyl halide could be obtained in high yields by distilling out, under the application of reduced pressure, hydrogen halide generated as a by-product in the reaction, excess halosilane, and the reaction product of water and halosilane; and thereafter adding
(d) a tertiary amine, and distilling the silylalkoxymethyl halide.
[0011] The method of the invention enables a high yield and industrially facile and efficient synthesis of a silylalkoxymethyl halide represented by formula (1): R1
R2 Si R4 O ChfeX (1)
R3 wherein Rl, R^, and R^ are alkyl, cycloalkyl, aryl, or a halogen atom, R^ is divalent hydrocarbyl group having 1 to 10 carbon atoms, and X is a halogen atom, without using either hydrogen chloride gas or a dehydrating agent, and it does so while making it possible to reduce the amount of solid waste. Detailed Description of the Invention
[0012] According to the method, the (a) silyl alcohol compound represented by formula (2):
Figure imgf000005_0001
is the primary starting material. R^, R2, and R^ in formula (2) are alkyl, cycloalkyl, aryl, or a halogen atom, while R^ is a divalent hydrocarbyl group having 1 to 10 carbon atoms. Rl, R2, and R^ can be specifically exemplified by alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, pentyl, isopentyl, hexyl, and isohexyl; cycloalkyl groups such as cyclopentyl, cyclohexyl, and cycloheptyl; aryl groups such as phenyl, tolyl, xylyl, and naphthyl; and halogen atoms such as the chlorine atom and fluorine atom. R^ is specifically exemplified by methylene; alkylene having 2 to 10 carbon atoms such as ethylene, propylene, and butylene; cycloalkylene having 3 to 10 carbon atoms such as cyclopentylene and cyclohexylene; and arylene having 6 to 10 carbon atoms such as phenylene and naphthylene. When the compound represented by formula (1) prepared in accordance with the invention is used as a reagent for protecting active hydrogen-containing functional groups, R', R2, and
R^ are preferably methyl, ethyl, propyl, isopropyl, or phenyl, and R^ preferably is methylene, ethylene, or propylene, and more preferably ethylene. The silyl alcohol compound represented by formula (2) can be specifically exemplified by trimethylsilylmethanol, 2- trimethylsilylethanol, 3-trimethylsilylpropanol, 2-triethylsilylethanol, 2- triisopropylsilylethanol, and 2-dimethylphenylsilylethanol. These silyl alcohol compounds can in some cases be acquired as reagents, and when necessary can also be synthesized by known procedures.
[0013] The (b) formaldehyde or polymer thereof is a generally known formaldehyde equivalent. Usable here are, inter alia, gaseous formaldehyde, trioxane (the trimer), and paraformaldehyde (a polymer). Granular paraformaldehyde is particularly preferred from the standpoints of reactivity and ease of handling. Aqueous formalin solutions are undesirable due to the negative effects exercised by their water fraction. The formaldehyde or polymer thereof may be used in a small excess, and preferably in the range of 1 to 1.5 equivalents, with respect to the (a) silyl alcohol compound with formula (2).
[0014] The (c) halosilane functions to react with the silyl alcohol compound and thereby produces the hydrogen halide required by the halomethylation reaction, and at the same time functions to scavenge the water generated as a by-product. When the compound represented by formula (1) prepared in accordance with the invention is used as a reagent for protecting active hydrogen-containing functional groups, the halosilane is preferably a chlorosilane or a bromosilane, and more preferably is a chlorosilane. Specific examples are tetrachlorosilane, methyltrichlorosilane, chlorotrimethylsilane, and chlorotriethylsilane. Chlorotrimethylsilane is most preferred when one considers its ease of acquisition and ease of separation of the product after water scavenging. The (c) halosilane is desirably used in excess relative to the
(a) silyl alcohol compound represented by formula (2), wherein 2 to 20 equivalents is preferred, and 3 to 5 equivalents is more preferred, in each case referred to the (a) silyl alcohol compound represented by formula (2).
[0015] The reaction among the (a) silyl alcohol compound represented by formula (2),
(b) formaldehyde or polymer thereof, and the (c) halosilane proceeds readily merely upon mixing the individual components. However, a procedure in which one component is added dropwise to a mixture of the other components is desirable, in order to avoid an overly vigorous reaction. More preferably, the reaction is appropriately carried out by adding the (a) silyl alcohol compound represented by formula (2) dropwise to a mixture of (b) formaldehyde or polymer thereof, and the (c) halosilane. The reaction temperature is preferably low, in order to avoid product decomposition and the range of 0 to 1O0C is most preferred. The reaction does not require solvent, but a solvent inert with respect to the individual components such as toluene, xylene, and heptane can be used when necessary.
[0016] The target material is obtained after the reaction by distilling out, under the application of reduced pressure, the hydrogen halide, excess halosilane, and water/halosilane reaction product. Purification by distillation is desirably carried out in order to provide an additional increase in target material purity. Improvements in the silylalkoxymethyl halide purity and reaction yield can be obtained by the addition of (d) tertiary amine to this distillative purification, in order to neutralize the hydrogen halide not completely distilled out under reduced pressure, and thereby more effectively inhibit product decomposition. This tertiary amine is preferably triethanolamine or diisopropylethylamine, and is more preferably diisopropylethylamine.
[0017] Silylalkoxymethyl halide represented by formula (1) prepared by the method in accordance with the invention can be exemplified by (trimethylsilyl)methoxyethyl chloride, 2-(trimethylsilyl)ethoxymethyl chloride, 3-(trimethylsilyl)propoxymethyl chloride, 2- (triethylsilyl)ethoxymethyl chloride, 2-(triisopropylsilyl)ethoxymethyl chloride, and 2- (dimethylphenylsilyl)ethoxymethyl chloride.
Examples
[0018] The invention is described by the examples provided below, but the invention is not limited to these examples. In these examples, the gas chromatograms and mass spectra of the reaction products were measured using a GCMS-QP5050A (Shimadzu Corporation). The reaction product was identified by agreement between the measurement results obtained for the reaction product using the GCMS-QP5050A, and the measurement results for a commercially acquired 2-(trimethylsilyl)ethoxymethyl chloride reference material (from Tokyo Kasei). The purity of the purified 2-(trimethylsilyl)ethoxymethyl chloride was calculated from the results of gas chromatographic measurement (GCMS-QP5050A) of the reference material and reaction product by comparing the respective peak area ratios.
[0019] Practical Example 1
13.5 g (0.45 mol) of paraformaldehyde and 125.0 g (1.15 mol) of chlorotrimethylsilane were introduced into a 300-mL four-neck flask fitted with a thermometer and stirrer. 54.4 g (0.46 mol) of 2-trimethylsilylethanol was added dropwise over 30 minutes while stirring and cooling with an ice bath. After warming the reaction mixture to room temperature, the pressure was reduced to 100 mmHg using an aspirator, and the hydrogen chloride was removed. The low boiling fraction was distilled off, and additional vacuum distillation was carried out to provide 34.0 g of 2-(trimethylsilyl)ethoxymethyl chloride. The
2-(trimethylsilyl)ethoxymethyl chloride product had a purity of 76%, and the yield was 33%. [0020] Comparative Example 1
6.0 g (0.2 mol) of paraformaldehyde and 23.7 g (0.2 mol) of 2-trimethylsilylethanol were introduced into a 100-mL four-neck flask fitted with a thermometer and stirrer. Hydrogen chloride gas was bubbled in while stirring and cooling with an ice bath, but the end point of the reaction was unclear. While the production of 2-(trimethylsilyl)ethoxymethyl chloride while on the ice bath was confirmed, the 2-(trimethylsilyl)ethoxymethyl chloride produced underwent decomposition when the mixture was warmed to room temperature, and no target material whatever was obtained.
[0021] Practical Example 2
6.0 g (0.2 mol) of paraformaldehyde and 108.6 g (1 mol) of chlorotrimethylsilane were introduced into a 200-mL four-neck flask fitted with a thermometer and stirrer. 23.7 g (0.2 mol) of 2-trimethylsilylethanol was added dropwise over 30 minutes while stirring and cooling with an ice bath. After warming the reaction mixture to room temperature, the pressure was reduced to 100 mm Hg using an aspirator, and the hydrogen chloride was removed. After then adding 5 drops of diisopropylethylamine, the low boiling fraction was distilled off, and additional vacuum distillation was carried out to provide 22.9 g of 2-(trimethylsilyl)ethoxymethyl chloride. The purity of the obtained 2-(trimethylsiIyl)ethoxymethyl chloride was very high, i.e., 98%, and the yield was 68%.
[0022] Practical Example 3
A reaction was carried out under the same conditions as in Practical Example 2, but using 36.1 g (0.2 mol) of 2-dimethylphenylsilylethanol in place of the 2-trimethylsilylethanol. 33.4 g of 2-(dimethylphenylsilyl)ethoxymethyl chloride was obtained. The purity of the 2-(trimethylsilyl)ethoxymethyl chloride was very high, i.e., 99%, and the yield was 73%.
Industrial Applicability
[0023] The method in accordance with the invention is useful for the industrial production of silylalkoxymethyl halides such as trimethylsilylmethoxymethyl chloride and phenyldimethylsilylmethoxymethyl chloride.

Claims

1. A method of manufacturing a silylalkoxymethyl halide of formula (1):
Figure imgf000009_0001
wherein R.1, R2, and R^ are an alkyl, cycloalkyl, aryl group, or a halogen atom, R^ is a divalent hydrocarbyl group having 1 to 10 carbon atoms, and X is a halogen atom, comprising reacting:
(a) a silyl alcohol compound of formula (2):
Figure imgf000009_0002
wherein R^, R^, and R^ are an alkyl, cycloalkyl, aryl group, or a halogen atom, and R^ is a divalent hydrocarbyl group having 1 to 10 carbon atoms, with
(b) formaldehyde or a polymer thereof, and
(c) a halosilane.
2. The method according to Claim 1 comprising additionally distilling out under reduced pressure, hydrogen halide generated as a by-product in the reaction, excess halosilane, and the reaction product of water and halosilane, and thereafter adding
(d) a tertiary amine, and purifying the silylalkoxymethyl halide by further distillation.
3. The method according to Claims 1 or 2 wherein the (a) silyl alcohol compound is trialkylsilylethanol, and the silylalkoxymethyl halide is trialkylsilylethoxymethyl halide.
4. The method according to Claims 1 or 2 wherein the (c) halosilane is chlorotrialkylsilane, and the silylalkoxymethyl halide is silylalkoxymethyl chloride.
PCT/JP2005/018405 2004-10-13 2005-09-28 Method of producing silylalkoxymethyl halide WO2006040964A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US11/577,047 US7915439B2 (en) 2004-10-13 2005-09-28 Method of producing silylalkoxymethyl halide
KR1020077010663A KR101163978B1 (en) 2004-10-13 2005-09-28 Method of producing silylalkoxymethyl halide
CN200580034960.9A CN101039949B (en) 2004-10-13 2005-09-28 Method of producing silylalkoxymethyl halide
EP05790166A EP1799694B1 (en) 2004-10-13 2005-09-28 Method of producing silylalkoxymethyl halide

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004-298875 2004-10-13
JP2004298875A JP4664032B2 (en) 2004-10-13 2004-10-13 Method for producing silylalkoxymethyl halide

Publications (1)

Publication Number Publication Date
WO2006040964A1 true WO2006040964A1 (en) 2006-04-20

Family

ID=35873184

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2005/018405 WO2006040964A1 (en) 2004-10-13 2005-09-28 Method of producing silylalkoxymethyl halide

Country Status (6)

Country Link
US (1) US7915439B2 (en)
EP (1) EP1799694B1 (en)
JP (1) JP4664032B2 (en)
KR (1) KR101163978B1 (en)
CN (1) CN101039949B (en)
WO (1) WO2006040964A1 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7781560B2 (en) 2005-06-15 2010-08-24 Dow Corning Toray Company, Ltd. Curable organopolysiloxane composition
US7803895B2 (en) 2005-11-04 2010-09-28 Dow Corning Toray Company, Ltd. Organosilicon polymer and method of manufacturing thereof
US7875699B2 (en) 2005-11-17 2011-01-25 Dow Corning Toray Company, Ltd. Method of controlling oil-absorbing properties of a silicone rubber powder
US7897717B2 (en) 2005-08-29 2011-03-01 Dow Corning Toray Company, Ltd. Insulating liquid die-bonding agent and semiconductor device
US8044153B2 (en) 2005-11-09 2011-10-25 Dow Corning Toray Company, Ltd. Curable silicone composition

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102617624A (en) * 2012-03-05 2012-08-01 诚达药业股份有限公司 Synthesizing method of 2-(trimethylsilane) ethoxyl methyl chloride
CN103408576B (en) * 2013-08-30 2016-03-16 安庆丰源化工有限公司 A kind of 2-(trimethylsilyl) ethoxymethyl chlorine synthetic method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE880285C (en) 1945-01-31 1953-06-22 Cassella Farbwerke Mainkur Ag Process for the production of ª ‡ chlorine ethers
WO2002097393A2 (en) * 2001-05-29 2002-12-05 Vanderbilt University Cleavable surfactants and methods of use thereof
WO2010097393A1 (en) 2009-02-24 2010-09-02 Sarl Firmus Method for manufacturing nano electronic devices made from 2d carbon crystals like graphene and devices obtained with this method

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2712093B2 (en) 1990-06-29 1998-02-10 東芝シリコーン株式会社 UV curable silicone composition
JPH0639493B2 (en) * 1990-09-26 1994-05-25 日本ゼオン株式会社 Method for producing halomethylated aromatic vinyl compound polymer
JP3161786B2 (en) 1991-11-20 2001-04-25 東レ・ダウコーニング・シリコーン株式会社 Organopolysiloxane and method for producing the same
JP3367964B2 (en) 1992-04-21 2003-01-20 東レ・ダウコーニング・シリコーン株式会社 Curable resin composition
JP3786139B2 (en) 1992-05-26 2006-06-14 東レ・ダウコーニング株式会社 Curable silicone composition
US5645941A (en) * 1992-11-19 1997-07-08 Shin-Etsu Chemical Co., Ltd. Silicone resin/silicone rubber composite material
EP0620242B1 (en) 1993-04-15 1998-08-19 Dow Corning Toray Silicone Company, Limited Epoxy group-containing silicone resin and compositions based thereon
JP2781799B2 (en) 1993-04-20 1998-07-30 信越ポリマー株式会社 Cover member for hard key top push button switch
JP2812139B2 (en) 1993-04-27 1998-10-22 信越化学工業株式会社 Epoxy resin composition
JP2695598B2 (en) 1993-06-30 1997-12-24 住友ベークライト株式会社 Die bonding material
JP3035135B2 (en) 1993-10-25 2000-04-17 住友ベークライト株式会社 Die bonding material
JP2834658B2 (en) 1993-12-02 1998-12-09 住友ベークライト株式会社 Conductive resin paste for semiconductors
TW343218B (en) * 1994-03-25 1998-10-21 Shinetsu Chem Ind Co Integral composite consisted of polysiloxane rubber and epoxy resin and process for producing the same
JP3574226B2 (en) 1994-10-28 2004-10-06 東レ・ダウコーニング・シリコーン株式会社 Curable silicone composition and cured product thereof
TW296400B (en) * 1994-11-17 1997-01-21 Shinetsu Chem Ind Co
JP3313267B2 (en) 1995-09-28 2002-08-12 住友ベークライト株式会社 Conductive resin paste
JPH1036510A (en) 1996-07-26 1998-02-10 Toray Dow Corning Silicone Co Ltd Electric part and its production
JP3411164B2 (en) 1996-10-31 2003-05-26 住友ベークライト株式会社 Die attach paste
JPH10147764A (en) 1996-11-20 1998-06-02 Sumitomo Bakelite Co Ltd Die attach paste and semiconductor device
US5859127A (en) * 1996-11-29 1999-01-12 Shin-Etsu Polymer Co., Ltd. Thermosetting resin composition and two-parts composite body thereof with silcone rubber
JP3313292B2 (en) 1996-12-04 2002-08-12 住友ベークライト株式会社 Die attach paste
JP3420473B2 (en) * 1997-04-30 2003-06-23 東レ・ダウコーニング・シリコーン株式会社 Silicone adhesive sheet, method for producing the same, and semiconductor device
JP2000198929A (en) 1998-10-30 2000-07-18 Dow Corning Toray Silicone Co Ltd Silicone rubber composition for composite molding
JP2002020719A (en) * 2000-07-11 2002-01-23 Shin Etsu Chem Co Ltd Silicone rubber adhesive composition and integrated molded article of the adhesive composition with thermoplastic resin
US6632892B2 (en) * 2001-08-21 2003-10-14 General Electric Company Composition comprising silicone epoxy resin, hydroxyl compound, anhydride and curing catalyst
JP4663969B2 (en) 2002-07-09 2011-04-06 東レ・ダウコーニング株式会社 Curable silicone resin composition and cured product thereof
JP2004043814A (en) 2002-07-15 2004-02-12 Dow Corning Toray Silicone Co Ltd Silicone-based adhesive sheet, method for adhering semiconductor chip with mounting part therefor and semiconductor device
JP2005075959A (en) 2003-09-01 2005-03-24 Dow Corning Toray Silicone Co Ltd Adhesive silicone elastomer sheet
TWI345576B (en) 2003-11-07 2011-07-21 Dow Corning Toray Silicone Curable silicone composition and cured product thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE880285C (en) 1945-01-31 1953-06-22 Cassella Farbwerke Mainkur Ag Process for the production of ª ‡ chlorine ethers
WO2002097393A2 (en) * 2001-05-29 2002-12-05 Vanderbilt University Cleavable surfactants and methods of use thereof
WO2010097393A1 (en) 2009-02-24 2010-09-02 Sarl Firmus Method for manufacturing nano electronic devices made from 2d carbon crystals like graphene and devices obtained with this method

Non-Patent Citations (28)

* Cited by examiner, † Cited by third party
Title
A. G. SHIPOV ET AL., ZHUMAL OBSHCHEI KHIMII (FORMERLY THE USSR, vol. 59, 1989, pages 1204 - 1205
A. SHIKHIEV ET AL., JOURNAL OF GENERAL CHEMISTRY OF THE USSR, vol. 41, no. 3, 1971, pages 617 - 619
A.G. SCHULTZ ET AL., ORGANIC PREPARATIONS AND PROCEDURES INTERNATIONAL, vol. 27, no. 5, 1995, pages 572 - 574
ARTHUR G. SCHULTZ ET AL., ORGANIC PREPARATIONS AND PROCEDURES INTERNATIONAL (US, vol. 27, 1995, pages 572 - 574
AZERBAIDZHANSKII KHIMICHESKIKK ZHURNAL, vol. 3, 1981, pages 50 - 52
B.H. LIPSHUTZ ET AL., TETRAHEDRON LETTERS, vol. 21, no. 35, 1980, pages 3343 - 3346
BOONS G J P H ET AL: "Use of (phenyldimethylsilyl)methoxymethyl and (phenyldimethylsilyl)methyl ethers as protecting groups for sugar hydroxyls", TETRAHEDRON LETTERS, vol. 31, no. 15, 1990, pages 2197 - 2200, XP009062783, ISSN: 0040-4039 *
BRUCE H. LIPSHUTZ ET AL., TETRAHEDRON LETTERS (GREAT BRITAIN, vol. 21, 1980, pages 3343 - 3346
DENIS GUEDIN-VUNONG ET AL., BULLETIN DE LA SOCIETE CHIMIQUE DE FRANCE (FRANCE, 1986, pages 245 - 252
GUEDIN-VUONG D ET AL: "An easy access to homopropargylic ethers", BULLETIN DE LA SOCIETE CHIMIQUE DE FRANCE, no. 2, 1986, pages 245 - 252, XP009013462, ISSN: 0037-8968 *
HAN Y ET AL: "Silicon directed ipso-substitution of polymer bound arylsilanes: preparation of biaryls via the Suzuki cross-coupling reaction", TETRAHEDRON LETTERS, vol. 37, no. 16, 1996, pages 2703 - 2706, XP004029774, ISSN: 0040-4039 *
HASSEBERG H A ET AL: "Synthesis of orelline", HELVETICA CHIMICA ACTA, vol. 71, no. 5, 1988, pages 957 - 963, XP009062842, ISSN: 0018-019X *
HOJO M ET AL: "Studies on organosilicon chemistry. 119. New access to carbonyl ylides by the silicon-based 1,3-elimination and their [3 + 2] cycloadditions to activated alkenes and alkynes: one-step synthesis of dihydrofurans and tetrahydrofurans", TETRAHEDRON LETTERS, vol. 34, no. 37, 1993, pages 5943 - 5946, XP009062792, ISSN: 0040-4039 *
I.A. SHIKHIEV, JOURNAL OF GENERAL CHEMISTRY OF THE USSR, vol. 45, no. 1, 1975, pages 91 - 93
J. P. H. BOONS ET AL., TETRAHEDRON LETTERS (GREAT BRITAIN, vol. 31, 1990, pages 2197 - 2200
LIPSHUTZ B H ET AL: "beta-(Trimethylsilyl)ethoxymethyl chloride. A new reagent for the protection of the hydroxyl group", TETRAHEDRON LETTERS, vol. 21, no. 35, 1980, pages 3343 - 3346, XP007900077, ISSN: 0040-4039 *
M. HOJO ET AL., TETRAHEDRON LETTERS, vol. 34, no. 37, 1993, pages 5943 - 5946
M.L. MIRAMON, JOURNAL OF ORGANIC CHEMISTRY, vol. 69, no. 20, 1 October 2004 (2004-10-01), pages 6949 - 6952
MIRAMON M-L ET AL: "Short synthesis of polyoxygenated macrocyclic rings using acetal linkages. Application to the preparation of a new lipidic polyamine.", JOURNAL OF ORGANIC CHEMISTRY, vol. 69, no. 20, 1 October 2004 (2004-10-01), pages 6949 - 6952, XP009062818, ISSN: 0022-3263 *
MUSTAFAEV R M ET AL: "Synthesis and reaction of silicon- and germanium-containing .alpha.-halo ethers", AZERBAIDZHANSKII KHIMICHESKII ZHURNAL, no. 3, 1981, pages 50 - 52, XP009062815, ISSN: 0005-2531 *
PYNE S G ET AL: "Chiral and stereochemical control via intramolecular Diels-Alder reaction of Z dienes", JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, vol. 104, no. 21, 1982, pages 5719 - 5728, XP002370706, ISSN: 0002-7863 *
S. G. PYNE ET AL., JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, vol. 104, no. 21, 1982, pages 5719 - 5728
SCHULTZ A G ET AL: "The synthesis of trimethylsilylmethoxymethyl chloride", ORGANIC PREPARATIONS AND PROCEDURES INTERNATIONAL, vol. 27, no. 5, 1995, pages 572 - 574, XP009062787, ISSN: 0030-4948 *
SHIKHIEV I A ET AL: "Synthesis and reactions of unsaturated organosilicon compounds. LXXII. Synthesis and reactions of the chloromethyl ether of trimethylsilylpropargyl alcohol", JOURNAL OF GENERAL CHEMISTRY OF THE USSR, vol. 41, no. 3, 1971, pages 617 - 619, XP009062816, ISSN: 0022-1279 *
SHIKHIEV I A ET AL: "Synthesis and transformations of some heteroorganic ethylene ethers", JOURNAL OF GENERAL CHEMISTRY OF THE USSR, vol. 45, no. 1, 1975, pages 91 - 93, XP009062844, ISSN: 0022-1279 *
SHIPOV A G ET AL: "Synthesis of alkyl chloromethyl ethers", JOURNAL OF GENERAL CHEMISTRY OF THE USSR, vol. 59, no. 5.2, 1989, pages 1067, XP009062846, ISSN: 0022-1279 *
VON H.A. HASSEBERG ET AL., HELVETICA CHIMICA ACTA, vol. 71, no. 5, 1988, pages 957 - 963
Y. HAN ET AL., TETRAHEDRON LETTERS, vol. 37, no. 16, 1996, pages 2703 - 2706

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7781560B2 (en) 2005-06-15 2010-08-24 Dow Corning Toray Company, Ltd. Curable organopolysiloxane composition
US7897717B2 (en) 2005-08-29 2011-03-01 Dow Corning Toray Company, Ltd. Insulating liquid die-bonding agent and semiconductor device
US7803895B2 (en) 2005-11-04 2010-09-28 Dow Corning Toray Company, Ltd. Organosilicon polymer and method of manufacturing thereof
US8044153B2 (en) 2005-11-09 2011-10-25 Dow Corning Toray Company, Ltd. Curable silicone composition
US7875699B2 (en) 2005-11-17 2011-01-25 Dow Corning Toray Company, Ltd. Method of controlling oil-absorbing properties of a silicone rubber powder
US8329858B2 (en) 2005-11-17 2012-12-11 Dow Corning Toray Co., Ltd. Method of controlling oil-absorbing properties of a silicone rubber powder

Also Published As

Publication number Publication date
EP1799694B1 (en) 2012-05-09
JP4664032B2 (en) 2011-04-06
KR101163978B1 (en) 2012-07-09
US7915439B2 (en) 2011-03-29
CN101039949B (en) 2015-05-06
EP1799694A1 (en) 2007-06-27
US20090203932A1 (en) 2009-08-13
JP2006111548A (en) 2006-04-27
CN101039949A (en) 2007-09-19
KR20070084166A (en) 2007-08-24

Similar Documents

Publication Publication Date Title
US7915439B2 (en) Method of producing silylalkoxymethyl halide
EP0098369B1 (en) Producing alkoxysilanes and alkoxy-oximinosilanes
FI91068B (en) Process for the preparation of diorganodialkoxysilanes
EP1945649B1 (en) Method for producing ketimine structure-containing alkoxysilane
EP0639576B1 (en) Organopolysiloxanes having a silanol group and process of making them
EP0305855B1 (en) Synthesis of silyl ketene acetal from allyl 2-organoacrylates
EP1368359B1 (en) Continuous transesterification process for alkoxyorganosilicon compounds
KR101780102B1 (en) Process for preparing (meth)acrylamido-functional silanes by the reaction of aminoalkyl alkoxysilanes with acrylic acid anhydride
US20100113812A1 (en) Process for preparing organic silane compounds having beta-cyano ester group
JP4278725B2 (en) Process for producing α, ω-dihydrogenorganopentasiloxane
EP0488759B1 (en) Thexyl (C1-C4)alkyl dialkoxy silanes; methods of preparation; and uses thereof
EP2876111B1 (en) Composition containing nitrogen-containing organoxysilane compound and method for making the same
US7105693B2 (en) Process for production of alkoxysilane-based compound
EP0809646B1 (en) A method for manufacturing organosilanes
US9073952B1 (en) Synthesis method for carbosilanes
JP2002012597A (en) Organic silicon compound
EP1203772B1 (en) Thexylchlorosilanes, their manufacture and use
US20110040114A1 (en) Method of manufacturing an aminoaryl-containing organosilicon compound and method of manufacturing an intermediate product of the aforementioned compound
CA1236475A (en) Producing alkoxysilanes and alkoxy-oximinosilanes
JPS63253090A (en) Silyl (meth)acrylate having trimethylsiloxy group
RU2166507C2 (en) Method of isolation of trimethylchlorosilane from azeotropic mixture trimethylchlorosilane/tetrachlorosilane
JP2001139581A (en) Method for producing phenoxysilane
JP2014218463A (en) Silylation method using silyl amine compound

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS KE KG KM KP KR KZ LC LK LR LS LT LU LV LY MA MD MG MK MN MW MX MZ NA NG NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU LV MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 200580034960.9

Country of ref document: CN

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 2005790166

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 1518/KOLNP/2007

Country of ref document: IN

WWE Wipo information: entry into national phase

Ref document number: 1020077010663

Country of ref document: KR

WWP Wipo information: published in national office

Ref document number: 2005790166

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 11577047

Country of ref document: US