WO2006012773A1

WO2006012773A1 - A transflective liquid crystal display and the manufacturing method thereof

Info

Publication number: WO2006012773A1
Application number: PCT/CN2004/000894
Authority: WO
Inventors: Yupu Lin
Original assignee: Quanta Display Inc.; Quanta Display Japan Inc.
Priority date: 2004-08-04
Filing date: 2004-08-04
Publication date: 2006-02-09

Abstract

The present invention relates to a transflective liquid crystal display and the manufacturing method Thereof, said device mainly includes the first tansparent conductive layer, the first alignment film, the liquid crystal layer, the second alignment layer, the second conductive layer, the color filter layer, the transparent planarization protective layer and the TFT array substrate which are superposed in this order (but the order of the second conductive layer and the color filter layer can be changed); wherein the portion of said transparent planarization protective layer is coatd with a reflective material so as to be a reflective region, and. the other portion of said transparent planarization protective layer which is not coated with the reflective material is etched to a certain deepth so as to be a transmissive region. As a result, the same plane of the transparent planarization protective layer has different height, and the reflected light and transmitted light will be the same colour shade.

Description

Semi-transmissive liquid crystal display device and method of forming the same

The present invention relates to a transflective liquid crystal display device and a method of forming the same, and more particularly to a liquid crystal display device which utilizes a flattened protective layer thickness change to achieve a semi-transmissive color display and a method of forming the same. Background technique

Existing transflective LCDs have a variety of designs, most of which separate the color filter layer (TFT) and TFT on different sides. Therefore, in order to take into account the chromaticity difference caused by the difference between the transmissive and the reflective luminosity, it is necessary to adjust the color resistance of the color filter material layer to match the chromaticity difference. The current practice is (1) coating the filter and resistive areas in different shapes and proportions in one pixel (pixel) to coat the filter photoresist and (2) using different concentrations of the same color photoresist to coat the filter photoresist. . However, in this practice, it is often necessary to replace different photoresist materials or adjust different thicknesses or areas of the same color (image) and divide into two coatings or even exposure and development steps, which not only wastes materials and increases working time, reducing productivity. And it is easy to form an error in accuracy. Summary of the invention The present invention is based on the shortcomings of known devices, and it is contemplated to fabricate a liquid crystal display device in a relatively simple and material-saving manner.

Accordingly, it is a primary object of the present invention to provide a transflective liquid crystal display device and a method of forming the same, which utilizes a change in the thickness of the planar protective layer to cause a different thickness of the color filter material layer on the planarized protective layer, thereby reflecting The region and the transmission region may be coated with the same photoresist to achieve the same performance of the semi-transmissive and transmissive colors.

Another object of the present invention is to provide a transflective liquid crystal display device and a method of forming the same, the liquid crystal display device formed by the method according to the present invention does not need to use a black matrix (BM), and utilizes planarization. The protective layer itself can simultaneously achieve the effect of preventing color mixing.

Another object of the present invention is to provide a transflective liquid crystal display device and a method of forming the same, wherein the reflective material layer on the planarization protective layer can simultaneously serve as a protective layer when etching the planarization protective layer (this When the light transmissive planarization protective layer under the reflective material layer is not etched and reflected, the fabrication and construction of the present invention are relatively simple.

According to an aspect of the present invention, a transflective liquid crystal display device mainly includes a first transparent insulating substrate, a liquid crystal layer, a transparent conductive layer, a color filter material layer, a light transmissive planarization protective layer, and a TFT array substrate layer. And stacked in a stack from top to bottom; wherein a portion of the planarized protective layer is coated with a film of a reflective material to form a reflective region, and the planarized protective layer is not coated with a reflective material film The rest of the area is etched to a depth to make it transmissive The region, thereby causing the same plane of the planarization layer to have two different height planes, so that the reflected and transmitted light becomes the same color concentration when visually observed.

According to another aspect of the present invention, a transflective liquid crystal display device mainly includes a first transparent insulating substrate, a liquid crystal layer, a color filter material layer, a transparent conductive layer, a light transmissive planarization protective layer, and a TFT array substrate. The layer is stacked in a stack from top to bottom; wherein a portion of the planarized protective layer is coated with a film of a reflective material to form a reflective region, and the planarized protective layer is not coated with a reflective material. The remaining area of the film is etched to a depth such that it becomes a transmissive area, thereby causing the same plane of the planarization layer to have two different height planes such that the reflected and transmitted light becomes the same color concentration when visually observed.

According to still another aspect of the present invention, a method for providing the present invention is to sequentially overlap a first transparent conductive layer, a first alignment layer, a liquid crystal layer, and a second alignment layer from top to bottom.

An alignment layer, a second transparent conductive layer, a color filter material layer, a light transmissive planarization protection layer, and a TFT array substrate layer, wherein: a layer of the reflective material is coated on a portion of the planarization protection layer , making it a reflective area; etching the remaining area without the reflective material to a depth to make it a transmissive area, resulting in two height planes on the same plane of the planarized protective layer; and then the same color filter material (resistance Applying on two height surfaces, the same color photoresist has different thicknesses in the same pixel, and has different color filtering effects. The reflected and transmitted light makes it the same color concentration when visually observed.

These and other objects, features and advantages of the present invention will become apparent from the description A description of the drawings will be more apparent to those skilled in the art.

BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a cross-sectional view showing the configuration of a liquid crystal display device in accordance with a preferred embodiment of the present invention;

Figure 2 is a schematic view showing the implementation of etching a planarized protective layer to a depth in accordance with the present invention;

3 is a schematic view showing the implementation of coating a photoresist material on two different height planes on a planarized protective layer and a partial top view thereof according to the present invention;

Figure 4 is a schematic cross-sectional view showing the configuration of a liquid crystal display device in accordance with another preferred embodiment of the present invention.

Simple description of the figure

1 transparent insulation layer

2 first transparent conductive layer

3 first alignment film

4 liquid crystal layer

5 second alignment film

6 second transparent conductive layer

7 color filter material layer 8 Translucent flattening protective layer

9 reflective layer

First, please refer to Figure 1. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic cross-sectional view showing the construction of a transflective liquid crystal display device in accordance with a preferred embodiment of the present invention. As shown in the figure, the liquid crystal display device according to the present invention mainly comprises a transparent insulating layer 1, a first transparent conductive layer 2, a first matching film layer 3, a liquid crystal layer 4, a second alignment film layer 5, and a second transparent The conductive layer 6, the color filter material layer 7, the light transmissive planarization protective layer 8 and the TFT array substrate layer (not shown) are formed by overlapping the top and bottom layers in sequence; the planarization protective layer 8 is coated with a layer A reflective metal film, such as an aluminum film or the like, is made to be the reflective layer 9, and the remaining region of the planarization protective layer without the metal film is etched to a depth, thereby causing the same plane of the planarization protective layer 8 to have two differentities. The height planes hi and h2 make the reflected and transmitted light become the same color depth when visually observed, where hi and h2 are calculated by color simulation based on the respective colors (R, G, B).

Next, please refer to Figure 2. Figure 2 is a schematic view showing the implementation of etching an organic protective layer to a depth in accordance with the present invention. In the present invention, the color light is blocked on the array side, and a uniform planarization protective layer 8 is applied on the lower plate, and then a layer 9 of a reflective material is partially coated thereon as a reflective layer. Next, the portion of the planarization protection layer 8 that is not protected by the reflective layer 9 is etched to a specific depth (i.e., corresponds to the height surface h2 in the figure) in accordance with the type of color photoresist used. at this time, The same plane of the planarization protective layer 8 has two different height faces hi (aluminum faces) and h2. Next, a layer of photoresist is spin-coated to form two layers of different thicknesses of the flattening protective layer (as shown in FIG. 3), so that the reflected and transmitted light becomes the same color depth when visually observed. In this case, the reflective region and the transmissive region may be covered with the same photoresist pigment (exemplified by red in the figure) to form a color filter material layer 7. Next, as shown in FIG. 1, the second transparent conductive layer 6, the second alignment film 5, the liquid crystal layer 4, the first alignment film 3, the first transparent conductive layer 2, and the transparent layer are sequentially covered on the color filter material layer. Light insulating layer 1. Thereby, a complete liquid crystal display device is formed. It can be seen from the above that the light-reflecting material layer on the planarization protective layer 8 can serve as a protective layer when the planarization protective layer is etched; and because of its reflection, it can be used as a light reflection of the LCD.

Finally, please refer to Figure 4. 4 is a schematic cross-sectional view showing the configuration of a transflective liquid crystal display device in accordance with another preferred embodiment of the present invention. As shown in the figure, the liquid crystal display device according to the present invention mainly comprises a light-transmissive insulating layer 1, a first transparent conductive layer 2, a first compound film layer 3, a liquid crystal layer 4, a second alignment film layer 5, and a color filter material. The layer 7, the second transparent conductive layer 6, the light transmissive planarization protective layer 8 and the TFT array substrate layer (not shown) are sequentially stacked from top to bottom; the planarization protective layer 8 is coated with a layer A reflective metal film, such as an aluminum film or the like, is made to be the reflective layer 9, and the remaining region of the planarization protective layer without the metal film is etched to a depth, thereby causing the same plane of the planarization protective layer 8 to have two differentities. The height planes hi and h2 make the reflected and transmitted light become the same color depth when visually observed, where hi and h2 are calculated by color simulation based on the respective colors (R, G, B). The biggest difference between Figure 1 and Figure 4 is the second. The stacking order of the conductive layer 6 and the color filter material layer 7 is interchanged. That is, the color filter material layer 7 in Fig. 4 is placed on the second conductive layer 6, and the other layers are not changed. In this case, the effect obtained is completely the same as the embodiment described above.

The effects and advantages of the present invention are described in detail by the above-described embodiments, which are not intended to limit the scope of the present invention. Therefore, equivalent changes and modifications of the shapes, structures, features, and spirits of the present invention are intended to be included within the scope of the appended claims.

Claims

A semi-transmissive liquid crystal display device, comprising: a first transparent insulating substrate, a liquid crystal layer, a transparent conductive layer, a color filter material layer, a light transmissive planarization protective layer and a TFT array substrate layer, from top to bottom And sequentially stacking and combining; wherein a portion of the planarization protective layer is coated with a reflective material film to make it a reflective region, and the planarization protective layer is not etched by coating the remaining region of the reflective material film The depth is made to be a transmissive region, whereby the same plane of the planarization layer has two different height planes, so that the reflected and transmitted light becomes the same color concentration when visually observed.

2. The liquid crystal display device as claimed in claim 1, wherein a first gap is formed between the first transparent insulating substrate and the liquid crystal layer, and a second gap is formed between the liquid crystal layer and the transparent conductive layer, first and second At least one of the two gaps includes a liquid crystal alignment film layer.

The liquid crystal display device according to claim 1 or 2, wherein the color filter material layer coated on the two different height faces in the same pixel is the same color photoresist, and the color filter material layer is formed. There are different thicknesses in the same pixel.

The liquid crystal display device according to claim 3, wherein the color filter material layer is applied by a spin coating method, a spinless method, a transfer method, or a printing method.

The liquid crystal display device according to claim 3, wherein the light-reflective material layer is made of one of metal materials having high reflectivity such as aluminum, silver, chromium, aluminum alloy, or chrome alloy.

6. A transflective liquid crystal display device, comprising: a first transparent insulating substrate, a liquid crystal layer, a color filter material layer, a transparent conductive layer, a light transmissive planarization protective layer and a TFT array substrate layer, from top to bottom Stacked in sequence; wherein a portion of the planarized protective layer is coated The layer of reflective material is made to be a reflective region, and the remaining region of the planarization protective layer that is not coated with the reflective material film is etched to a depth to make it a transmissive region, thereby causing the same plane of the planarization layer to have two Different height planes make the reflected and transmitted light become the same color concentration when visually observed.

The liquid crystal display device according to claim 6, wherein a first gap is formed between the first transparent insulating substrate and the liquid crystal layer, and a second gap is formed between the liquid crystal layer and the color filter material layer. At least one of the second gaps includes a liquid crystal alignment film layer.

The liquid crystal display device according to claim 6 or 7, wherein the color filter material layer coated on the two different height faces in the same pixel is a photoresist of the same color, and the color filter material layer is provided. There are different thicknesses in the same pixel.

The liquid crystal display device according to claim 1 or 6, wherein the depth is determined by a type (R, G, B) of the color filter material.

The liquid crystal display device according to claim 8, wherein the color filter material layer is applied by a spin coating method, a spinless method, a transfer method, or a printing method.

The liquid crystal display device according to claim 8, wherein the light-reflective material layer is made of one of metal materials having high reflectivity such as aluminum, silver, chromium, aluminum alloy, or chromium alloy.

12. A method of forming a transflective liquid crystal display device, comprising: sequentially stacking a first transparent conductive layer, a first alignment film layer, a liquid crystal layer, a second alignment film layer, and a second transparent conductive layer from top to bottom. a layer, a color filter material layer, and a light transmissive planarization protective layer and a TFT array substrate layer, wherein: a layer of the reflective material is coated on a portion of the planarization protection layer to be a reflective region; The remaining area coated with the reflective material is etched to a depth to make it a transmissive area, resulting in two height planes on the same plane of the planarization layer; (Photoresist) is applied on the two height surfaces so that the same color photoresist has different thicknesses in the same pixel, and has different color filtering effects, and the reflected and transmitted light makes it the same color when visually observed. concentration.

13. The method according to claim 12, wherein the stacking order of the second transparent conductive layer and the color filter material layer are reversed from each other, and the color filter material layer is arranged above the second transparent conductive layer.

14. Method according to claim 12 or 13, characterized in that the depth is determined by the type of color resist (R, G B); the depth can be derived via a chromaticity simulation calculation.

The method according to claim 12 or 13, wherein the color filter material layer is coated by spin coating, spinless, transfer or printing.

The method according to claim 12 or 13, wherein the layer of the light-reflecting material is made of one of metal materials having high reflectivity such as aluminum, silver, chromium, aluminum alloy, or chrome alloy.