WO2005108646A3 - Rotary target locking ring assembly - Google Patents

Rotary target locking ring assembly Download PDF

Info

Publication number
WO2005108646A3
WO2005108646A3 PCT/US2005/015475 US2005015475W WO2005108646A3 WO 2005108646 A3 WO2005108646 A3 WO 2005108646A3 US 2005015475 W US2005015475 W US 2005015475W WO 2005108646 A3 WO2005108646 A3 WO 2005108646A3
Authority
WO
WIPO (PCT)
Prior art keywords
rotary target
locking ring
ring assembly
target locking
inner ring
Prior art date
Application number
PCT/US2005/015475
Other languages
French (fr)
Other versions
WO2005108646A2 (en
Inventor
Goerge M Wityak
Bruce W Webb
Original Assignee
Academy Corp
Goerge M Wityak
Bruce W Webb
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Academy Corp, Goerge M Wityak, Bruce W Webb filed Critical Academy Corp
Publication of WO2005108646A2 publication Critical patent/WO2005108646A2/en
Publication of WO2005108646A3 publication Critical patent/WO2005108646A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Joints Allowing Movement (AREA)
  • Clamps And Clips (AREA)

Abstract

The present invention comprises a locking ring assembly (90) for a rotary target (140, 140', 140', 140'') used in a physical deposition process of the type that comprises at least one rotary target segment (140, 140', 140', 140'') mechanically disposed on a backing tube. The locking ring assembly comprises an inner ring 20 and an outer ring (42), both comprising cooperative threading. The inner ring (20) comprises two or more separable segments (22, 24).
PCT/US2005/015475 2004-04-29 2005-04-29 Rotary target locking ring assembly WO2005108646A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US56671404P 2004-04-29 2004-04-29
US60/566,714 2004-04-29

Publications (2)

Publication Number Publication Date
WO2005108646A2 WO2005108646A2 (en) 2005-11-17
WO2005108646A3 true WO2005108646A3 (en) 2007-01-25

Family

ID=35320817

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/015475 WO2005108646A2 (en) 2004-04-29 2005-04-29 Rotary target locking ring assembly

Country Status (1)

Country Link
WO (1) WO2005108646A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103681201B (en) * 2012-08-30 2016-03-09 宁波江丰电子材料股份有限公司 Sputtering ring and manufacture method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4443318A (en) * 1983-08-17 1984-04-17 Shatterproof Glass Corporation Cathodic sputtering apparatus
US5026360A (en) * 1989-06-27 1991-06-25 E. R. Squibb & Sons Clamping systems for two piece ostomy device
US6375815B1 (en) * 2001-02-17 2002-04-23 David Mark Lynn Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4443318A (en) * 1983-08-17 1984-04-17 Shatterproof Glass Corporation Cathodic sputtering apparatus
US5026360A (en) * 1989-06-27 1991-06-25 E. R. Squibb & Sons Clamping systems for two piece ostomy device
US6375815B1 (en) * 2001-02-17 2002-04-23 David Mark Lynn Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly

Also Published As

Publication number Publication date
WO2005108646A2 (en) 2005-11-17

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