WO2005093792A1

WO2005093792A1 - Exposure equipment, exposure method and device manufacturing method

Info

Publication number: WO2005093792A1
Application number: PCT/JP2005/005473
Authority: WO
Inventors: Yuichi Shibazaki
Original assignee: Nikon Corporation
Priority date: 2004-03-25
Filing date: 2005-03-25
Publication date: 2005-10-06
Also published as: US20110001943A1; KR101181683B1; CN1950929B; CN1950929A; US20070201010A1; EP1737024A4; KR20070019721A; JP4671051B2; EP1737024A1; JPWO2005093792A1

Abstract

A measuring stage (MST) is provided with a plate (101) for supplying a liquid and performs measurement relating to exposure through a projection optical system (PL) and the liquid (Lq). In the measuring stage, at least a part of it, including the plate, is replaceable. Therefore, measurement relating to exposure can be constantly performed at a high accuracy and the highly accurate exposure can be maintained by replacing at least the part including the plate, before the plate surface deteriorates due to contact with the liquid. In a case where at least one edge plane of the plate is mirror-finished, at the time of replacing at least a part of a measuring part including the plate, the position of the plate can be accurately measured, for instance, by using an interferometer, through the mirror-processed plate edge plane, even when the part of the measuring part is roughly positioned after replacement.

Description

Exposure apparatus, exposure method, and device manufacturing method

Technical field

The present invention relates to an exposure apparatus, an exposure method, and a device manufacturing method, and more particularly, to an exposure apparatus used in a lithographic process when manufacturing an electronic device such as a semiconductor element (integrated circuit) and a liquid crystal display element. The present invention relates to an apparatus, an exposure method, and a device manufacturing method using the exposure apparatus.

Background art

[0002] Conventionally, in a lithographic process for manufacturing electronic devices such as semiconductor devices (integrated circuits and the like) and liquid crystal display devices, a resist (photosensitive agent) is formed by projecting an image of a mask (or reticle) pattern through a projection optical system. ) Is transferred to each of a plurality of shot areas on a photosensitive object such as a wafer or a glass plate (hereinafter, referred to as a “wafer”) coated with a). A loose exposure stepper and a step-and-scan projection exposure apparatus (a so-called scanning stepper (also called a scanner)) are mainly used.

[0003] In this type of projection exposure apparatus, a higher resolution (resolution) is required year by year as the pattern becomes finer due to the higher integration of integrated circuits. Increasing the numerical aperture (NA) of projection optical systems (large NA) has been gradually advanced. However, shortening the wavelength of the exposure light and increasing the NA of the projection optical system improve the resolving power of the projection exposure apparatus, but also causes a reduction in the depth of focus. Also, it is expected that the exposure wavelength will be further shortened in the future, and if it is left as it is, the depth of focus becomes too narrow, and the focus margin during the exposure operation may be insufficient.

[0004] Therefore, as a method of substantially shortening the exposure wavelength and increasing (widening) the depth of focus compared to air, an exposure apparatus using an immersion method has recently attracted attention. I have. As an exposure apparatus using the liquid immersion method, there is known an exposure apparatus that performs exposure while a space between a lower surface of a projection optical system and a wafer surface is locally filled with a liquid such as water or an organic solvent (for example, See Patent Document 1 below). In the exposure apparatus described in Patent Document 1, in the liquid The wavelength power of the exposure light is increased by lZn times (n is the refractive index of the liquid, usually about 1.2.1.6) in air, and the resolution is improved. The depth of focus is increased n times compared to the projection optical system obtained without using the immersion method (assuming that such a projection optical system can be manufactured). It can be enlarged n times.

[0005] Recently, a stage (measurement stage) which can be driven in a two-dimensional plane independently of the wafer stage (substrate stage) and is provided with a measuring instrument used for measurement is provided. An exposure apparatus has also been proposed (for example, see Patent Documents 2 and 3). When this measurement stage is adopted, only the minimum necessary components (for example, a wafer holder, etc.) required for exposing the wafer need be provided on the wafer stage. Can be achieved. This is expected to reduce the size of the drive mechanism (motor) that drives the wafer stage, reduce the amount of heat generated by the motor, and minimize the thermal deformation of the wafer stage and a decrease in exposure accuracy. .

[0006] However, when a measurement stage is employed in the above-described liquid immersion exposure apparatus, various measurements related to exposure are performed in a state where water is immersed in the measurement stage. There is a high probability that the surface of the member will deteriorate due to contact with the liquid and irradiation of exposure light, the measurement accuracy of various measurements related to exposure will deteriorate over time, and it will be difficult to maintain the exposure accuracy over a long period of time. . Of course, a water-repellent coat is applied to the upper surface of each measuring instrument part of the measurement stage. This water-repellent coat is generally used for exposure light (during deep ultraviolet or vacuum ultraviolet) used in immersion exposure. It has the following properties:

[0007] Even when a measurement stage is not used and various measuring instruments are provided on the wafer stage, the surface of the member that comes into contact with the liquid (the surface of this member is often coated with a water-repellent coating) is not used. Similar to the above, a phenomenon may occur in which the measurement accuracy of various measurements related to exposure deteriorates with time due to deterioration due to contact with a liquid and irradiation of exposure light.

[0008] Patent Document 1: International Publication No. 99Z49504 pamphlet

Patent Document 2: JP-A-11-135400

Patent Document 3: Japanese Patent Application Laid-Open No. 3-212812 Disclosure of the invention

Means for solving the problem

[0009] The present invention has been made under the above-described circumstances. In a first aspect, the present invention is an exposure apparatus that exposes a substrate via a projection optical system. A movable substrate stage; and a measuring unit having a plate to which a liquid is supplied, and measuring the exposure via the projection optical system and the liquid. A first exposure apparatus, wherein at least a part including a port is configured to be exchangeable.

[0010] According to this, at least a part including the plate is exchangeable among the measurement units having the plate to which the liquid is supplied and performing the measurement related to the exposure through the projection optical system and the liquid. I have. For this reason, by exchanging at least a part including the plate before the plate surface is deteriorated by contact with the liquid, it is possible to always perform high-accuracy exposure measurement and maintain high-accuracy exposure. It becomes possible.

According to a second aspect of the present invention, there is provided an exposure apparatus for exposing a substrate via a projection optical system, the substrate stage being capable of mounting and moving the substrate; at least one end surface having a mirror surface A measurement section having a processed plate, and performing measurement related to the exposure via the projection optical system; at least a part including the plate constituting the measurement section is configured to be replaceable. A second exposure apparatus.

[0012] According to this, since at least a part of the plate including the plate constituting the measurement unit is replaceable, the plate can be replaced before the plate surface is deteriorated by exposure light or the like during measurement. By exchanging at least a part including, the measurement relating to the exposure can be performed with high accuracy at all times, and it is possible to maintain the exposure with high accuracy. Also, since at least one end face of the plate is mirror-finished, when replacing at least a part of the measuring section including the plate with a new one, the replaced part is roughly roughened. Even if the position is determined, the position of the plate can be accurately measured through the mirror-finished end surface of the plate, for example, using an interferometer or the like. Therefore, even if a part of the measuring unit is roughly positioned during replacement, it is possible to accurately position the measuring unit at a desired position during measurement. Increased downtime due to replacement It is possible to effectively prevent a decrease in device operation efficiency.

According to a third aspect of the present invention, there is provided an exposure apparatus for exposing a substrate via a projection optical system, comprising: a substrate stage on which the substrate is placed and movable; A third exposure apparatus, comprising: a measurement unit that performs measurement related to the exposure via the projection optical system; and a detection device that detects a time at which the plate is replaced.

[0014] According to this, a time immediately before the measurement accuracy of the measurement unit starts to decrease is determined in advance by an experiment or the like, and this time is set in advance as a plate replacement time detected by the detection device, and the detection device is set in advance. If the plate is replaced when the replacement time is detected, the plate can be replaced at an optimal time before the measurement accuracy of the measuring unit is reduced. That is, it is possible to maintain the measurement accuracy of the exposure-related measurement by the measurement unit with high accuracy, and to minimize the frequency of plate replacement. Therefore, it is possible to maintain the exposure accuracy with high accuracy over a long period of time, and effectively prevent a decrease in the operation efficiency of the apparatus due to an increase in downtime due to plate replacement.

According to a fourth aspect of the present invention, there is provided an exposure method for exposing a substrate, wherein at least one of the measurement units including the plate is included in a measurement unit that performs measurement related to the exposure via a plate to which a liquid is supplied. A first exposing method, comprising: exchanging a unit; and performing a measurement related to the exposure using the measuring unit after the exchanging, and exposing the substrate by reflecting the measurement result.

[0016] According to this, for example, at least a part including the plate among the measurement units that measure the exposure via the plate to which the liquid is supplied before the plate surface is deteriorated by contact with the liquid By exchanging, it is possible to measure the exposure with high accuracy by the measurement unit, and to reflect the measurement result, it becomes possible to perform the exposure with high accuracy.

According to a fifth aspect of the present invention, there is provided an exposure method for exposing a substrate, wherein at least one end face of the measurement unit that performs measurement related to the exposure is processed through a mirror-finished plate. Exchanging at least a part of the plate; measuring the position of the plate after the exchange via the end face, and performing the measurement using the measuring unit; reflecting the measurement result And a step of exposing the substrate. [0018] According to this, for example, before the plate surface is deteriorated due to exposure light or the like at the time of measurement, at least a part including the plate is replaced, and the position of the plate is measured via the end face. By performing exposure-related measurement using the measurement unit, the exposure-related measurement can be performed with high accuracy, and when replacing at least a part of the measurement unit including the plate with a new one, Even if the part is roughly positioned, the position of the plate can be accurately measured through the mirror-finished end surface of the plate. Therefore, even if a part of the measuring unit is roughly positioned at the time of replacement, the measuring unit can be accurately positioned at a desired position at the time of measurement. In addition, by reflecting the measurement result, highly accurate exposure can be performed.

According to a sixth aspect of the present invention, there is provided an exposure method for exposing a substrate, the method comprising: performing a measurement using a measurement unit that performs measurement related to the exposure via a plate; A third exposing method comprising: detecting a timing of exchanging the plate and exchanging the plate; and exposing the substrate by reflecting the measurement result.

[0020] According to this, the time immediately before the measurement accuracy of the measurement unit starts to decrease is determined in advance by an experiment or the like, and this time is set in advance as the plate replacement time. Then, by replacing the plate when the replacement time is detected, the plate can be replaced at an optimal time before the measurement accuracy of the measuring unit is reduced. That is, it is possible to maintain the measurement accuracy of the exposure-related measurement by the measurement unit with high accuracy, and to minimize the frequency of plate replacement. In addition, by reflecting the measurement result, highly accurate exposure can be performed.

In the lithographic process, the substrate is exposed using the first to third exposure apparatuses of the present invention to form a device pattern on the substrate, thereby producing a highly integrated microdevice. It is possible to improve the performance. Therefore, from another viewpoint, the present invention can be said to be a device manufacturing method using any of the first to third exposure apparatuses of the present invention.

Brief Description of Drawings

FIG. 1 is a schematic view showing an exposure apparatus according to a first embodiment.

FIG. 2 is a perspective view showing a stage device. FIG. 3 (A) is a perspective view showing a measurement stage.

FIG. 3 (B) is a perspective view showing a state in which a measurement stage force is also removed from a measurement stage force.

FIG. 4 is a longitudinal sectional view of a measurement stage.

FIG. 5 is a longitudinal sectional view of a self-weight canceller.

FIG. 6 is a schematic diagram for explaining the operation of the self-weight canceller.

FIG. 7 is a block diagram showing a main configuration of a control system of the exposure apparatus of the first embodiment.

FIG. 8 (A) is a plan view (part 1) for explaining the parallel processing operation of the first embodiment.

FIG. 8 (B) is a plan view (part 2) for explaining the parallel processing operation of the first embodiment.

FIG. 9 (A) is a plan view (part 3) for explaining the parallel processing operation of the first embodiment.

FIG. 9 (B) is a plan view (part 4) for explaining the parallel processing operation of the first embodiment.

FIG. 10 is a plan view (part 3) for explaining the parallel processing operation of the first embodiment.

FIG. 11 is a perspective view showing a measurement stage and a loading / unloading mechanism according to a second embodiment.

FIG. 12 is a perspective view showing a state in which a plate is also carried out with respect to a measurement stage force.

BEST MODE FOR CARRYING OUT THE INVENTION

<< First Embodiment >>

Hereinafter, a first embodiment of the present invention will be described with reference to FIGS.

FIG. 1 shows a schematic configuration of an exposure apparatus 100 according to the first embodiment. The exposure apparatus 100 is a step-and-scan projection exposure apparatus, that is, a so-called scanning Jung 'stepper (also called a scanner). The exposure apparatus 100 includes a stage having an illumination system 10, a reticle stage RST holding a reticle R as a mask, a projection unit PU, a wafer stage WST as a substrate stage, and a measurement stage MST forming a measurement unit. An apparatus 50 and a control system thereof are provided. The wafer W as a substrate is now mounted on the wafer stage WST!

The illumination system 10 illuminates a slit-shaped illumination area on a reticle R defined by a reticle blind (not shown) with illumination light (exposure light) IL at a substantially uniform illuminance. Here, an ArF excimer laser beam (wavelength 193 nm) is used as an example of the illumination light IL.

On reticle stage RST, reticle R on which a circuit pattern or the like is formed on its pattern surface (the lower surface in FIG. 1) is fixed, for example, by vacuum suction. Retic The reticle stage RST is driven by a reticle stage drive unit 11 including a linear motor or the like (not shown in FIG. 1; see FIG. 7). In addition to being capable of minute drive in an XY plane perpendicular to the plane, it can be driven at a specified scan direction (here, the Y-axis direction, which is the horizontal direction in FIG. 1).

The position (including rotation about the Z axis) of the reticle stage RST in the stage movement plane is adjusted by a movable mirror 15 (actually, Y-axis) by a reticle laser interferometer (hereinafter referred to as “reticle interferometer”) 116. (A moving Y mirror having a reflecting surface perpendicular to the axial direction and an X moving mirror having a reflecting surface perpendicular to the X-axis direction are provided). You. The measured value of reticle interferometer 116 is sent to main controller 20 (not shown in FIG. 1, see FIG. 7), and main controller 20 controls reticle stage RST based on the measured value of reticle interferometer 116. By calculating the positions in the X-axis direction, the Y-axis direction, and the 0-z direction (the rotation direction around the Z-axis), and controlling the reticle stage driving unit 11 based on the calculation result, the position of the reticle stage RST (and Speed).

[0028] Above the reticle R, a pair of reticle alignment marks on the reticle R via the projection optical system PL and a pair of reference marks corresponding to these on the measurement stage MST (hereinafter, referred to as a "first reference mark"). And a pair of reticle alignment detection systems RAa and RAb, which also have a TTR (Through The Reticle) alignment system using light of an exposure wavelength for simultaneously observing You. As these reticle alignment detection systems RAa and RAb, those having the same configuration as those disclosed in, for example, JP-A-7-176468 and corresponding US Pat. No. 5,646,413 are used. Used. To the extent permitted by national legislation in the designated country (or selected elected country) specified in this international application, the disclosures of the above-mentioned publications and corresponding US patents will be incorporated herein by reference.

[0029] The projection unit PU is arranged below the reticle stage RST in FIG. The projection unit PU includes a lens barrel 40 and a projection optical system PL composed of a plurality of optical element lenses held in a predetermined positional relationship within the lens barrel 40. As the projection optical system PL, for example, a plurality of lenses (lens elements) having a common optical axis AX in the Z-axis direction Refractive optics that also provide power are used. The projection optical system PL has a predetermined projection magnification (for example, 1Z4 times or 1Z5 times), for example, on both sides telecentric. Therefore, when the illumination area of the reticle R is illuminated by the illumination light IL from the illumination system 10, the illumination light IL that has passed through the reticle R causes the illumination area IL to pass through the projection optical system PL (projection unit PU). A reduced image of the circuit pattern of reticle R (a reduced image of a part of the circuit pattern) is formed on a wafer having a surface coated with a resist (photosensitive agent).

[0030] Further, among the plurality of lenses constituting the force projection optical system PL (not shown), specific plural lenses are formed based on an instruction from the main control device 20. 381 (see Fig. 7) to adjust the optical characteristics (including the imaging characteristics) of the projection optical system PL, such as magnification, distortion, coma, and field curvature (including the image plane tilt). Like! /

[0031] In the exposure apparatus 100 of the present embodiment, since the exposure using the liquid immersion method is performed as described later, the aperture on the reticle side increases as the numerical aperture NA substantially increases. For this reason, it is difficult for the refractive optical system including only the lens to satisfy the Petzval condition, and the projection optical system tends to be large. In order to avoid a large projection optical system, a catadioptric system including a mirror and a lens may be used.

Further, in the exposure apparatus 100 of the present embodiment, since the exposure is performed by applying the liquid immersion method, a lens (hereinafter, referred to as a lens) as an optical element closest to the image plane (side of the wafer W) constituting the projection optical system PL. In the vicinity of 91, a liquid supply nozzle 51A and a liquid recovery nozzle 51B that constitute the liquid immersion device 132 are provided.

[0033] The liquid supply nozzle 51A is connected to the other end of a supply pipe (not shown) connected at one end to a liquid supply device 288 (not shown in Fig. 1, see Fig. 7). The collection nozzle 51B is connected to the other end of a collection pipe (not shown) whose one end is connected to a liquid collection device 292 (not shown in FIG. 1, see FIG. 7).

[0034] The liquid supply device 288 includes a liquid tank, a pressurizing pump, a temperature control device, a valve for controlling the stop of the supply of the liquid to the supply pipe, and the like. As a knob, for example, it is possible to adjust the flow rate as well as the supply of liquid. It is desirable to use a flow control valve. The temperature controller adjusts the temperature of the liquid in the liquid tank to a temperature substantially equal to the temperature in a chamber (not shown) in which the exposure apparatus main body is housed.

[0035] The liquid recovery device 292 is configured to include a liquid tank and a suction pump, a valve for controlling the recovery / stop of the liquid via the recovery pipe, and the like. As the knob, it is desirable to use a flow control valve corresponding to the valve on the liquid supply device 288 described above.

[0036] As the liquid, here, ultrapure water (hereinafter, simply referred to as "water" unless otherwise required) through which ArF excimer laser light (light having a wavelength of 193 nm) is transmitted is used. And Ultrapure water has the advantage that it can be easily obtained in large quantities at semiconductor manufacturing plants and the like, and that it has no adverse effect on the photoresist or optical lenses on the wafer.

[0037] The refractive index n of water with respect to ArF excimer laser light is approximately 1.44. In this water, the wavelength of the illumination light IL is shortened to 193 nm XlZn = about 134 nm.

The liquid supply device 288 and the liquid recovery device 292 each include a controller, and each controller is controlled by the main controller 20 (see FIG. 7). The controller of the liquid supply device 288 opens the valve connected to the supply pipe at a predetermined opening in accordance with an instruction from the main control device 20, and connects the front end lens 91 and the wafer W via the liquid supply nozzle 51A. Supply water. At this time, the controller of the liquid recovery device 292 opens the valve connected to the recovery pipe at a predetermined opening in accordance with an instruction from the main control device 20, and connects the tip lens 91 and the wafer via the liquid recovery nozzle 51B. The force between W and the liquid is collected inside the liquid recovery unit 292 (liquid tank). At this time, main controller 20 constantly determines the amount of water supplied by liquid supply nozzle 51A between tip lens 91 and wafer W, and the amount of water recovered through liquid recovery nozzle 51B. A command is given to the controller of the liquid supply device 288 and the controller of the liquid recovery device 292 so as to be equal. Therefore, a certain amount of water Lq (see FIG. 1) is held between the tip lens 91 and the wafer W. In this case, the water Lq held between the tip lens 91 and the wafer W is constantly replaced.

As is clear from the above description, the liquid immersion device 132 of this embodiment includes the liquid supply device 288, the liquid recovery device 292, the supply pipe, the recovery pipe, the liquid supply nozzle 51A, and the liquid recovery nozzle. This is a local liquid immersion apparatus configured to include chisel 5 IB and the like.

When the measurement stage MST is located below the projection unit PU, the space between the measurement table MTB and the tip lens 91 can be filled with water in the same manner as described above.

In the above description, for simplicity of description, a force provided with one liquid supply nozzle and one liquid recovery nozzle is not limited to this. As disclosed in the 99Z49504 pamphlet, a configuration having many nozzles may be employed. The point is that any configuration can be used as long as the liquid can be supplied between the lowermost optical member (tip lens) 91 and the wafer W constituting the projection optical system PL. .

Although not shown, for example, an optical fiber type water leak sensor is installed outside the liquid immersion area where the water Lq is held, for example, outside the liquid supply nozzle 51A and the liquid recovery nozzle 5IB. Therefore, main controller 20 is configured to be able to instantaneously detect the occurrence of water leakage based on the output of this water leakage sensor.

[0043] The stage device 50 includes a frame caster FC, a base plate 12 provided on the frame caster FC, a wafer stage WST and a measurement stage MST disposed above the upper surface of the base plate 12. An interferometer system 118 (see Fig. 7) as a position measuring device including interferometers 16 and 18 for measuring the positions of these stages WST and MST, and a stage drive 124 (see Fig. 7) for driving the stages WST and MST ).

As shown in FIG. 2 which shows the stage device 50 in a perspective view, the frame caster FC has a Y-axis direction as a longitudinal direction near one end in the X direction and an end near the other side. It is composed of a substantially flat member in which protruding projections FCa and FCb are formed in a body.

[0045] The base board 12 also serves as a plate-like member, which is also referred to as a surface board, and is arranged on an area between the above-mentioned convex portions FCa and FCb of the frame caster FC. The upper surface of the base plate 12 has a very high degree of flatness and serves as a guide surface when the wafer stage WST and the measurement stage MST are moved.

As shown in FIG. 2, the wafer stage WST is mounted on a wafer stage main body 28 disposed on the base board 12 via a tilt driving mechanism (not shown) on the wafer stage main body 28. Wafer table WTB. Ζ The tilt drive mechanism is In this case, the wafer stage WTB is configured to include three actuators (for example, a voice coil motor or an electromagnet) that support the wafer table WTB at three points on the wafer stage body 28, and the wafer table WTB is moved in the Z-axis direction and the 0x direction. (Rotation direction around X axis), 0 Micro drive in three directions of freedom of y direction (rotation direction around Y axis).

The wafer stage main body 28 is formed of a hollow member having a rectangular cross section and extending in the X-axis direction. On the lower surface of the wafer stage main body 28, a plurality of, for example, four, not shown, gas static pressure bearings, for example, air bearings are provided, and through these air bearings, the wafer stage WST is provided above the above-mentioned guide surface by a number. It is levitated and supported without contact through a clearance of about μm.

[0048] Above the protrusion FCa of the frame caster FC, as shown in FIG. 2, a Y-axis stator 86 extending in the Y-axis direction is arranged. Similarly, a Y-axis stator 87 extending in the Y-axis direction is arranged above the convex portion FCb of the frame caster FC. These Y-axis stators 86 and 87 are supported by floating air bearings (not shown) provided on the lower surfaces thereof, for example, air bearings, through predetermined clearances with respect to the upper surfaces of the convex portions FCa and FCb. Have been. In the present embodiment, the Y-axis stators 86 and 87 are configured as magnetic pole units having a plurality of permanent magnet group forces.

[0049] Inside the wafer stage main body 28, a magnetic pole unit 90 having a permanent magnet group as a mover in the X-axis direction is provided.

An X-axis stator 80 extending in the X-axis direction is inserted into the internal space of the magnetic pole unit 90. The X-axis stator 80 is constituted by an armature unit having a plurality of armature coils arranged at predetermined intervals along the X-axis direction. In this case, a moving magnet type X-axis linear motor that drives the wafer stage WST in the X-axis direction is configured by the magnetic pole unit 90 and the X-axis stator 80 including an armature unit. Hereinafter, the X-axis linear motor will be referred to as the X-axis linear motor 80 using the same reference numerals as those of the stator (stator for the X-axis) 80 as appropriate. Note that a moving coil type linear motor may be used instead of the moving magnet type linear motor.

[0051] An armature unit including a plurality of armature coils arranged at predetermined intervals along the Y-axis direction is provided at one end and the other side in the longitudinal direction of the X-axis stator 80, for example. Consisting of Mover 82, 83 force is fixed respectively. Each of these movers 82 and 83 is inserted into the above-mentioned stator 86 and 87 for the Y-axis, respectively. That is, in the present embodiment, a moving coil type Y-axis linear motor is configured by the movers 82 and 83 formed of the armature unit and the Y-axis stators 86 and 87 formed of the magnetic pole unit. In the following, the two Y-axis linear motors will be referred to as the Y-axis linear motor 82 and the Y-axis linear motor 83, respectively, using the same reference numerals as the movers 82 and 83, respectively. Note that moving magnet type linear motors may be used as the Y-axis linear motors 82 and 83.

That is, the wafer stage WST is driven in the X-axis direction by the X-axis linear motor 80, and is driven in the Y-axis direction integrally with the X-axis linear motor 80 by the pair of Y-axis linear motors 82 and 83. You. The wafer stage WST is also driven to rotate in the z-direction by slightly varying the driving force in the Y-axis direction generated by the Y-axis linear motors 82 and 83.

[0053] On the wafer table WTB, a wafer holder 70 for holding the wafer W is provided. The wafer holder 70 includes a plate-shaped main body, and an auxiliary plate fixed to the upper surface of the main body and having a circular opening formed at the center thereof having a diameter larger than the diameter of the wafer W by about 2 mm. A large number of pins are arranged in a region of the main body inside the circular opening of the auxiliary plate, and the wafer W is vacuum-sucked in a state where the wafer W is supported by the large number of pins. In this case, when the wafer W is vacuum-sucked, the height of the surface of the wafer W and the surface of the auxiliary plate are almost the same.

As shown in FIG. 2, an X movable mirror 17X having a reflecting surface orthogonal to the X axis at one end (one X side end) in the X axis direction is provided on the upper surface of wafer table WTB in the Y axis direction. One end (+ Y side end) in the Y-axis direction is provided, and a Y movable mirror 17Y having a reflecting surface orthogonal to the Y-axis is extended in the X-axis direction. As shown in FIG. 2, each of the reflecting surfaces of these movable mirrors 17X and 17Y has an interference from an X-axis interferometer 46 and a Y-axis interferometer 18, which constitute an interferometer system 118 (see FIG. 7) described later. A measuring beam (length measuring beam) is projected, and each of the interferometers 46 and 18 receives the respective reflected light, so that the reference position of each reflecting surface (generally, the side of the projection unit PU and the Opacity alignment) A fixed mirror is placed on the side of the system ALG (see Fig. 7 and Fig. 8 (A) etc.), and the displacement in the measurement direction from the reference mirror is measured. Y-axis interferometer 18 Has a length measuring axis parallel to the Y axis connecting the projection center (optical axis AX) of the projection optical system PL and the detection center of the alignment system ALG, and the X axis interferometer 46 is a Y axis interferometer 18. It has a length measurement axis that vertically intersects with the length measurement axis at the projection center of the projection optical system PL (see Fig. 8 (A), etc.).

The Y-axis interferometer 18 is a multi-axis interferometer having at least three optical axes, and the output value of each optical axis can be measured independently. The output value (measurement value) of the Y-axis interferometer 18 is supplied to a main controller 20 as shown in FIG. 7, and the main controller 20 controls the wafer based on the output value from the Y-axis interferometer 18. It is possible to measure not only the position of the table WTB in the Y-axis direction (Y position), but also the rotation amount around the X-axis (pitching amount) and the rotation amount around the Z-axis (jowing amount). Further, the X-axis interferometer 46 is a multi-axis interferometer having at least two optical axes, so that the output value of each optical axis can be measured independently. The output value (measured value) of the X-axis interferometer 46 is supplied to the main controller 20. The main controller 20 determines the position of the wafer table WTB in the X-axis direction based on the output value from the X-axis interferometer 46. It is now possible to measure not only the (X position), but also the amount of rotation (rolling amount) around the Y axis!

As described above, in practice, movable mirrors 17X and 17Y are provided on wafer table WTB. These are typically shown as movable mirror 17 in FIG. Incidentally, for example, the end surface of the wafer table WTB may be mirror-finished to form a reflection surface (corresponding to the reflection surfaces of the moving mirrors 17X and 17Y described above).

As shown in FIG. 2, the measurement stage MST is composed of a combination of a plurality of members such as a Y stage 81 whose longitudinal direction is in the X-axis direction. A plurality of hydrostatic bearings provided on the lower surface of the base member 12, for example, floating above and below the upper surface (guide surface) of the base board 12 via an air bearing through a clearance of several zm without contact. Being done.

As can be seen from the perspective view of FIG. 3 (A), the measurement stage MST has a rectangular plate-shaped measurement stage main body 81c elongated in the X-axis direction and an X-axis direction on the upper surface of the measurement stage main body 81c. A Y stage 81 having a pair of protrusions 81a and 8 lb fixed to one side and the other side of the Y stage 81; a leveling table 52 disposed above the upper surface of the measurement stage body 81c; A measurement table MTB that constitutes at least a part of the measurement unit provided on the ring table 52 is provided. [0059] A plurality of armature coils arranged at predetermined intervals along the Y-axis direction are built in the end surfaces on one side and the other side in the X-axis direction of the measurement stage main body 81c constituting the Y stage 81. The movers 84 and 85, each consisting of an armature unit, are fixed. These movers 84 and 85 are inserted into the Y-axis stators 86 and 87 from the inside, respectively. That is, in the present embodiment, two moving coil type Y-motors are constituted by the movers 84 and 85 formed of the armature units and the Y-axis stators 86 and 87 formed of the magnetic pole units. . In the following, each of the two Y-axis linear motors will be referred to as the Y-axis linear motor 84 and the Y-axis linear motor 85, as appropriate, using the same reference numerals as the respective movers 84 and 85. I do. In the present embodiment, the overall force of the measurement stage MST is driven in the Y-axis direction by these Y-axis linear motors 84 and 85. The Y-axis linear motors 84 and 85 may be moving magnet type linear motors.

[0060] On the bottom surface of the measurement stage main body 81c, the above-described plurality of static gas pressure bearings are provided. The above-mentioned pair of protrusions 81a and 81b are fixed to each other near one end in the X-axis direction and the other end in the X-axis direction on the upper surface of the measurement stage body 81c. Between these protruding portions 81a and 81b, stators 61 and 63 extending in the X-axis direction are arranged at predetermined intervals in the Z-axis direction (up and down). Are fixed to the protrusions 81a and 81b, respectively.

[0061] A mover of an X voice coil motor 54a is provided on the + X side end surface of the leveling table 52, and a stator of the X voice coil motor 54a is fixed to an upper surface of the measurement stage main body 81c. Have been. Further, on the + Y end surface of the leveling table 52, movers of Y voice coil motors 54b and 54c are provided, respectively. The stators of these Y voice coil motors 54b and 54c are provided on the upper surface of the measurement stage body 81c. It is fixed to. The X voice coil motor 54a is composed of, for example, a mover composed of a magnetic pole unit and a stator composed of an armature unit, and generates a driving force in the X-axis direction by electromagnetic interaction therebetween. The Y voice coil motors 54b and 54c are similarly configured and generate a driving force in the Y-axis direction. That is, the leveling table 52 is driven in the X-axis direction with respect to the Y stage 81 by the X voice coil motor 54a, and is driven in the Y-axis direction with respect to the Y stage 81 by the Y voice coil motors 54b and 54c. Is done. Also, voice coil motors 54b and 54c are generated. By varying the driving force, the leveling table 52 can be driven relative to the Y stage 81 in the direction of rotation around the Z axis (Θ direction).

[0062] The leveling table 52 has a plate-like casing with an open bottom surface, as schematically shown in a partial cross section in Fig. 4, and has a Z-axis inside. Three Z voice coil motors 56 that generate directional driving force (however, Z voice coil motors 56 on the far side of the drawing are not shown) 1S are arranged. The stator of each Z voice coil motor 56 is composed of an armature unit, and is fixed to the upper surface of measurement stage main body 81c. The mover of each Z voice coil motor 56 is formed of a magnetic pole unit, and is fixed to the leveling table 52. These three Z voice coil motors 56 generate a driving force in the Z-axis direction by electromagnetic interaction between the respective stators and movers. Therefore, the leveling table 52 is driven in the Z-axis direction by the three Z voice coil motors 56, and is rotated around the X-axis (0 X direction) and around the Y-axis (0 y direction). 〖They are also driven minutely.

That is, the leveling table 52 has six degrees of freedom directions (X, Υ, Z, θ θ, により) by the above-described X voice coil motor 54a, Y voice coil motors 54b, 54c, and three Z voice coil motors 56. θ γ, 0 ζ) and can be micro-driven in a non-contact manner.

As shown in FIG. 4, a self-weight canceling mechanism 58 for canceling the self-weight of the leveling table 52 is also arranged inside the leveling table 52. In other words, it can be said that the self-weight canceling mechanism 58 compensates for the self-weight of the measurement table ΜΤΒ. The self-weight canceling mechanism 58 is disposed near the position of the approximate center of gravity of the triangle constituted by the three voice coil motors 56 described above.

As shown in the vertical sectional view of FIG. 5, the self-weight canceller 58 is a cylindrical cylinder having an open lower end (end on one side) and a closed upper end (+ Ζ end). A portion 170A and a piston portion 170B inserted into the cylinder portion 17OA through the opening and movable relative to the cylinder portion 170A.

[0066] An annular first annular convex portion 172a is formed near the lower end portion (-Z side end portion) of the cylinder portion 170A over the entire circumference of the inner peripheral surface thereof. Further, a second annular convex portion 172b is formed at a predetermined interval below (-Z side) the first annular convex portion 172a. And Siri The inner bottom surface of the annular concave groove 172d having a predetermined depth formed between the first annular convex portion 172a and the second annular convex portion 172b of the cylinder portion 170A communicates the internal space of the cylinder portion 170A with the outside. Through holes 172c are formed at a plurality of locations at predetermined intervals.

[0067] The piston portion 170B is inserted into the cylinder portion 170A with a predetermined clearance formed between the outer peripheral surface and the first and second annular convex portions 172a and 172b.

[0068] The piston 170B has a two-part force consisting of a cylindrical part having a first diameter and a disk part having a second diameter (> the first diameter) provided on the Z side and concentric with the cylindrical part. It has a columnar shape. The piston portion 170B is formed with a ventilation pipe 174a extending in the Z-axis direction from the center of the upper end surface to the bottom surface. The ventilation pipe 174a communicates with a groove 174b formed on the lower end surface (-Z side end surface) of the piston portion 170B, and is formed near the lower end surface of the piston portion 170B so as to become narrower as approaching the lower end surface. ing. That is, the lower end of the ventilation pipe 174a is formed to serve as a kind of nozzle (tapered nozzle). Note that the groove 174b actually has a shape in which a circle and a cross which is orthogonal at the center thereof are combined.

[0069] Also, in the vicinity of the periphery of the upper end surface of the piston portion 170B, four ventilation pipes 176 (in FIG. 5, each on the + Y side and the -Y side; Only the two ventilation pipes 176 to be placed are shown, and the remaining two ventilation pipes 176 located on the + X side and the -X side are not shown). It is formed in a state dug down to the position. In the vicinity of the lower ends of these four ventilation pipes 176, there are formed through holes 178 as gas outlets communicating with the outside of the outer peripheral surface of the piston 170B.

[0070] In this case, a substantially airtight space 180 is formed above the piston portion 170B inside the cylinder portion 170A. One end of an air supply pipe (not shown) is connected to this space 180 via an opening (not shown) formed in a part of the cylinder portion 170A, and the other end of the air supply pipe is connected to a gas supply (not shown). Connected to the device. From this gas supply device, for example, a rare gas such as helium or a gas such as nitrogen or air is supplied into the space 180 through an air supply pipe, and the space 180 has a higher pressure than the outside of the cylinder 170A. It is a compressed space. Therefore, hereinafter, the space 180 is also referred to as “positive pressure space 180”.

In the self-weight canceller 58 thus configured, as shown in FIG. Is a positive pressure space, so that the gas flow indicated by the arrow A in the ventilation pipe 174a (

1

Hereinafter, “flow A” is generated as appropriate). Gas force indicated by this flow A

1 1

The gas ejected from the tapered nozzle at the lower end of the conduit 174a and indicated by an arrow A in the groove 174b

2

Flow occurs. This gas spreads over the entire area of the groove 174b and is ejected toward the upper surface of the measurement stage main body 81c in the entire groove 174b. As a result, a predetermined pressure is generated between the bottom surface of the piston 170B and the upper surface of the measurement stage main body 81c by the static pressure of the gas (pressure in the gap) between the bottom surface of the piston 170B and the upper surface of the measurement stage main body 81c. Clearance of AL formed

1 That is, a kind of aerostatic bearing is substantially formed on the bottom surface of the piston 170B, and the piston 170B is floated above the measurement stage main body 81c in a non-contact manner. Hereinafter, this gas static pressure bearing is also referred to as “thrust bearing”.

[0072] Similarly to the ventilation pipes 174a, each of the four ventilation pipes 176 has a gas indicated by an arrow B.

1

As a result, a gas flow indicated by an arrow B from the inside of the piston portion 170B to the outside is generated in the throttle hole 178, and the gas ejected from the throttle hole 178 is generated.

2

The air is sprayed on the second annular convex portion 172b. At this time, the outer peripheral surface of the piston portion 170B and the first and second annular convex portions 172a, 172b are caused by the static pressure of gas (pressure in the gap) between the second annular convex portion 172b and the outer peripheral surface of the piston portion 170B. , A predetermined clearance ΔL is formed. That is, on the peripheral wall of the piston portion 170B,

2

In addition, a gas static pressure bearing is formed, and the piston 170B and the cylinder 170A are not in contact with each other. Hereinafter, this gas static pressure bearing is also referred to as “radial bearing”.

[0073] Further, a gas flow indicated by an arrow C is generated in the plurality of through holes 172c formed at predetermined intervals in the annular concave groove 172d of the cylinder portion 170A, whereby the second annular convex portion is formed. 172

1

The gas in the clearance A L, such as the gas injected into b and the gas in the positive pressure space 180,

2

It is being discharged to!

According to the self-weight canceller 58 of the present embodiment, when the leveling table 52 is supported at its upper end, its own weight is supported by the positive pressure in the positive pressure space 180 and the Y stage 81 is supported. The clearance AL can always be maintained between the upper surface of the measurement stage main body 81c and the upper surface of the main stage 81c by the action of the thrust bearing. Also, leveling table 5 Even if a force is applied to tilt in the tilting direction (0x, 0y direction), the clearance AL is maintained by the action of the radial bearing.

2

The oblique will be absorbed. Therefore, according to the self-weight canceller 58, it is possible to support the leveling table 52 with low rigidity by positive pressure and absorb the inclination thereof.

Returning to FIG. 3 (A), the measurement table MTB is composed of a measurement table main body 59 made of a material such as Zerodur (trade name of SCHOTT) and a vertically arranged side of the Y side of the measurement table main body 59. Movers 62 and 64 having a substantially U-shaped cross section and having the X-axis direction as a longitudinal direction.

A plurality of, for example, four air bearings 42 (see FIG. 4) are provided on the bottom surface of the measurement table main body 59, and the measurement table MTB is provided above the upper surface of the leveling table 52 via these air bearings 42. It is levitated and supported without contact through a clearance of several μm.

The mover 62 includes a mover yoke having a substantially U-shaped YZ section, and N-pole permanent magnets arranged at predetermined intervals and alternately along the X-axis direction on the inner surface (upper and lower surfaces) of the mover yoke. A permanent magnet group including a plurality of pairs of magnets and S pole permanent magnets is provided, and is engaged with the stator 61 described above. In the inner space of the mover yoke of the mover 62, an alternating magnetic field is formed along the X-axis direction. The stator 61 is formed of, for example, an armature unit including a plurality of armature coils arranged at predetermined intervals along the X-axis direction. That is, a moving magnet type X-axis linear motor LX that drives the measurement table MTB in the X-axis direction is constituted by the stator 61 and the mover 62!

The mover 64 includes a mover yoke having a substantially U-shaped YZ cross section, and an N-pole permanent magnet and an S-pole permanent magnet provided on inner surfaces (upper and lower surfaces) of the mover yoke, respectively. , And are engaged with the stator 63 described above. In the inner space of the mover yoke of the mover 64, a magnetic field of + Z direction or Z direction is formed. The stator 63 includes an armature coil disposed therein such that an electric current flows only in the X-axis direction in a magnetic field formed by the N-pole magnet and the S-pole magnet. In other words, the moving magnet type Y voice coil motor VY that drives the measuring table MTB in the Y-axis direction by the mover 64 and the stator 63. It is configured.

As is clear from the above description, in the present embodiment, the Y-axis linear motors 82 to 85 and the X-axis linear motor 80, the fine movement mechanism (not shown) for driving the wafer table WTB, and the measurement stage MST The above-described motors (54a-54c, 56, LX, VY) constitute the stage driving section 124 shown in FIG. Various drive mechanisms constituting the stage drive section 124 are controlled by the main controller 20 shown in FIG.

[0080] The measurement table MTB further includes measuring instruments for performing various measurements related to exposure. More specifically, on the upper surface of the measurement table main body 59, a plate 101 having a glass material such as Zeguchi Dua (trade name of Schott) or quartz glass is provided. The surface of the plate 101 is coated with chromium over almost the entire surface, and in some places, a region for a measuring instrument, a Japanese Patent Application Laid-Open No. 5-21314, and a corresponding US Pat. No. 5,243,195, etc. are used. There is a reference mark area FM in which a plurality of reference marks to be disclosed are formed. To the extent permitted by the laws of the designated country (or selected elected country) specified in this international application, the disclosures of the above gazettes and corresponding US patents are incorporated herein by reference.

The measurement device area is patterned, and various measurement aperture patterns are formed. Examples of the measurement aperture pattern include an aerial image measurement aperture pattern (for example, a slit-shaped aperture pattern), an uneven illumination measurement pinhole aperture pattern, an illuminance measurement aperture pattern, and a wavefront aberration measurement aperture pattern. Is formed.

[0082] Inside the measurement table main body 59 below the aerial image measurement aperture pattern, exposure light applied to the plate 101 via the projection optical system PL and water is applied through the aerial image measurement aperture pattern. A light receiving system is provided for receiving the light by the projection optical system PL disclosed in, for example, JP-A-2002-14005 and the corresponding US Patent Application Publication No. 2002Z0041377. An aerial image measuring device for measuring the light intensity of the aerial image (projected image) of the pattern is constructed.

Further, a light receiving system including a light receiving element is provided inside the measurement table main body 59 below the illumination unevenness measurement pinhole opening pattern. No. 4,465,368 and the corresponding projection light disclosed therein A non-uniform illuminance measuring instrument has a pinhole-shaped light receiving unit that receives the illumination light IL on the image plane of the science and engineering PL.

Further, a light receiving system including a light receiving element is provided inside the measurement table body 59 below the illuminance measurement opening pattern, whereby, for example, Japanese Patent Application Laid-Open No. 11-16816 and An illuminance monitor having a light receiving unit having a predetermined area for receiving illumination light IL via water on an image plane of a projection optical system PL disclosed in US Patent Application Publication No. 2002Z0061469 and the like corresponding to . To the extent permitted by national laws and regulations of the designated country (or selected elected country) specified in this international application, the disclosures in this specification shall be made with reference to the disclosures of the above-mentioned publications and corresponding U.S. patents or U.S. patent application publications. Partly.

Further, a light receiving system including, for example, a microlens array is provided inside the measurement table main body 59 below the aperture pattern for measuring wavefront aberration, whereby, for example, International Publication No. 99/60361. A wavefront aberration measuring instrument disclosed in a pamphlet and the corresponding European Patent No. 1,079,223 is constituted.

In FIG. 7, the aerial image measuring device, the illuminance unevenness measuring device, the illuminance monitor, and the wavefront aberration measuring device are shown as a measuring device group 43.

In the present embodiment, in response to the immersion exposure for exposing the wafer W with the exposure light (illumination light) IL via the projection optical system PL and water, the illumination light IL In the illuminance monitor, illuminance unevenness measuring device, aerial image measuring device, wavefront aberration measuring device, and the like used in the measurement using the illuminator, the illumination light IL is received via the projection optical system PL and water. For this reason, the surface of the plate 101 is provided with a water-repellent coat. Note that, for each of the measuring instruments, for example, only a part of the optical system or the like may be mounted on the measuring stage MST, or the entire measuring instrument may be arranged on the measuring stage MST.

[0088] On the upper surface of the measurement table MTB (plate 101), an X movable mirror 117X having a reflection surface orthogonal to the X axis at one end (one X side end) in the X axis direction is extended in the Y axis direction. At one end (one Y-side end) in the Y-axis direction, a Y moving mirror 117Y having a reflecting surface orthogonal to the Y-axis is extended in the X-axis direction. As shown in FIG. 2, the interferometer beam (length measuring beam) from the Y-axis interferometer 16 constituting the interferometer system 118 is projected onto the reflecting surface of the Y moving mirror 117Y, and the interferometer 16 By receiving the reflected light, the reference position force of the reflecting surface of the Y moving mirror 117Y is reduced. Measure the displacement. Also, when the measurement table MTB moves immediately below the projection unit PU during measurement or the like, the interferometer beam (length measuring beam) from the X-axis interferometer 46 is projected on the reflecting surface of the X movable mirror 117X, By receiving the reflected light, the interferometer 46 measures the displacement of the reflecting surface of the X moving mirror 117X from the reference position. The Y-axis interferometer 16 has a length-measuring axis parallel to the Y-axis direction perpendicular to the length-measuring axis of the X-axis interferometer 46 at the projection center (optical axis AX) of the projection optical system PL, You.

[0089] The Y-axis interferometer 16 is a multi-axis interferometer having at least three optical axes, and the output value of each optical axis can be measured independently. The output value (measured value) of the Y-axis interferometer 16 is supplied to the main controller 20 as shown in FIG. 7, and the main controller 20 measures the output value based on the output value from the Y-axis interferometer 16. It is possible to measure not only the Y position of the table MTB, but also the pitching and jowing amounts. In addition, main controller 20 measures the X position and the amount of rolling of measurement table MTB based on the output value from X-axis interferometer 46.

As can be understood from the above description, in the present embodiment, the interferometer beam from the Y-axis interferometer 18 is always projected on the movable mirror 17Y over the entire movement range of the wafer stage WST, Interferometer An interferometer beam of as much as 16 forces is always projected on the movable mirror 117Y over the entire moving range of the measurement stage MST. Therefore, in the Y-axis direction, the positions of the stages WST and MST are always managed by the main controller 20 based on the measured values of the Y-axis interferometers 18 and 16.

On the other hand, as can be easily imagined from FIG. 2, the main controller 20 controls the X-axis interferometer 46 only within the range of the interferometer beam force from the X-axis interferometer 46 and the movable mirror 17X. The X position of the wafer table WTB (wafer stage WST) is managed based on the output value, and the interferometer beam force from the X-axis interferometer 46 is based on the output value of the X-axis interferometer 46 only within the range of the moving mirror 117X. Next, the X position of the measurement table MTB (measurement stage MST) is managed. Therefore, while the X position cannot be managed based on the output value of the X-axis interferometer 46, the positions of the wafer table WTB and the measurement table MTB are measured by an encoder (not shown). Based on the measured values of the X-axis interferometer 46, the main controller 20 can control the wafer table WTB and Manage the position of the table MTB.

[0092] In addition, main controller 20 controls the state in which the interferometer beam from X-axis interferometer 46 does not hit any of moving mirrors 17X and 117X. At this point, the X-axis interferometer 46 that has not been used for control is reset, and thereafter, the Y-axis interferometer 18 or 16 and the X-axis interferometer 46 that constitute the interferometer system 118 are reset. It is used to manage the position of the wafer stage WST or measurement stage MST.

In the present embodiment, a plurality of force X-axis interferometers including the two Y-axis interferometers 16 and 18 and the one X-axis interferometer 46 to constitute the interferometer system 118 of FIG. It is also possible to adopt a configuration that always provides the interferometer beam force from one of the X-axis interferometers to the movable mirror 17X or 117X. In this case, the X-axis interferometer that controls the positions of the wafer stage WST and the measurement stage MST should be switched according to the X position of these stages!

[0094] Further, the above-mentioned multi-axis interferometer irradiates a laser beam onto a reflection surface provided on a holding member for holding projection unit PU via a reflection surface provided on stage WST or MST at an angle of 45 °. Alternatively, relative position information about the optical axis direction (Z-axis direction) of the projection optical system PL between the reflection surface and the stage may be detected.

[0095] In the exposure apparatus 100 of the present embodiment, the holding member for holding the projection unit PU includes an off-axis alignment system (hereinafter abbreviated as "alignment system") ALG (not shown in FIG. 1, 7 and 8 (A) etc.). For example, this alignment-based ALG irradiates the target mark with a broadband detection light beam that does not expose the resist on the wafer, and the target mark image formed on the light-receiving surface by the reflected light with the target mark power. An image of the index (the index pattern on the index plate provided in the alignment system ALG) is captured using an imaging element (such as a CCD), and the image processing method FI A ( Field Image Alignment) type sensors are used. The imaging signal from the alignment ALG is supplied to the main controller 20 in FIG.

[0096] The alignment type ALG is not limited to the FIA type, but irradiates a target mark with a coherent detection light and detects scattered light or diffracted light that also generates the target mark force, or detects the target light. Two diffracted beams that also generate a mark force (for example, diffracted beams of the same order or A single alignment sensor for detecting interference by diffracting light diffracted in the direction) can be used in combination as appropriate.

The exposure apparatus 100 according to the present embodiment includes a force irradiation system 90a and a light receiving system 90b (see FIG. 7), which are not shown in FIG. 1, for example, Japanese Patent Application Laid-Open No. 6-283403 and corresponding thereto. An oblique incidence type multi-point focal position detection system similar to that disclosed in US Pat. No. 5,448,332 is provided. In the present embodiment, as an example, the irradiation system 90a is suspended and supported by a holding member that holds the projection unit PU on the −X side of the projection unit PU, and the light receiving system 90b is held on the + X side of the projection unit PU. It is suspended and supported below the member. That is, the irradiation system 90a, the light receiving system 90b, and the projection optical system PL are mounted on the same member, and the positional relationship between them is maintained constant. To the extent permitted by the national laws of the designated States (or selected elected States) specified in this International Application, the disclosures of the above-mentioned publications and corresponding US patents are incorporated herein by reference.

FIG. 7 shows a main configuration of a control system of exposure apparatus 100. This control system is mainly configured by a main controller 20 composed of a microcomputer (or a workstation) that controls the entire apparatus as a whole. Further, a display DIS such as a memory MEM and a CRT display (or a liquid crystal display) is connected to the main controller 20.

[0099] Next, the parallel processing operation using wafer stage WST and measurement stage MST in exposure apparatus 100 of the present embodiment configured as described above will be described with reference to FIGS. Will be explained. During the following operation, the main controller 20 controls the opening and closing of each valve of the liquid supply device 288 and the liquid recovery device 292 of the liquid immersion device 132 as described above. The area immediately below the lens 91 is always filled with water. However, in the following, in order to facilitate the description, the description of the control of the liquid supply device 288 and the liquid recovery device 292 will be omitted.

[0100] FIG. 8A shows a step-and-scan exposure method for wafer W on wafer stage WST (here, for example, the last wafer of one lot (one lot is 25 or 50)). The state where light is being performed is shown. At this time, measurement stage MST waits at a predetermined standby position without colliding with wafer stage WST! /

[0101] The above-described exposure operation is performed by the main controller 20 in advance, for example, in the case of the Enhanced Group. Based on the results of wafer alignment such as global alignment ( _EGA) and the measurement results of the latest alignment-based ALG, etc., the scanning start position for the exposure of each shot area on the wafer W (acceleration) This is performed by repeating a shot-to-shot movement operation in which the wafer stage WST is moved to the (start position) and a scanning exposure operation of transferring a pattern formed on the reticle R to each shot area by a scanning exposure method.

[0102] Here, the movement between shots in which the wafer stage WST is moved is performed by monitoring the measurement values of the 20-force interferometers 18 and 46 of the main control device, and using the X-axis linear motor 80 and the Y-axis linear motor. This is done by controlling 82 and 83. In addition, the above scanning exposure is performed while monitoring the measured values of the main controller 20 force interferometers 18, 46 and the reticle interferometer 116, while controlling the reticle stage driving unit 11 and the Y-axis linear motors 82, 83 (and X-axis). By controlling the linear motor 80), the reticle R (reticle stage RST) and the wafer W (wafer stage WST) are scanned relative to each other in the Y-axis direction. This is realized by synchronously moving the reticle R (reticle stage RST) and wafer W (wafer stage WST) at constant speed in the Y-axis direction with respect to the illumination area of the illumination light IL during the uniform movement. The above-described exposure operation is performed in a state where water is held between the tip lens 91 and the wafer W.

[0103] Then, at the stage where the exposure of the wafer and the W on the wafer stage WST side is completed, the main controller 20 sets the Y-axis linear based on the measurement value of the interferometer 16 and the measurement value of the encoder (not shown). By controlling the motors 84 and 85 and the X-axis linear motor LX, the measurement table MTB is moved to the position shown in FIG. In the state shown in FIG. 8B, the end surface on the + Y side of measurement table MTB is in contact with the end surface on the Y side of wafer table WTB. The measurement values of the interferometers 16 and 18 may be monitored, and the measurement table MTB and the wafer table WTB may be separated from each other by about 300 m in the Y-axis direction to maintain a non-contact state.

Next, main controller 20 starts an operation of simultaneously driving both stages WST and MST in the + Y direction while maintaining the positional relationship between wafer table WTB and measurement table MTB in the Y-axis direction.

In this manner, when main controller 20 drives wafer stage WST and measurement stage MST simultaneously, in the state of FIG. 8B, tip lens 91 of projection unit PU and wafer Hydraulic force held between W and wafer stage WST and measurement stage MST move in the + Y side and move sequentially from wafer W to wafer holder 70 to measurement table MTB. During the above movement, the wafer table WTB and the measurement table MTB maintain the positional relationship of contact with each other. FIG. 9 (A) shows a state in which water is simultaneously present on the wafer stage WST and the measurement stage MST during the above movement, that is, immediately before water is passed on the wafer stage WST force measurement stage MST. State is shown.

When the wafer stage WST and the measurement stage MST are simultaneously driven a predetermined distance in the + Y direction from the state shown in FIG. 9A, as shown in FIG. 9B, the measurement table MTB and the tip lens The water is held between the air conditioner and 91. Prior to this, in the main controller 20, the interferometer beam from the X-axis interferometer 46 is irradiated on the moving mirror 117X on the measurement table MTB! / Perform 46 resets. In the state shown in FIG. 9B, main controller 20 manages the X position of wafer table WTB (wafer stage WST) based on a measurement value of an encoder (not shown).

[0107] Next, main controller 20 controls linear motors 80, 82, and 83 while controlling the position of wafer stage WST based on the interferometer 18 and the measurement values of the encoder, and performs predetermined wafer exchange. The wafer stage WST is moved to the position and replaced with the first wafer of the next lot, and in parallel with this, predetermined measurement using the measurement stage MST is performed as necessary. An example of this measurement is a baseline measurement of an alignment ALG performed after the reticle is replaced on the reticle stage RST. Specifically, in main controller 20, reticle alignment marks on the reticle corresponding to a pair of first reference marks in reference mark area FM provided on plate 101 on measurement table MTB are described above. The positional relationship between the pair of first fiducial marks and the corresponding reticle alignment marks is detected by simultaneously detecting using the alignment systems RAa and RAb. At the same time, main controller 20 detects the second fiducial mark in the fiducial mark area FM with the alignment ALG, thereby detecting the positional relationship between the detection center of the alignment ALG and the second fiducial mark. I do. Then, main controller 20 determines the positional relationship between the pair of first fiducial marks and the corresponding reticle alignment mark, and the detection center of alignment ALG and the second alignment mark. The center of projection of the reticle pattern by the projection optical system PL and the center of detection of the alignment system ALG based on the positional relationship between the two fiducial marks and the known positional relationship between the pair of first fiducial marks and the second fiducial mark. Find the distance, ie, the baseline of the alignment ALG. The state at this time is shown in FIG.

[0108] In addition to the measurement of the baseline of the alignment ALG described above, a plurality of pairs of reticle alignment marks are formed on the reticle, and a plurality of pairs of the first reference marks are formed in the reference mark area FM in response to this. In addition, at least two pairs of the first fiducial marks and the corresponding reticle alignment marks are moved relative to the reticle stage RST and the wafer stage WST in the Y-axis direction while moving the reticle alignment systems RAa and RAb. The so-called reticle alignment is performed by using the measurement.

In this case, mark detection using reticle alignment systems RAa and RAb is performed via projection optical system PL and water.

[0110] At the stage where the operations on both stages WST and MST described above are completed, main controller 20 brings measurement table MTB and wafer table WTB (wafer stage WST) into contact with each other, and maintains the state. While moving in the XY plane, returning the wafer stage WST directly below the projection unit. During this movement, the main controller 20 irradiates the interferometer beam from the X-axis interferometer 46 to the moving mirror 17X on the wafer table WTB! / At some point, the X-axis Performing reset of interferometer 46. Then, on the wafer stage WST side, a wafer alignment is performed on the replaced wafer, that is, an alignment mark on the replaced wafer is detected by an alignment ALG, and the position coordinates of a plurality of shot areas on the wafer are determined. Is calculated. As described above, the measurement table MTB and the wafer table WTB (wafer stage WST) can be in a non-contact state! ,.

[0111] Thereafter, main controller 20 simultaneously drives both stages WST and MST in the Y direction while maintaining the positional relationship between wafer table WTB (wafer stage WST) and measurement table MTB in the Y-axis direction. Then, after moving the wafer stage WST (Ueno) below the projection optical system PL, the measurement stage MST is retracted to a predetermined position.

[0112] Thereafter, main controller 20 executes a step 'and' scan exposure operation on the new wafer in the same manner as described above, and reticle patterning is performed on a plurality of shot areas on the wafer. Are sequentially transferred.

[0113] In the above description, the case where the baseline measurement is performed as the measurement operation is described. However, the present invention is not limited to this, and the measurement stage MST is performed while each wafer is replaced on the wafer stage WST side. The measurement instrument group 43 may be used to perform illuminance measurement, illuminance unevenness measurement, aerial image measurement, wavefront aberration measurement, and the like, and the measurement results may be reflected in subsequent wafer exposure. Specifically, for example, the projection optical system PL can be adjusted by the above-described imaging characteristic correction controller 381 based on the measurement result.

[0114] In this case, different measurements can be performed for each wafer exchange according to the time required for the wafer exchange. If one measurement is not completed during one wafer exchange, the measurement can be divided and performed multiple times.

By the way, as described above, since the measurement using each of the measuring devices is performed on the plate 101 of the measurement table MTB in a state where water is filled, the surface (upper surface) of the plate 101 is not Water repellent coat is applied. However, since the water-repellent coat deteriorates when exposed to ultraviolet light for a long period of time that is weak to ultraviolet light, it is necessary to perform maintenance (replacement) of the water-repellent coat portion at a predetermined frequency. In view of the above, in exposure apparatus 100 of the present embodiment, measurement table MTB is in a state of non-contact engagement with other components of measurement stage MST. In other words, the measurement table MTB is shifted to the + Y side to release the engagement between the mover and the stator of each of the X linear motor LX and Y voice coil motor VY.

As shown in 3 (B), the measurement table MTB can be easily detached from other components and components of the measurement stage MST. In the present embodiment, the measurement table MTB is replaced with a new measurement table at a predetermined replacement time.

[0116] When replacing the measurement table MTB, the water-repellent coating should be used in order to maintain the measurement accuracy of various measurements well and minimize the downtime of the equipment accompanying the replacement of the measurement table MTB. It is desirable to set the time immediately before the deterioration (immediately before the deterioration exceeds a predetermined allowable range).

Therefore, in the present embodiment, the deterioration of the water-repellent coat and the measurement table MTB Based on the relationship with the change in the measurement results of the various measuring instruments provided in, the measured values of the various measuring instruments immediately before the water-repellent coat deteriorates are calculated, and the value of the boundary where the measurement results of the various measuring instruments exceed the allowable value Is stored in the memory MEM (see FIG. 7) as a threshold value. During use of the device, when measurement is performed using the measurement table MTB, the main control device 20 compares the measurement result with a threshold value stored in the memory MEM to determine a replacement time. It is to be determined whether or not it has arrived. Then, when main controller 20 determines that the replacement time has come, it displays that fact on display DIS (see FIG. 7). Therefore, the operator stops the operation of the exposure apparatus 100 and manually replaces the measurement table MTB. That is, in the present embodiment, a detection device that detects the replacement time of the plate 101 by the main control device 20 and the memory MEM is configured.

When a robot or the like used for replacing measurement table MTB is provided, main controller 20 displays the replacement time on display DIS, stops the operation of the device, and stops the robot. It is also possible to carry out the measurement table MTB to the outside and to carry in a new measurement table onto the measurement stage body 81c by using, for example.

[0119] Further, when detecting when to exchange the measurement table MTB, for example, separately from the exposure light, light having the same wavelength as the exposure light (detection light) is guided to the vicinity of the projection unit PU using an optical fiber or the like. Then, the part other than the part used for various measurements of the plate 101 of the measurement table MTB is irradiated with the detection light for the same (or somewhat longer) time as the measurement time, and the illuminance (light amount) of the detection light at that time is measured. It is also possible to determine the arrival of the replacement time by measuring with an optical sensor provided exclusively for detecting the replacement time and calculating the degree of deterioration based on the measurement result. In addition, the degree of deterioration may be predicted using a timer or the like based on the deterioration time obtained in advance by simulation or the like. In short, any method can be used as long as it can detect the degree of deterioration of the water-repellent coat using any means and can detect that the replacement time has come.

As described in detail above, according to the exposure apparatus 100 of the present embodiment, the exposure apparatus 100 includes the plate 101 to which water (liquid) is supplied, and performs measurement related to exposure via the projection optical system and water. In the measurement stage MST, the measurement table MTB including the plate 101 can be exchanged. Yes. For this reason, even when the measurement related to exposure is repeatedly performed using the measurement stage MST via the projection optical system PL and water in a state where water is supplied to the surface of the plate 101, the surface of the plate 101 may be in contact with water. By exchanging the measurement table MTB before deterioration due to contact, measurement related to exposure can always be performed with high accuracy, and as a result, highly accurate exposure can be maintained.

[0121] In the exposure apparatus of the present embodiment, the time immediately before the measurement accuracy of the various measuring instruments provided in the measurement table MTB starts to decrease is determined in advance by an experiment or the like, and this time is determined by the replacement time of the measurement table MTB. The arrival of that time is detected as described above. Therefore, by exchanging the measurement table MTB according to the detection result, the measurement table MTB can be exchanged at an optimal time before the measurement accuracy of the various measuring instruments provided in the measurement table MTB is reduced. It becomes possible. In other words, it is possible to maintain the measurement accuracy of the measurement related to exposure using the measurement table MTB with high accuracy, and to minimize the frequency of replacement of the measurement table MTB. Therefore, it is possible to maintain the exposure accuracy with high accuracy over a long period of time, and to effectively prevent a decrease in apparatus operation efficiency due to an increase in downtime due to replacement of the measurement table.

[0122] Further, according to the exposure apparatus 100, the pattern of the reticle R can be transferred onto the wafer with high precision by performing high-resolution exposure with a large depth of focus compared to that in the air by immersion exposure. For example, transfer of a fine pattern of about 70-100 nm can be realized as a device rule.

In the above embodiment, the force described in the case where the measurement stage MST includes the replaceable measurement table MTB is not limited to this. The measurement stage MST itself is not limited to this. A configuration may be adopted in which the engagement between the mover and the stator of the Y-axis rear motor that drives the measurement stage in the Y-axis direction can be released.

In the above embodiment, the force described in the case where the measurement table MTB is detachable from the leveling table 52 configuring the measurement stage MST is not limited to this. The table may be screwed to a part of the measurement stage MST. Even if it is strong, the measurement table can be removed by removing the screws. Is an exchangeable force.

In the above embodiment, the case where the leveling table 52 has a configuration having six degrees of freedom and the measurement table MTB force has S3 degrees of freedom has been described. However, the present invention is not limited to this, and the leveling table 52 may have three degrees of freedom. The configuration in which the measurement table MTB has three degrees of freedom may be adopted. Further, a configuration in which the measurement table MTB has six degrees of freedom may be employed without providing the leveling table 52. In short, it is only necessary that at least a part of the measuring unit including the plate 101 is replaceable.

In the above embodiment, the case where the piston-shaped dead weight canceller 58 is employed as a mechanism for canceling the dead weight of the leveling table 52 has been described. However, the present invention is not limited to this, and a bellows-shaped dead weight canceller or the like may be used. It may be adopted. In addition, the weight of the wafer stage body 28 may be canceled by the weight canceller 58!

<< Second Embodiment >>

Next, a second embodiment of the present invention will be described with reference to FIGS. Here, parts that are the same as or equivalent to those in the first embodiment described above are denoted by the same reference numerals, and the description thereof is simplified or omitted. In the exposure apparatus of the second embodiment, the configuration and the like of a measurement stage as a measurement unit are different from those of the above-described first embodiment, and the configurations and the like of other parts are the same as those of the above-described first embodiment. The same goes. Therefore, the following description focuses on the differences from the viewpoint of avoiding redundant description.

FIG. 11 is a perspective view showing measurement stage MST ′ according to the second embodiment. Comparing FIG. 11 with FIG. 3 (A), in the measurement stage MST ′ of the second embodiment, the measurement table MTB ′ as a measurement unit is replaced with the measurement table MTB ′ of the above-described first embodiment. It can be seen that is provided. The measurement table MTB 'includes a measurement table main body 159 slightly different in configuration from the above-described measurement table main body 59, and a plate 101' detachably mounted on the measurement table main body 159. Therefore, except for these points, it is basically configured and has the same functions as the above-mentioned measurement table MTB.

The plate 101 ′ is made of a glass material such as Zerodur (trade name of Schott), quartz glass, or the like, as in the first embodiment, and covers almost the entire surface thereof. ROM is applied, and areas for measuring instruments and reference mark areas are provided in some places. Then, a pattern jung is applied to the measurement device area, and the same aerial image measurement aperture pattern (for example, slit-shaped aperture pattern), illumination unevenness measurement pinhole aperture pattern, and the like as in the first embodiment described above. Measurement aperture patterns such as an illuminance measurement aperture pattern and a wavefront aberration measurement aperture pattern are formed.

[0130] The Y-side end surface and the X-side end surface of the plate 101 'are mirror-finished and have reflecting surfaces (corresponding to the reflecting surfaces of the moving mirrors 117X and 117Y on the measurement table MTB in the first embodiment). Is formed. Also, in the second embodiment, since various measurements are performed in a state where water is supplied onto the plate 101 ′, a water-repellent coat is applied to the surface of the plate 101 ′.

[0131] In the second embodiment, the plate 101 'is suction-held on the measurement table main body 159 via a vacuum chuck (not shown) provided in the measurement table main body 159. Of course, the plate 101 ′ may be fixed to the measurement table body 159 using a mechanical mechanism instead of vacuum suction.

The measurement table main body 159 is provided with a plurality of light receiving systems corresponding to the above-described various measurement aperture patterns, respectively, as in the first embodiment. . However, on the upper surface of the measurement table main body 159, a groove 21a extending in the X-axis direction is formed at the center of the end surface on the + X side in the Y-axis direction below the region where the plate 101 'is mounted. Grooves 21b and 21c extending in the X-axis direction to below the region where the plate 101 'is mounted are formed near one end in the Y-axis direction and the other end in the Y-axis direction on the side end surface, respectively.

[0133] Above the measurement stage MST 'in FIG. 11, a carry-in / out mechanism 24 used to carry in / out the plate 101' is provided. This carrying-in / out mechanism 24 is actually provided above the base board 12 near the end in the −Y direction.

The carrying-in / out mechanism 24 has a main body 27 capable of sliding in the Y-axis direction and a vertical movement in the Z-axis direction, and is mounted on the main body 27 and moves in opposite directions in the X-axis direction (mutually (In the direction of approaching or moving away from the hand), and has two substantially L-shaped hand parts 25a and 25b when viewed from the + Y direction. [0135] One hand unit 25a is attached to the main unit 27 in a suspended and supported state, with the + X end protruding outside the main unit 27. A hook 26a is provided. The other hand part 25b is attached to the main body part 27 in a suspended and supported state, with the -X end protruding outside the main body part 27. An extended portion extending in the axial direction is provided, and hook portions 26b and 26c are provided at the + Y side end and the Y side end of the extended portion. The hook portions 26a, 26b, 26c are provided at substantially the same height.

[0136] The hand units 25a and 25b are slidable in mutually opposing directions along the X-axis direction by a drive mechanism (not shown) provided in the main body unit 27! / ヽ (that is, openable and closable). The loading / unloading mechanism 24 is controlled by the main controller 20.

[0137] The configuration and the like of the other parts are the same as those of the first embodiment. Therefore, also in the exposure apparatus of the second embodiment, the exposure operation and the measurement operation are performed in the same sequence as in the first embodiment.

[0138] In the second embodiment, as in the case of the first embodiment, the difference between the deterioration of the water-repellent coat and the change in the measurement results of various measuring instruments provided in the measurement table MTB 'is determined by an experiment in advance. Based on the relationship, the measured values of various measuring instruments immediately before the water-repellent coat is degraded are obtained, and the boundary value at which the measured results of the various measuring instruments exceed the allowable value is stored as a threshold in the memory MEM. Then, when measurement is performed using the measurement table MTB ', the main controller 20 compares the measurement result with the threshold value stored in the memory MEM to determine when the plate 101' is to be replaced.ゝ Judge whether or not. That is, in the second embodiment, a detection device that includes the main control device 20 and the memory MEM to detect the arrival of the replacement time of the plate 101 ′ is configured.

[0139] Further, the detection of the replacement time of the plate 101 may be performed using the other methods described in the first embodiment.

[0140] In any case, when the main controller 20 detects the replacement time of the plate 101 '(determines that the replacement time has arrived), the main controller 20 displays the arrival of the replacement time on the display DIS, and issues an instruction by the operator. wait. Alternatively, when the replacement time of plate 101 'is detected (it is determined that the replacement time has come), main controller 20 displays the arrival of the replacement time on display DIS. At the same time, the plate 101 is replaced as follows.

[0141] That is, after moving the loading / unloading mechanism 24 to the position shown in Fig. 11, the main control device 20 drives the main body 27 downward, and in the state where the hand parts 25a, 25b are open, the hook part 26a, 26b, 26c are also inserted into the grooves 21a, 21b, 21c with an upward force. Then, the main control device 20 closes the hand units 25a and 25b by a predetermined amount via the drive mechanism in the main body unit 27. As a result, the hand 25a is driven to the −X side, the hand 25b is driven to the + X side, and the hook 26a of the node 25a, the hooks 26b, 26c of the node 25b, and the force ^ plate 101 ' Each underneath; ^ come to stand. FIG. 12 shows the state at this time. At this time, the hook portions 26b and 26c are not in contact with the X-side end surface of the plate 101.

[0142] Then, in the state of Fig. 12, the main controller 20 stops the vacuum check of the measurement table main body 159, releases the vacuum suction of the plate 101 ', and moves the main body 27 in the + Z direction. The plate 101 'is lifted by the hooks 26a-26c. After that, the main controller 20 drives the main body 27 up to a predetermined height, and then drives the main unit 27 to the Y side to transfer the plate 101 'to a transport system (not shown). Thereby, the plate 101 'is carried out of the exposure apparatus by the transport system, and a new plate 101' is transported to a predetermined position inside the exposure apparatus by the transport system, and stands by at that position. It is delivered to the node portions 25a and 25b of the loading / unloading mechanism 24.

Thereafter, main controller 20 carries in a new plate 101 ′ force measurement table main body 159 by performing an operation reverse to the above. However, when carrying in the new plate 101 ′, the main controller 20 presses the + X side end face or the like of the new plate 101 ′ against a positioning pin (not shown) provided on the measurement table main body 159. Perform rough positioning by using a similar method. Then, after the positioning is completed, the main controller 20 turns on a vacuum chuck (not shown) and suction-holds a new plate 101 ′ on the measurement table main body 159.

In this case, since the end surface of the plate 101 ′ is mirror-finished as described above, even if the plate 101 ′ is roughly positioned as described above, In various measurements using the stage MST ', the position of the plate 101' can be accurately measured using an interferometer. Measurement can be performed with high accuracy even after plate exchange.

As described above, according to the exposure apparatus of the second embodiment, the time immediately before the measurement accuracy of various measuring instruments on the measurement table MTB ′ starts to decrease is determined in advance by an experiment or the like. Is set in advance as the replacement time of the plate 101, and the main controller 20 as the detecting device replaces the plate 101 'when the replacement time is detected. Plates can be replaced at an optimal time before the measurement accuracy of various measuring instruments decreases. That is, it is possible to maintain the measurement accuracy of the exposure-related measurement by the various measuring devices on the measurement table MTB 'with high accuracy, and to minimize the frequency of plate replacement. Therefore, the exposure accuracy can be maintained at a high level over a long period of time, and it is possible to effectively prevent a decrease in the operation efficiency of the apparatus due to an increase in downtime due to plate replacement.

[0146] In the second embodiment, the plate 101 'has two mirror-finished end faces. Therefore, when the plate 101' is replaced with a new one, the plate after replacement is replaced with a new one. Even if the plate is roughly positioned, the position of the plate can be accurately measured using the interferometers 16 and 46 via the mirror-finished end surface of the plate. Therefore, even if the plate is roughly positioned at the time of replacement, it is possible to accurately position the measurement table WTB that constitutes the measurement unit at the desired position at the time of measurement. In this respect as well, it is possible to effectively prevent a decrease in device operation efficiency due to an increase in downtime due to replacement.

[0147] Also in the exposure apparatus of the second embodiment, the liquid immersion exposure is performed, so that the pattern of the reticle R can be accurately transferred onto the wafer.

[0148] In the second embodiment, the force of the plate 101 'is assumed to be exchangeable. The present invention is not limited to this. The measurement unit including the plate (the measurement unit of the second embodiment) It suffices if at least a part of the table is configured to be replaceable.

[0149] In the second embodiment, in order to make rough positioning sufficient when replacing the plate 101 ', the end face of the plate 101' is made to have a mirror surface. As in the first embodiment, the movable mirrors 117X, 117X are mounted on the measurement table main body 159. Y may be provided.

Further, in the second embodiment, it is sufficient if the plate is replaceable, so the configuration of the other parts of the measurement stage is not limited to the configuration shown in FIG. / ヽ. For example, a measurement stage having a configuration similar to the wafer stage WST in FIG. 2 may be adopted, and the plate included in the measurement stage may be configured to be exchangeable.

[0151] In the second embodiment, the case where the carry-in / out mechanism 24 shown in Fig. 11 is employed as a mechanism for replacing the plate 101 'has been described. However, instead of the carry-in / out mechanism 24, a wafer loader is used. For example, a robot used for such a purpose may be adopted as the carrying-in / out mechanism. In this case, a configuration may be adopted in which the ends of the plate protrude on both sides in the X-axis direction of the measurement tables ΜΤΒ and ロボット, and the lower force plate may be lifted by the arm of the robot to exchange the plate. A vertical movement mechanism for raising the plate from the measurement table body 159 by a predetermined height is provided on the measurement table MTB ', and with the plate lifted by the vertical movement mechanism, the robot arm is inserted below the plate. The arm may be lifted to replace the plate.

In each of the above embodiments, the case where the present invention is applied to an immersion exposure apparatus has been described. However, the present invention is not limited to this. As in the second embodiment, at least a part of the measuring unit can be replaced (for example, a replaceable measurement table (or a measurement stage) is provided), and the replaceable plate is replaced in the same manner as in the second embodiment. It is effective to provide and mirror-finish the end surface of the plate, and to provide a detection device for detecting the replacement time of at least a part of the measurement unit including the plate. In this case, it is not necessary to apply a water-repellent coat to the plate, but by replacing a part of the measurement unit including the plate, various measurement accuracy decreases due to deterioration of the plate due to irradiation of exposure light of high energy. Is a force that can effectively prevent

In each of the above embodiments, a measurement stage constituting a measurement unit having measurement tables ΜΤΒ and MTB ′ is provided separately from wafer stage WST. It may be provided. In this case, at least a partial force including the plate of the measurement unit constituting the measurement unit should be detachable (replaceable) from the wafer stage WST! [0154] In each of the above embodiments, the case where the stage apparatus includes one wafer stage and one measurement stage has been described. However, the present invention is not limited to this. In order to do this, it is good to provide multiple uenos and stages.

[0155] In each of the above embodiments, ultrapure water (water) is used as the liquid, but it is a matter of course that the present invention is not limited to this. As the liquid, a liquid which is chemically stable and has a high transmittance of the illumination light IL and which is safe, for example, a fluorine-based inert liquid may be used. As the fluorine-based inert liquid, for example, Fluorinert (trade name of Threehem, USA) can be used. This fluorine-based inert liquid is also excellent in the cooling effect. In addition, a liquid that has transparency to the illuminating light IL and a refractive index as high as possible and that is stable against the photoresist applied to the surface of the projection optical system wafer (for example, cedar oil) should be used. Can also be used. Also, F

If a laser is used as the light source, Fomblin oil may be selected.

[0156] In each of the above embodiments, the collected liquid may be reused. In this case, a filter for removing impurities from the collected liquid is provided in the liquid collection device, the collection pipe, or the like. It is desirable to keep.

[0157] In each of the above embodiments, the force at which the optical element closest to the image plane of the projection optical system PL is the front lens 91 is not limited to a lens. An optical plate (parallel plane plate or the like) used for adjusting the optical characteristics such as aberration (spherical aberration, coma aberration, etc.) may be used, or a simple cover glass may be used. The optical element closest to the image plane of the projection optical system PL (the tip lens 91 in each of the above embodiments) is a liquid (due to scattering particles generated from the resist by irradiation of the illumination light IL or adhesion of impurities in the liquid, etc.). In the above embodiments, the surface may be soiled by contact with water. For this reason, the optical element may be detachably (exchangeably) fixed to the lowermost part of the lens barrel 40, and may be periodically replaced.

[0158] In such a case, if the optical element that comes into contact with the liquid is a lens, the cost of the replacement part and the time required for the replacement become longer, which increases the maintenance cost (running cost) and the throughput. Causes a decline. Therefore, optical elements that come into contact with liquid For example, a parallel flat plate that is less expensive than the lens 91 may be used.

[0159] In each of the above embodiments, the case where the present invention is applied to a scanning exposure apparatus such as a step-and-scan method has been described. However, the scope of the present invention is not limited to this. Of course. That is, the present invention can be applied to a step-and-repeat type projection exposure apparatus, a step-and-stitch type exposure apparatus, or a proximity type exposure apparatus.

The use of the exposure apparatus is not limited to the exposure apparatus for semiconductor manufacturing. For example, an exposure apparatus for a liquid crystal for transferring a liquid crystal display element pattern onto a square glass plate, an organic EL, a thin film magnetic head Also, it can be widely applied to an exposure device for manufacturing an imaging device (CCD, etc.), a micromachine, a DNA chip, and the like. In addition, glass substrates or silicon wafers are used to manufacture reticles or masks used in light exposure equipment that can be used only with micro devices such as semiconductor devices, EUV exposure equipment, X-ray exposure equipment, and electron beam exposure equipment. The present invention can also be applied to an exposure apparatus that transfers a circuit pattern to a substrate.

The light source of the exposure apparatus of each of the above embodiments is not limited to an ArF excimer laser, but a KrF excimer laser (output wavelength 248 nm), an F laser (output wavelength 157 nm), and an Ar laser (output laser).

2 2 power wavelength 126 nm), and pulsed laser light source such as a Kr laser (output wavelength 146 nm), _8-wire (

2

It is also possible to use an ultra-high pressure mercury lamp that emits bright lines such as 436 nm wavelength and i-line (365 nm wavelength). In addition, a harmonic generation device of a YAG laser can be used. In addition, a DFB semiconductor laser or a fiber laser is used to amplify a single-wavelength laser beam in the infrared or visible range that is oscillated by, for example, a fiber amplifier doped with erbium (or both erbium and ytterbium), and to use nonlinear optical optics. It is also possible to use harmonics that have been wavelength-converted into ultraviolet light using a crystal. In addition, the projection optical system is not limited to the reduction system, but can be the same magnification and magnification system.

In each of the above embodiments, it goes without saying that the illumination light IL of the exposure apparatus is not limited to light having a wavelength of 100 nm or more, and light having a wavelength of less than 100 nm may be used. For example, in recent years, in order to expose a pattern of 70 nm or less, EUV (Extreme Ultraviolet) light in a soft X-ray region (for example, a wavelength range of 5 to 15 nm) is generated using a SOR or a plasma laser as a light source, and the exposure wavelength All-reflection reduction optics designed under (eg 13.5nm) An EUV exposure apparatus using a system and a reflective mask is being developed. In this apparatus, a configuration in which scan exposure is performed by synchronously scanning the mask and the wafer using arc illumination can be considered.

In the semiconductor device, a step of designing the function and performance of the device, a step of manufacturing a reticle based on this design step, a step of manufacturing a wafer from a silicon material, The lithography step to transfer the pattern formed on the mask to the resist (photosensitive agent) coated wafer by the exposure equipment of the above, the device assembling step (including the dicing step, the bonding step, the knocking step), the inspection step, etc. It is manufactured through In this case, since the exposure apparatus of each of the above embodiments is used in the lithography step, highly accurate exposure can be realized for a long time. Therefore, the productivity of a highly integrated microdevice on which a fine pattern is formed can be improved.

Industrial applicability

[0164] As described above, the exposure apparatus, the exposure method, and the device manufacturing method of the present invention are suitable for manufacturing electronic devices such as semiconductor elements (integrated circuits) and liquid crystal display elements.

Claims

The scope of the claims

[1] An exposure apparatus for exposing a substrate via a projection optical system,

A substrate stage on which the substrate can be mounted and movable;

A measurement unit that has a plate to which liquid is supplied, and performs measurement related to the exposure via the projection optical system and the liquid.

An exposure apparatus, wherein at least a part including the plate constituting the measuring unit is configured to be replaceable.

[2] In the exposure apparatus according to claim 1,

The measurement unit includes a measurement unit in which at least a part is provided on a part of the substrate stage, and some constituent members including at least the plate constituting the measurement unit are detachable from the substrate stage. An exposure apparatus, wherein the exposure apparatus is attached to a camera.

[3] The exposure apparatus according to claim 1,

The exposure apparatus according to claim 1, wherein the measurement unit includes a measurement stage main body that is movable in a two-dimensional plane independently of the substrate stage, and a measurement table main body that holds the plate.

[4] In the exposure apparatus according to claim 3,

The exposure apparatus according to claim 1, wherein the plate is held detachably from the main body of the measurement table.

[5] The exposure apparatus according to claim 4,

An exposure apparatus, further comprising a leveling table mounted on the measurement stage main body, wherein the measurement table main body is supported movably on the leveling table.

[6] The exposure apparatus according to claim 5,

The leveling table can be driven in directions of six degrees of freedom,

An exposure apparatus, wherein the measurement table body is drivable in three directions of freedom within a horizontal plane.

[7] The exposure apparatus according to claim 3, An exposure apparatus comprising: a self-weight compensation mechanism that compensates for the self-weight of the measurement table main body.

[8] The exposure apparatus according to claim 1,

At least one reference mark and at least one measurement pattern are formed on the plate,

An exposure apparatus, wherein the measurement unit includes a light receiving system that receives exposure light applied to the plate via the projection optical system via the measurement pattern.

[9] The exposure apparatus according to claim 8,

A plurality of types of measurement patterns are formed on the plate,

An exposure apparatus, wherein the measurement unit has a plurality of the light receiving systems corresponding to the measurement patterns.

[10] The exposure apparatus according to claim 9,

The plurality of types of measurement patterns include at least one of an aerial image measurement aperture pattern, an illumination unevenness measurement pinhole aperture pattern, an illuminance measurement aperture pattern, and a wavefront aberration measurement aperture pattern. Exposure equipment.

[11] The exposure apparatus according to claim 1,

An exposure apparatus further comprising at least one substrate stage different from the substrate stage on which the substrate is mounted.

[12] The exposure apparatus according to claim 1,

An exposure apparatus, further comprising: a control device that executes the measurement by the measurement unit in accordance with a substrate exchange time on the substrate stage.

[13] The exposure apparatus according to claim 12, wherein

An exposure apparatus, wherein the control device executes a specific type of measurement a plurality of times in accordance with the substrate replacement time.

[14] An exposure apparatus for exposing a substrate via a projection optical system,

A substrate stage on which the substrate can be mounted and movable;

At least one end face having a mirror-finished plate, and a measurement unit that performs measurement related to the exposure via the projection optical system; An exposure apparatus, wherein at least a part including the plate constituting the measuring unit is configured to be replaceable.

[15] The exposure apparatus according to claim 14,

[16] The exposure apparatus according to claim 14,

[17] The exposure apparatus according to claim 16, wherein

[18] The exposure apparatus according to claim 17,

[19] The exposure apparatus according to claim 18, wherein

The leveling table can be driven in directions of six degrees of freedom,

[20] The exposure apparatus according to claim 17,

An exposure apparatus comprising: a self-weight compensation mechanism that compensates for the self-weight of the measurement table main body.

[21] The exposure apparatus according to claim 14,

At least one reference mark and at least one measurement pattern are formed on the plate, An exposure apparatus, wherein the measurement unit includes a light receiving system that receives exposure light applied to the plate via the projection optical system via the measurement pattern.

[22] The exposure apparatus according to claim 21,

A plurality of types of measurement patterns are formed on the plate,

[23] The exposure apparatus according to claim 22, wherein

The plurality of types of measurement patterns include at least one of an aerial image measurement aperture pattern, illumination unevenness measurement pinhole aperture pattern, illuminance measurement aperture pattern, and wavefront aberration measurement aperture pattern. Exposure equipment.

[24] The exposure apparatus according to claim 14,

An exposure apparatus further comprising at least one substrate stage other than the substrate stage on which the substrate is mounted.

[25] The exposure apparatus according to claim 14,

[26] The exposure apparatus according to claim 25,

[27] An exposure apparatus for exposing a substrate via a projection optical system,

A substrate stage on which the substrate can be mounted and movable;

A measurement unit having an exchangeable plate and performing measurement related to the exposure via the projection optical system;

An exposure device, comprising: a detection device that detects a time at which the plate is replaced.

[28] The exposure apparatus according to claim 27,

[29] The exposure apparatus according to claim 28,

A plurality of types of measurement patterns are formed on the plate,

[30] The exposure apparatus according to claim 29,

[31] The exposure apparatus according to claim 27,

[32] The exposure apparatus according to claim 27,

[33] The exposure apparatus according to claim 32,

[34] A device manufacturing method including a lithographic step of transferring a device pattern onto a substrate by using the exposure apparatus according to any one of the above aspects.

[35] An exposure method for exposing a substrate, comprising:

Exchanging at least a part of the measuring unit that performs the measurement related to the exposure through the plate to which the liquid is supplied, including the plate;

Performing the measurement related to the exposure using the measurement unit after the replacement, and exposing the substrate by reflecting the measurement result.

[36] An exposure method for exposing a substrate, comprising:

The exposure measurement is performed via at least one mirror-finished plate. Replacing at least a part including the plate among the measurement units to be performed; and measuring the position of the plate after the exchange via the end face, and performing the measurement using the measurement unit;

Exposing the substrate while reflecting the measurement result.

An exposure method for exposing a substrate, comprising:

Performing the measurement using a measurement unit that performs measurement related to the exposure via a plate;

Detecting a replacement time of the plate and replacing the plate;

Exposing the substrate while reflecting the measurement result.