WO2005063444A1

WO2005063444A1 - Geinder

Info

Publication number: WO2005063444A1
Application number: PCT/JP2003/016719
Authority: WO
Inventors: Jun Ujike
Original assignee: Ujike Co., Ltd.
Priority date: 2003-12-25
Filing date: 2003-12-25
Publication date: 2005-07-14
Also published as: CN1886233A; EP1698434A4; EP1698434A1; AU2003292618A1

Abstract

A grinder (1) comprising a resilient plate (2) having one side bonded with the back side of an abrasive cloth (3) and the other side provided with a means (5) being secured to the rotary shaft of a rotary grinder, characterized in that longitudinal grooves (7a) and lateral grooves (7b) are made in a lattice from in the surface of the abrasive cloth (3) on the side abutting against an object to be ground.

Description

Specification

Polishing machine technical field

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing machine which is used by being attached to a rotating shaft of a rotary polishing machine when polishing or polishing a metal or other processed surface or painted surface.

Background art

With respect to a polishing machine used by being attached to a rotating shaft of a rotary polishing device, conventionally, a back surface of a polishing cloth is fixed to one surface of an elastic plate, and a rotating shaft of the rotary polishing device is fixed to the other surface of the elastic plate. There has been proposed a polishing machine which is provided with a fixing means, and which makes the surface of the polishing cloth abut against an object to be polished for polishing. In such a polishing machine, the outer peripheral portion can be brought into contact with the surface of the polished material, the outer peripheral portion having the highest linear velocity can be effectively used for polishing, and replacement can be easily performed when it becomes dirty.

In such a conventionally known polishing machine, there has been proposed a form in which a surface of a polishing cloth in contact with an object to be polished is formed by implanting a fiber of a predetermined length on a base cloth. Application for new model registration (1992 application publication No. 927669). In this conventional technique, a plurality of rows of grooves extending in a predetermined direction, for example, a vertical direction, are formed at predetermined intervals on a surface of the polishing cloth that comes into contact with an object to be polished.

In the polishing operation, paper polishing is performed using a suitable compound, liquid agent and paper such as water-resistant paper, and then cloth polishing is performed using a fiber such as wool buff, and then using a sponge buff. In some cases, final polishing may be performed by sponge polishing. Here, the sponge polishing performed using a sponge buff is a finish polishing that erases the left-hand edge of the cloth when polishing the cloth.

The polishing plate having a configuration in which the back surface of the polishing cloth is fixed to one surface side of the elastic plate and the surface of the polishing cloth is brought into contact with the surface of the object to be polished may be used for the above-described cloth polishing. After this cloth polishing, the puff left on the surface (polishing surface) of the object to be polished is finally finished by sponge polishing.

However, as described above, in a conventional polishing machine having a plurality of rows of grooves extending in a predetermined direction at a predetermined width, for example, a vertical direction, the plurality of rows of grooves are ground during polishing. Considering the possible effects on the polished surface, there was room for further improvement.

After the above-described cloth polishing process using a conventional polishing machine, sponge polishing is not easily performed to completely remove puffs from the polished surface. Therefore, if it is possible to provide a polishing machine that is less likely to have a puff on the polished surface when the cloth is polished using the polishing machine, a sufficient finish can be easily obtained by the subsequent sponge polishing process.

Disclosure of the invention

The present invention overcomes the above-mentioned problems that existed in a conventional polishing machine, fixes the back surface of a polishing cloth to one surface of an elastic plate, and connects a rotating shaft of a rotary polishing device to the other surface of the elastic plate. A polishing means for polishing the polishing cloth by bringing the surface of the polishing cloth into contact with the polishing surface of the object to be polished. When the polishing disk is used for polishing a cloth, the polishing surface is hardly buffed. The purpose is to provide a polishing board.

When such a polishing machine is used for the above-described cloth polishing, a plurality of rows of grooves extending in a predetermined direction, for example, a longitudinal direction at predetermined intervals, are provided on the surface of the polishing machine in contact with an object to be polished. In the conventional polishing machine in a form in which the grooves are formed, there are places where the plurality of rows of grooves are substantially perpendicular to the rotation direction of the polishing machine. At this point, the “escape” of the liquid or compound used during polishing is formed only in the negative direction. Focusing on this point, the inventor of the present application proposed that the vertical grooves and the horizontal grooves intersect in a grid pattern so that the “escape” of the liquid agent / compound is always formed in four directions during rotation of the polishing machine. did . In other words, by allowing the liquid agent compound to escape in both the vertical and horizontal grooves during rotation of the polishing machine, puffs generated when the polishing machine of the above-described embodiment is used for cloth polishing are reduced. In addition, the time required for subsequent polishing, such as sponge polishing, has been reduced.

In other words, the polishing machine of the present invention is a polishing machine comprising: a back surface of a polishing cloth fixed to one surface of an elastic plate; and a fixing means to a rotating shaft of a rotary polishing device provided on the other surface of the elastic plate. Further, vertical grooves and horizontal grooves are provided in a grid pattern on the surface of the polishing cloth which is in contact with the object to be polished.

The elastic plate that constitutes the polishing board of the present invention reduces the influence of irregularities on the surface of the polishing object by reducing the force of the polishing operator, operating the polishing device (rotary polishing machine), and reducing the surface of the polishing cloth. It is desirable that the material be brought into contact with the polishing surface with a uniform pressure. Therefore, is the elastic plate made of a conventionally known elastic material such as sponge or rubber material? )be able to. The thickness and shape can also be determined as appropriate. However, since the surface (polished surface) of the object to be polished is polished by rotating motion, a disk shape is generally used.

For the polishing cloth, a cloth material suitable for polishing can be appropriately selected according to the purpose of polishing and the purpose of use, such as the degree of finishing.For example, a brushed material or the like is adopted, and vertical grooves and horizontal grooves are formed on the surface of the cloth. It can be provided in a shape.

Further, fibers can be implanted in a portion of the surface of the polishing cloth surrounded by the vertical grooves and the horizontal grooves. When a fiber is implanted in a portion surrounded by the vertical groove and the horizontal groove, the material of the fiber, for example, fiber such as wool, and the length of the fiber can be selected according to the purpose and application of polishing. In addition, when the fibers are planted, the planting density and the widths of the vertical grooves and the horizontal grooves can be appropriately changed.

The provision of vertical and horizontal grooves in a lattice pattern on the surface of the polishing cloth that is in contact with the object to be polished is because grooves in a direction substantially coincident with the rotational direction (tangential direction) in each part of the polishing machine that rotates during polishing. The purpose is to provide. If grooves are formed in the direction of rotation (tangential direction) on the surface of the polishing cloth of the polishing machine in this way, the liquid agent accumulated in the grooves will flow properly along the grooves, and the pressure applied at the grooves will be reduced. It is moderately relaxed and can be polished without making puffs on the surface (polished surface) of the object to be polished.

The polishing machine of the present invention is mounted on the tip of the rotating shaft of a rotary polishing machine. The polishing work is performed by rotating the polishing machine while the surface side of the polishing machine (the surface side of the polishing cloth) is in contact with the object to be polished. It is necessary that it does not easily come off the tip of the rotating shaft of the motor. Also, it is convenient if the polishing machine can be easily attached to and detached from the tip of the rotating shaft of the rotary polishing machine so that it can be replaced according to the purpose and application of polishing. From such a viewpoint, a velvet fastener material can be used as a means for fixing to the rotating shaft of the rotary polishing device provided on the other surface side of the elastic plate. Since the velvet fastener material is a pair of male and female fitting with each other, one of the velvet fastener materials is attached to the other surface of the elastic plate, and the other is attached to the tip of the rotating shaft of the rotary polishing device. The polishing machine of the present invention may be provided with a concave portion at the center thereof, which is depressed from the surface contacting the object to be polished toward the side attached to the tip of the rotating shaft of the rotary polishing machine.

When the phenomenon in which the liquid material used for polishing and the compound gather near the center of the rotating plate due to the rotation of the polishing machine occurs, the concave portion escapes so that the liquid material and the compound gathered near the center do not become thick. It is stored near the center. When liquids and compounds gather near the center of the polishing machine, the distribution of these compounds becomes uneven, and the degree of polishing differs between the center and the outer periphery of the polishing machine, resulting in uneven polishing. There is. In order to avoid this, a recess is provided in the vicinity of the center of the polishing machine for storing the liquid agent and the compound gathered.

According to the present invention, a vertical groove and a horizontal groove are formed on the surface of the polishing cloth provided on the polishing object surface side of the polishing board, which is in contact with the polishing object surface (polishing surface), that is, on the polishing cloth surface. Since the polishing liquid is used, there is an effect that the polishing liquid / compound goes around the vertical groove or the horizontal groove and escapes when the polishing disk is rotated. Thereby, there is an effect that a puff is hardly formed in a cloth polishing process performed using the polishing machine of the present invention.

Also, since the fixing means to the polishing apparatus is made of a velvet fastener material, the polishing machines for coarse and fine can be easily replaced according to the application.

Further, since a concave portion capable of accommodating the liquid agent compound is provided in the central portion of the polishing machine, it is possible to prevent polishing unevenness or the like caused by the liquid agent compound gathering near the center. Brief description of the drawings ''

FIG. 1 is a plan view of a surface of a polishing machine according to the present invention, which is in contact with an object to be polished.

FIG. 2 is a front cross-sectional view showing a surface of the polishing machine shown in FIG.

1

FIG. 3 is a plan view of a surface of the polishing machine shown in FIG. 1 which is fixed to a rotary polishing apparatus. FIG. 4 is an explanatory view for explaining the relationship between the grooves provided in the polishing cloth and the rotating direction of the polishing board. FIG. 4 (a) is an explanatory view of a conventional polishing board having only vertical grooves FIG. 4 (b) is an explanatory view of the embodiment shown in FIG. 1 having a vertical groove and a horizontal groove. BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, the best mode for carrying out the present invention will be described with reference to the accompanying drawings. FIG. 2 is a front cross-sectional view of the polishing machine of the present invention in a state in which a polishing cloth 3 for polishing in contact with the polishing surface (that is, the surface of the object to be polished) is arranged on the upper side, and FIG. FIG. 2 is a plan view of the polishing board of the present invention in a state where a polishing pad 3 that performs polishing while being in contact with a polishing surface (that is, the surface of an object to be polished) is arranged on the upper side.

The polishing disc 1 of the present invention is configured such that a polishing cloth 3 is fixed on one side (an upper side in FIG. 2) of an elastic plate 2 and a velvet fastener 5 is fixed on an other side (a lower side in FIG. 2) with an adhesive. Have been.

The elastic plate 2 has a thickness of about 2 cm and is a disc made of sponge having a trapezoidal cross section as shown in FIG. In addition, a through hole 6 having a diameter of about 3 cm is provided at the center.

The polishing cloth 3 has a base cloth 4 on which wool fibers 8 having a length of about 4 to 6 mm are planted. The polishing cloth 3 has the same flat surface as the lower bottom side (the upper side in FIG. 2) of the elastic plate 2 having a trapezoidal cross section. The planted wool fibers 8, 8 form wool fiber groups 9, 9 defined by vertical grooves 7a and vertical grooves 7b provided in a lattice (FIG. 1). The width of the vertical groove 7a and the horizontal groove 7b is 1.5 mn! The distance between the centers of the adjacent vertical grooves 7a and 7a and the distance between the adjacent horizontal grooves 7b and 7b is about 5mm to 8mm. .

The velvet fastener 5 has the same planar shape as the upper surface side (the lower side in FIG. 2) of the elastic plate 2 having a trapezoidal cross section.

The use of the polishing machine 1 configured as described above will be described.

A rotating plate equipped with one of the velvet fasteners 5 to be paired with the velvet fasteners 5 of the polishing machine 1 is connected to the lower end of the rotating shaft of the rotary polishing device (not shown), and the velvet fasteners 5 are bonded and rotated. Attach the polishing machine 1 to the polishing machine.

Next, a polishing liquid or a compound is applied to the polishing cloth 3, and the polishing plate 1 is rotated to polish the polishing surface.

Here, the relationship between the vertical grooves 7a and the horizontal grooves 7b provided on the surface of the polishing cloth 3 and the rotation direction of the polishing machine 1 will be described with reference to FIG. 4 (b). This will be described in comparison with FIG. 4 (a) for explaining the board. FIG. 4 (a) illustrates, for comparison, the rotation of a conventional polishing machine 10 having only the vertical grooves 15 and no horizontal grooves. Arrows 11 and 12 indicate the rotation direction of the polishing machine 10.

In the portion A surrounded by the ellipse, the vertical groove 15 is substantially parallel to the arrow 11 indicating the rotation direction of the polishing machine 10. For this reason, the polishing liquid / compound flows appropriately along the vertical grooves 15. On the other hand, in the part B surrounded by the ellipse, the vertical groove 15 is substantially perpendicular to the arrow 12 indicating the rotation direction of the polishing machine. For this reason, the polishing liquid or the compound accumulated in the vertical groove 15 may be slightly dragged at the edge of the vertical groove 15, and the polishing surface may be slightly puffed. As described above, in the case of only the flutes 15, puffs remaining on the polished surface increase.

On the other hand, in the polishing machine 1 of the present invention shown in FIG. 4 (b), a vertical groove 7a substantially parallel to the arrow 13 indicating the rotation direction of the polishing machine 1 is formed in a portion C surrounded by an ellipse. There is also a transverse groove 7b which is substantially parallel to the arrow 14 indicating the direction of rotation of the polishing machine 1 in the portion D surrounded by the ellipse. Therefore, there is a groove that is substantially parallel to the rotation direction of the polishing platen 1 on the entire surface of the polishing cloth 3, and the polishing agent or the liquid compound is formed along the vertical groove 7a or the horizontal groove 7b on the entire surface of the polishing cloth 3. Flows moderately.

Note that, on the entire surface of the polishing cloth 3, for example, there are grooves substantially parallel to the rotation direction of the polishing machine 1, such as portions C and D surrounded by ellipses, and at the same time, substantially parallel to the rotation direction of the polishing machine 1. There will be grooves at right angles. FIG. 4 (a) In the conventional polishing machine 10 shown in the figure, as described above, the polishing liquid material and the compound are stored in the vertical grooves 15 which are substantially perpendicular to the rotation direction of the polishing machine 10, and the vertical grooves 1 It is thought that it is slightly dragged at the edge of 5, slightly buffing the polished surface.

However, in the polishing machine 1 of the present invention shown in FIG. 4 (b), the grooves are provided in a grid pattern, and the polishing liquid compound stored in the grooves substantially perpendicular to the rotation direction of the polishing machine 1 is: Immediately, it goes around the groove that is almost parallel to the rotation direction of the polishing machine 1 and escapes. For this reason, it is considered that the polishing liquid / compound is less likely to be dragged at the edge of the groove.

Actually, a polished surface on which cloth polishing was performed using the polishing table 1 of the present invention shown in FIG. 4 (b) and a cloth polishing table using the conventional polishing table 10 shown in FIG. With the polished surface When it was compared, it was confirmed that less buffing was left on the polished surface when polishing was performed using the polishing machine 1.

After polishing using the polishing machine 1, finish polishing is performed using a polishing machine with a finer polishing cloth or a polishing machine made of a sponge material, but the polishing machine 1 is used. Since very few puffs are left in Kenning, the time required for finish polishing can be reduced. As a result, it was possible to shorten the work time of the daughter and reduce the labor.

In addition, since the polishing machine 1 is provided with the through-holes 6, the liquid agent and the compound gathered in the center of the polishing machine 1 can be stored in the through-holes 6, so that the distribution of the compound is not uneven and the central portion is not uneven. There is no danger of excessive polishing due to the liquid material and compound collected in the area.

As described above, the preferred embodiments of the present invention have been described with reference to the accompanying drawings. However, the present invention is not limited to such embodiments, and various modifications may be made within the technical scope understood from the appended claims. It can be changed to a different form.

Claims

The scope of the claims

1. A polishing plate having a back surface side of a polishing cloth fixed to one surface side of an elastic plate and a fixing means to a rotating shaft of a rotary polishing device provided on the other surface side of the elastic plate, wherein the polishing cloth is polished. A polishing machine characterized in that vertical and horizontal grooves are provided in a lattice pattern on the surface which is in contact with an object.

2. The polishing machine according to claim 1, wherein fibers are implanted in a portion of the surface surrounded by the vertical and horizontal grooves.

3. The polishing machine according to claim 1, wherein the fixing means is a velvet fastener material.

4. A concave portion is formed in a central portion of the polishing machine, the concave portion being recessed from a side in contact with an object to be polished to a side fixed to a rotating shaft of a rotary polishing apparatus. 4. The polishing machine according to any one of items 1 to 3.