WO2005053906A1 - Method of manufacturing mirrors from joined mirror blanks, x-y interferometer and method of inspecting wafers - Google Patents

Method of manufacturing mirrors from joined mirror blanks, x-y interferometer and method of inspecting wafers Download PDF

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Publication number
WO2005053906A1
WO2005053906A1 PCT/GB2004/005044 GB2004005044W WO2005053906A1 WO 2005053906 A1 WO2005053906 A1 WO 2005053906A1 GB 2004005044 W GB2004005044 W GB 2004005044W WO 2005053906 A1 WO2005053906 A1 WO 2005053906A1
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WO
WIPO (PCT)
Prior art keywords
mirrors
blocks
mirror
glass
interferometer
Prior art date
Application number
PCT/GB2004/005044
Other languages
French (fr)
Inventor
David Roberts Mcmurtry
Original Assignee
Renishaw Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renishaw Plc filed Critical Renishaw Plc
Publication of WO2005053906A1 publication Critical patent/WO2005053906A1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
    • B24B13/0018—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor for plane optical surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Definitions

  • This invention relates to a method of manufacture of mirrors and in particular thin mirrors for use in interferometry.
  • a mirror which is optically flat for the length of a stage in one direction is required.
  • a large cross-sectional area of glass is required.
  • .A certain width is required to enable the mirror surface to be polished to the required accuracy and a large depth is required to stabilise the block.
  • a cross-section of the order of 25mm x 25mm is necessary however the closer to a 10:1 or preferably an 8:1 length to width ratio the better.
  • a further issue is that for x-y stage interferometry, where a laser beam is reflected off the mirror, typically a glass block of only 300mm x 25mm x 6mm is required. This allows for alignment tolerances and bevel width for a 3mm diameter laser beam. So, not only is there an excess of glass which increases cost, weight etc but, there is also a limitation that more expensive glass must be used, which may not be required by the optical laser interferometer requirements in the system.
  • the present invention provides a method of manufacturing mirrors comprising the steps of: producing at least two blocks of glass; joining the at least two blocks of glass together to produce a combined block whereby one surface of the combined block comprises a plane and each of the at least two blocks of glass has a surface lying in that plane which surface additionally comprises the mirror surface; polishing the mirror surface; coating the mirror surface; and separating the combined block into the at least two blocks of glass whereby the steps of coating and separating can be carried out in either order.
  • the at least two blocks of glass may be 6mm wide wherein at least five blocks of glass are joined to provide sufficient surface area for polishing to the required accuracy.
  • the invention reduces the volume of glass used and, as multiple blocks are polished at one time, cost and manufacturing times are also reduced.
  • the invention provides an x-y interferometer comprising at least two mirrors manufactured by producing at least two blocks of glass; joining the at least two blocks of glass together to produce a combined block whereby one surface of the combined block comprises a plane and each of the at least two blocks of glass has a surface lying in that plane which surface additionally comprises the mirror surface; polishing the mirror surface; coating the mirror surface; and separating the combined block into the at least two blocks of glass whereby the steps of coating and separating can be carried out in either order, whereby at least one mirror is used to measure displacement along the x and y axes respectively.
  • the invention provides an x-y interferometer comprising at least two mirrors manufactured by producing at least two blocks of glass; joining the at least two blocks of glass together to produce a combined block whereby one surface of the combined block comprises a plane and each of the at least two blocks of glass has a surface lying in that plane which surface additionally comprises the mirror surface; polishing the mirror surface; coating the mirror surface; and separating the combined block into the at least two blocks of glass whereby the steps of coating and separating can be carried out in either order, whereby two of the mirrors are used to measure pitch of an object said two mirrors being vertically displaced with respect to one another.
  • the invention provides a method of manufacturing or inspecting semi-conductor wafers comprising an x-y interferometer having at least two mirrors manufactured by producing at least two blocks of glass; joining the at least two blocks of glass together to produce a combined block whereby one surface of the combined block comprises a plane and each of the at least two blocks of glass has a surface lying in that plane which surface additionally comprises the mirror surface; polishing the mirror surface; coating the mirror surface; and separating the combined block into the at least two blocks of glass whereby the steps of coating and separating can be carried out in either order, whereby at least one mirror is used to measure displacement along the x and y axes respectively.
  • Fig 1 shows schematically, steps involved to produce mirrors according to the invention
  • Fig 2 shows an x-y stage for use in x-y interferometry using mirrors manufactured according to the invention
  • Fig 3 shows schematically, measurement of pitch in x-y interferometry.
  • Fig 1 shows the steps involved to produce mirrors according to the invention. Initially, five blocks of glass are cut from a block of substrate. These blocks 10a, 10b, 10c, lOd, lOe are joined 10 to produce a composite block having a common surface 12 which will eventually comprise the mirror surface. The common surface is polished 20, then an optical coating 32 is applied to the polished surface followed by separation 40 of the coated composite block into individual mirrors 40a, 40b, 40c, 40d, 40e.
  • a number of blocks of glass are first cut from a block of substrate. If the mirrors are for x-y stage laser interferometry then they can be cut from float glass of ⁇ mm depth (to meet optical requirements) or an alternative mirror substrate may be used such as fused silica, borosillicate glass (borofloat) , ROBAX or ZERODUR which have a low coefficient of thermal expansion, if this is a requirement of the mirror.
  • a typical length for a x-y stage laser interferometry mirror is 300-400mm.
  • the blocks are joined 10 by for example by using a suitable material (for example wax, plaster of Paris, glues) , wringing or even clamping them together. Wringing is where two surfaces are placed together and twisted producing adhesion between those surfaces.
  • the joined surface is adjacent the surface 12 which will be polished to produce the mirror surface so it is important the blocks are adhered correctly so the mirror surfaces are all on the same side. It is also important that the mirrors are adhered correctly when it comes to separating the mirrors so there is no significant distortion of the mirror surface on separation.
  • the mirror side of the whole block 12 can be ground and polished 20 by conventional techniques, to produce the required mirror blank surface.
  • the glass may now be optically coated either as a whole block 30 followed by separation 40 into individual blocks 40a, 0b, 0c, 40d, 40e or, the block is separated 50 into individual mirror parts 50a, 50b, 50c, 50d, 50e which are then coated 62 by any conventional process to produce individual mirrors 60a, 60b, 60c, ⁇ Od, ⁇ Oe.
  • Separation is by tapping the joints for wrung blocks or, by immersion in a solvent for example water for wrung blocks or a suitable solvent to break the bonds of any adhesive that has been used.
  • a stage 100 is provided with a first mirror 120 which is used to measure movement along the x-axis and a second mirror 130 which is used to measure movement along the y-axis.
  • Such an x-y stage may be used in the manufacture or inspection of semi-conductor wafers or other objects where precision location is essential for the production of articles.
  • pitch can be measured by mounting two mirrors 200,210 one above the other with the required separation 220 on the stage 100. To ensure that the two mirrors are placed such that they are sufficiently parallel to achieve adequate signal strength for interferometry, a pair of co-planar roller bearings mounted in a horizontal plane may be used. The two mirrors are placed with their mirror surfaces resting on the roller bearings.
  • Two spacers 230 are then inserted between the two mirrors such that the centre lines of the two mirrors have the correct separation to give adequate resolution for measuring pitch and glued to the mirrors.
  • the advantage of this combined mirror over the standard single mirror is the reduced mass of the combined mirror, and thus permitting a higher dynamic range of the stage for a given set-up. Thus potentially permitting shorter wafer processing and inspection times.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)

Abstract

A method of manufacturing mirrors is disclosed comprising, producing two blocks of glass (10a,10b), joining the two blocks to produce a combined block whereby one surface (12) of the combined block comprises a plane and each of the two blocks has a surface lying in that plane which surface additionally comprises the mirror surface, polishing (20) the mirror surface, coating (32,62) the mirror surface, and separating (40,50) the combined block into the two blocks of glass where the steps of coating and separating can be carried out in either order. Also disclosed is a method of manufacturing or inspecting semi-conductor wafers and an x-y interferometer whereby in one embodiment at least one mirror (120,130) is used to measure displacement along the x and y axes respectively and, in a further embodiment, two mirrors are used to measure pitch of an object said two mirrors (200,210) being vertically displaced with respect to one another.

Description

METHOD OF MANUFACTURING MIRRORS FROM JOINED MIRROR BLANKS, X-Y INTERFEROMETER AND METHOD OF INSPECTING WAFERS
This invention relates to a method of manufacture of mirrors and in particular thin mirrors for use in interferometry.
For some applications, for example x-y stage interferometers, a mirror which is optically flat for the length of a stage in one direction is required. In order to achieve this by current techniques a large cross-sectional area of glass is required. .A certain width is required to enable the mirror surface to be polished to the required accuracy and a large depth is required to stabilise the block. As an example, for a 300mm long mirror a cross-section of the order of 25mm x 25mm is necessary however the closer to a 10:1 or preferably an 8:1 length to width ratio the better.
A further issue, is that for x-y stage interferometry, where a laser beam is reflected off the mirror, typically a glass block of only 300mm x 25mm x 6mm is required. This allows for alignment tolerances and bevel width for a 3mm diameter laser beam. So, not only is there an excess of glass which increases cost, weight etc but, there is also a limitation that more expensive glass must be used, which may not be required by the optical laser interferometer requirements in the system.
Accordingly, the present invention provides a method of manufacturing mirrors comprising the steps of: producing at least two blocks of glass; joining the at least two blocks of glass together to produce a combined block whereby one surface of the combined block comprises a plane and each of the at least two blocks of glass has a surface lying in that plane which surface additionally comprises the mirror surface; polishing the mirror surface; coating the mirror surface; and separating the combined block into the at least two blocks of glass whereby the steps of coating and separating can be carried out in either order.
For x-y stage interferometry, the at least two blocks of glass may be 6mm wide wherein at least five blocks of glass are joined to provide sufficient surface area for polishing to the required accuracy.
The invention reduces the volume of glass used and, as multiple blocks are polished at one time, cost and manufacturing times are also reduced.
According to a second aspect, the invention provides an x-y interferometer comprising at least two mirrors manufactured by producing at least two blocks of glass; joining the at least two blocks of glass together to produce a combined block whereby one surface of the combined block comprises a plane and each of the at least two blocks of glass has a surface lying in that plane which surface additionally comprises the mirror surface; polishing the mirror surface; coating the mirror surface; and separating the combined block into the at least two blocks of glass whereby the steps of coating and separating can be carried out in either order, whereby at least one mirror is used to measure displacement along the x and y axes respectively.
According to a third aspect, the invention provides an x-y interferometer comprising at least two mirrors manufactured by producing at least two blocks of glass; joining the at least two blocks of glass together to produce a combined block whereby one surface of the combined block comprises a plane and each of the at least two blocks of glass has a surface lying in that plane which surface additionally comprises the mirror surface; polishing the mirror surface; coating the mirror surface; and separating the combined block into the at least two blocks of glass whereby the steps of coating and separating can be carried out in either order, whereby two of the mirrors are used to measure pitch of an object said two mirrors being vertically displaced with respect to one another.
According to a fourth aspect, the invention provides a method of manufacturing or inspecting semi-conductor wafers comprising an x-y interferometer having at least two mirrors manufactured by producing at least two blocks of glass; joining the at least two blocks of glass together to produce a combined block whereby one surface of the combined block comprises a plane and each of the at least two blocks of glass has a surface lying in that plane which surface additionally comprises the mirror surface; polishing the mirror surface; coating the mirror surface; and separating the combined block into the at least two blocks of glass whereby the steps of coating and separating can be carried out in either order, whereby at least one mirror is used to measure displacement along the x and y axes respectively.
The invention will now be described by way of example with reference to the accompanying drawings, of which: Fig 1 shows schematically, steps involved to produce mirrors according to the invention; Fig 2 shows an x-y stage for use in x-y interferometry using mirrors manufactured according to the invention; and Fig 3 shows schematically, measurement of pitch in x-y interferometry.
Fig 1 shows the steps involved to produce mirrors according to the invention. Initially, five blocks of glass are cut from a block of substrate. These blocks 10a, 10b, 10c, lOd, lOe are joined 10 to produce a composite block having a common surface 12 which will eventually comprise the mirror surface. The common surface is polished 20, then an optical coating 32 is applied to the polished surface followed by separation 40 of the coated composite block into individual mirrors 40a, 40b, 40c, 40d, 40e.
A number of blocks of glass, for example at least five if each block is βmm wide, are first cut from a block of substrate. If the mirrors are for x-y stage laser interferometry then they can be cut from float glass of βmm depth (to meet optical requirements) or an alternative mirror substrate may be used such as fused silica, borosillicate glass (borofloat) , ROBAX or ZERODUR which have a low coefficient of thermal expansion, if this is a requirement of the mirror. A typical length for a x-y stage laser interferometry mirror is 300-400mm.
The blocks are joined 10 by for example by using a suitable material (for example wax, plaster of Paris, glues) , wringing or even clamping them together. Wringing is where two surfaces are placed together and twisted producing adhesion between those surfaces. The joined surface is adjacent the surface 12 which will be polished to produce the mirror surface so it is important the blocks are adhered correctly so the mirror surfaces are all on the same side. It is also important that the mirrors are adhered correctly when it comes to separating the mirrors so there is no significant distortion of the mirror surface on separation.
Once the blocks have been joined 10 together to form a large enough single composite block, the mirror side of the whole block 12 can be ground and polished 20 by conventional techniques, to produce the required mirror blank surface.
The glass may now be optically coated either as a whole block 30 followed by separation 40 into individual blocks 40a, 0b, 0c, 40d, 40e or, the block is separated 50 into individual mirror parts 50a, 50b, 50c, 50d, 50e which are then coated 62 by any conventional process to produce individual mirrors 60a, 60b, 60c, βOd, βOe.
Separation is by tapping the joints for wrung blocks or, by immersion in a solvent for example water for wrung blocks or a suitable solvent to break the bonds of any adhesive that has been used.
Referring now to Fig 2, for x-y stage interferometry, one mirror is required for the measurement of movement in each axis. Conveniently, the mirrors may therefore each be adhered to a side of the stage. A stage 100 is provided with a first mirror 120 which is used to measure movement along the x-axis and a second mirror 130 which is used to measure movement along the y-axis. Such an x-y stage may be used in the manufacture or inspection of semi-conductor wafers or other objects where precision location is essential for the production of articles.
It may be desirable to measure the pitch of the stage. Referring now to Fig 3, to measure pitch requires the beams of an interferometer to be vertically displaced. The traditional method to solve this problem is to use mirrors that are wider (higher) than normal. Thus the traditional mirrors are bulky. Using mirrors according to the invention, pitch can be measured by mounting two mirrors 200,210 one above the other with the required separation 220 on the stage 100. To ensure that the two mirrors are placed such that they are sufficiently parallel to achieve adequate signal strength for interferometry, a pair of co-planar roller bearings mounted in a horizontal plane may be used. The two mirrors are placed with their mirror surfaces resting on the roller bearings. Two spacers 230 are then inserted between the two mirrors such that the centre lines of the two mirrors have the correct separation to give adequate resolution for measuring pitch and glued to the mirrors. The advantage of this combined mirror over the standard single mirror is the reduced mass of the combined mirror, and thus permitting a higher dynamic range of the stage for a given set-up. Thus potentially permitting shorter wafer processing and inspection times.

Claims

1. A method of manufacturing mirrors comprising the steps of: producing at least two blocks of glass (10a, 10b); joining the at least two blocks of glass together to produce a combined block whereby one surface (12) of the combined block comprises a plane and each of the at least two blocks of glass has a surface lying in tb_at plane which surface additionally comprises the mirror surface; polishing (20) the mirror surface (12) ; coating (32,62) the mirror surface; and separating (40,50) the combined block into the at least two blocks of glass whereby the steps of coating and separating can be carried out in either order.
2. An x-y interferometer comprising at least two mirrors manufactured according to claim 1 whereby at least one mirror (120,130) is used to measure displacement along the x and y axes respectively.
3. An x-y interferometer comprising at least two mirrors manufactured according to claim 1 whereby two of the mirrors (200,210) are used to measure pitch of an object said two mirrors being vertically displaced with respect to one another.
4. A method of manufacturing or inspecting semi- conductor wafers comprising an x-y interferometer having at least two mirrors manufactured according to claim 1 whereby at least one mirror (120,130) is used to measure displacement along the x and y axes respectively.
PCT/GB2004/005044 2003-12-03 2004-12-01 Method of manufacturing mirrors from joined mirror blanks, x-y interferometer and method of inspecting wafers WO2005053906A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0327945A GB0327945D0 (en) 2003-12-03 2003-12-03 Mirror manufacture
GB0327945.2 2003-12-03

Publications (1)

Publication Number Publication Date
WO2005053906A1 true WO2005053906A1 (en) 2005-06-16

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1925965A1 (en) * 2006-11-24 2008-05-28 Winlight Optics Method for manufacturing optical surfaces for the production of assemblies capable of rearranging one or more light beams

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2394610A (en) * 1943-06-30 1946-02-12 Eastman Kodak Co Apparatus for manufacturing optical prisms
US2408496A (en) * 1941-07-23 1946-10-01 Libbey Owens Ford Glass Co Glass surfacing method and apparatus
WO1991017409A1 (en) * 1990-04-30 1991-11-14 International Business Machines Corporation Two axis plane mirror interferometer
EP0461773A2 (en) * 1990-06-12 1991-12-18 Zygo Corporation Linear pitch, and yaw displacement measuring interferometer
US6147764A (en) * 1998-04-03 2000-11-14 Mitutoyo Corporation Of Kamiyokoba Optical interference profiler having shadow compensation
US20030133125A1 (en) * 2002-01-07 2003-07-17 Canon Kabushiki Kaisha Alignment stage, exposure apparatus, and semiconductor device manufacturing method

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2408496A (en) * 1941-07-23 1946-10-01 Libbey Owens Ford Glass Co Glass surfacing method and apparatus
US2394610A (en) * 1943-06-30 1946-02-12 Eastman Kodak Co Apparatus for manufacturing optical prisms
WO1991017409A1 (en) * 1990-04-30 1991-11-14 International Business Machines Corporation Two axis plane mirror interferometer
EP0461773A2 (en) * 1990-06-12 1991-12-18 Zygo Corporation Linear pitch, and yaw displacement measuring interferometer
US6147764A (en) * 1998-04-03 2000-11-14 Mitutoyo Corporation Of Kamiyokoba Optical interference profiler having shadow compensation
US20030133125A1 (en) * 2002-01-07 2003-07-17 Canon Kabushiki Kaisha Alignment stage, exposure apparatus, and semiconductor device manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1925965A1 (en) * 2006-11-24 2008-05-28 Winlight Optics Method for manufacturing optical surfaces for the production of assemblies capable of rearranging one or more light beams
FR2909190A1 (en) * 2006-11-24 2008-05-30 Winlight Optics Sarl METHOD FOR MANUFACTURING OPTICAL SURFACES FOR MAKING ASSEMBLIES SUITABLE FOR REARRANGING AN OPTICAL (X) BEAM (S).

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