WO2004107055A3 - Ensemble electrodes et son utilisation - Google Patents

Ensemble electrodes et son utilisation Download PDF

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Publication number
WO2004107055A3
WO2004107055A3 PCT/EP2004/005386 EP2004005386W WO2004107055A3 WO 2004107055 A3 WO2004107055 A3 WO 2004107055A3 EP 2004005386 W EP2004005386 W EP 2004005386W WO 2004107055 A3 WO2004107055 A3 WO 2004107055A3
Authority
WO
WIPO (PCT)
Prior art keywords
electrode
optical element
electrode arrangement
charged particles
inert
Prior art date
Application number
PCT/EP2004/005386
Other languages
German (de)
English (en)
Other versions
WO2004107055A2 (fr
Inventor
Frank Stietz
Markus Weiss
Bas Mertens
Marko Wedowski
Original Assignee
Zeiss Carl Smt Ag
Frank Stietz
Markus Weiss
Bas Mertens
Marko Wedowski
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Frank Stietz, Markus Weiss, Bas Mertens, Marko Wedowski filed Critical Zeiss Carl Smt Ag
Publication of WO2004107055A2 publication Critical patent/WO2004107055A2/fr
Publication of WO2004107055A3 publication Critical patent/WO2004107055A3/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)

Abstract

Ensemble électrodes destiné à éloigner des particules chargées, dans lequel un élément optique (1) est connecté en tant que première électrode (10) qui émet des électrons secondaires photoinduits lorsque ledit élément optique est exposé à des rayons ultraviolets extrêmes et / ou à des rayons X mous. Une seconde électrode (20) est placée à un certain écart de la surface exposée aux rayons de l'élément optique, la surface (1a) au moins de la seconde électrode (20) étant constituée d'au moins une matière inerte. L'avantage des matières inertes est que l'efficacité de l'électrode reste constante et qu'aucune matière elle-même n'est expulsée de la surface de l'électrode pendant l'éloignement de particules chargées.
PCT/EP2004/005386 2003-05-30 2004-05-19 Ensemble electrodes et son utilisation WO2004107055A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10324613.4 2003-05-30
DE2003124613 DE10324613A1 (de) 2003-05-30 2003-05-30 Elektrodenanordnung und deren Verwendung

Publications (2)

Publication Number Publication Date
WO2004107055A2 WO2004107055A2 (fr) 2004-12-09
WO2004107055A3 true WO2004107055A3 (fr) 2005-03-03

Family

ID=33441507

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2004/005386 WO2004107055A2 (fr) 2003-05-30 2004-05-19 Ensemble electrodes et son utilisation

Country Status (2)

Country Link
DE (1) DE10324613A1 (fr)
WO (1) WO2004107055A2 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1726993A1 (fr) * 2005-05-24 2006-11-29 Carl Zeiss SMT AG Système optique et procédé destiné au fonctionnement de celui-ci
US7646004B2 (en) 2005-05-24 2010-01-12 Carl Zeiss Smt Ag Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element
DE102010030023A1 (de) 2010-06-14 2011-12-15 Carl Zeiss Smt Gmbh Optisches System
DE102018211498A1 (de) * 2018-07-11 2019-08-01 Carl Zeiss Smt Gmbh Optische Anordnung

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3710125A (en) * 1970-04-29 1973-01-09 Univ Northwestern Secondary emission enhancer for an x-ray image intensifier
EP1182510A1 (fr) * 2000-08-25 2002-02-27 Asm Lithography B.V. Appareil de projection lithographique et dispositif de manipulation de masques
US6642531B1 (en) * 2002-12-23 2003-11-04 Intel Corporation Contamination control on lithography components
EP1411392A1 (fr) * 2002-10-18 2004-04-21 ASML Netherlands B.V. Appareil de projection lithographique

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3710125A (en) * 1970-04-29 1973-01-09 Univ Northwestern Secondary emission enhancer for an x-ray image intensifier
EP1182510A1 (fr) * 2000-08-25 2002-02-27 Asm Lithography B.V. Appareil de projection lithographique et dispositif de manipulation de masques
EP1411392A1 (fr) * 2002-10-18 2004-04-21 ASML Netherlands B.V. Appareil de projection lithographique
US6642531B1 (en) * 2002-12-23 2003-11-04 Intel Corporation Contamination control on lithography components

Also Published As

Publication number Publication date
DE10324613A1 (de) 2004-12-16
WO2004107055A2 (fr) 2004-12-09

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