WO2004099469A3 - High resolution electrolytic lithography, apparatus therefor and resulting products - Google Patents

High resolution electrolytic lithography, apparatus therefor and resulting products Download PDF

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Publication number
WO2004099469A3
WO2004099469A3 PCT/US2004/010489 US2004010489W WO2004099469A3 WO 2004099469 A3 WO2004099469 A3 WO 2004099469A3 US 2004010489 W US2004010489 W US 2004010489W WO 2004099469 A3 WO2004099469 A3 WO 2004099469A3
Authority
WO
WIPO (PCT)
Prior art keywords
lithography
high resolution
apparatus therefor
resulting products
substrate
Prior art date
Application number
PCT/US2004/010489
Other languages
French (fr)
Other versions
WO2004099469A2 (en
Inventor
Sungho Jin
Original Assignee
Univ California
Sungho Jin
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ California, Sungho Jin filed Critical Univ California
Priority to US10/552,197 priority Critical patent/US20060249391A1/en
Publication of WO2004099469A2 publication Critical patent/WO2004099469A2/en
Publication of WO2004099469A3 publication Critical patent/WO2004099469A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/14—Etching locally
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Abstract

In accordance with the invention, a surface of a substrate is patterned by the steps of providing the substrate, covering the surface with electrolyte, and disposing at least one nanoscale electrode in the electrolyte adjacent the surface. A current is then applied between the electrode and the substrate to electrolyically deposit material on or remove material from the surface. The material is deposited or removed in a pattern dependent on the pattern, movement and shape of the nanoscale electrodes. Apparatus for this process and novel products therefrom are also described.
PCT/US2004/010489 2003-04-09 2004-04-06 High resolution electrolytic lithography, apparatus therefor and resulting products WO2004099469A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US10/552,197 US20060249391A1 (en) 2003-04-09 2004-04-06 High resolution electrolytic lithography, apparatus therefor and resulting products

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US46147703P 2003-04-09 2003-04-09
US60/461,477 2003-04-09

Publications (2)

Publication Number Publication Date
WO2004099469A2 WO2004099469A2 (en) 2004-11-18
WO2004099469A3 true WO2004099469A3 (en) 2005-01-20

Family

ID=33434923

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/010489 WO2004099469A2 (en) 2003-04-09 2004-04-06 High resolution electrolytic lithography, apparatus therefor and resulting products

Country Status (2)

Country Link
US (1) US20060249391A1 (en)
WO (1) WO2004099469A2 (en)

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GB0416600D0 (en) * 2004-07-24 2004-08-25 Univ Newcastle A process for manufacturing micro- and nano-devices
US7598021B2 (en) 2005-10-17 2009-10-06 Micron Technology, Inc. High resolution printing technique
DK1948850T3 (en) 2005-11-18 2019-07-29 Luxembourg Inst Science & Tech List PROCEDURE FOR MAKING A MULTIPLE LAYER STRUCTURE
WO2007079548A1 (en) * 2006-01-16 2007-07-19 Securency International Pty Ltd Security documents with personalised images and methods of manufacture
FR2898138B1 (en) * 2006-03-03 2008-05-16 Commissariat Energie Atomique METHOD FOR ELECTROCHEMICAL STRUCTURING OF A CONDUCTIVE OR SEMICONDUCTOR MATERIAL, AND DEVICE FOR CARRYING OUT SAID METHOD
US20070215480A1 (en) * 2006-03-16 2007-09-20 Fang Nicholas X Pattern transfer by solid state electrochemical stamping
US7998330B2 (en) * 2006-03-16 2011-08-16 The Board Of Trustees Of The University Of Illinois Direct nanoscale patterning of metals using polymer electrolytes
DE102006013362A1 (en) * 2006-03-16 2007-09-27 Siemens Ag Method for producing an electrical component with a nanoneedle structure
KR100872281B1 (en) * 2006-12-15 2008-12-05 삼성전기주식회사 Semiconductor light emitting device having nano-wire structure and method for fabricating the same
US7869334B2 (en) * 2007-03-19 2011-01-11 Intel Corporation Seek-scan probe (SSP) memory with sharp probe tips formed at CMOS-compatible temperatures
US7888583B2 (en) * 2007-05-07 2011-02-15 Wisconsin Alumni Research Foundation Semiconductor nanowire thermoelectric materials and devices, and processes for producing same
WO2009029302A2 (en) * 2007-05-08 2009-03-05 University Of Washington Shadow edge lithography for nanoscale patterning and manufacturing
US8107194B2 (en) 2008-09-24 2012-01-31 International Business Machines Corporation Writing and reading multi-layer continuous magnetic recording media
US7911739B2 (en) * 2008-09-25 2011-03-22 International Business Machines Corporation Writing and reading multi-level patterned magnetic recording media
ITMI20081734A1 (en) * 2008-09-30 2010-04-01 Consiglio Nazionale Ricerche SPACIOUSLY CONTROLLED INCORPORATION OF A PARTICLE MICROMETRIC OR NANOMETRIC SCALE IN A CONDUCTIVE SURFACE LAYER OF A SUPPORT.
US8911607B2 (en) * 2009-07-30 2014-12-16 Empire Technology Development Llc Electro-deposition of nano-patterns
US8031425B2 (en) * 2009-11-10 2011-10-04 International Business Machines Corporation Writing and reading multi-layer continuous magnetic recording media, with more than two recording layers
US8085502B2 (en) * 2009-11-10 2011-12-27 International Business Machines Corporation Writing and reading multi-level patterned magnetic recording media, with more than two recording levels
US9711392B2 (en) * 2012-07-25 2017-07-18 Infineon Technologies Ag Field emission devices and methods of making thereof
US10857575B2 (en) 2017-02-27 2020-12-08 Nanovation Partners LLC Shelf-life-improved nanostructured implant systems and methods
ES2738026A1 (en) * 2018-07-17 2020-01-17 Juanpera Jesus Hernandez Block, panel and system for 3D electrodeposition (Machine-translation by Google Translate, not legally binding)
US10922056B1 (en) * 2020-04-24 2021-02-16 DESC (Dubai Electronic Security Center) Atmospheric pressure air microplasma system for true random bit generation
US20230088962A1 (en) * 2021-09-23 2023-03-23 Fabric8Labs, Inc. Systems and methods for manufacturing electrical components using electrochemical deposition

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US5780101A (en) * 1995-02-17 1998-07-14 Arizona Board Of Regents On Behalf Of The University Of Arizona Method for producing encapsulated nanoparticles and carbon nanotubes using catalytic disproportionation of carbon monoxide
US5865978A (en) * 1997-05-09 1999-02-02 Cohen; Adam E. Near-field photolithographic masks and photolithography; nanoscale patterning techniques; apparatus and method therefor
EP1122759A2 (en) * 2000-02-07 2001-08-08 Samsung SDI Co., Ltd. Secondary electron amplification structure employing carbon nanotube, and plasma panel and back light using the same
US6283812B1 (en) * 1999-01-25 2001-09-04 Agere Systems Guardian Corp. Process for fabricating article comprising aligned truncated carbon nanotubes
US20020046953A1 (en) * 2000-10-24 2002-04-25 Lee James Weifu Catalyst-induced growth of carbon nanotubes on tips of cantilevers and nanowires
US20020172820A1 (en) * 2001-03-30 2002-11-21 The Regents Of The University Of California Methods of fabricating nanostructures and nanowires and devices fabricated therefrom

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US5641391A (en) * 1995-05-15 1997-06-24 Hunter; Ian W. Three dimensional microfabrication by localized electrodeposition and etching
EP2017374A3 (en) * 2000-03-17 2011-04-27 Ebara Corporation Plating apparatus and method
US6831017B1 (en) * 2002-04-05 2004-12-14 Integrated Nanosystems, Inc. Catalyst patterning for nanowire devices
US7068582B2 (en) * 2002-09-30 2006-06-27 The Regents Of The University Of California Read head for ultra-high-density information storage media and method for making the same
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Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5780101A (en) * 1995-02-17 1998-07-14 Arizona Board Of Regents On Behalf Of The University Of Arizona Method for producing encapsulated nanoparticles and carbon nanotubes using catalytic disproportionation of carbon monoxide
US5865978A (en) * 1997-05-09 1999-02-02 Cohen; Adam E. Near-field photolithographic masks and photolithography; nanoscale patterning techniques; apparatus and method therefor
US6283812B1 (en) * 1999-01-25 2001-09-04 Agere Systems Guardian Corp. Process for fabricating article comprising aligned truncated carbon nanotubes
EP1122759A2 (en) * 2000-02-07 2001-08-08 Samsung SDI Co., Ltd. Secondary electron amplification structure employing carbon nanotube, and plasma panel and back light using the same
US20020046953A1 (en) * 2000-10-24 2002-04-25 Lee James Weifu Catalyst-induced growth of carbon nanotubes on tips of cantilevers and nanowires
US20020172820A1 (en) * 2001-03-30 2002-11-21 The Regents Of The University Of California Methods of fabricating nanostructures and nanowires and devices fabricated therefrom

Also Published As

Publication number Publication date
WO2004099469A2 (en) 2004-11-18
US20060249391A1 (en) 2006-11-09

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