WO2004066026A3 - Imageable elements and compositions for imaging by means of uv irradiation - Google Patents

Imageable elements and compositions for imaging by means of uv irradiation Download PDF

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Publication number
WO2004066026A3
WO2004066026A3 PCT/EP2004/000457 EP2004000457W WO2004066026A3 WO 2004066026 A3 WO2004066026 A3 WO 2004066026A3 EP 2004000457 W EP2004000457 W EP 2004000457W WO 2004066026 A3 WO2004066026 A3 WO 2004066026A3
Authority
WO
WIPO (PCT)
Prior art keywords
imaging
imageable elements
irradiation
compositions
coating
Prior art date
Application number
PCT/EP2004/000457
Other languages
French (fr)
Other versions
WO2004066026A2 (en
Inventor
Hans-Joachim Timpe
Original Assignee
Kodak Polychrome Graphics Gmbh
Hans-Joachim Timpe
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Polychrome Graphics Gmbh, Hans-Joachim Timpe filed Critical Kodak Polychrome Graphics Gmbh
Publication of WO2004066026A2 publication Critical patent/WO2004066026A2/en
Publication of WO2004066026A3 publication Critical patent/WO2004066026A3/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

A process is described for imaging imageable elements by means of UV light with a wavelength selected from the range of 220 to 310 nm, wherein the imageable elements comprise a coating on a substrate which coating consists of a phenolic resin capable of forming a multiple centered hydrogen bonding and optionally one or more additives.
PCT/EP2004/000457 2003-01-21 2004-01-21 Imageable elements and compositions for imaging by means of uv irradiation WO2004066026A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10302111.6 2003-01-21
DE2003102111 DE10302111A1 (en) 2003-01-21 2003-01-21 Imageable elements and compositions for imaging by means of UV radiation

Publications (2)

Publication Number Publication Date
WO2004066026A2 WO2004066026A2 (en) 2004-08-05
WO2004066026A3 true WO2004066026A3 (en) 2004-10-07

Family

ID=32730562

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2004/000457 WO2004066026A2 (en) 2003-01-21 2004-01-21 Imageable elements and compositions for imaging by means of uv irradiation

Country Status (2)

Country Link
DE (1) DE10302111A1 (en)
WO (1) WO2004066026A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7678531B2 (en) * 2007-01-30 2010-03-16 Eastman Kodak Company Positive-working imageable elements

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6320018B1 (en) * 1996-10-04 2001-11-20 Dsm N.V. Supramolecular polymer
WO2002053626A1 (en) * 2000-12-29 2002-07-11 Kodak Polychrome Graphics, L.L.C. Imageable element and composition comprising thermally reversible polymers

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR9810545A (en) * 1997-07-05 2000-09-05 Kodak Polychrome Graphics Llc Methods for configuration training
EP1368413B1 (en) * 2000-12-29 2008-07-23 Eastman Kodak Company Two-layer imageable element comprising thermally reversible polymers

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6320018B1 (en) * 1996-10-04 2001-11-20 Dsm N.V. Supramolecular polymer
WO2002053626A1 (en) * 2000-12-29 2002-07-11 Kodak Polychrome Graphics, L.L.C. Imageable element and composition comprising thermally reversible polymers

Also Published As

Publication number Publication date
WO2004066026A2 (en) 2004-08-05
DE10302111A1 (en) 2004-08-19

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