WO2004053926A3 - A method for depositing a metal layer on a semiconductor interconnect structure - Google Patents

A method for depositing a metal layer on a semiconductor interconnect structure Download PDF

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Publication number
WO2004053926A3
WO2004053926A3 PCT/EP2003/050958 EP0350958W WO2004053926A3 WO 2004053926 A3 WO2004053926 A3 WO 2004053926A3 EP 0350958 W EP0350958 W EP 0350958W WO 2004053926 A3 WO2004053926 A3 WO 2004053926A3
Authority
WO
WIPO (PCT)
Prior art keywords
layer
depositing
interconnect structure
liner layer
metal layer
Prior art date
Application number
PCT/EP2003/050958
Other languages
French (fr)
Other versions
WO2004053926A2 (en
Inventor
Sandra Malhotra
Andrew Simon
Original Assignee
Ibm
Ibm Deutschland
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm, Ibm Deutschland filed Critical Ibm
Priority to AU2003300263A priority Critical patent/AU2003300263A1/en
Priority to JP2004558112A priority patent/JP4767541B2/en
Priority to EP03799543A priority patent/EP1570518A2/en
Publication of WO2004053926A2 publication Critical patent/WO2004053926A2/en
Publication of WO2004053926A3 publication Critical patent/WO2004053926A3/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76841—Barrier, adhesion or liner layers
    • H01L21/76843—Barrier, adhesion or liner layers formed in openings in a dielectric
    • H01L21/76844—Bottomless liners
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
    • H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
    • H01L21/76805—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics the opening being a via or contact hole penetrating the underlying conductor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76841—Barrier, adhesion or liner layers
    • H01L21/76853—Barrier, adhesion or liner layers characterized by particular after-treatment steps
    • H01L21/76865—Selective removal of parts of the layer

Abstract

Disclosed is a method for depositing a metal layer on an interconnect structure for a semiconductor wafer. In the method, a metal conductor (14) is covered by a dielectric layer (18). The dielectric layer is patterned so as to expose the metal conductor. A liner layer (24) is then deposited into the pattern. The liner layer is then argon sputter etched to remove the liner layer and expose the metal conductor (14). In the process of argon sputter etching, the liner layer is redeposited onto the sidewall of the pattern. Lastly, an additional layer (26) is deposited into the pattern and covers the redeposited liner layer.
PCT/EP2003/050958 2002-12-11 2003-12-08 A method for depositing a metal layer on a semiconductor interconnect structure WO2004053926A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
AU2003300263A AU2003300263A1 (en) 2002-12-11 2003-12-08 A method for depositing a metal layer on a semiconductor interconnect structure
JP2004558112A JP4767541B2 (en) 2002-12-11 2003-12-08 Method for depositing a metal layer on a semiconductor interconnect structure
EP03799543A EP1570518A2 (en) 2002-12-11 2003-12-08 A method for depositing a metal layer on a semiconductor interconnect structure

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/318,605 US6949461B2 (en) 2002-12-11 2002-12-11 Method for depositing a metal layer on a semiconductor interconnect structure
US10/318,605 2002-12-11

Publications (2)

Publication Number Publication Date
WO2004053926A2 WO2004053926A2 (en) 2004-06-24
WO2004053926A3 true WO2004053926A3 (en) 2004-11-25

Family

ID=32506404

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/050958 WO2004053926A2 (en) 2002-12-11 2003-12-08 A method for depositing a metal layer on a semiconductor interconnect structure

Country Status (8)

Country Link
US (1) US6949461B2 (en)
EP (1) EP1570518A2 (en)
JP (1) JP4767541B2 (en)
KR (1) KR100702549B1 (en)
CN (1) CN100461369C (en)
AU (1) AU2003300263A1 (en)
TW (1) TWI236099B (en)
WO (1) WO2004053926A2 (en)

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Also Published As

Publication number Publication date
WO2004053926A2 (en) 2004-06-24
AU2003300263A1 (en) 2004-06-30
KR100702549B1 (en) 2007-04-04
CN1947236A (en) 2007-04-11
CN100461369C (en) 2009-02-11
TWI236099B (en) 2005-07-11
JP4767541B2 (en) 2011-09-07
US20040115928A1 (en) 2004-06-17
US6949461B2 (en) 2005-09-27
KR20050086476A (en) 2005-08-30
EP1570518A2 (en) 2005-09-07
JP2006518927A (en) 2006-08-17
AU2003300263A8 (en) 2004-06-30
TW200421542A (en) 2004-10-16

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