WO2004053455A3 - Plating bath composition control - Google Patents
Plating bath composition control Download PDFInfo
- Publication number
- WO2004053455A3 WO2004053455A3 PCT/US2003/037718 US0337718W WO2004053455A3 WO 2004053455 A3 WO2004053455 A3 WO 2004053455A3 US 0337718 W US0337718 W US 0337718W WO 2004053455 A3 WO2004053455 A3 WO 2004053455A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- plating bath
- composition
- composition control
- bath composition
- changing
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1617—Purification and regeneration of coating baths
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1675—Process conditions
- C23C18/1683—Control of electrolyte composition, e.g. measurement, adjustment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Automation & Control Theory (AREA)
- Electroplating Methods And Accessories (AREA)
- Control Of Non-Electrical Variables (AREA)
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2003293069A AU2003293069A1 (en) | 2002-12-09 | 2003-11-25 | Plating bath composition control |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/314,776 US20040108213A1 (en) | 2002-12-09 | 2002-12-09 | Plating bath composition control |
US10/314,776 | 2002-12-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004053455A2 WO2004053455A2 (en) | 2004-06-24 |
WO2004053455A3 true WO2004053455A3 (en) | 2004-08-05 |
Family
ID=32468562
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2003/037718 WO2004053455A2 (en) | 2002-12-09 | 2003-11-25 | Plating bath composition control |
Country Status (3)
Country | Link |
---|---|
US (1) | US20040108213A1 (en) |
AU (1) | AU2003293069A1 (en) |
WO (1) | WO2004053455A2 (en) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3819840B2 (en) * | 2002-07-17 | 2006-09-13 | 大日本スクリーン製造株式会社 | Plating apparatus and plating method |
US7166203B2 (en) * | 2002-09-12 | 2007-01-23 | Teck Cominco Metals Ltd. | Controlled concentration electrolysis system |
US7678258B2 (en) * | 2003-07-10 | 2010-03-16 | International Business Machines Corporation | Void-free damascene copper deposition process and means of monitoring thereof |
US7291253B2 (en) * | 2004-05-04 | 2007-11-06 | Eci Technology, Inc. | Detection of an unstable additive breakdown product in a plating bath |
DE102005024910A1 (en) * | 2005-05-31 | 2006-12-07 | Advanced Micro Devices, Inc., Sunnyvale | Method and system for in-line control of solder bump deposition |
JP2007051362A (en) * | 2005-07-19 | 2007-03-01 | Ebara Corp | Plating apparatus and method for managing plating liquid |
US7676890B2 (en) | 2005-10-25 | 2010-03-16 | Black And Decker, Inc. | Vibration dampening handle for a powered apparatus |
JP2009242941A (en) * | 2008-03-11 | 2009-10-22 | Panasonic Corp | Semiconductor device production method and semiconductor production apparatus |
KR101022923B1 (en) | 2008-05-06 | 2011-03-16 | 삼성전기주식회사 | Qualitative analysis method and apparatus for high molecular additives in metal plating solutions |
US20100068404A1 (en) * | 2008-09-18 | 2010-03-18 | Guardian Industries Corp. | Draw-off coating apparatus for making coating articles, and/or methods of making coated articles using the same |
US8808521B2 (en) * | 2010-01-07 | 2014-08-19 | Boli Zhou | Intelligent control system for electrochemical plating process |
KR20120083170A (en) * | 2011-01-17 | 2012-07-25 | 삼성전자주식회사 | Plating method using photoresist residue analysis method in plating solution |
JP6373157B2 (en) * | 2014-10-14 | 2018-08-15 | 日置電機株式会社 | Electrochemical sensor and electrochemical measuring device |
US10590560B1 (en) | 2018-08-22 | 2020-03-17 | Eci Technology, Inc. | Control of additive turnover in an electrodeposition solution |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4774101A (en) * | 1986-12-10 | 1988-09-27 | American Telephone And Telegraph Company, At&T Technologies, Inc. | Automated method for the analysis and control of the electroless metal plating solution |
US6200436B1 (en) * | 1999-04-27 | 2001-03-13 | Advanced Micro Devices, Inc. | Recycling consistent plating system for electroplating |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3951602A (en) * | 1974-06-25 | 1976-04-20 | E. I. Du Pont De Nemours And Company | Spectrophotometric formaldehyde-copper monitor |
US4096301A (en) * | 1976-02-19 | 1978-06-20 | Macdermid Incorporated | Apparatus and method for automatically maintaining an electroless copper plating bath |
US4229218A (en) * | 1979-02-05 | 1980-10-21 | Shipley Company Inc. | Self-monitoring electroless plating solution |
US4479852A (en) * | 1983-01-21 | 1984-10-30 | International Business Machines Corporation | Method for determination of concentration of organic additive in plating bath |
JPS60104246A (en) * | 1983-11-11 | 1985-06-08 | C Uyemura & Co Ltd | Method for analyzing formaldehyde in chemical copper plating bath |
US4694682A (en) * | 1984-03-29 | 1987-09-22 | Etd Technology, Inc. | Analysis of organic additives in plating baths using novel chromatographic methods in a mass balance approach |
US4628726A (en) * | 1984-03-29 | 1986-12-16 | Etd Technology, Inc. | Analysis of organic compounds in baths used in the manufacture of printed circuit board using novel chromatographic methods |
US4631116A (en) * | 1985-06-05 | 1986-12-23 | Hughes Aircraft Company | Method of monitoring trace constituents in plating baths |
US4707378A (en) * | 1986-07-11 | 1987-11-17 | International Business Machines Corporation | Method and apparatus for controlling the organic contamination level in an electroless plating bath |
US4914719A (en) * | 1989-03-10 | 1990-04-03 | Criticare Systems, Inc. | Multiple component gas analyzer |
US5352350A (en) * | 1992-02-14 | 1994-10-04 | International Business Machines Corporation | Method for controlling chemical species concentration |
DE69535979D1 (en) * | 1994-02-28 | 2009-08-20 | Analytica Of Branford Inc | MULTIPOL ION CONDUCTOR FOR MASS SPECTROMETRY |
US5858196A (en) * | 1996-01-31 | 1999-01-12 | Kawasaki Steel Corporation | Method of controlling component concentration of plating solution in continuous electroplating |
US6113769A (en) * | 1997-11-21 | 2000-09-05 | International Business Machines Corporation | Apparatus to monitor and add plating solution of plating baths and controlling quality of deposited metal |
US6416647B1 (en) * | 1998-04-21 | 2002-07-09 | Applied Materials, Inc. | Electro-chemical deposition cell for face-up processing of single semiconductor substrates |
US6365033B1 (en) * | 1999-05-03 | 2002-04-02 | Semitoof, Inc. | Methods for controlling and/or measuring additive concentration in an electroplating bath |
US6113759A (en) * | 1998-12-18 | 2000-09-05 | International Business Machines Corporation | Anode design for semiconductor deposition having novel electrical contact assembly |
US6585876B2 (en) * | 1999-04-08 | 2003-07-01 | Applied Materials Inc. | Flow diffuser to be used in electro-chemical plating system and method |
US6521112B1 (en) * | 1999-07-13 | 2003-02-18 | Dj Parker Company, Inc. | Paced chemical replenishment system |
US6508924B1 (en) * | 2000-05-31 | 2003-01-21 | Shipley Company L.L.C. | Control of breakdown products in electroplating baths |
WO2001096632A2 (en) * | 2000-06-15 | 2001-12-20 | Applied Materials, Inc. | A method and apparatus for conditioning electrochemical baths in plating technology |
US6454927B1 (en) * | 2000-06-26 | 2002-09-24 | Applied Materials, Inc. | Apparatus and method for electro chemical deposition |
US20030150734A1 (en) * | 2002-02-11 | 2003-08-14 | Applied Materials, Inc. | Electroplating solution composition control |
US6749739B2 (en) * | 2002-10-07 | 2004-06-15 | Eci Technology, Inc. | Detection of suppressor breakdown contaminants in a plating bath |
-
2002
- 2002-12-09 US US10/314,776 patent/US20040108213A1/en not_active Abandoned
-
2003
- 2003-11-25 WO PCT/US2003/037718 patent/WO2004053455A2/en not_active Application Discontinuation
- 2003-11-25 AU AU2003293069A patent/AU2003293069A1/en not_active Abandoned
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4774101A (en) * | 1986-12-10 | 1988-09-27 | American Telephone And Telegraph Company, At&T Technologies, Inc. | Automated method for the analysis and control of the electroless metal plating solution |
US6200436B1 (en) * | 1999-04-27 | 2001-03-13 | Advanced Micro Devices, Inc. | Recycling consistent plating system for electroplating |
Also Published As
Publication number | Publication date |
---|---|
WO2004053455A2 (en) | 2004-06-24 |
US20040108213A1 (en) | 2004-06-10 |
AU2003293069A1 (en) | 2004-06-30 |
AU2003293069A8 (en) | 2004-06-30 |
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