WO2004021084A3 - Decal transfer microfabrication - Google Patents
Decal transfer microfabrication Download PDFInfo
- Publication number
- WO2004021084A3 WO2004021084A3 PCT/US2003/026751 US0326751W WO2004021084A3 WO 2004021084 A3 WO2004021084 A3 WO 2004021084A3 US 0326751 W US0326751 W US 0326751W WO 2004021084 A3 WO2004021084 A3 WO 2004021084A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- pattern
- microfabrication
- substrate
- decal transfer
- silicon
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
- B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/03—Processes for manufacturing substrate-free structures
- B81C2201/034—Moulding
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24562—Interlaminar spaces
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24628—Nonplanar uniform thickness material
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2003260094A AU2003260094A1 (en) | 2002-08-28 | 2003-08-28 | Decal transfer microfabrication |
EP03791812A EP1539638A2 (en) | 2002-08-28 | 2003-08-28 | Decal transfer microfabrication |
JP2004531513A JP2005537141A (en) | 2002-08-28 | 2003-08-28 | Transfer fine processing |
CA002495978A CA2495978A1 (en) | 2002-08-28 | 2003-08-28 | Decal transfer microfabrication |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/230,882 | 2002-08-28 | ||
US10/230,882 US6805809B2 (en) | 2002-08-28 | 2002-08-28 | Decal transfer microfabrication |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004021084A2 WO2004021084A2 (en) | 2004-03-11 |
WO2004021084A3 true WO2004021084A3 (en) | 2004-06-17 |
Family
ID=31976614
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2003/026751 WO2004021084A2 (en) | 2002-08-28 | 2003-08-28 | Decal transfer microfabrication |
Country Status (9)
Country | Link |
---|---|
US (2) | US6805809B2 (en) |
EP (1) | EP1539638A2 (en) |
JP (1) | JP2005537141A (en) |
KR (1) | KR20050052480A (en) |
CN (2) | CN100413778C (en) |
AU (1) | AU2003260094A1 (en) |
CA (1) | CA2495978A1 (en) |
SG (1) | SG170619A1 (en) |
WO (1) | WO2004021084A2 (en) |
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US8222072B2 (en) * | 2002-12-20 | 2012-07-17 | The Trustees Of Princeton University | Methods of fabricating devices by low pressure cold welding |
US6808646B1 (en) * | 2003-04-29 | 2004-10-26 | Hewlett-Packard Development Company, L.P. | Method of replicating a high resolution three-dimensional imprint pattern on a compliant media of arbitrary size |
US7435256B2 (en) * | 2003-11-06 | 2008-10-14 | Boston Scientific Scimed, Inc. | Method and apparatus for controlled delivery of active substance |
US20050136500A1 (en) * | 2003-12-19 | 2005-06-23 | Kimberly-Clark Worldwide; Inc. | Flow-through assay devices |
CN100554354C (en) * | 2003-12-22 | 2009-10-28 | 陶氏康宁公司 | Silicone composition and purposes and printing transferring method thereof in control printing or molded patterns release or transfer printing |
DE602005025098D1 (en) | 2004-03-08 | 2011-01-13 | Univ Illinois | MICROFLUIDIC ELECTROCHEMICAL REACTORS |
US7741003B2 (en) * | 2004-03-30 | 2010-06-22 | Hitachi Global Storage Technologies Netherlands B.V. | Photoresist transfer pads |
US7662545B2 (en) * | 2004-10-14 | 2010-02-16 | The Board Of Trustees Of The University Of Illinois | Decal transfer lithography |
FR2877142B1 (en) * | 2004-10-21 | 2007-05-11 | Commissariat Energie Atomique | METHOD OF TRANSFERRING AT LEAST ONE MICROMETRIC OR MILLIMETRIC SIZE OBJECT USING A POLYMER HANDLE |
US8252191B2 (en) | 2005-05-10 | 2012-08-28 | Dow Corning Corporation | Sub-micron decal transfer lithography |
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US6363183B1 (en) * | 2000-01-04 | 2002-03-26 | Seungug Koh | Reconfigurable and scalable intergrated optic waveguide add/drop multiplexing element using micro-opto-electro-mechanical systems and methods of fabricating thereof |
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-
2002
- 2002-08-28 US US10/230,882 patent/US6805809B2/en not_active Expired - Lifetime
-
2003
- 2003-08-28 WO PCT/US2003/026751 patent/WO2004021084A2/en active Application Filing
- 2003-08-28 SG SG200802867-2A patent/SG170619A1/en unknown
- 2003-08-28 AU AU2003260094A patent/AU2003260094A1/en not_active Abandoned
- 2003-08-28 EP EP03791812A patent/EP1539638A2/en not_active Withdrawn
- 2003-08-28 JP JP2004531513A patent/JP2005537141A/en active Pending
- 2003-08-28 CN CNB038234440A patent/CN100413778C/en not_active Expired - Fee Related
- 2003-08-28 CN CNA2008101356893A patent/CN101327904A/en active Pending
- 2003-08-28 CA CA002495978A patent/CA2495978A1/en not_active Abandoned
- 2003-08-28 KR KR1020057003410A patent/KR20050052480A/en active IP Right Grant
-
2004
- 2004-08-04 US US10/911,049 patent/US20050199584A1/en not_active Abandoned
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Also Published As
Publication number | Publication date |
---|---|
CN100413778C (en) | 2008-08-27 |
US20050199584A1 (en) | 2005-09-15 |
CN1684902A (en) | 2005-10-19 |
US6805809B2 (en) | 2004-10-19 |
EP1539638A2 (en) | 2005-06-15 |
AU2003260094A8 (en) | 2004-03-19 |
AU2003260094A1 (en) | 2004-03-19 |
WO2004021084A2 (en) | 2004-03-11 |
CN101327904A (en) | 2008-12-24 |
US20040040653A1 (en) | 2004-03-04 |
JP2005537141A (en) | 2005-12-08 |
CA2495978A1 (en) | 2004-03-11 |
SG170619A1 (en) | 2011-05-30 |
KR20050052480A (en) | 2005-06-02 |
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