WO2003100126A1 - Procede et dispositif pour le traitement au plasma de pieces - Google Patents

Procede et dispositif pour le traitement au plasma de pieces Download PDF

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Publication number
WO2003100126A1
WO2003100126A1 PCT/DE2003/001507 DE0301507W WO03100126A1 WO 2003100126 A1 WO2003100126 A1 WO 2003100126A1 DE 0301507 W DE0301507 W DE 0301507W WO 03100126 A1 WO03100126 A1 WO 03100126A1
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
workpieces
station
carrier
chamber
Prior art date
Application number
PCT/DE2003/001507
Other languages
German (de)
English (en)
Inventor
Michael Litzenberg
Frank Lewin
Hartwig Müller
Klaus Vogel
Gregor Arnold
Stephan Behle
Andreas LÜTTRINGHAUS-HENKEL
Matthias Bicker
Jürgen Klein
Original Assignee
Sig Technology Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE10227637A external-priority patent/DE10227637A1/de
Application filed by Sig Technology Ltd. filed Critical Sig Technology Ltd.
Priority to EP03732225A priority Critical patent/EP1507891A1/fr
Priority to AU2003239757A priority patent/AU2003239757A1/en
Publication of WO2003100126A1 publication Critical patent/WO2003100126A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
    • B08B9/42—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus being characterised by means for conveying or carrying containers therethrough
    • B08B9/426—Grippers for bottles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C49/00—Blow-moulding, i.e. blowing a preform or parison to a desired shape within a mould; Apparatus therefor
    • B29C49/42—Component parts, details or accessories; Auxiliary operations
    • B29C49/4205—Handling means, e.g. transfer, loading or discharging means
    • B29C49/42069—Means explicitly adapted for transporting blown article
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D23/00—Details of bottles or jars not otherwise provided for
    • B65D23/02—Linings or internal coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G29/00—Rotary conveyors, e.g. rotating discs, arms, star-wheels or cones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • C08J9/0004—Use of compounding ingredients, the chemical constitution of which is unknown, broadly defined, or irrelevant
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/046—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C2791/00—Shaping characteristics in general
    • B29C2791/001—Shaping in several steps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C49/00—Blow-moulding, i.e. blowing a preform or parison to a desired shape within a mould; Apparatus therefor
    • B29C49/42—Component parts, details or accessories; Auxiliary operations
    • B29C49/4205—Handling means, e.g. transfer, loading or discharging means
    • B29C49/42073—Grippers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C49/00—Blow-moulding, i.e. blowing a preform or parison to a desired shape within a mould; Apparatus therefor
    • B29C49/42—Component parts, details or accessories; Auxiliary operations
    • B29C49/4205—Handling means, e.g. transfer, loading or discharging means
    • B29C49/42073—Grippers
    • B29C49/42075—Grippers with pivoting clamps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C49/00—Blow-moulding, i.e. blowing a preform or parison to a desired shape within a mould; Apparatus therefor
    • B29C49/42—Component parts, details or accessories; Auxiliary operations
    • B29C49/4205—Handling means, e.g. transfer, loading or discharging means
    • B29C49/42093—Transporting apparatus, e.g. slides, wheels or conveyors
    • B29C49/42095—Rotating wheels or stars
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C49/00—Blow-moulding, i.e. blowing a preform or parison to a desired shape within a mould; Apparatus therefor
    • B29C49/42—Component parts, details or accessories; Auxiliary operations
    • B29C49/4205—Handling means, e.g. transfer, loading or discharging means
    • B29C49/42093—Transporting apparatus, e.g. slides, wheels or conveyors
    • B29C49/42105—Transporting apparatus, e.g. slides, wheels or conveyors for discontinuous or batch transport
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C49/00—Blow-moulding, i.e. blowing a preform or parison to a desired shape within a mould; Apparatus therefor
    • B29C49/42—Component parts, details or accessories; Auxiliary operations
    • B29C49/4205—Handling means, e.g. transfer, loading or discharging means
    • B29C49/42113—Means for manipulating the objects' position or orientation
    • B29C49/42115—Inversion, e.g. turning preform upside down
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C49/00—Blow-moulding, i.e. blowing a preform or parison to a desired shape within a mould; Apparatus therefor
    • B29C49/42—Component parts, details or accessories; Auxiliary operations
    • B29C49/42384—Safety, e.g. operator safety
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C49/00—Blow-moulding, i.e. blowing a preform or parison to a desired shape within a mould; Apparatus therefor
    • B29C49/42—Component parts, details or accessories; Auxiliary operations
    • B29C49/64—Heating or cooling preforms, parisons or blown articles
    • B29C49/68—Ovens specially adapted for heating preforms or parisons
    • B29C49/6835—Ovens specially adapted for heating preforms or parisons using reflectors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2201/00—Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
    • B65G2201/02—Articles
    • B65G2201/0235—Containers
    • B65G2201/0244—Bottles
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2300/00—Characterised by the use of unspecified polymers
    • C08J2300/14—Water soluble or water swellable polymers, e.g. aqueous gels

Definitions

  • the invention relates to a method for plasma treatment of workpieces, in which the workpieces are inserted into an at least partially evacuable plasma chamber of a treatment station and in which the workpieces are positioned within the treatment station by holding elements.
  • the invention further relates to a device for plasma treatment of workpieces, which has at least one evacuable plasma chamber for receiving the workpieces and in which the plasma chamber is arranged in the region of a treatment station, and in which the plasma chamber from a chamber bottom, a chamber lid and a side - Chen chamber wall is limited and has at least one holding element for positioning the workpieces.
  • Such methods and devices are used, for example, to provide plastics with surface coatings.
  • such methods and devices are also already known for coating inner or outer surfaces of containers which are intended for packaging liquids.
  • Devices for plasma sterilization are also known.
  • PCT-WO 95/22413 describes a plasma chamber for internally coating PET bottles.
  • the bottles to be coated are lifted into a plasma chamber by a movable base and connected to an adapter in the area of a bottle mouth.
  • the bottle interior can be evacuated through the adapter.
  • a hollow lance is inserted through the adapter into the interior of the bottles to supply process gas.
  • the plasma is ignited using a microwave.
  • PCT-WO 01/31680 describes a plasma chamber into which the bottles are introduced from a movable lid which was previously connected to a mouth area of the bottles.
  • PCT-WO 00/58631 also already shows the arrangement of plasma stations on a rotating wheel and, for such an arrangement, describes a group assignment of vacuum pumps and plasma stations in order to support a favorable evacuation of the chambers and the interior of the bottles.
  • the coating of several containers in a common plasma station or a common cavity is mentioned.
  • container layers made of silicon oxides with the general chemical formula SiO x are used to improve the barrier properties of the thermoplastic material.
  • portions of carbon, hydrogen and nitrogen can also be contained in the barrier layers produced in this way.
  • Such barrier layers prevent penetration of oxygen into the packaged liquids and escape of carbon dioxide in the case of liquids containing CO 2 .
  • the previously known methods and devices are not yet sufficiently suitable to be used for mass production, in which both a low coating price per workpiece and a high production speed must be achieved.
  • the object of the present invention is therefore to provide a method of the type mentioned in the introduction in such a way that a quantitative production output is increased with good product quality.
  • This object is achieved in that at least two holding elements are positioned relative to one another in the area of the treatment station by a common carrier.
  • Another object of the present invention is to construct a device of the type mentioned in the introduction in such a way that, with a compact structure, high production output and good product quality are supported.
  • This object is achieved in that at least two holding elements are held by a common carrier in the area of the plasma station.
  • the joint positioning of the holding elements from a common carrier in the area of the treatment station makes it possible to support an increased production output for each treatment station.
  • insertion of the workpieces to be processed into the treatment station and removal of the finished workpieces from the treatment station are supported.
  • the common carrier for the holding elements supports an exactly reproducible positioning of the containers within the plasma station as well as the implementation of input and output processes with little expenditure of time and high reliability.
  • at least two holding elements be moved together with the carrier in a direction offset by a movement that is at least temporarily carried out by the carrier during the execution of a treatment process.
  • Simultaneous treatment of a large number of workpieces with a compact construction of the treatment device is supported in that at least two holding elements are moved together with the support offset relative to one another transversely to the direction of a movement which is at least temporarily carried out by the support during the execution of a treatment process.
  • a simple implementation in terms of device technology is also supported in that process gas is supplied through the chamber floor.
  • a quick and uniform distribution of the process gas in an interior of the workpieces can be achieved in that the process gas is fed through a lance into the interior of the workpieces.
  • the carrier is positioned relative to the treatment station.
  • the carrier loaded with at least one workpiece, is inserted into the treatment station.
  • the carrier loaded with at least one workpiece, is removed from the treatment station.
  • a continuous execution of transfer processes is supported in that the carrier carries out a rotational movement at least temporarily relative to the treatment station.
  • Simple kinematics when carrying out transfer operations can be achieved in that the carrier is equipped with workpieces to be treated by a rotating transfer element.
  • the transfer element is moved at the same speed as the carrier at least at the time of transfer of a workpiece to the carrier.
  • microwaves generated in the region of the chamber lid be introduced into the cavity by at least one microwave generator.
  • a typical application is that workpieces made of a thermoplastic are treated.
  • beverage bottles are treated as workpieces.
  • a high production rate with great reliability and high product quality can be achieved in that the at least one plasma station is transferred from a rotating plasma wheel from an input position to an output position.
  • An increase in production capacity with only a slightly increased expenditure on equipment can be achieved by providing several cavities from one plasma station.
  • a typical application is defined in that a plasma coating is carried out as the plasma treatment.
  • the plasma treatment is carried out using a low pressure plasma.
  • Particularly advantageous usage properties for workpieces for packaging food can be achieved in that at least some inorganic substances are deposited by the plasma.
  • the plasma deposits a substance to improve the barrier properties of the workpieces.
  • an adhesion promoter is additionally deposited to improve the adherence of the substance to surfaces of the workpieces.
  • High productivity can be supported by treating at least two workpieces simultaneously in a common cavity.
  • Another area of application is that plasma sterilization is carried out as the plasma treatment.
  • a surface activation of the workpieces is carried out as a plasma treatment.
  • finished workpieces be removed at least one unloading station is used from the area of the carrier.
  • the workpieces to be treated are fed in that at least one loading station is used to feed workpieces to be machined into the area of the carrier.
  • Very short transfer times can be achieved in that the loading station is designed to feed workpieces to be machined to a carrier separate from the plasma wheel.
  • Low weights to be transferred when carrying out the transfer processes can be achieved in that at least one carrier is arranged in the area of each plasma station.
  • a simple implementation of the transfer operations is supported in that at least two holding elements are arranged along a circumference of the carrier.
  • a kinematically simple implementation of the transfer processes is supported in that the input path runs centrally to a center point of the plasma wheel.
  • Locally changeable transfer points can be realized in that the input path is arranged in the area of a transfer element.
  • Simple kinematic boundary conditions when carrying out the transfer operations are provided in that a speed of movement of the transfer element is adapted to a speed of movement of the carrier carried by the plasma wheel.
  • an output section be provided for removing workpieces to be treated from the supports.
  • the output path runs centrally to a center of the plasma wheel.
  • the output path is arranged in the area of a transfer element.
  • a convenient material flow during unloading can be achieved in that the transfer element is driven in a rotating manner.
  • Optimal utilization of the process angle is achieved by arranging the loading station on the one hand and the unloading station on the other hand at two cycle positions with a stationary plasma wheel.
  • the loading station is designed as a loading wheel.
  • the unloading station is designed as an unloading wheel.
  • wheels have a peripheral speed corresponding to a transport speed of the carrier in the area of its current transfer area.
  • Another mode of operation is defined by the fact that at least two rotations of the plasma wheel are provided for the period between an input of the workpieces into the plasma station and an output of the workpieces.
  • a material flow at a substantially constant height can be achieved in that the plasma station is guided so that it can be positioned at least partially in the direction of the carrier.
  • Another embodiment variant is that the carrier is guided so that it can be positioned vertically into the plasma chamber from above.
  • the carrier is guided so that it can be positioned in the vertical direction from below into the plasma chamber.
  • FIG. 1 is a schematic diagram of a plurality of plasma chambers which are arranged on a rotating plasma wheel. net and in which the plasma wheel is coupled with input and output wheels.
  • FIG. 2 shows an arrangement similar to FIG. 1, in which the plasma station is each equipped with two plasma chambers,
  • FIG. 3 is a perspective view of a plasma wheel with a plurality of plasma chambers
  • FIG. 4 is a perspective view of a plasma station with a cavity
  • FIG. 5 shows a front view of the device according to FIG. 4 with the plasma chamber closed
  • FIG. 7 shows a representation corresponding to FIG. 5 with the plasma chamber open
  • FIG. 9 is an enlarged view of the plasma chamber with the bottle to be coated according to FIG. 6,
  • 10 is a perspective view of a support ring of a plasma wheel, on which a plurality of carriers for positioning several holding elements for bottle-shaped workpieces are arranged
  • 11 shows a schematic representation of a plasma wheel, in which fully equipped carriers for the workpieces are inserted into the plasma wheel and are removed from the plasma wheel together with the treated workpieces after the treatment process has been carried out
  • Fig. 12 shows a modified embodiment compared to Fig. 11, in which on the. Plasma wheel rotatably mounted carriers are arranged, which cooperate with loading and unloading lines, which are arranged outside the plasma wheel,
  • FIG. 13 shows a further modified embodiment in which a pulsed operation of the plasma wheel and a pulsed operation of input wheels and output wheels is provided
  • Fig. 14 shows a plan view of a holding element for a single workpiece
  • FIGS. 14 and 14 are perspective views of a holding element according to FIGS. 14 and
  • FIG. 16 shows the holding element according to FIG. 15 with a bottle-shaped workpiece held.
  • FIG. 1 shows a plasma module (1), which is provided with a rotating plasma wheel (2).
  • a plurality of plasma stations (3) are arranged along a circumference of the plasma wheel (2).
  • the plasma stations (3) are provided with cavities (4) or plasma chambers (17) for receiving workpieces (5) to be treated.
  • Fig. 1 only one workpiece (5) per plasma station (3) is shown.
  • the feeds and discharges of the workpieces also only schematically show the handling of individual workpieces (5). In fact, at least two workpieces (5) are assigned to each plasma station (3).
  • the workpieces (5) to be treated are fed to the plasma module (1) in the area of an input (6) in accordance with the simplification of the illustration and are forwarded via a separating wheel (7) to a transfer wheel (8) which is equipped with positionable support arms (9). Is provided.
  • the support arms (9) are arranged such that they can be pivoted relative to a base (10) of the transfer wheel (8), so that the distance between the workpieces (5) can be changed relative to one another.
  • the workpieces (5) are transferred from the transfer wheel (8) to an input wheel (11) with a greater distance between the workpieces (5) relative to one another relative to the separating wheel (7).
  • (11) transfers the workpieces (5) to be treated to the plasma wheel (2). After the treatment has been carried out, the treated workpieces (5) are removed from an output wheel
  • the plasma stations (3) are each shown with two cavities (4) or plasma chambers (17) to further clarify the design principle.
  • two workpieces (5) can be treated simultaneously.
  • Fig. 3 shows a perspective view of a plasma module (1) with a partially constructed plasma wheel (2). To simplify matters, only one workpiece (5) is shown here for each plasma station (3).
  • the plasma stations (3) are arranged on a support ring (14) which is designed as part of a rotary connection and is mounted in the area of a machine base (15).
  • the plasma stations (3) each have a station frame (16) which holds plasma chambers (17).
  • the plasma chambers (17) have cylindrical chamber walls (18) and microwave generators (19).
  • a rotary distributor (20) is arranged in a center of the plasma wheel (2), via which the plasma stations (3) are supplied with operating resources and energy. Ring lines (21) in particular can be used for the distribution of operating resources.
  • the workpieces (5) to be treated are shown below the cylindrical chamber walls (18). Lower parts of the plasma chambers (17) are not shown for the sake of simplicity.
  • Fig. 4 shows a plasma station (3) in perspective. To simplify matters, only one workpiece (5) is shown here for each plasma station (3). It can be seen that the station frame (16) is provided with guide rods (23) on which a slide (24) is guided to hold the cylindrical chamber wall (18). Fig. 4 shows the carriage (24) with chamber wall (18) in a raised state so that the workpiece (5) is released.
  • the microwave generator (19) is arranged in the upper region of the plasma station (3).
  • the microwave generator (19) is connected via a deflection (25) and an adapter (26) to a coupling channel (27) which opens into the plasma chamber (17).
  • the microwave generator (19) can be coupled both directly in the area of the chamber lid (31) and via a spacer element to the chamber lid (31) with a predeterminable distance to the chamber lid (31) and thus in a larger surrounding area of the chamber lid (31). to be ordered.
  • the adapter (26) has the function of a transition element and the coupling channel (27) is designed as a coaxial conductor.
  • a quartz glass window is arranged in the region of a junction of the coupling channel (27) in the chamber cover (31).
  • the deflection (25) is designed as a waveguide.
  • the workpiece (5) is positioned in the area of a sealing element (28) which is arranged in the area of a chamber base (29).
  • the chamber base (29) is designed as part of a chamber base (30). To facilitate adjustment, it is possible to fix the chamber base (30) in the area of the guide rods (23). Another variant is to attach the chamber base (30) directly to the station frame (16). With such an arrangement, it is also possible, for example, to design the guide rods (23) in two parts in the vertical direction.
  • FIG. 5 shows a simplified front view of the plasma station (3) according to FIG. 3 in a closed state of the plasma chamber (17).
  • the carriage (24) with the cylindrical chamber wall (18) is lowered compared to the positioning in Fig. 4, so that the chamber wall (18) has moved against the chamber bottom (29).
  • the plasma coating can be carried out in this positioning state.
  • FIG. 6 shows the arrangement according to FIG. 5 in a vertical sectional view.
  • the coupling channel (27) opens into a chamber cover (31) which has a laterally projecting flange (32).
  • a seal (33) is arranged in the area of the flange (32) and is acted upon by an inner flange (34) of the chamber wall (18).
  • the chamber wall (18) is thereby sealed relative to the chamber cover (31).
  • Another seal (35) is arranged in a lower region of the chamber wall (18) in order to ensure a seal relative to the chamber bottom (29) here too.
  • the chamber wall (18) encloses the cavity (4), so that both an interior of the cavity (4) and interior spaces of the workpieces (5) can be evacuated.
  • hollow lances (36) are arranged in the area of the chamber base (30) and can be moved into the interior of the workpieces (5).
  • the lances (36) are positioned by a lance slide (37) which can be positioned along the guide rods (23).
  • a process gas channel (38) runs inside the lance slide (37) and, in the raised position shown in FIG. 6, is coupled to a gas connection (39) of the chamber base (30). This arrangement avoids hose-like connecting elements on the lance slide (37).
  • FIGS. 7 and 8 show the arrangement according to FIGS.
  • the coupling channel (27) has a cylindrical design and is arranged essentially coaxially with the chamber wall (18).
  • FIG. 9 shows the vertical section according to FIG. 6 in an enlarged partial illustration in the vicinity of the chamber wall (18).
  • the lance (36) is guided through a recess (40) in the sealing element (28).
  • Fig. 10 shows a support ring (14) of a further embodiment of the plasma wheel (2).
  • a plurality of supports (41) are arranged on the support ring (14), each of which positions holding elements (42) for the workpieces (5).
  • the carriers (41) are essentially circularly limited and six holding elements (42) are arranged in the vicinity of a circumference of the carriers (41).
  • the holding elements (42) are designed for positioning bottle-shaped workpieces (5), the Workpieces (5) are each arranged with mouth openings in the vertical direction downwards.
  • the carriers (41) with the holding elements (42) and the workpieces (5) can be used in differently designed plasma stations (3).
  • FIG. 11 shows a schematic representation of a plasma wheel (2) with a plurality of carriers (41).
  • the carriers (41) are completely loaded with the workpieces (5) to be treated in the area of a loading station (43) and a carrier (41) equipped with the workpieces (5) is transferred to the plasma wheel (2).
  • the carrier (41) equipped with the workpieces (5) is removed from the plasma wheel (2) and transferred to the area of an unloading station (44).
  • the carrier (41) can again be loaded with workpieces (5) in the area of the loading station (43) and transferred back to the plasma wheel (2).
  • at least one carrier (41) more than can be arranged simultaneously in the region of the plasma wheel (2).
  • a carrier fully equipped with workpieces (5) can be transferred back to the plasma wheel (2).
  • different variants are conceivable. For example, it is possible to always convey the workpieces (5) on an essentially horizontal transport path.
  • machining of the workpieces (5) in the area of the plasma wheel (2) and unloading of the carriers (41) in the area of the unloading station (44) would be carried out at an essentially constant height level.
  • the carrier (41) with the workpieces (5) or also without the workpieces (5) being positioned in an upward or downward direction.
  • Such a procedure is particularly advantageous if the support (41) is to be lifted into the plasma chamber (17) or lowered into the plasma chamber (17) together with the workpieces (5) to be machined.
  • FIG. 12 shows an embodiment modified from the representation in FIG. 11.
  • the carriers (41) are arranged stationary in the area of the plasma wheel (2) and rotatably supported relative to the plasma wheel (2) by means of rotary bearings (45).
  • rotary bearings (45) it is contemplated to mount the carriers (41) in the region of the plasma wheel (42) in such a way that rotational movements can be carried out.
  • the plasma wheel (2) carries out a continuous rotational movement with a constant rotational speed.
  • the loading station (43) is formed from a transfer element (46) and a loading wheel (47).
  • the workpieces (5) to be machined reach the area of the loading wheel (47) via an input path (48) and are transferred from there to the transfer element
  • the transfer element (46) has a circumferential transfer element (49), which can be implemented in a chain-like manner, for example.
  • the loading wheel (47) initially transfers the workpieces (5) to be machined to the transfer element (49) in the area of a transfer position (50). Expediently the loading wheel
  • a transfer path (51) is provided, which essentially has a curvature corresponding to the movement path of a part of the carrier (2) facing away from a center point (52) of the plasma wheel (2). 41) runs. This takes into account the fact that there is no fixed transfer position between the carrier (41) and the transfer element (49), but that the transfer position changes due to the rotation of the plasma wheel (2).
  • the carrier (41) After completion of the treatment process of the workpieces (5) and a corresponding rotational movement of the plasma wheel (2) the carrier (41) reaches the area of a transfer element (53) which, together with an unloading wheel (54), forms the unloading station (44). Similar to the transfer element (46), the transfer element (53) also has. Transfer element (55), which can be chain-like, for example, and driven in rotation.
  • Transfer element (55) which can be chain-like, for example, and driven in rotation.
  • the transfer of the coated workpieces (5) from the carrier (41) to the transfer element (55) and from the transfer element (55) to the unloading wheel (54) and from this to an output path (56) is carried out in a manner analogous to that for the input, only in reverse Sequence of the transfer processes to be carried out.
  • a transfer section (57) of the transfer element (55) also runs with a curvature corresponding to the transfer section (51) of the transfer element (49).
  • FIG. 13 shows a variant in which the plasma wheel (2) is operated in cycles. This enables direct loading of the carriers (41) using the loading wheel (47) and direct unloading of the carriers (41) using the unloading wheel (54), since there are fixed input and output positions.
  • the loading wheels (47) and unloading wheels (54) shown as an alternative to the loading wheels (47) and unloading wheels (54) shown, other rotating transfer elements (49, 55) that are moved back and forth alternately can also be used.
  • the wheels shown have advantages both in terms of mechanical stability and in terms of the exact reproducibility of the movements carried out.
  • the holding element (42) for positioning a workpiece (5) (not shown) within the plasma chamber (17).
  • the holding element (42) is designed like pliers and has two pivotably mounted holding arms (58, 59).
  • the holding arms (58, 59) can be pivoted relative to axes of rotation (60, 61).
  • the holding arms (58, 59) of springs (62, 63) are pressed into a respective holding position.
  • leg springs (62, 63) is preferred.
  • the holding element (42) is arranged above the carrier (41), so that after lifting the chamber wall (18) there is lateral accessibility of the holding element (42).
  • the workpiece (5) can hereby be transferred from a positioning element to the holding element (42) without a lifting movement of the workpiece (5) in the direction of a longitudinal axis (64) of the cavity.
  • a clamping space (65) for receiving the workpiece (5) is arranged between the holding arms (58, 59).
  • the holding arms (58, 59) protrude into the clamping space (65) with fixing projections (66, 67).
  • the holding arms (58, 59) have locking webs (68, 69) which face away from the fixing projections (66, 67) and which are arranged in one by locking elements (70, 71) which can preferably be positioned together with the chamber wall (18) Locking position can be fixed.
  • the holding element (42) has a stop element (72).
  • the stop element (72) limits maximum insertion of the workpiece (5) into the clamping space (65).
  • the workpiece (5) is pressed against the stop element (72) by the fixing projections (66, 67).
  • the stop element (72) and the fixing projections (66, 67) are thereby arranged at approximately the same height level.
  • 14 additionally shows the sealing element (28) and the lance (36) at a lower height level than the holding element (42) due to the selected viewing direction with respect to the plane of the drawing.
  • FIG. 15 shows the holding element (42) according to FIG. 14 in a perspective illustration and without depicting the locking elements (70, 71). It can be seen in particular that the holding element (42) has a base plate (73) from which the holding arms (58, 59) and the further components are carried.
  • the base plate (73) can be mounted in the area of the carrier (41) via spacer elements (74, 75) and connecting elements (76, 77).
  • the fixing projections (66, 67) are each provided with insertion bevels (78) and outlet bevels (79).
  • the workpiece (5) first comes into contact with the insertion bevels (78) and presses the holding arms (58, 59) apart against the forces of the springs (62, 63).
  • the holding arms (58, 59) automatically return to the locking position due to the forces of the springs (62, 63) and press the workpiece (5) against the stop element (72 ).
  • the workpiece (5) is thereby fixed within the plasma chamber (17).
  • the workpiece (5) is gripped by a transfer element and pulled against the outlet bevels (79).
  • the outlet bevel (79) is preferably curved and is designed with a curvature course corresponding to an outer contour of the workpiece (5) in the contact area.
  • the holding arms (58, 59) are thereby brought apart and release the workpiece (5).
  • the controlled pliers arms enable the workpieces (5) to be gripped actively and support the application of compressive and tensile forces to the insertion bevels (78) and the outlet bevels (79).
  • the controlled pliers of the transfer elements act on the workpiece (5) at an essentially same height level as the holding arms (58, 59) or at a somewhat lower or higher level. As a result, the introduction of tilting forces into the workpiece (5) is avoided or greatly reduced.
  • FIG. 16 shows the arrangement according to FIG. 15 after inserting a bottle-like workpiece (5) which is acted upon by the holding arms (58, 59) between a support ring (80) and a shoulder region (81). Holding such a bottle-like workpiece (5) in the neck region shown leads to a very stable fixation of the workpiece (5).
  • the locking elements (70, 71) are also shown in FIG. 16. The locking elements (70, 71) are positioned together with the chamber wall (18). In the arrangement shown, the locking elements (70, 71) block a movement of the holding arms (58, 59), so that an uncontrolled opening of the holding element (42) is reliably prevented.
  • a typical treatment process is explained below using the example of a coating process and carried out in such a way that the workpieces (5) are first transported to the plasma wheel (2) using the loading station (43) and that the sleeve-like chamber wall (18) is inserted in a pushed-up state the workpieces (5) into the plasma station (3). After the insertion process has been completed, the chamber wall (18) is removed into its sealed positioning lowered and at the same time an evacuation of both the cavity (4) and the interior of the workpieces (5).
  • the lances (36) are moved into the interior of the workpieces (5) and, by moving the sealing elements (28), the interior of the workpieces (5) is sealed off from the interior of the cavity (5). 4) performed. It is also possible to move the lances (36) into the workpieces (5) synchronously with the beginning of the evacuation of the interior of the cavity. The pressure inside the workpieces (5) is then further reduced. In addition, the positioning movement of the lances (36) is at least partially already carried out parallel to the positioning of the chamber wall (18). After reaching a sufficiently low vacuum, process gas is introduced into the interior of the workpieces (5) and the plasma is ignited with the aid of the microwave generator (19). In particular, it is intended to use the plasma to deposit both an adhesion promoter and the actual barrier layer made of silicon oxides on the inner surfaces of the workpieces (5).
  • the adhesion promoter can be applied, for example, in a two-stage process as the first stage before the barrier layer is applied in the second stage, but it is also conceivable, in a continuous process, to use at least a part of the barrier layer facing the workpiece (5) as a gradient layer - To generate at least part of the adhesion promoter immediately.
  • a gradient layer can easily be changed during the duration of an already ignited plasma by changing the composition of the product. Zeßgases are generated.
  • Such a change in the composition of the process gas can be achieved abruptly by changing valve controls or continuously by changing the mixing ratio of components of the process gas.
  • a typical structure of a gradient layer is such that a part of the gradient layer facing the workpiece (5) contains at least a predominant proportion of the adhesion promoter and at least a predominant part of the barrier material in a part of the gradient layer facing away from the workpiece (5).
  • a transition of the respective components takes place continuously in at least part of the gradient layer in accordance with a predeterminable gradient curve.
  • the interior of the plasma chamber (17) and the interior of the workpieces (5) are first evacuated together to a pressure level of approximately 20 mbar to 50 mbar.
  • the pressure in the interior of the workpieces (5) is then further reduced to approximately 0.1 mbar.
  • a vacuum of about 0.3 mbar is maintained while the treatment process is being carried out.
  • the lances (36) are removed from the interior of the workpieces (5) and the plasma chamber (17) and the interior of the workpieces (5) are ventilated.
  • the chamber wall (18) is raised again in order to remove the coated workpieces (5) and to enter new workpieces (5) to be coated.
  • the sealing elements (28) are moved back into the chamber base (30) at least in regions.
  • the chamber wall (18), the sealing elements (28) and / or the lances (36) can be positioned using different drive units.
  • the use of pneumatic drives and / or electrical drives, in particular in one embodiment as a linear motor, is conceivable.
  • the curve control can be designed, for example, in such a way that control curves are arranged along a circumference of the plasma wheel (2), along which curve rollers are guided.
  • the cam rollers are coupled to the components to be positioned.
  • the supports (41) can be constructed in a manner dependent on the specified structural boundary conditions. For example, it is possible to design the carrier (41) like a plate and to provide it with suitable recesses, for example for the lances (36) and the sealing elements (28). It is also conceivable to construct the carrier (41) like a ring or to construct a to choose that starting from a central area outward-pointing spoke-like support segments are used.
  • channel branches can be arranged in the area of the chamber base (30), which make it possible to supply several plasma chambers (17) or cavities (4) with common control valves.
  • pumps which are used to generate the required negative pressure

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Abstract

L'invention concerne un procédé et un dispositif pour le traitement au plasma de pièces. Ces pièces (5) sont placées dans une chambre d'une station de traitement, chambre dans laquelle un vide au moins partiel peut être créé, et maintenues en position à l'intérieur de cette station de traitement par des éléments de maintien (42). Au niveau de cette station de traitement, au moins deux éléments de maintien sont placés dans une certaine position l'un par rapport à l'autre par un support commun (41).
PCT/DE2003/001507 2002-05-24 2003-05-09 Procede et dispositif pour le traitement au plasma de pieces WO2003100126A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP03732225A EP1507891A1 (fr) 2002-05-24 2003-05-09 Procede et dispositif pour le traitement au plasma de pieces
AU2003239757A AU2003239757A1 (en) 2002-05-24 2003-05-09 Method and device for the plasma treatment of work pieces

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE10223288.1 2002-05-24
DE10223288 2002-05-24
DE10227637A DE10227637A1 (de) 2002-05-24 2002-06-20 Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken
DE10227637.4 2002-06-20

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WO2003100126A1 true WO2003100126A1 (fr) 2003-12-04

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024033045A1 (fr) * 2022-08-08 2024-02-15 Khs Gmbh Dispositif de positionnement et scellement pour maintenir et sceller une pièce dans une chambre à plasma d'un appareil de revêtement par plasma

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