WO2003092040A3 - Verfahren zum bearbeiten eines wafers - Google Patents

Verfahren zum bearbeiten eines wafers Download PDF

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Publication number
WO2003092040A3
WO2003092040A3 PCT/EP2003/004176 EP0304176W WO03092040A3 WO 2003092040 A3 WO2003092040 A3 WO 2003092040A3 EP 0304176 W EP0304176 W EP 0304176W WO 03092040 A3 WO03092040 A3 WO 03092040A3
Authority
WO
WIPO (PCT)
Prior art keywords
wafer
processing
semi
predetermined pattern
defects
Prior art date
Application number
PCT/EP2003/004176
Other languages
English (en)
French (fr)
Other versions
WO2003092040A2 (de
Inventor
Oliver Koethe
Christof Landesberger
Martin Bleier
Original Assignee
Fraunhofer Ges Forschung
Oliver Koethe
Christof Landesberger
Martin Bleier
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE10229499A external-priority patent/DE10229499B4/de
Application filed by Fraunhofer Ges Forschung, Oliver Koethe, Christof Landesberger, Martin Bleier filed Critical Fraunhofer Ges Forschung
Publication of WO2003092040A2 publication Critical patent/WO2003092040A2/de
Publication of WO2003092040A3 publication Critical patent/WO2003092040A3/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Dicing (AREA)
  • Weting (AREA)

Abstract

Ein Verfahren zum Bearbeiten eines Wafers (100), der Halbleitermaterial aufweist, umfasst zunächst ein mechanisches Abtragen von Halbleitermaterial des Wafers (100) in einem vorbestimmten Muster, wodurch Defekte (116) an dem Wafer (100) entlang des vorbestimmten Musters entstehen. Abschließend werden die Defekte beseitigt, indem Halbleitermaterial entlang einer durch das mechanische Abtragen gebildeten Oberfläche des vorbestimmten Musters abgetragen wird.
PCT/EP2003/004176 2002-04-23 2003-04-22 Verfahren zum bearbeiten eines wafers WO2003092040A2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE10218099 2002-04-23
DE10218099.7 2002-04-23
DE10229499.2 2002-07-01
DE10229499A DE10229499B4 (de) 2002-04-23 2002-07-01 Verfahren zum Bearbeiten eines Wafers

Publications (2)

Publication Number Publication Date
WO2003092040A2 WO2003092040A2 (de) 2003-11-06
WO2003092040A3 true WO2003092040A3 (de) 2004-03-25

Family

ID=29271565

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/004176 WO2003092040A2 (de) 2002-04-23 2003-04-22 Verfahren zum bearbeiten eines wafers

Country Status (1)

Country Link
WO (1) WO2003092040A2 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113224005A (zh) * 2021-04-08 2021-08-06 深圳市德明利光电有限公司 一种芯片切割道工艺方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6063696A (en) * 1997-05-07 2000-05-16 Texas Instruments Incorporated Method of reducing wafer particles after partial saw using a superhard protective coating
WO2001003180A1 (de) * 1999-07-01 2001-01-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. Verfahren zum vereinzeln eines wafers
US6294439B1 (en) * 1997-07-23 2001-09-25 Kabushiki Kaisha Toshiba Method of dividing a wafer and method of manufacturing a semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6063696A (en) * 1997-05-07 2000-05-16 Texas Instruments Incorporated Method of reducing wafer particles after partial saw using a superhard protective coating
US6294439B1 (en) * 1997-07-23 2001-09-25 Kabushiki Kaisha Toshiba Method of dividing a wafer and method of manufacturing a semiconductor device
WO2001003180A1 (de) * 1999-07-01 2001-01-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. Verfahren zum vereinzeln eines wafers

Also Published As

Publication number Publication date
WO2003092040A2 (de) 2003-11-06

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