WO2003081712A3 - Grating element for filtering wavelengths ≤ 100nm - Google Patents

Grating element for filtering wavelengths ≤ 100nm Download PDF

Info

Publication number
WO2003081712A3
WO2003081712A3 PCT/EP2003/002419 EP0302419W WO03081712A3 WO 2003081712 A3 WO2003081712 A3 WO 2003081712A3 EP 0302419 W EP0302419 W EP 0302419W WO 03081712 A3 WO03081712 A3 WO 03081712A3
Authority
WO
WIPO (PCT)
Prior art keywords
grating
grating element
filtering wavelengths
individual
wavelengths
Prior art date
Application number
PCT/EP2003/002419
Other languages
German (de)
French (fr)
Other versions
WO2003081712A2 (en
Inventor
Klaus Heidemann
Karlfried Osterried
Original Assignee
Zeiss Carl Smt Ag
Klaus Heidemann
Karlfried Osterried
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Klaus Heidemann, Karlfried Osterried filed Critical Zeiss Carl Smt Ag
Priority to EP03708203A priority Critical patent/EP1485759A2/en
Priority to AU2003212324A priority patent/AU2003212324A1/en
Priority to JP2003579308A priority patent/JP2005521107A/en
Publication of WO2003081712A2 publication Critical patent/WO2003081712A2/en
Publication of WO2003081712A3 publication Critical patent/WO2003081712A3/en
Priority to US10/945,626 priority patent/US20050180013A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G02B27/4222—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant in projection exposure systems, e.g. photolithographic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
    • G02B27/4244—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in wavelength selecting devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements

Abstract

The invention relates to a grating element for filtering wavelengths ≤ 100 nm, comprising a plurality of individual grating elements, which have grating lines that produce a grating periodicity. The invention is characterised in that the individual grating elements are arranged one behind the other in the direction of the beams of a beam bundle, which strikes the grating element, on a curved surface in relation to the plane that is fixed by the grating element.
PCT/EP2003/002419 2002-03-21 2003-03-10 Grating element for filtering wavelengths ≤ 100nm WO2003081712A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP03708203A EP1485759A2 (en) 2002-03-21 2003-03-10 Grating element for filtering wavelengths = 100nm
AU2003212324A AU2003212324A1 (en) 2002-03-21 2003-03-10 Grating element for filtering wavelengths d 100nm
JP2003579308A JP2005521107A (en) 2002-03-21 2003-03-10 Lattice element for filtering wavelengths below 100 nm
US10/945,626 US20050180013A1 (en) 2002-03-21 2004-09-21 Grating element for filtering wavelengths < 100 nm

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10212691.7 2002-03-21
DE2002112691 DE10212691A1 (en) 2002-03-21 2002-03-21 Grating element for filtering wavelengths 100 nm

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/945,626 Continuation US20050180013A1 (en) 2002-03-21 2004-09-21 Grating element for filtering wavelengths < 100 nm

Publications (2)

Publication Number Publication Date
WO2003081712A2 WO2003081712A2 (en) 2003-10-02
WO2003081712A3 true WO2003081712A3 (en) 2004-03-04

Family

ID=27798029

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/002419 WO2003081712A2 (en) 2002-03-21 2003-03-10 Grating element for filtering wavelengths ≤ 100nm

Country Status (5)

Country Link
EP (1) EP1485759A2 (en)
JP (1) JP2005521107A (en)
AU (1) AU2003212324A1 (en)
DE (1) DE10212691A1 (en)
WO (1) WO2003081712A2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7821900B2 (en) * 2008-05-15 2010-10-26 Northrop Grumman Systems Corporation Diffractive optical element and method of designing the same
NL2004816A (en) * 2009-07-07 2011-01-10 Asml Netherlands Bv Euv radiation generation apparatus.
DE102011003145A1 (en) * 2010-02-09 2011-08-11 Carl Zeiss SMT GmbH, 73447 Optical system with aperture device
JP5637702B2 (en) * 2010-03-09 2014-12-10 キヤノン株式会社 Exposure apparatus and device manufacturing method
DE102017206066A1 (en) * 2017-04-10 2018-10-11 Anvajo GmbH spectrometer
DE102021210671A1 (en) 2021-09-24 2022-12-01 Carl Zeiss Smt Gmbh INTENSITY ADJUSTING FILTER FOR AN OPTICAL ASSEMBLY AND OPTICAL ASSEMBLY WITH A RESPECTIVE INTENSITY ADJUSTING FILTER AND METHOD OF MANUFACTURE THEREOF

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04120717A (en) * 1990-09-12 1992-04-21 Nec Corp X-ray exposure apparatus
EP0884736A1 (en) * 1997-06-11 1998-12-16 Istituto Nazionale Di Fisica Nucleare Pseudo-spherical stepped diffractor constructed under constant step width conditions (multi-stepped monochromator)
US6285497B1 (en) * 1998-08-06 2001-09-04 Euv Llc Diffractive element in extreme-UV lithography condenser
US20020097385A1 (en) * 2000-10-10 2002-07-25 Asm Lithography B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04120717A (en) * 1990-09-12 1992-04-21 Nec Corp X-ray exposure apparatus
EP0884736A1 (en) * 1997-06-11 1998-12-16 Istituto Nazionale Di Fisica Nucleare Pseudo-spherical stepped diffractor constructed under constant step width conditions (multi-stepped monochromator)
US6285497B1 (en) * 1998-08-06 2001-09-04 Euv Llc Diffractive element in extreme-UV lithography condenser
US20020097385A1 (en) * 2000-10-10 2002-07-25 Asm Lithography B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 016, no. 379 (E - 1247) 13 August 1992 (1992-08-13) *

Also Published As

Publication number Publication date
JP2005521107A (en) 2005-07-14
WO2003081712A2 (en) 2003-10-02
DE10212691A1 (en) 2003-10-02
EP1485759A2 (en) 2004-12-15
AU2003212324A8 (en) 2003-10-08
AU2003212324A1 (en) 2003-10-08

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